DE69433493D1 - Stabilisierte kationisch härtbare Zusammensetzungen - Google Patents

Stabilisierte kationisch härtbare Zusammensetzungen

Info

Publication number
DE69433493D1
DE69433493D1 DE69433493T DE69433493T DE69433493D1 DE 69433493 D1 DE69433493 D1 DE 69433493D1 DE 69433493 T DE69433493 T DE 69433493T DE 69433493 T DE69433493 T DE 69433493T DE 69433493 D1 DE69433493 D1 DE 69433493D1
Authority
DE
Germany
Prior art keywords
curable compositions
cationically curable
stabilized
stabilized cationically
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69433493T
Other languages
English (en)
Other versions
DE69433493T2 (de
Inventor
Wayne S Mahoney
Michael C Palazzotto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of DE69433493D1 publication Critical patent/DE69433493D1/de
Application granted granted Critical
Publication of DE69433493T2 publication Critical patent/DE69433493T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/12—Saturated oxiranes characterised by the catalysts used containing organo-metallic compounds or metal hydrides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterized by the type of post-polymerisation functionalisation
    • C08G2650/16—Photopolymerisation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2809—Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2852—Adhesive compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31511—Of epoxy ether

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
DE69433493T 1993-06-16 1994-05-12 Stabilisierte kationisch härtbare Zusammensetzungen Expired - Fee Related DE69433493T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78738 1993-06-16
US08/078,738 US5494943A (en) 1993-06-16 1993-06-16 Stabilized cationically-curable compositions

Publications (2)

Publication Number Publication Date
DE69433493D1 true DE69433493D1 (de) 2004-02-19
DE69433493T2 DE69433493T2 (de) 2004-12-02

Family

ID=22145930

Family Applications (3)

Application Number Title Priority Date Filing Date
DE69435343T Expired - Lifetime DE69435343D1 (de) 1993-06-16 1994-05-12 Stabilisierte kationisch härtbare Zusammensetzungen
DE69434027T Expired - Fee Related DE69434027T2 (de) 1993-06-16 1994-05-12 Stabilisierte Kationisch härtbare Zusammensetzungen
DE69433493T Expired - Fee Related DE69433493T2 (de) 1993-06-16 1994-05-12 Stabilisierte kationisch härtbare Zusammensetzungen

Family Applications Before (2)

Application Number Title Priority Date Filing Date
DE69435343T Expired - Lifetime DE69435343D1 (de) 1993-06-16 1994-05-12 Stabilisierte kationisch härtbare Zusammensetzungen
DE69434027T Expired - Fee Related DE69434027T2 (de) 1993-06-16 1994-05-12 Stabilisierte Kationisch härtbare Zusammensetzungen

Country Status (9)

Country Link
US (2) US5494943A (de)
EP (5) EP0909773B1 (de)
JP (2) JPH08511572A (de)
KR (1) KR100381949B1 (de)
CN (1) CN1125456A (de)
CA (1) CA2162883A1 (de)
DE (3) DE69435343D1 (de)
ES (2) ES2227757T3 (de)
WO (1) WO1994029364A1 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5744557A (en) * 1993-06-16 1998-04-28 Minnesota Mining And Manufacturing Company Energy-curable cyanate/ethylenically unsaturated compositions
KR0172779B1 (ko) * 1995-03-29 1999-03-20 김주용 감광막 제거 방법
DE19629082A1 (de) * 1996-07-18 1998-01-22 Siemens Ag Thermisch härtbares einkomponentiges Low viskosity Adhesive-Klebstoffsystem für Verklebungen im Mikrobereich
FR2752582B1 (fr) * 1996-08-21 2003-06-13 Rhone Poulenc Chimie Compositions a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adherents
US5982271A (en) * 1996-11-28 1999-11-09 Tdk Corporation Organic positive temperature coefficient thermistor
US6174932B1 (en) * 1998-05-20 2001-01-16 Denovus Llc Curable sealant composition
US6858260B2 (en) 1997-05-21 2005-02-22 Denovus Llc Curable sealant composition
US6277898B1 (en) * 1997-05-21 2001-08-21 Denovus Llc Curable sealant composition
US5973020A (en) * 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
US6187836B1 (en) 1998-06-05 2001-02-13 3M Innovative Properties Company Compositions featuring cationically active and free radically active functional groups, and methods for polymerizing such compositions
JP3737285B2 (ja) * 1998-08-28 2006-01-18 積水化学工業株式会社 光硬化性組成物、光硬化性接着シート、及び接合方法
JP3739211B2 (ja) * 1998-08-28 2006-01-25 積水化学工業株式会社 光硬化型粘接着シート、光硬化型粘接着シートの製造方法及び接合方法
US6306926B1 (en) * 1998-10-07 2001-10-23 3M Innovative Properties Company Radiopaque cationically polymerizable compositions comprising a radiopacifying filler, and method for polymerizing same
US6482868B1 (en) 1998-12-31 2002-11-19 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
US6133335A (en) * 1998-12-31 2000-10-17 3M Innovative Properties Company Photo-polymerizable compositions and articles made therefrom
US6265459B1 (en) 1998-12-31 2001-07-24 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
DE19912251A1 (de) 1999-03-18 2000-09-21 Espe Dental Ag Zweikomponentige Zubereitungen zur Herstellung von zahntechnischen Modellen
US6413699B1 (en) * 1999-10-11 2002-07-02 Macdermid Graphic Arts, Inc. UV-absorbing support layers and flexographic printing elements comprising same
US6635689B1 (en) * 2000-06-26 2003-10-21 3M Innovative Properties Company Accelerators for cationic polymerization catalyzed by iron-based catalysts
US6391523B1 (en) * 2000-09-15 2002-05-21 Microchem Corp. Fast drying thick film negative photoresist
WO2002057321A1 (en) * 2001-01-16 2002-07-25 Henkel Loctite Corporation Oil-activated sheet metal adhesive compositions
US20040094264A1 (en) * 2001-01-30 2004-05-20 Hiroaki Yamaguchi Method for adhering substrates using light activatable adhesive film
JP3627011B2 (ja) 2001-02-13 2005-03-09 インターナショナル・ビジネス・マシーンズ・コーポレーション 接合方法
US6592801B2 (en) * 2001-04-30 2003-07-15 Essilor International Compagnie Generale D'optique Photopolymerization of episulfides using metal complexes and its use for making ophthalmic lenses
US7053133B2 (en) * 2001-05-29 2006-05-30 Hiroaki Yamaguchi Ultraviolet activatable adhesive film
US6955739B2 (en) * 2001-06-19 2005-10-18 3M Innovative Properties Company Method for adhering substrates using ultraviolet activatable adhesive film and an ultraviolet irradiation apparatus
US20040266913A1 (en) * 2001-09-13 2004-12-30 Hiroaki Yamaguchi Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
US20050256230A1 (en) * 2002-04-01 2005-11-17 Hiroaki Yamaguchi Cationic polymerizable adhesive composition and anisotropically electroconductive adhesive composition
US6773474B2 (en) 2002-04-19 2004-08-10 3M Innovative Properties Company Coated abrasive article
GB0212977D0 (en) * 2002-06-06 2002-07-17 Vantico Ag Actinic radiation curable compositions and their use
DE10241165B4 (de) * 2002-09-05 2005-08-11 Kodak Polychrome Graphics Gmbh Stabilisierte infrarotempfindliche Elemente
JP4093938B2 (ja) * 2003-08-26 2008-06-04 松下電器産業株式会社 光情報記録媒体の原盤製造方法、パターン形成方法およびレジスト
US7192991B2 (en) 2003-11-26 2007-03-20 3M Innovative Properties Company Cationically curable composition
US20050250929A1 (en) * 2004-05-10 2005-11-10 3M Innovative Properties Company Ferrocenium-derived catalyst for cationically polymerizable monomers
US7449280B2 (en) * 2004-05-26 2008-11-11 Microchem Corp. Photoimageable coating composition and composite article thereof
US7294048B2 (en) * 2004-06-18 2007-11-13 3M Innovative Properties Company Abrasive article
US20060088674A1 (en) * 2004-10-27 2006-04-27 Hladik Molly L Ultraviolet curable barrier layers
US20080003420A1 (en) * 2006-06-29 2008-01-03 3M Innovative Properties Company Transfer hardcoat films for graphic substrates
US8764960B2 (en) * 2006-08-07 2014-07-01 Inktec Co., Ltd. Manufacturing methods for metal clad laminates
US20090000727A1 (en) * 2007-06-29 2009-01-01 Kanta Kumar Hardcoat layers on release liners
US20090004478A1 (en) * 2007-06-29 2009-01-01 3M Innovative Properties Company Flexible hardcoat compositions, articles, and methods
EP2428199A1 (de) 2010-09-09 2012-03-14 3M Innovative Properties Company Härtbare Zusammensetzung, derer Herstellungsverfahren und Verwendung
KR20120036454A (ko) * 2010-10-08 2012-04-18 동우 화인켐 주식회사 점착제 조성물, 이를 포함하는 편광판 및 액정표시장치
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
WO2013116130A1 (en) 2012-02-03 2013-08-08 3M Innovative Properties Company Primer compositions for optical films
JP5403175B2 (ja) * 2012-04-23 2014-01-29 大日本印刷株式会社 カラーフィルタ用色材分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、並びに、液晶表示装置及び有機発光表示装置
JP6102219B2 (ja) * 2012-11-28 2017-03-29 凸版印刷株式会社 横電界を印加する表示方式の液晶表示装置用カラーフィルタ
EP2938652B1 (de) 2012-12-27 2021-03-31 3M Innovative Properties Company Polymerisierbare zusammensetzung mit einem benzoxazin und einem säurebildenden peroxidkatalysator, artikel und verfahren

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3711391A (en) * 1971-05-18 1973-01-16 American Can Co Photopolymerizable epoxy systems containing sulfoxide gelation inhibitors
US3816280A (en) * 1971-05-18 1974-06-11 American Can Co Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors
GB1404242A (en) * 1973-01-15 1975-08-28 American Can Co Controlled polymerization process and stabilized polymerizable compositions
US5089536A (en) * 1982-11-22 1992-02-18 Minnesota Mining And Manufacturing Company Energy polmerizable compositions containing organometallic initiators
US5191101A (en) * 1982-11-22 1993-03-02 Minnesota Mining And Manufacturing Company Energy polymerizable compositions containing organometallic initiators
US5073476A (en) * 1983-05-18 1991-12-17 Ciba-Geigy Corporation Curable composition and the use thereof
EP0152377B1 (de) * 1984-02-10 1987-12-09 Ciba-Geigy Ag Härtbare Zusammensetzung und deren Verwendung
US4503211A (en) * 1984-05-31 1985-03-05 Minnesota Mining And Manufacturing Co. Epoxy resin curing agent, process and composition
DE3586485D1 (de) * 1984-11-14 1992-09-17 Ciba Geigy Ag Photohaertbare gefuellte expoxidharz-zusammensetzungen und deren verwendung.
US4707432A (en) * 1985-09-23 1987-11-17 Ciba-Geigy Corporation Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
US4751138A (en) * 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US4920182A (en) * 1987-12-18 1990-04-24 Ciba-Geigy Corporation Epoxy resin compositions containing polyester flexibilizer and metallocene complex initiator
US4846905A (en) * 1988-04-06 1989-07-11 Minnesota Mining And Manufacturing Company Acid catalyzed, toughened epoxy adhesives
US4985340A (en) * 1988-06-01 1991-01-15 Minnesota Mining And Manufacturing Company Energy curable compositions: two component curing agents
DE58908927D1 (de) * 1988-08-04 1995-03-09 Ciba Geigy Ag Härterkombination für kationisch polymerisierbare Materialien.
US5179179A (en) * 1989-03-21 1993-01-12 Ciba-Geigy Corporation Initiators for materials which can be polymerized cationically
US5130406A (en) * 1989-03-21 1992-07-14 Ciba-Geigy Corporation Initiators for materials which can be polymerized cationically
ES2074686T3 (es) * 1990-04-10 1995-09-16 Ciba Geigy Ag Mezclas de materiales con resina epoxi que contienen complejos areno de hierro y determinadas aminas.
WO1992008745A1 (en) * 1990-11-16 1992-05-29 Nippon Kayaku Kabushiki Kaisha Cationically polymerizable organic material composition and stabilization of said composition
ES2090568T3 (es) * 1991-04-08 1996-10-16 Ciba Geigy Ag Composiciones reticulables termicamente.
US5252694A (en) * 1992-01-22 1993-10-12 Minnesota Mining And Manufacturing Company Energy-polymerization adhesive, coating, film and process for making the same
US5362421A (en) * 1993-06-16 1994-11-08 Minnesota Mining And Manufacturing Company Electrically conductive adhesive compositions
US5453450A (en) * 1993-06-16 1995-09-26 Minnesota Mining And Manufacturing Company Stabilized curable adhesives

Also Published As

Publication number Publication date
EP1277778A3 (de) 2003-11-26
EP0703937A1 (de) 1996-04-03
US5672637A (en) 1997-09-30
CA2162883A1 (en) 1994-12-22
JPH08511572A (ja) 1996-12-03
JP4662963B2 (ja) 2011-03-30
DE69434027D1 (de) 2004-10-28
DE69433493T2 (de) 2004-12-02
US5494943A (en) 1996-02-27
WO1994029364A1 (en) 1994-12-22
DE69435343D1 (de) 2011-05-26
EP1277778A2 (de) 2003-01-22
EP1277777A2 (de) 2003-01-22
EP1277778B1 (de) 2011-04-13
DE69434027T2 (de) 2005-09-08
EP0896974B1 (de) 2004-01-14
EP0909773A2 (de) 1999-04-21
EP0896974A2 (de) 1999-02-17
CN1125456A (zh) 1996-06-26
EP0909773B1 (de) 2004-09-22
JP2007217709A (ja) 2007-08-30
EP0909773A3 (de) 1999-05-06
KR100381949B1 (ko) 2003-08-21
EP1277777A3 (de) 2003-11-26
EP0896974A3 (de) 1999-05-06
ES2227757T3 (es) 2005-04-01
ES2210647T3 (es) 2004-07-01

Similar Documents

Publication Publication Date Title
DE69434027D1 (de) Stabilisierte Kationisch härtbare Zusammensetzungen
BR9304329A (pt) Composiçao curável
DE69209570D1 (de) Härtbare Zusammensetzung
DE69423670D1 (de) Siloxy-aluminoxan-Zusammensetzungen
DE69604940D1 (de) Strahlenhärtbare Zusammensetzungen
DE4499925T1 (de) Abspülbare Zusammensetzungen
DE69300984D1 (de) Strahlungshärtbare Zusammensetzungen
DE69402871D1 (de) Photo-härtbare überzugszusammensetzungen
DE69326743D1 (de) Tintenzusammensetzungen
DE69321652D1 (de) Härtbare Silikonzusammensetzung
DE69322442D1 (de) Strahlungshärtbare Hartüberzugszusammensetzungen
FI941663A (fi) Trikriittisen pisteen omaava koostumus
GB9422489D0 (en) Curable epoxysilicone compositions
DE59206930D1 (de) Thermisch härtbare Zusammensetzungen
DZ1835A1 (fr) Nouvelles formulations.
DE69423258D1 (de) Härtbare Zusammensetzung
DE69422755D1 (de) Härtbare Zusammensetzung
FR2712491B1 (fr) Compositions antisudorales.
DE69319416D1 (de) Härtbare Organopolysiloxanzusammensetzungen
DE69737583D1 (de) Härtbare Zusammensetzung
DE69120171D1 (de) Härtbare Zusammensetzung
DE69206431D1 (de) Härtbare Zusammensetzung.
DE59408674D1 (de) Dichtstoffe
DE69309733D1 (de) Lichthärtbare Zusammensetzungen
DE69222886D1 (de) Härtbare Zusammensetzung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee