DE69421215D1 - Einen Schnellatomstrahl gebrauchende Verarbeitungsvorrichtung - Google Patents
Einen Schnellatomstrahl gebrauchende VerarbeitungsvorrichtungInfo
- Publication number
- DE69421215D1 DE69421215D1 DE69421215T DE69421215T DE69421215D1 DE 69421215 D1 DE69421215 D1 DE 69421215D1 DE 69421215 T DE69421215 T DE 69421215T DE 69421215 T DE69421215 T DE 69421215T DE 69421215 D1 DE69421215 D1 DE 69421215D1
- Authority
- DE
- Germany
- Prior art keywords
- processing device
- fast atom
- atom beam
- fast
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/04—Irradiation devices with beam-forming means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Drying Of Semiconductors (AREA)
- Laser Beam Processing (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Particle Accelerators (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19207393A JP3432545B2 (ja) | 1993-07-05 | 1993-07-05 | 高速原子線を用いる加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69421215D1 true DE69421215D1 (de) | 1999-11-25 |
DE69421215T2 DE69421215T2 (de) | 2000-05-31 |
Family
ID=16285188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69421215T Expired - Fee Related DE69421215T2 (de) | 1993-07-05 | 1994-07-04 | Einen Schnellatomstrahl gebrauchende Verarbeitungsvorrichtung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5563416A (de) |
EP (1) | EP0633714B1 (de) |
JP (1) | JP3432545B2 (de) |
KR (1) | KR100333429B1 (de) |
DE (1) | DE69421215T2 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6671034B1 (en) * | 1998-04-30 | 2003-12-30 | Ebara Corporation | Microfabrication of pattern imprinting |
US6465795B1 (en) * | 2000-03-28 | 2002-10-15 | Applied Materials, Inc. | Charge neutralization of electron beam systems |
US6921722B2 (en) * | 2000-05-30 | 2005-07-26 | Ebara Corporation | Coating, modification and etching of substrate surface with particle beam irradiation of the same |
CN100369706C (zh) * | 2004-10-22 | 2008-02-20 | 沈阳黎明航空发动机(集团)有限责任公司 | 一种薄壁钛合金组件的真空电子束焊接方法 |
US8801378B2 (en) | 2010-02-24 | 2014-08-12 | Sikorsky Aircraft Corporation | Low offset hingeless rotor with pitch change bearings |
CN103084726B (zh) * | 2013-02-01 | 2015-04-08 | 中国航空工业集团公司北京航空制造工程研究所 | 一种电子束表面微造型的动态加工方法 |
CN112570875B (zh) * | 2020-12-09 | 2022-07-29 | 兰州空间技术物理研究所 | 一种用于板式表面张力贮箱形变控制的焊接工艺方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL244946A (de) * | 1959-08-17 | |||
SU886044A1 (ru) * | 1980-03-11 | 1981-11-30 | Каунасский Политехнический Институт Им. А.Снечкуса | Способ обработки рабочей поверхности магнитной головки |
FR2555829B1 (fr) * | 1983-11-30 | 1986-03-28 | Lucas Georges | Emission conjuguee de lumiere coherente et de particules materielles chargees en energie, et dispositif pour la mise en oeuvre d'une telle emission |
US4624736A (en) * | 1984-07-24 | 1986-11-25 | The United States Of America As Represented By The United States Department Of Energy | Laser/plasma chemical processing of substrates |
US5108543A (en) * | 1984-11-07 | 1992-04-28 | Hitachi, Ltd. | Method of surface treatment |
KR960016218B1 (ko) * | 1987-06-05 | 1996-12-07 | 가부시기가이샤 히다찌세이사꾸쇼 | 표면처리방법 및 그 장치 |
US4886570A (en) * | 1987-07-16 | 1989-12-12 | Texas Instruments Incorporated | Processing apparatus and method |
EP0380667A4 (en) * | 1987-10-07 | 1991-04-24 | Terumo Kabushiki Kaisha | Ultraviolet-absorbing polymer material and photoetching process |
US4874459A (en) * | 1988-10-17 | 1989-10-17 | The Regents Of The University Of California | Low damage-producing, anisotropic, chemically enhanced etching method and apparatus |
EP0418540A3 (en) * | 1989-08-11 | 1991-08-07 | Sanyo Electric Co., Ltd. | Dry etching method |
JPH0724240B2 (ja) * | 1991-03-05 | 1995-03-15 | 株式会社荏原製作所 | 高速原子線源 |
US5286331A (en) * | 1991-11-01 | 1994-02-15 | International Business Machines Corporation | Supersonic molecular beam etching of surfaces |
JP2840502B2 (ja) * | 1992-06-03 | 1998-12-24 | 三洋電機株式会社 | 高機能材料膜形成方法 |
US5429730A (en) * | 1992-11-02 | 1995-07-04 | Kabushiki Kaisha Toshiba | Method of repairing defect of structure |
-
1993
- 1993-07-05 JP JP19207393A patent/JP3432545B2/ja not_active Expired - Fee Related
-
1994
- 1994-07-04 EP EP94110368A patent/EP0633714B1/de not_active Expired - Lifetime
- 1994-07-04 DE DE69421215T patent/DE69421215T2/de not_active Expired - Fee Related
- 1994-07-05 US US08/267,741 patent/US5563416A/en not_active Expired - Fee Related
- 1994-07-05 KR KR1019940015981A patent/KR100333429B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5563416A (en) | 1996-10-08 |
EP0633714A1 (de) | 1995-01-11 |
JP3432545B2 (ja) | 2003-08-04 |
KR950004654A (ko) | 1995-02-18 |
EP0633714B1 (de) | 1999-10-20 |
KR100333429B1 (ko) | 2002-09-05 |
DE69421215T2 (de) | 2000-05-31 |
JPH0716761A (ja) | 1995-01-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |