DE69128343D1 - Photopolymerisierbare zusammensetzung und photopolymerisierbares element - Google Patents

Photopolymerisierbare zusammensetzung und photopolymerisierbares element

Info

Publication number
DE69128343D1
DE69128343D1 DE69128343T DE69128343T DE69128343D1 DE 69128343 D1 DE69128343 D1 DE 69128343D1 DE 69128343 T DE69128343 T DE 69128343T DE 69128343 T DE69128343 T DE 69128343T DE 69128343 D1 DE69128343 D1 DE 69128343D1
Authority
DE
Germany
Prior art keywords
photopolymerizable
composition
photopolymerizable composition
photopolymerizable element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69128343T
Other languages
English (en)
Other versions
DE69128343T2 (de
Inventor
Yoshitaka Hitachi Chemi Minami
Hajime Hitachi Chemic Kakumaru
Naohiro Asahi Denka Kog Kubota
Nobuhide Asahi Denka Tominaga
Koji Asahi Denka Kogy Ishizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Asahi Denka Kogyo KK filed Critical Hitachi Chemical Co Ltd
Publication of DE69128343D1 publication Critical patent/DE69128343D1/de
Application granted granted Critical
Publication of DE69128343T2 publication Critical patent/DE69128343T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D219/00—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems
    • C07D219/02—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems with only hydrogen, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69128343T 1990-09-28 1991-09-27 Photopolymerisierbare zusammensetzung und photopolymerisierbares element Expired - Lifetime DE69128343T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2260876A JP2505637B2 (ja) 1990-09-28 1990-09-28 光重合性組成物および光重合性エレメント
PCT/JP1991/001293 WO1992006412A1 (fr) 1990-09-28 1991-09-27 Composition photopolymerisable et element photopolymerisable

Publications (2)

Publication Number Publication Date
DE69128343D1 true DE69128343D1 (de) 1998-01-15
DE69128343T2 DE69128343T2 (de) 1998-03-26

Family

ID=17353982

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69128343T Expired - Lifetime DE69128343T2 (de) 1990-09-28 1991-09-27 Photopolymerisierbare zusammensetzung und photopolymerisierbares element

Country Status (5)

Country Link
US (1) US5334484A (de)
EP (1) EP0503076B1 (de)
JP (1) JP2505637B2 (de)
DE (1) DE69128343T2 (de)
WO (1) WO1992006412A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08157744A (ja) * 1994-12-12 1996-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
US7147983B1 (en) * 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
JP4716347B2 (ja) * 2001-04-05 2011-07-06 旭化成イーマテリアルズ株式会社 ドライフィルムレジスト
JP2002182385A (ja) * 2001-10-19 2002-06-26 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、感光性樹脂組成物層の積層方法、感光性樹脂組成物層積層基板及び感光性樹脂組成物層の硬化方法
JP2002182387A (ja) * 2001-10-19 2002-06-26 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JP2002148797A (ja) * 2001-10-19 2002-05-22 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、感光性樹脂組成物層の積層方法、感光性樹脂組成物層積層基板及び感光性樹脂組成物層の硬化方法
JP2003091067A (ja) * 2002-06-17 2003-03-28 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JP5252963B2 (ja) * 2007-04-17 2013-07-31 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及び積層体
MY152732A (en) * 2008-04-28 2014-11-28 Hitachi Chemical Co Ltd Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board
EP2284611B1 (de) * 2008-06-02 2013-11-20 Hitachi Chemical Company, Ltd. Lichtempfindliche harzzusammensetzung, lichtempfindliches element, verfahren zur herstellung einer resist-struktur und verfahren zur herstellung einer bestückten leiterplatte
KR101514900B1 (ko) * 2009-03-13 2015-04-23 히타치가세이가부시끼가이샤 감광성 수지 조성물, 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법
CN104111585A (zh) * 2009-07-29 2014-10-22 旭化成电子材料株式会社 感光性树脂组合物、感光性树脂层压体和抗蚀图案形成方法
CN103076719B (zh) * 2011-10-26 2019-08-09 日立化成株式会社 感光性树脂组合物、感光性元件、抗蚀图案的形成方法及印刷配线板的制造方法
JP6064480B2 (ja) * 2011-10-26 2017-01-25 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP5826006B2 (ja) * 2011-12-01 2015-12-02 旭化成イーマテリアルズ株式会社 感光性樹脂組成物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5327605A (en) * 1976-08-26 1978-03-15 Sumitomo Metal Ind Silicaaalumina refractory materials
JPS59226002A (ja) * 1983-06-06 1984-12-19 Fuji Photo Film Co Ltd 光重合性組成物
JPS60164739A (ja) * 1984-02-07 1985-08-27 Fuji Photo Film Co Ltd 光重合性組成物
JPH07103165B2 (ja) * 1987-04-14 1995-11-08 日立化成工業株式会社 光重合性組成物
DE3878349T2 (de) * 1987-03-17 1993-05-27 Asahi Denka Kogyo Kk Substituierte acridin-derivate und deren verwendung.
JP2570758B2 (ja) * 1987-08-19 1997-01-16 日立化成工業株式会社 感光性樹脂組成物
JP2693568B2 (ja) * 1989-04-28 1997-12-24 日立化成工業株式会社 光重合性組成物
EP0360443A1 (de) * 1988-09-03 1990-03-28 Hitachi Chemical Co., Ltd. Acridinverbindung und ihre Verwendung in photopolymerisierbarer Zusammensetzung
JP2513498B2 (ja) * 1988-09-03 1996-07-03 旭電化工業株式会社 アクリジン化合物
DE3843204A1 (de) * 1988-12-22 1990-06-28 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial

Also Published As

Publication number Publication date
WO1992006412A1 (fr) 1992-04-16
DE69128343T2 (de) 1998-03-26
US5334484A (en) 1994-08-02
EP0503076B1 (de) 1997-12-03
JP2505637B2 (ja) 1996-06-12
EP0503076A1 (de) 1992-09-16
EP0503076A4 (en) 1993-02-24
JPH04136942A (ja) 1992-05-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HITACHI CHEMICAL CO., LTD., TOKIO/TOKYO, JP

Owner name: ADEKA CORP., TOKIO/TOKYO, JP