DE69128343D1 - Photopolymerisierbare zusammensetzung und photopolymerisierbares element - Google Patents
Photopolymerisierbare zusammensetzung und photopolymerisierbares elementInfo
- Publication number
- DE69128343D1 DE69128343D1 DE69128343T DE69128343T DE69128343D1 DE 69128343 D1 DE69128343 D1 DE 69128343D1 DE 69128343 T DE69128343 T DE 69128343T DE 69128343 T DE69128343 T DE 69128343T DE 69128343 D1 DE69128343 D1 DE 69128343D1
- Authority
- DE
- Germany
- Prior art keywords
- photopolymerizable
- composition
- photopolymerizable composition
- photopolymerizable element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D219/00—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems
- C07D219/02—Heterocyclic compounds containing acridine or hydrogenated acridine ring systems with only hydrogen, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2260876A JP2505637B2 (ja) | 1990-09-28 | 1990-09-28 | 光重合性組成物および光重合性エレメント |
PCT/JP1991/001293 WO1992006412A1 (fr) | 1990-09-28 | 1991-09-27 | Composition photopolymerisable et element photopolymerisable |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69128343D1 true DE69128343D1 (de) | 1998-01-15 |
DE69128343T2 DE69128343T2 (de) | 1998-03-26 |
Family
ID=17353982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69128343T Expired - Lifetime DE69128343T2 (de) | 1990-09-28 | 1991-09-27 | Photopolymerisierbare zusammensetzung und photopolymerisierbares element |
Country Status (5)
Country | Link |
---|---|
US (1) | US5334484A (de) |
EP (1) | EP0503076B1 (de) |
JP (1) | JP2505637B2 (de) |
DE (1) | DE69128343T2 (de) |
WO (1) | WO1992006412A1 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08157744A (ja) * | 1994-12-12 | 1996-06-18 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
US7147983B1 (en) * | 1996-10-07 | 2006-12-12 | Shipley Company, L.L.C. | Dyed photoresists and methods and articles of manufacture comprising same |
JP4716347B2 (ja) * | 2001-04-05 | 2011-07-06 | 旭化成イーマテリアルズ株式会社 | ドライフィルムレジスト |
JP2002182385A (ja) * | 2001-10-19 | 2002-06-26 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、感光性樹脂組成物層の積層方法、感光性樹脂組成物層積層基板及び感光性樹脂組成物層の硬化方法 |
JP2002182387A (ja) * | 2001-10-19 | 2002-06-26 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
JP2002148797A (ja) * | 2001-10-19 | 2002-05-22 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、感光性樹脂組成物層の積層方法、感光性樹脂組成物層積層基板及び感光性樹脂組成物層の硬化方法 |
JP2003091067A (ja) * | 2002-06-17 | 2003-03-28 | Hitachi Chem Co Ltd | 感光性樹脂組成物及びこれを用いた感光性エレメント |
JP5252963B2 (ja) * | 2007-04-17 | 2013-07-31 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び積層体 |
MY152732A (en) * | 2008-04-28 | 2014-11-28 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board |
EP2284611B1 (de) * | 2008-06-02 | 2013-11-20 | Hitachi Chemical Company, Ltd. | Lichtempfindliche harzzusammensetzung, lichtempfindliches element, verfahren zur herstellung einer resist-struktur und verfahren zur herstellung einer bestückten leiterplatte |
KR101514900B1 (ko) * | 2009-03-13 | 2015-04-23 | 히타치가세이가부시끼가이샤 | 감광성 수지 조성물, 및 이를 이용한 감광성 엘리먼트, 레지스트 패턴의 형성 방법 및 프린트 배선판의 제조 방법 |
CN104111585A (zh) * | 2009-07-29 | 2014-10-22 | 旭化成电子材料株式会社 | 感光性树脂组合物、感光性树脂层压体和抗蚀图案形成方法 |
CN103076719B (zh) * | 2011-10-26 | 2019-08-09 | 日立化成株式会社 | 感光性树脂组合物、感光性元件、抗蚀图案的形成方法及印刷配线板的制造方法 |
JP6064480B2 (ja) * | 2011-10-26 | 2017-01-25 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
JP5826006B2 (ja) * | 2011-12-01 | 2015-12-02 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5327605A (en) * | 1976-08-26 | 1978-03-15 | Sumitomo Metal Ind | Silicaaalumina refractory materials |
JPS59226002A (ja) * | 1983-06-06 | 1984-12-19 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS60164739A (ja) * | 1984-02-07 | 1985-08-27 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPH07103165B2 (ja) * | 1987-04-14 | 1995-11-08 | 日立化成工業株式会社 | 光重合性組成物 |
DE3878349T2 (de) * | 1987-03-17 | 1993-05-27 | Asahi Denka Kogyo Kk | Substituierte acridin-derivate und deren verwendung. |
JP2570758B2 (ja) * | 1987-08-19 | 1997-01-16 | 日立化成工業株式会社 | 感光性樹脂組成物 |
JP2693568B2 (ja) * | 1989-04-28 | 1997-12-24 | 日立化成工業株式会社 | 光重合性組成物 |
EP0360443A1 (de) * | 1988-09-03 | 1990-03-28 | Hitachi Chemical Co., Ltd. | Acridinverbindung und ihre Verwendung in photopolymerisierbarer Zusammensetzung |
JP2513498B2 (ja) * | 1988-09-03 | 1996-07-03 | 旭電化工業株式会社 | アクリジン化合物 |
DE3843204A1 (de) * | 1988-12-22 | 1990-06-28 | Hoechst Ag | Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial |
-
1990
- 1990-09-28 JP JP2260876A patent/JP2505637B2/ja not_active Expired - Lifetime
-
1991
- 1991-09-27 DE DE69128343T patent/DE69128343T2/de not_active Expired - Lifetime
- 1991-09-27 US US07/859,430 patent/US5334484A/en not_active Expired - Lifetime
- 1991-09-27 EP EP91916752A patent/EP0503076B1/de not_active Expired - Lifetime
- 1991-09-27 WO PCT/JP1991/001293 patent/WO1992006412A1/ja active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
WO1992006412A1 (fr) | 1992-04-16 |
DE69128343T2 (de) | 1998-03-26 |
US5334484A (en) | 1994-08-02 |
EP0503076B1 (de) | 1997-12-03 |
JP2505637B2 (ja) | 1996-06-12 |
EP0503076A1 (de) | 1992-09-16 |
EP0503076A4 (en) | 1993-02-24 |
JPH04136942A (ja) | 1992-05-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: HITACHI CHEMICAL CO., LTD., TOKIO/TOKYO, JP Owner name: ADEKA CORP., TOKIO/TOKYO, JP |