DE69106496D1 - Wirbelbettgasverteilerplatte zur Anwendung in einem Gasphasenpolymerisationsapparat. - Google Patents

Wirbelbettgasverteilerplatte zur Anwendung in einem Gasphasenpolymerisationsapparat.

Info

Publication number
DE69106496D1
DE69106496D1 DE69106496T DE69106496T DE69106496D1 DE 69106496 D1 DE69106496 D1 DE 69106496D1 DE 69106496 T DE69106496 T DE 69106496T DE 69106496 T DE69106496 T DE 69106496T DE 69106496 D1 DE69106496 D1 DE 69106496D1
Authority
DE
Germany
Prior art keywords
fluidized bed
distributor plate
phase polymerizer
gas phase
gas distributor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69106496T
Other languages
English (en)
Other versions
DE69106496T2 (de
Inventor
Toru Masaki
Setuo Kawano
Yuzo Saitoh
Hirozo Ijiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Application granted granted Critical
Publication of DE69106496D1 publication Critical patent/DE69106496D1/de
Publication of DE69106496T2 publication Critical patent/DE69106496T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/38—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique with fluidised bed containing a rotatable device or being subject to rotation or to a circulatory movement, i.e. leaving a vessel and subsequently re-entering it
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/44—Fluidisation grids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymerisation Methods In General (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
DE69106496T 1989-11-13 1991-05-10 Wirbelbettgasverteilerplatte zur Anwendung in einem Gasphasenpolymerisationsapparat. Expired - Fee Related DE69106496T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1294455A JP2703813B2 (ja) 1989-11-13 1989-11-13 流動層型気相重合装置のガス分散板
US07/696,800 US5599513A (en) 1989-11-13 1991-05-07 Gas distribution plate for use with fluidized-bed gas-phase polymerizer
EP91107631A EP0512147B1 (de) 1989-11-13 1991-05-10 Wirbelbettgasverteilerplatte zur Anwendung in einem Gasphasenpolymerisationsapparat

Publications (2)

Publication Number Publication Date
DE69106496D1 true DE69106496D1 (de) 1995-02-16
DE69106496T2 DE69106496T2 (de) 1995-06-08

Family

ID=40227874

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69106496T Expired - Fee Related DE69106496T2 (de) 1989-11-13 1991-05-10 Wirbelbettgasverteilerplatte zur Anwendung in einem Gasphasenpolymerisationsapparat.

Country Status (4)

Country Link
US (1) US5599513A (de)
EP (1) EP0512147B1 (de)
JP (1) JP2703813B2 (de)
DE (1) DE69106496T2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5381827A (en) * 1992-11-30 1995-01-17 Sumitomo Chemical Company, Limited Gas distributor for use in gas phase polymerization apparatus
FR2759304B1 (fr) * 1997-02-11 1999-04-02 Pierre Jules Hinderer Procede de traitement en continu de matieres pulverulentes en vrac et installation permettant sa mise en oeuvre
DE19825589A1 (de) 1998-06-09 1999-12-16 Elenac Gmbh Gasphasenwirbelschichtreaktor
DE10015597A1 (de) 2000-03-29 2001-12-20 Huettlin Gmbh Bodenelement für eine Vorrichtung zum Behandeln von partikelförmigem Gut
US20040129218A1 (en) * 2001-12-07 2004-07-08 Toshiki Takahashi Exhaust ring mechanism and plasma processing apparatus using the same
US6670071B2 (en) * 2002-01-15 2003-12-30 Quallion Llc Electric storage battery construction and method of manufacture
US6861094B2 (en) * 2002-04-25 2005-03-01 Micron Technology, Inc. Methods for forming thin layers of materials on micro-device workpieces
US6838114B2 (en) 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US7118783B2 (en) * 2002-06-26 2006-10-10 Micron Technology, Inc. Methods and apparatus for vapor processing of micro-device workpieces
US6821347B2 (en) * 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US6955725B2 (en) * 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US7335396B2 (en) * 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US20040261712A1 (en) * 2003-04-25 2004-12-30 Daisuke Hayashi Plasma processing apparatus
US7235138B2 (en) * 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7344755B2 (en) * 2003-08-21 2008-03-18 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7422635B2 (en) 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7056806B2 (en) * 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) * 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7647886B2 (en) * 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US7584942B2 (en) * 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US20050249873A1 (en) * 2004-05-05 2005-11-10 Demetrius Sarigiannis Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US20060165873A1 (en) * 2005-01-25 2006-07-27 Micron Technology, Inc. Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
US20060237138A1 (en) * 2005-04-26 2006-10-26 Micron Technology, Inc. Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes
JP2008044978A (ja) * 2006-08-11 2008-02-28 Sumitomo Chemical Co Ltd オレフィン重合体の製造方法
CN101952018B (zh) * 2008-02-21 2013-07-31 蓝星环境股份有限公司 用于改善气-液输送的装置
WO2009135315A1 (en) 2008-05-08 2009-11-12 Blue Planet Environmental Inc. Device for mixing gas into a flowing liquid
EP3362151B1 (de) 2015-10-15 2020-08-05 Cargill, Incorporated Zusammensetzung mit oleosomen verschiedener grössenverteilung
WO2018174075A1 (ja) * 2017-03-24 2018-09-27 株式会社カネカ 流動層反応装置及び塩素化塩化ビニル系樹脂の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3089251A (en) * 1959-06-04 1963-05-14 Dorr Oliver Inc Treatment chamber for material in a fluidized state
DE1802550A1 (de) * 1967-11-30 1969-05-29 Fahlberg List Veb Vorrichtung zur Behandlung und Umhuellung von Schuettguetern gleichmaessiger Koernung in der Wirbelschicht
US3508341A (en) * 1968-05-29 1970-04-28 Franklin Carr Price Fluidized bed hearth construction
US3672577A (en) * 1970-10-15 1972-06-27 Fuller Co Fluid bed grid plate assembly
DE2819704C2 (de) * 1978-05-05 1985-10-10 Bergwerksverband Gmbh, 4300 Essen Anströmboden für Wirbelrinnen
DE3128596A1 (de) * 1981-07-20 1983-01-27 Heinz 2050 Hamburg Schumacher Vorrichtung zur behandlung von flockigem oder gekoerntem material mit gasen oder daempfen im kontinuierlichen betrieb im gegenstrom
US4475467A (en) * 1982-02-12 1984-10-09 York-Shipley, Inc. Fluidized bed reactor utilizing a plate support and method of operating the reactor
JPS58154702A (ja) * 1982-03-09 1983-09-14 Mitsui Petrochem Ind Ltd 撹拌流動層型気相重合装置のガス分散板
DZ520A1 (fr) * 1982-03-24 2004-09-13 Union Carbide Corp Procédé perfectionné pour accroitre le rendement espace temps d'une réaction de polymérisation exothermique en lit fluidisé.
DE3425519C2 (de) * 1984-07-11 1986-08-21 Heinrich Grünewald oHG, Inkrom Werk, 5912 Hilchenbach Düse für ein Wirbelbett
CA1241525A (en) * 1984-08-24 1988-09-06 Larry L. Simpson Fluidized bed polymerization reactors
JPS62168501A (ja) * 1986-01-20 1987-07-24 Seiji Michimae 湿式ガス処理装置
DE3613362A1 (de) * 1986-04-19 1987-10-29 Orth Gmbh H Flugschichttrockner
US5014632A (en) * 1988-08-16 1991-05-14 A. Ahlstrom Corporation Distributor plate in a fluidized bed reactor

Also Published As

Publication number Publication date
DE69106496T2 (de) 1995-06-08
JPH03153704A (ja) 1991-07-01
EP0512147A1 (de) 1992-11-11
EP0512147B1 (de) 1995-01-04
JP2703813B2 (ja) 1998-01-26
US5599513A (en) 1997-02-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee