DE69033048D1 - System zur Positionsdetektion - Google Patents
System zur PositionsdetektionInfo
- Publication number
- DE69033048D1 DE69033048D1 DE69033048T DE69033048T DE69033048D1 DE 69033048 D1 DE69033048 D1 DE 69033048D1 DE 69033048 T DE69033048 T DE 69033048T DE 69033048 T DE69033048 T DE 69033048T DE 69033048 D1 DE69033048 D1 DE 69033048D1
- Authority
- DE
- Germany
- Prior art keywords
- detection system
- position detection
- detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1186936A JP2704001B2 (ja) | 1989-07-18 | 1989-07-18 | 位置検出装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69033048D1 true DE69033048D1 (de) | 1999-05-20 |
DE69033048T2 DE69033048T2 (de) | 2000-04-06 |
Family
ID=16197312
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69033048T Expired - Fee Related DE69033048T2 (de) | 1989-07-18 | 1990-07-17 | System zur Positionsdetektion |
Country Status (4)
Country | Link |
---|---|
US (1) | US5148036A (de) |
EP (1) | EP0409572B1 (de) |
JP (1) | JP2704001B2 (de) |
DE (1) | DE69033048T2 (de) |
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0624388B2 (ja) * | 1986-06-13 | 1994-03-30 | 財団法人鉄道総合技術研究所 | 遠方監視制御装置の回線制御方法 |
GB9125603D0 (en) * | 1991-12-02 | 1992-01-29 | Gec-Marconi Limited | Optical analysis system and positioning apparatus therefor |
US5455679A (en) * | 1993-02-22 | 1995-10-03 | Canon Kabushiki Kaisha | Position detecting system |
US6126382A (en) * | 1997-11-26 | 2000-10-03 | Novellus Systems, Inc. | Apparatus for aligning substrate to chuck in processing chamber |
JP2000012455A (ja) * | 1998-06-25 | 2000-01-14 | Nikon Corp | 荷電粒子線転写露光装置及び荷電粒子線転写露光装置におけるマスクと感応基板の位置合わせ方法 |
US6924937B2 (en) * | 1998-11-16 | 2005-08-02 | Canon Kabushiki Kaisha | Aberration correcting optical system |
EP1030222B1 (de) * | 1999-02-18 | 2006-01-04 | ASML Netherlands B.V. | Lithographischer Projektionsapparat |
JP4269393B2 (ja) * | 1999-03-03 | 2009-05-27 | 株式会社ニコン | アライメントマーク及びアライメント方法 |
US6873087B1 (en) | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
EP2264522A3 (de) | 2000-07-16 | 2011-12-14 | The Board of Regents of The University of Texas System | Verfahren zur Bildung einer Struktur auf einem Substrat |
WO2002006902A2 (en) | 2000-07-17 | 2002-01-24 | Board Of Regents, The University Of Texas System | Method and system of automatic fluid dispensing for imprint lithography processes |
WO2002010721A2 (en) * | 2000-08-01 | 2002-02-07 | Board Of Regents, The University Of Texas System | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography |
WO2002017383A2 (en) | 2000-08-21 | 2002-02-28 | Board Of Regents, The University Of Texas System | Flexure based translation stage |
CN100365507C (zh) * | 2000-10-12 | 2008-01-30 | 德克萨斯州大学***董事会 | 用于室温下低压微刻痕和毫微刻痕光刻的模板 |
US6964793B2 (en) | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
US20050064344A1 (en) * | 2003-09-18 | 2005-03-24 | University Of Texas System Board Of Regents | Imprint lithography templates having alignment marks |
US7037639B2 (en) | 2002-05-01 | 2006-05-02 | Molecular Imprints, Inc. | Methods of manufacturing a lithography template |
CH695914A5 (de) * | 2002-05-17 | 2006-10-13 | Hera Rotterdam Bv | Vorrichtung und Verfahren zur optischen Erfassung von Gegenständen. |
US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US6908861B2 (en) * | 2002-07-11 | 2005-06-21 | Molecular Imprints, Inc. | Method for imprint lithography using an electric field |
US6900881B2 (en) | 2002-07-11 | 2005-05-31 | Molecular Imprints, Inc. | Step and repeat imprint lithography systems |
MY144124A (en) * | 2002-07-11 | 2011-08-15 | Molecular Imprints Inc | Step and repeat imprint lithography systems |
US7019819B2 (en) | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US7070405B2 (en) | 2002-08-01 | 2006-07-04 | Molecular Imprints, Inc. | Alignment systems for imprint lithography |
US7027156B2 (en) * | 2002-08-01 | 2006-04-11 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
JP2006516065A (ja) * | 2002-08-01 | 2006-06-15 | モレキュラー・インプリンツ・インコーポレーテッド | インプリント・リソグラフィの散乱計測アラインメント |
US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
US8349241B2 (en) | 2002-10-04 | 2013-01-08 | Molecular Imprints, Inc. | Method to arrange features on a substrate to replicate features having minimal dimensional variability |
US6980282B2 (en) * | 2002-12-11 | 2005-12-27 | Molecular Imprints, Inc. | Method for modulating shapes of substrates |
US6929762B2 (en) | 2002-11-13 | 2005-08-16 | Molecular Imprints, Inc. | Method of reducing pattern distortions during imprint lithography processes |
US6871558B2 (en) * | 2002-12-12 | 2005-03-29 | Molecular Imprints, Inc. | Method for determining characteristics of substrate employing fluid geometries |
JP4563181B2 (ja) * | 2002-12-13 | 2010-10-13 | モレキュラー・インプリンツ・インコーポレーテッド | 基板の面曲がりを使用する倍率補正 |
US7452574B2 (en) | 2003-02-27 | 2008-11-18 | Molecular Imprints, Inc. | Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer |
US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
US7150622B2 (en) * | 2003-07-09 | 2006-12-19 | Molecular Imprints, Inc. | Systems for magnification and distortion correction for imprint lithography processes |
US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
US8211214B2 (en) | 2003-10-02 | 2012-07-03 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
US7906180B2 (en) | 2004-02-27 | 2011-03-15 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
US20050270516A1 (en) * | 2004-06-03 | 2005-12-08 | Molecular Imprints, Inc. | System for magnification and distortion correction during nano-scale manufacturing |
CN101379435A (zh) * | 2004-06-03 | 2009-03-04 | 得克萨斯州大学***董事会 | 用于改进显微蚀刻的对齐和覆盖的***和方法 |
US7768624B2 (en) * | 2004-06-03 | 2010-08-03 | Board Of Regents, The University Of Texas System | Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques |
US7785526B2 (en) * | 2004-07-20 | 2010-08-31 | Molecular Imprints, Inc. | Imprint alignment method, system, and template |
JP4637684B2 (ja) * | 2004-09-10 | 2011-02-23 | 株式会社日立ハイテクノロジーズ | 荷電粒子線応用装置 |
US20070231421A1 (en) * | 2006-04-03 | 2007-10-04 | Molecular Imprints, Inc. | Enhanced Multi Channel Alignment |
US7292326B2 (en) * | 2004-11-30 | 2007-11-06 | Molecular Imprints, Inc. | Interferometric analysis for the manufacture of nano-scale devices |
US7630067B2 (en) | 2004-11-30 | 2009-12-08 | Molecular Imprints, Inc. | Interferometric analysis method for the manufacture of nano-scale devices |
JP5198071B2 (ja) * | 2004-12-01 | 2013-05-15 | モレキュラー・インプリンツ・インコーポレーテッド | インプリントリソグラフィ・プロセスにおける熱管理のための露光方法 |
US20070228608A1 (en) * | 2006-04-03 | 2007-10-04 | Molecular Imprints, Inc. | Preserving Filled Features when Vacuum Wiping |
WO2007117524A2 (en) | 2006-04-03 | 2007-10-18 | Molecular Imprints, Inc. | Method of concurrently patterning a substrate having a plurality of fields and alignment marks |
JP5027468B2 (ja) * | 2006-09-15 | 2012-09-19 | 日本ミクロコーティング株式会社 | プローブクリーニング用又はプローブ加工用シート、及びプローブ加工方法 |
US8710629B2 (en) * | 2009-12-17 | 2014-04-29 | Qualcomm Incorporated | Apparatus and method for controlling semiconductor die warpage |
EP2615425B1 (de) * | 2012-01-13 | 2018-03-07 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Messsystem für einen optischen Berührungsauslöser oder eine Abtastsonde mit Konkavspiegel |
NL2016625A (en) * | 2015-04-20 | 2016-10-24 | Asml Netherlands Bv | Lithographic Method and Apparatus. |
JP2021089963A (ja) * | 2019-12-04 | 2021-06-10 | キヤノン株式会社 | 搬送装置、露光装置及び物品の製造方法 |
CN113375579B (zh) * | 2021-06-25 | 2022-08-23 | 上海工程技术大学 | 一种栅极组件栅极面间距检测方法及检测平台 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4037969A (en) * | 1976-04-02 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Zone plate alignment marks |
FR2436967A1 (fr) * | 1978-09-19 | 1980-04-18 | Thomson Csf | Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede |
US4360273A (en) * | 1980-02-14 | 1982-11-23 | Sperry Corporation | Optical alignment of masks for X-ray lithography |
US4326805A (en) * | 1980-04-11 | 1982-04-27 | Bell Telephone Laboratories, Incorporated | Method and apparatus for aligning mask and wafer members |
US4398824A (en) * | 1981-04-15 | 1983-08-16 | Bell Telephone Laboratories, Incorporated | Wafer tilt compensation in zone plate alignment system |
US4650983A (en) * | 1983-11-07 | 1987-03-17 | Nippon Kogaku K. K. | Focusing apparatus for projection optical system |
DE3719538A1 (de) * | 1986-06-11 | 1987-12-17 | Toshiba Kawasaki Kk | Verfahren und vorrichtung zum einstellen eines spalts zwischen zwei objekten auf eine vorbestimmte groesse |
KR900004269B1 (ko) * | 1986-06-11 | 1990-06-18 | 가부시기가이샤 도시바 | 제 1물체와 제 2 물체와의 위치 맞추는 방법 및 장치 |
US4815854A (en) * | 1987-01-19 | 1989-03-28 | Nec Corporation | Method of alignment between mask and semiconductor wafer |
JPH01285803A (ja) * | 1988-05-13 | 1989-11-16 | Fujitsu Ltd | フレネル・ゾーン・プレートおよびそれを用いる位置合せ方法 |
JP2734004B2 (ja) * | 1988-09-30 | 1998-03-30 | キヤノン株式会社 | 位置合わせ装置 |
-
1989
- 1989-07-18 JP JP1186936A patent/JP2704001B2/ja not_active Expired - Fee Related
-
1990
- 1990-07-17 DE DE69033048T patent/DE69033048T2/de not_active Expired - Fee Related
- 1990-07-17 EP EP90307815A patent/EP0409572B1/de not_active Expired - Lifetime
-
1992
- 1992-02-18 US US07/835,062 patent/US5148036A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69033048T2 (de) | 2000-04-06 |
EP0409572B1 (de) | 1999-04-14 |
JP2704001B2 (ja) | 1998-01-26 |
US5148036A (en) | 1992-09-15 |
JPH0348705A (ja) | 1991-03-01 |
EP0409572A3 (en) | 1991-11-27 |
EP0409572A2 (de) | 1991-01-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de | ||
8370 | Indication of lapse of patent is to be deleted | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |