DE68927482D1 - Positionierungsmechanismus und -verfahren - Google Patents
Positionierungsmechanismus und -verfahrenInfo
- Publication number
- DE68927482D1 DE68927482D1 DE68927482T DE68927482T DE68927482D1 DE 68927482 D1 DE68927482 D1 DE 68927482D1 DE 68927482 T DE68927482 T DE 68927482T DE 68927482 T DE68927482 T DE 68927482T DE 68927482 D1 DE68927482 D1 DE 68927482D1
- Authority
- DE
- Germany
- Prior art keywords
- procedure
- positioning mechanism
- positioning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
Landscapes
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Machine Tool Units (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Machine Tool Positioning Apparatuses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63015859A JP2631485B2 (ja) | 1988-01-28 | 1988-01-28 | 位置決め装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68927482D1 true DE68927482D1 (de) | 1997-01-09 |
DE68927482T2 DE68927482T2 (de) | 1997-04-03 |
Family
ID=11900526
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68927482T Expired - Fee Related DE68927482T2 (de) | 1988-01-28 | 1989-01-27 | Positionierungsmechanismus und -verfahren |
Country Status (4)
Country | Link |
---|---|
US (1) | US4999506A (de) |
EP (1) | EP0326425B1 (de) |
JP (1) | JP2631485B2 (de) |
DE (1) | DE68927482T2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2777915B2 (ja) * | 1989-08-30 | 1998-07-23 | キヤノン株式会社 | 位置合わせ機構 |
JP2860578B2 (ja) * | 1990-03-02 | 1999-02-24 | キヤノン株式会社 | 露光装置 |
JPH03273663A (ja) * | 1990-03-23 | 1991-12-04 | Canon Inc | 基板保持装置 |
DE69123279T2 (de) * | 1990-04-06 | 1997-04-24 | Canon K.K., Tokio/Tokyo | Transportvorrichtung für Substrate und Verfahren zur Kontrolle |
JP3068843B2 (ja) * | 1990-09-12 | 2000-07-24 | キヤノン株式会社 | 露光装置の位置決め方法と位置決め機構 |
JP3173928B2 (ja) * | 1992-09-25 | 2001-06-04 | キヤノン株式会社 | 基板保持装置、基板保持方法および露光装置 |
KR0139039B1 (ko) * | 1993-06-30 | 1998-06-01 | 미타라이 하지메 | 노광장치와 이것을 이용한 디바이스 제조방법 |
US5450245A (en) * | 1993-10-26 | 1995-09-12 | Laser Communications, Inc. | Laser alignment apparatus |
JP3894509B2 (ja) * | 1995-08-07 | 2007-03-22 | キヤノン株式会社 | 光学装置、露光装置およびデバイス製造方法 |
JP3815750B2 (ja) * | 1995-10-09 | 2006-08-30 | キヤノン株式会社 | ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法 |
US5854819A (en) * | 1996-02-07 | 1998-12-29 | Canon Kabushiki Kaisha | Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same |
US6151100A (en) * | 1996-12-12 | 2000-11-21 | Canon Kabushiki Kaisha | Positioning system |
JP3745167B2 (ja) | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
JP3631045B2 (ja) | 1999-06-16 | 2005-03-23 | キヤノン株式会社 | 駆動装置、光学素子駆動装置、露光装置およびデバイス製造方法 |
US6915582B1 (en) | 2004-02-20 | 2005-07-12 | Arinc Incorporated | Alignment structure |
US7143520B2 (en) * | 2004-04-16 | 2006-12-05 | Arinc Incorporated | Alignment structure |
JP5324251B2 (ja) * | 2008-05-16 | 2013-10-23 | キヤノンアネルバ株式会社 | 基板保持装置 |
JP5186280B2 (ja) * | 2008-05-19 | 2013-04-17 | オリンパス株式会社 | 移動ステージ装置 |
JP2011064461A (ja) * | 2009-09-15 | 2011-03-31 | Kohzu Precision Co Ltd | 位置決めステージ |
JP5861133B2 (ja) * | 2011-01-17 | 2016-02-16 | 株式会社アドバンストシステムズジャパン | 常温低周波ボンディング装置 |
JP2014008553A (ja) * | 2012-06-28 | 2014-01-20 | Mitsuboshi Diamond Industrial Co Ltd | 加工ヘッド |
FR3086877A1 (fr) | 2018-10-09 | 2020-04-10 | Psa Automobiles Sa | Dispositif de positionnement rapide |
CN115274529B (zh) * | 2022-09-27 | 2022-12-20 | 无锡邑文电子科技有限公司 | 一种调节定位机构、调节定位方法以及半导体去胶机 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3300618A (en) * | 1963-12-26 | 1967-01-24 | Welding Research Inc | Optical viewing system for electron beam welders |
US3926323A (en) * | 1970-04-10 | 1975-12-16 | Packard Instrument Co Inc | Method of and apparatus for vial transferring and changing |
JPS51111076A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Exposure device |
US4401406A (en) * | 1980-10-31 | 1983-08-30 | Miguel Rovira | Remote three axis cable transport system |
US4528576A (en) * | 1982-04-15 | 1985-07-09 | Canon Kabushiki Kaisha | Recording apparatus |
JPS58194561A (ja) * | 1982-05-11 | 1983-11-12 | Canon Inc | 記録装置 |
US4514858A (en) * | 1983-03-15 | 1985-04-30 | Micronix Partners | Lithography system |
US4669867A (en) * | 1984-02-20 | 1987-06-02 | Canon Kabushiki Kaisha | Alignment and exposure apparatus |
US4676630A (en) * | 1985-04-25 | 1987-06-30 | Canon Kabushiki Kaisha | Exposure apparatus |
US4749867A (en) * | 1985-04-30 | 1988-06-07 | Canon Kabushiki Kaisha | Exposure apparatus |
JPS6235513A (ja) * | 1985-08-09 | 1987-02-16 | Hitachi Ltd | 分子線エピタキシ装置 |
-
1988
- 1988-01-28 JP JP63015859A patent/JP2631485B2/ja not_active Expired - Fee Related
-
1989
- 1989-01-26 US US07/302,184 patent/US4999506A/en not_active Expired - Lifetime
- 1989-01-27 EP EP89300838A patent/EP0326425B1/de not_active Expired - Lifetime
- 1989-01-27 DE DE68927482T patent/DE68927482T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE68927482T2 (de) | 1997-04-03 |
EP0326425A3 (de) | 1989-12-20 |
JP2631485B2 (ja) | 1997-07-16 |
EP0326425B1 (de) | 1996-11-27 |
US4999506A (en) | 1991-03-12 |
JPH01193689A (ja) | 1989-08-03 |
EP0326425A2 (de) | 1989-08-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |