DE68923629D1 - MIS Bauelement mit zusätzlichem Gate. - Google Patents

MIS Bauelement mit zusätzlichem Gate.

Info

Publication number
DE68923629D1
DE68923629D1 DE68923629T DE68923629T DE68923629D1 DE 68923629 D1 DE68923629 D1 DE 68923629D1 DE 68923629 T DE68923629 T DE 68923629T DE 68923629 T DE68923629 T DE 68923629T DE 68923629 D1 DE68923629 D1 DE 68923629D1
Authority
DE
Germany
Prior art keywords
additional gate
mis component
mis
component
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68923629T
Other languages
English (en)
Other versions
DE68923629T2 (de
Inventor
Masataka Minami
Youkou Wakui
Takahiro Nagano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE68923629D1 publication Critical patent/DE68923629D1/de
Publication of DE68923629T2 publication Critical patent/DE68923629T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4983—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET with a lateral structure, e.g. a Polysilicon gate with a lateral doping variation or with a lateral composition variation or characterised by the sidewalls being composed of conductive, resistive or dielectric material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
    • H01L21/28123—Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects
    • H01L21/2815—Lithography-related aspects, e.g. sub-lithography lengths; Isolation-related aspects, e.g. to solve problems arising at the crossing with the side of the device isolation; Planarisation aspects part or whole of the electrode is a sidewall spacer or made by a similar technique, e.g. transformation under mask, plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
    • H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
    • H01L29/42312—Gate electrodes for field effect devices
    • H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
    • H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
    • H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
    • H01L29/42376—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the length or the sectional shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/435—Resistive materials for field effect devices, e.g. resistive gate for MOSFET or MESFET
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/6656—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using multiple spacer layers, e.g. multiple sidewall spacers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66568—Lateral single gate silicon transistors
    • H01L29/66575—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate
    • H01L29/6659—Lateral single gate silicon transistors where the source and drain or source and drain extensions are self-aligned to the sides of the gate with both lightly doped source and drain extensions and source and drain self-aligned to the sides of the gate, e.g. lightly doped drain [LDD] MOSFET, double diffused drain [DDD] MOSFET
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7831—Field effect transistors with field effect produced by an insulated gate with multiple gate structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7833—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
    • H01L29/7836—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with a significant overlap between the lightly doped extension and the gate electrode
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/90—MOSFET type gate sidewall insulating spacer

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
DE68923629T 1988-02-12 1989-02-13 MIS Bauelement mit zusätzlichem Gate. Expired - Fee Related DE68923629T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63028680A JP2667857B2 (ja) 1988-02-12 1988-02-12 半導体装置およびその製造方法

Publications (2)

Publication Number Publication Date
DE68923629D1 true DE68923629D1 (de) 1995-09-07
DE68923629T2 DE68923629T2 (de) 1996-03-21

Family

ID=12255212

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68923629T Expired - Fee Related DE68923629T2 (de) 1988-02-12 1989-02-13 MIS Bauelement mit zusätzlichem Gate.

Country Status (5)

Country Link
US (1) US5132758A (de)
EP (1) EP0329047B1 (de)
JP (1) JP2667857B2 (de)
KR (1) KR0135607B1 (de)
DE (1) DE68923629T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0834313B2 (ja) * 1989-10-09 1996-03-29 株式会社東芝 半導体装置及びその製造方法
JP2652108B2 (ja) * 1991-09-05 1997-09-10 三菱電機株式会社 電界効果トランジスタおよびその製造方法
WO1993009567A1 (en) * 1991-10-31 1993-05-13 Vlsi Technology, Inc. Auxiliary gate lightly doped drain (agldd) structure with dielectric sidewalls
JPH0697192A (ja) * 1992-07-29 1994-04-08 Kawasaki Steel Corp 半導体装置及びその製造方法
US6008544A (en) 1992-12-08 1999-12-28 Fujitsu Limited Semiconductor device and manufacturing method of the semiconductor device
KR960002100B1 (ko) * 1993-03-27 1996-02-10 삼성전자주식회사 전하결합소자형 이미지센서
KR960006004A (ko) * 1994-07-25 1996-02-23 김주용 반도체 소자 및 그 제조방법
US5747852A (en) * 1995-05-26 1998-05-05 Advanced Micro Devices, Inc. LDD MOS transistor with improved uniformity and controllability of alignment
US5817032A (en) 1996-05-14 1998-10-06 Biopath Automation Llc. Means and method for harvesting and handling tissue samples for biopsy analysis
JPH10144918A (ja) * 1996-11-11 1998-05-29 Toshiba Corp 半導体装置及びその製造方法
US6262451B1 (en) 1997-03-13 2001-07-17 Motorola, Inc. Electrode structure for transistors, non-volatile memories and the like
KR100569716B1 (ko) * 1998-08-21 2006-08-11 삼성전자주식회사 액정 표시 장치의 박막 트랜지스터 구조
US20070166834A1 (en) * 1998-10-05 2007-07-19 Biopath Automation, L.L.C. Apparatus and method for harvesting and handling tissue samples for biopsy analysis
DE10047168A1 (de) * 2000-09-22 2002-04-18 Eupec Gmbh & Co Kg Steuerbares Halbleiterbauelement
US6727534B1 (en) * 2001-12-20 2004-04-27 Advanced Micro Devices, Inc. Electrically programmed MOS transistor source/drain series resistance
EP1545775B1 (de) * 2002-09-26 2010-06-16 BioPath Automation, L.L.C. Kassette und einbettanordnung, stufungsvorrichtungen und verfahren zur handhabung von gewebeproben
US7179424B2 (en) * 2002-09-26 2007-02-20 Biopath Automation, L.L.C. Cassette for handling and holding tissue samples during processing, embedding and microtome procedures, and methods therefor
JP4105164B2 (ja) * 2002-09-26 2008-06-25 バイオパス・オートメーション・エル・エル・シー 組織標本のハンドリングおよび包埋を自動化する機器および方法
US6710416B1 (en) * 2003-05-16 2004-03-23 Agere Systems Inc. Split-gate metal-oxide-semiconductor device
US20070116612A1 (en) * 2005-11-02 2007-05-24 Biopath Automation, L.L.C. Prefix tissue cassette
BRPI0718425B8 (pt) * 2006-12-12 2021-06-22 Biopath Automation Llc dispositivo de suporte de amostra de tecido histológico
CN102334085A (zh) * 2008-12-30 2012-01-25 比欧帕斯自动化公司 用于处理用于组织病理学的组织样本的***和方法
EP2389116B1 (de) * 2009-01-22 2017-11-08 BioPath Automation, L.L.C. Mikrotom-sezierbarer biopsieträger zur ausrichtung von gewebeproben

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2011178B (en) * 1977-12-15 1982-03-17 Philips Electronic Associated Fieldeffect devices
JPS5552262A (en) * 1978-10-12 1980-04-16 Fujitsu Ltd Mos semiconductor device
JPS5961182A (ja) * 1982-09-30 1984-04-07 Toshiba Corp 半導体装置の製造方法
JPS59231864A (ja) * 1983-06-15 1984-12-26 Hitachi Ltd 半導体装置
US4502202A (en) * 1983-06-17 1985-03-05 Texas Instruments Incorporated Method for fabricating overlaid device in stacked CMOS
EP0240781A3 (de) * 1986-04-08 1989-12-06 Siemens Aktiengesellschaft Verfahren zum Herstellen von Flankenmaskierschichten an den Gate-Elektroden von MOS-Transistoren mit schwach-dotierten Drain-Anschlussgebieten
JPS62248256A (ja) * 1986-04-21 1987-10-29 Nec Corp 半導体装置
JPS63177471A (ja) * 1987-01-16 1988-07-21 Mitsubishi Electric Corp Ｍｏｓ形半導体装置

Also Published As

Publication number Publication date
US5132758A (en) 1992-07-21
DE68923629T2 (de) 1996-03-21
EP0329047A3 (en) 1990-10-10
KR0135607B1 (ko) 1998-04-22
KR890013796A (ko) 1989-09-26
JP2667857B2 (ja) 1997-10-27
EP0329047A2 (de) 1989-08-23
EP0329047B1 (de) 1995-08-02
JPH01205470A (ja) 1989-08-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee