DE60317902D1 - Verfahren zur herstellung von löchern in polymersubstraten - Google Patents
Verfahren zur herstellung von löchern in polymersubstratenInfo
- Publication number
- DE60317902D1 DE60317902D1 DE60317902T DE60317902T DE60317902D1 DE 60317902 D1 DE60317902 D1 DE 60317902D1 DE 60317902 T DE60317902 T DE 60317902T DE 60317902 T DE60317902 T DE 60317902T DE 60317902 D1 DE60317902 D1 DE 60317902D1
- Authority
- DE
- Germany
- Prior art keywords
- polymer substrates
- producing holes
- holes
- producing
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12361—All metal or with adjacent metals having aperture or cut
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US183674 | 2002-06-27 | ||
US10/183,674 US6824959B2 (en) | 2002-06-27 | 2002-06-27 | Process for creating holes in polymeric substrates |
PCT/US2003/020477 WO2004004430A1 (en) | 2002-06-27 | 2003-06-27 | Process for creating holes in polymeric substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60317902D1 true DE60317902D1 (de) | 2008-01-17 |
DE60317902T2 DE60317902T2 (de) | 2008-10-23 |
Family
ID=29779180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60317902T Expired - Lifetime DE60317902T2 (de) | 2002-06-27 | 2003-06-27 | Verfahren zur herstellung von löchern in polymersubstraten |
Country Status (11)
Country | Link |
---|---|
US (1) | US6824959B2 (de) |
EP (1) | EP1523868B1 (de) |
JP (3) | JP4411410B2 (de) |
KR (1) | KR100659808B1 (de) |
CN (1) | CN1672472A (de) |
AU (1) | AU2003245746A1 (de) |
DE (1) | DE60317902T2 (de) |
ES (1) | ES2297175T3 (de) |
MY (1) | MY134327A (de) |
TW (1) | TWI228953B (de) |
WO (1) | WO2004004430A1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050153107A1 (en) * | 2004-01-12 | 2005-07-14 | Tdk Corporation | Substrate having functional layer pattern formed thereon and method of forming functional layer pattern |
US7271697B2 (en) * | 2004-12-07 | 2007-09-18 | Multi-Fineline Electronix | Miniature circuitry and inductive components and methods for manufacturing same |
KR100738055B1 (ko) * | 2005-05-18 | 2007-07-12 | 삼성에스디아이 주식회사 | 전자소자의 적층 형성 방법 및 이를 이용한 fed의제조방법 |
US8008188B2 (en) | 2007-06-11 | 2011-08-30 | Ppg Industries Ohio, Inc. | Method of forming solid blind vias through the dielectric coating on high density interconnect substrate materials |
US8637778B2 (en) | 2010-04-08 | 2014-01-28 | Intel Corporation | Debond interconnect structures |
Family Cites Families (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3451793A (en) | 1966-02-12 | 1969-06-24 | Toko Inc | Magnetic thin film wire with multiple laminated film coating |
US3469982A (en) | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
FR2041471A5 (en) | 1969-04-25 | 1971-01-29 | Cii | Multi-layer circuits with thermosetting - dielectric |
US3984299A (en) | 1970-06-19 | 1976-10-05 | Ppg Industries, Inc. | Process for electrodepositing cationic compositions |
US3738835A (en) | 1971-10-21 | 1973-06-12 | Ibm | Electrophoretic photoresist composition and a method of forming etch resistant masks |
US3947338A (en) | 1971-10-28 | 1976-03-30 | Ppg Industries, Inc. | Method of electrodepositing self-crosslinking cationic compositions |
US3793278A (en) | 1972-03-10 | 1974-02-19 | Ppg Industries Inc | Method of preparing sulfonium group containing compositions |
US3833436A (en) | 1972-09-05 | 1974-09-03 | Buckbee Mears Co | Etching of polyimide films |
DE2707405C3 (de) | 1976-07-19 | 1987-12-03 | Vianova Kunstharz Ag, Werndorf | Verfahren zur Herstellung von Bindemitteln für die Elektrotauchlackierung |
US4343885A (en) | 1978-05-09 | 1982-08-10 | Dynachem Corporation | Phototropic photosensitive compositions containing fluoran colorformer |
JPS5527647A (en) | 1978-08-17 | 1980-02-27 | Nippon Telegraph & Telephone | Paint for forming insulating film of conductive printed circuit board and method of forming insulating film |
ZA796485B (en) | 1978-12-11 | 1980-11-26 | Shell Res Ltd | Thermosetting resinous binder compositions,their preparation,and use as coating materials |
JPS56136416A (en) * | 1980-03-27 | 1981-10-24 | Matsushita Electric Works Ltd | Limit switch |
US4378264A (en) | 1980-05-27 | 1983-03-29 | E. I. Du Pont De Nemours And Company | Integrated laminating process |
JPS58108229A (ja) | 1981-12-21 | 1983-06-28 | Hitachi Ltd | ポリイミド系樹脂膜の選択エツチング方法 |
JPS59133232A (ja) | 1983-01-21 | 1984-07-31 | Hitachi Ltd | ポリイミドのエツチング方法 |
GB8327756D0 (en) | 1983-10-17 | 1983-11-16 | Ici Plc | Extraction process |
US4508749A (en) | 1983-12-27 | 1985-04-02 | International Business Machines Corporation | Patterning of polyimide films with ultraviolet light |
US4592816A (en) | 1984-09-26 | 1986-06-03 | Rohm And Haas Company | Electrophoretic deposition process |
DE3785732T2 (de) | 1986-11-28 | 1993-10-21 | Nippon Paint Co Ltd | Dispersion aus kationischen Mikrogelpartikeln und Beschichtungszusammensetzung davon. |
JPH0287590A (ja) | 1988-09-22 | 1990-03-28 | Shindo Denshi Kogyo Kk | フイルム回路基板の貫通穴形成方法 |
US5242713A (en) | 1988-12-23 | 1993-09-07 | International Business Machines Corporation | Method for conditioning an organic polymeric material |
EP0433720A3 (en) | 1989-12-22 | 1992-08-26 | Siemens Aktiengesellschaft | Method of applying a solder stop coating on printed circuit boards |
US5096556A (en) | 1990-06-25 | 1992-03-17 | Ppg Industries, Inc. | Cationic microgels and their use in electrodeposition |
JPH04355990A (ja) | 1990-09-18 | 1992-12-09 | Fujitsu Ltd | 回路基板およびその製造方法 |
US5229550A (en) | 1990-10-30 | 1993-07-20 | International Business Machines Corporation | Encapsulated circuitized power core alignment and lamination |
US5298685A (en) | 1990-10-30 | 1994-03-29 | International Business Machines Corporation | Interconnection method and structure for organic circuit boards |
US5153986A (en) | 1991-07-17 | 1992-10-13 | International Business Machines | Method for fabricating metal core layers for a multi-layer circuit board |
US5242780A (en) | 1991-10-18 | 1993-09-07 | Industrial Technology Research Institute | Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups |
US5227008A (en) | 1992-01-23 | 1993-07-13 | Minnesota Mining And Manufacturing Company | Method for making flexible circuits |
GB2265021B (en) | 1992-03-10 | 1996-02-14 | Nippon Steel Chemical Co | Photosensitive materials and their use in forming protective layers for printed circuit and process for preparation of printed circuit |
JPH05320313A (ja) | 1992-05-27 | 1993-12-03 | Murata Mfg Co Ltd | 電子部品封止用樹脂組成物 |
JPH05343837A (ja) | 1992-06-05 | 1993-12-24 | Taiyo Ink Mfg Ltd | ソルダーレジストインキ組成物及びソルダーレジストパターン形成方法 |
JPH06268378A (ja) | 1993-03-12 | 1994-09-22 | Oki Electric Ind Co Ltd | 多層配線基板のビアホールの形成方法 |
US5600035A (en) | 1994-07-13 | 1997-02-04 | Ppg Industries, Inc. | Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups |
US5590460A (en) | 1994-07-19 | 1997-01-07 | Tessera, Inc. | Method of making multilayer circuit |
WO1996022597A1 (fr) | 1995-01-17 | 1996-07-25 | Nippon Steel Chemical Co., Ltd. | Stratifie |
JPH09148748A (ja) * | 1995-11-20 | 1997-06-06 | Taiyo Ink Mfg Ltd | 多層プリント配線板及びその製造方法並びにそれに用いる樹脂絶縁層形成用組成物 |
US6117931A (en) * | 1996-07-01 | 2000-09-12 | Basf Corporation | Curable coating compositions having improved effect pigment orientation and a method of using the same |
US6080526A (en) * | 1997-03-24 | 2000-06-27 | Alliedsignal Inc. | Integration of low-k polymers into interlevel dielectrics using controlled electron-beam radiation |
JPH1121359A (ja) | 1997-06-30 | 1999-01-26 | Process Lab Micron:Kk | ポリエステル系フィルムの化学エッチング方法 |
JPH1171501A (ja) | 1997-08-29 | 1999-03-16 | Hitachi Chem Co Ltd | エポキシ樹脂組成物及びそれを用いた硬化物 |
JP3339387B2 (ja) | 1997-11-07 | 2002-10-28 | 日立電線株式会社 | Tab用テープの製造方法 |
JP3067021B2 (ja) | 1998-09-18 | 2000-07-17 | インターナショナル・ビジネス・マシーンズ・コーポレ−ション | 両面配線基板の製造方法 |
JP4257877B2 (ja) * | 1998-10-08 | 2009-04-22 | 関西ペイント株式会社 | 塗料組成物 |
JP2000227665A (ja) * | 1998-11-02 | 2000-08-15 | Kansai Paint Co Ltd | パターン形成方法 |
US6177357B1 (en) | 1999-04-30 | 2001-01-23 | 3M Innovative Properties Company | Method for making flexible circuits |
US6379865B1 (en) | 2000-04-11 | 2002-04-30 | 3M Innovative Properties Company | Photoimageable, aqueous acid soluble polyimide polymers |
JP2001305750A (ja) | 2000-04-18 | 2001-11-02 | Toray Eng Co Ltd | ポリイミドフィルムのエッチング方法 |
JP4685236B2 (ja) * | 2000-12-13 | 2011-05-18 | 三菱レイヨン株式会社 | 熱硬化性被覆組成物 |
-
2002
- 2002-06-27 US US10/183,674 patent/US6824959B2/en not_active Expired - Fee Related
-
2003
- 2003-06-19 TW TW092116664A patent/TWI228953B/zh not_active IP Right Cessation
- 2003-06-26 MY MYPI20032397A patent/MY134327A/en unknown
- 2003-06-27 WO PCT/US2003/020477 patent/WO2004004430A1/en active IP Right Grant
- 2003-06-27 EP EP03739352A patent/EP1523868B1/de not_active Expired - Fee Related
- 2003-06-27 AU AU2003245746A patent/AU2003245746A1/en not_active Abandoned
- 2003-06-27 KR KR1020047021341A patent/KR100659808B1/ko not_active IP Right Cessation
- 2003-06-27 DE DE60317902T patent/DE60317902T2/de not_active Expired - Lifetime
- 2003-06-27 CN CNA038178761A patent/CN1672472A/zh active Pending
- 2003-06-27 ES ES03739352T patent/ES2297175T3/es not_active Expired - Lifetime
- 2003-06-27 JP JP2004518069A patent/JP4411410B2/ja not_active Expired - Fee Related
-
2006
- 2006-09-26 JP JP2006261571A patent/JP2007027786A/ja not_active Withdrawn
-
2010
- 2010-02-26 JP JP2010043307A patent/JP2010118708A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
TWI228953B (en) | 2005-03-01 |
MY134327A (en) | 2007-12-31 |
CN1672472A (zh) | 2005-09-21 |
JP4411410B2 (ja) | 2010-02-10 |
JP2005531162A (ja) | 2005-10-13 |
ES2297175T3 (es) | 2008-05-01 |
TW200414848A (en) | 2004-08-01 |
WO2004004430A1 (en) | 2004-01-08 |
DE60317902T2 (de) | 2008-10-23 |
US6824959B2 (en) | 2004-11-30 |
JP2010118708A (ja) | 2010-05-27 |
EP1523868A1 (de) | 2005-04-20 |
KR20050006301A (ko) | 2005-01-15 |
US20040000426A1 (en) | 2004-01-01 |
JP2007027786A (ja) | 2007-02-01 |
EP1523868B1 (de) | 2007-12-05 |
AU2003245746A1 (en) | 2004-01-19 |
KR100659808B1 (ko) | 2006-12-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |