DE60301297D1 - Polarisierendes optisches Element und Herstellungsverfahren dafür - Google Patents

Polarisierendes optisches Element und Herstellungsverfahren dafür

Info

Publication number
DE60301297D1
DE60301297D1 DE60301297T DE60301297T DE60301297D1 DE 60301297 D1 DE60301297 D1 DE 60301297D1 DE 60301297 T DE60301297 T DE 60301297T DE 60301297 T DE60301297 T DE 60301297T DE 60301297 D1 DE60301297 D1 DE 60301297D1
Authority
DE
Germany
Prior art keywords
manufacturing
optical element
method therefor
polarizing optical
polarizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60301297T
Other languages
English (en)
Other versions
DE60301297T2 (de
Inventor
Junichi Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60301297D1 publication Critical patent/DE60301297D1/de
Publication of DE60301297T2 publication Critical patent/DE60301297T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/008—Surface plasmon devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods
DE60301297T 2002-06-04 2003-06-03 Polarisierendes optisches Element und Herstellungsverfahren dafür Expired - Lifetime DE60301297T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002162258 2002-06-04
JP2002162258 2002-06-04
JP2003119353A JP2004062148A (ja) 2002-06-04 2003-04-24 光学部品及びその製造方法
JP2003119353 2003-04-24

Publications (2)

Publication Number Publication Date
DE60301297D1 true DE60301297D1 (de) 2005-09-22
DE60301297T2 DE60301297T2 (de) 2006-03-02

Family

ID=29552382

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60301297T Expired - Lifetime DE60301297T2 (de) 2002-06-04 2003-06-03 Polarisierendes optisches Element und Herstellungsverfahren dafür

Country Status (6)

Country Link
US (1) US7009768B2 (de)
EP (1) EP1369714B1 (de)
JP (1) JP2004062148A (de)
KR (1) KR100584992B1 (de)
CN (1) CN1237355C (de)
DE (1) DE60301297T2 (de)

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TW200909997A (en) * 2004-07-09 2009-03-01 Hoya Corp Photomask blank, photomask manufacturing method and semiconductor device manufacturing method
US20060027290A1 (en) * 2004-08-03 2006-02-09 Nec Corporation Microstructure and manufacturing process thereof
DE102004041222A1 (de) * 2004-08-26 2006-03-02 Carl Zeiss Jena Gmbh Photonische Kristallstruktur
JP2006126338A (ja) * 2004-10-27 2006-05-18 Nippon Sheet Glass Co Ltd 偏光子およびその製造方法
JP2006133403A (ja) * 2004-11-04 2006-05-25 Canon Inc 偏光分離素子
US20080055722A1 (en) * 2006-08-31 2008-03-06 Perkins Raymond T Optical Polarization Beam Combiner/Splitter with an Inorganic, Dielectric Grid Polarizer
US7800823B2 (en) 2004-12-06 2010-09-21 Moxtek, Inc. Polarization device to polarize and further control light
US20080055721A1 (en) * 2006-08-31 2008-03-06 Perkins Raymond T Light Recycling System with an Inorganic, Dielectric Grid Polarizer
US20080055549A1 (en) * 2006-08-31 2008-03-06 Perkins Raymond T Projection Display with an Inorganic, Dielectric Grid Polarizer
US7570424B2 (en) 2004-12-06 2009-08-04 Moxtek, Inc. Multilayer wire-grid polarizer
US20080055719A1 (en) * 2006-08-31 2008-03-06 Perkins Raymond T Inorganic, Dielectric Grid Polarizer
US7961393B2 (en) * 2004-12-06 2011-06-14 Moxtek, Inc. Selectively absorptive wire-grid polarizer
US20080055720A1 (en) * 2006-08-31 2008-03-06 Perkins Raymond T Optical Data Storage System with an Inorganic, Dielectric Grid Polarizer
US7619816B2 (en) * 2004-12-15 2009-11-17 Api Nanofabrication And Research Corp. Structures for polarization and beam control
US20060127830A1 (en) * 2004-12-15 2006-06-15 Xuegong Deng Structures for polarization and beam control
KR101133761B1 (ko) * 2005-01-26 2012-04-09 삼성전자주식회사 액정 표시 장치
JP4479535B2 (ja) * 2005-02-21 2010-06-09 セイコーエプソン株式会社 光学素子の製造方法
JP4207083B2 (ja) 2006-04-04 2009-01-14 セイコーエプソン株式会社 光学多層膜フィルタ、光学多層膜フィルタの製造方法および電子機器装置
US8755113B2 (en) * 2006-08-31 2014-06-17 Moxtek, Inc. Durable, inorganic, absorptive, ultra-violet, grid polarizer
US7789515B2 (en) 2007-05-17 2010-09-07 Moxtek, Inc. Projection device with a folded optical path and wire-grid polarizer
JP4881792B2 (ja) * 2007-05-29 2012-02-22 リコー光学株式会社 光学素子、複合光学素子及び光学素子の製造方法
JP5109520B2 (ja) * 2007-07-27 2012-12-26 セイコーエプソン株式会社 光学素子、液晶装置、液晶装置用マザー基板、及び電子機器、並びにワイヤグリッド偏光素子
WO2009144117A1 (en) * 2008-05-30 2009-12-03 Asml Netherlands B.V. Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter
US20100103517A1 (en) * 2008-10-29 2010-04-29 Mark Alan Davis Segmented film deposition
JP5574602B2 (ja) * 2008-12-26 2014-08-20 株式会社フォトニックラティス 多値波長板
US8248696B2 (en) * 2009-06-25 2012-08-21 Moxtek, Inc. Nano fractal diffuser
CN102933991B (zh) * 2010-04-06 2014-12-10 日本电气株式会社 波长板、发光元件和使用该发光元件的图像显示装置
JP5589581B2 (ja) * 2010-06-11 2014-09-17 コニカミノルタ株式会社 光学素子とその製造方法
US8611007B2 (en) 2010-09-21 2013-12-17 Moxtek, Inc. Fine pitch wire grid polarizer
US8913321B2 (en) 2010-09-21 2014-12-16 Moxtek, Inc. Fine pitch grid polarizer
US20150077851A1 (en) 2010-12-30 2015-03-19 Moxtek, Inc. Multi-layer absorptive wire grid polarizer
JP2012189773A (ja) * 2011-03-10 2012-10-04 Sony Chemical & Information Device Corp 偏光素子
US8913320B2 (en) 2011-05-17 2014-12-16 Moxtek, Inc. Wire grid polarizer with bordered sections
US8873144B2 (en) 2011-05-17 2014-10-28 Moxtek, Inc. Wire grid polarizer with multiple functionality sections
JP5362059B2 (ja) * 2012-03-09 2013-12-11 住友化学株式会社 偏光性積層フィルムの製造方法
US8922890B2 (en) 2012-03-21 2014-12-30 Moxtek, Inc. Polarizer edge rib modification
US9632223B2 (en) 2013-10-24 2017-04-25 Moxtek, Inc. Wire grid polarizer with side region
WO2017010099A1 (ja) * 2015-07-13 2017-01-19 凸版印刷株式会社 発色構造体およびその製造方法
JP6670879B2 (ja) * 2018-04-11 2020-03-25 デクセリアルズ株式会社 偏光素子、液晶プロジェクター及び偏光素子の製造方法
CN109212690A (zh) * 2018-10-29 2019-01-15 青岛海信宽带多媒体技术有限公司 单纤双向光组件及光模块
WO2021041065A1 (en) * 2019-08-27 2021-03-04 Corning Incorporated Optical film structures and articles for hidden displays and display devices

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JPS6034742B2 (ja) * 1976-02-20 1985-08-10 ミノルタ株式会社 光学的ロ−パスフイルタ−
US4712881A (en) * 1985-06-21 1987-12-15 The United States Of America As Represented By The Secretary Of The Army Birefringent artificial dielectric structures
DE3707983A1 (de) * 1987-03-12 1988-09-22 Max Planck Gesellschaft Optische einrichtung geringer dicke mit abstuetzvorrichtung
US5254202A (en) * 1992-04-07 1993-10-19 International Business Machines Corporation Fabrication of laser ablation masks by wet etching
JP3369399B2 (ja) 1996-05-09 2003-01-20 沖電気工業株式会社 屈折率多次元周期構造の作製方法
JP3960643B2 (ja) 1996-08-13 2007-08-15 日本板硝子株式会社 光学素子の製造方法
JPH1117606A (ja) 1997-06-26 1999-01-22 Toyota Motor Corp 車両用データ通信装置
JPH1195027A (ja) 1997-09-18 1999-04-09 Shimadzu Corp 多層構造偏光素子
JP3288976B2 (ja) 1998-08-07 2002-06-04 彰二郎 川上 偏光子とその作製方法
JP3371846B2 (ja) * 1999-04-06 2003-01-27 日本電気株式会社 ホログラム素子
JP3553838B2 (ja) 1999-12-06 2004-08-11 日本電信電話株式会社 超臨界乾燥方法
US6532111B2 (en) * 2001-03-05 2003-03-11 Eastman Kodak Company Wire grid polarizer
US6577442B2 (en) * 2001-09-27 2003-06-10 Intel Corporation Reflective spectral filtering of high power extreme ultra-violet radiation

Also Published As

Publication number Publication date
US20030223118A1 (en) 2003-12-04
US7009768B2 (en) 2006-03-07
CN1467514A (zh) 2004-01-14
CN1237355C (zh) 2006-01-18
JP2004062148A (ja) 2004-02-26
EP1369714A1 (de) 2003-12-10
DE60301297T2 (de) 2006-03-02
KR20030095248A (ko) 2003-12-18
EP1369714B1 (de) 2005-08-17
KR100584992B1 (ko) 2006-05-29

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