DE60229515D1 - Ionenstrahl vorrichtung - Google Patents

Ionenstrahl vorrichtung

Info

Publication number
DE60229515D1
DE60229515D1 DE60229515T DE60229515T DE60229515D1 DE 60229515 D1 DE60229515 D1 DE 60229515D1 DE 60229515 T DE60229515 T DE 60229515T DE 60229515 T DE60229515 T DE 60229515T DE 60229515 D1 DE60229515 D1 DE 60229515D1
Authority
DE
Germany
Prior art keywords
ion beam
beam device
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60229515T
Other languages
English (en)
Inventor
Mervyn Howard Davis
Gary Proudfoot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nordiko Technical Services Ltd
Original Assignee
Nordiko Technical Services Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nordiko Technical Services Ltd filed Critical Nordiko Technical Services Ltd
Application granted granted Critical
Publication of DE60229515D1 publication Critical patent/DE60229515D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Electron Sources, Ion Sources (AREA)
DE60229515T 2001-06-01 2002-05-29 Ionenstrahl vorrichtung Expired - Lifetime DE60229515D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0113368.5A GB0113368D0 (en) 2001-06-01 2001-06-01 Apparatus
PCT/GB2002/002544 WO2002097850A2 (en) 2001-06-01 2002-05-29 Uniform broad ion beam deposition

Publications (1)

Publication Number Publication Date
DE60229515D1 true DE60229515D1 (de) 2008-12-04

Family

ID=9915732

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60229515T Expired - Lifetime DE60229515D1 (de) 2001-06-01 2002-05-29 Ionenstrahl vorrichtung

Country Status (7)

Country Link
US (1) US20060231759A1 (de)
EP (1) EP1393340B1 (de)
JP (1) JP4093955B2 (de)
AU (1) AU2002304513A1 (de)
DE (1) DE60229515D1 (de)
GB (1) GB0113368D0 (de)
WO (1) WO2002097850A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8354652B2 (en) 2006-07-20 2013-01-15 Aviza Technology Limited Ion source including separate support systems for accelerator grids
EP2044609B1 (de) 2006-07-20 2011-01-12 SPP Process Technology Systems UK Limited Ionenabscheidungsvorrichtung
EP2044610B1 (de) 2006-07-20 2012-11-28 SPP Process Technology Systems UK Limited Plasmaquellen
JP5380263B2 (ja) 2009-12-15 2014-01-08 キヤノンアネルバ株式会社 イオンビーム発生器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4447773A (en) * 1981-06-22 1984-05-08 California Institute Of Technology Ion beam accelerator system
US4538067A (en) * 1982-12-09 1985-08-27 International Business Machines Corporation Single grid focussed ion beam source
US4684848A (en) * 1983-09-26 1987-08-04 Kaufman & Robinson, Inc. Broad-beam electron source
GB8905073D0 (en) * 1989-03-06 1989-04-19 Nordiko Ltd Ion gun
GB9622127D0 (en) * 1996-10-24 1996-12-18 Nordiko Ltd Ion gun
US6214183B1 (en) * 1999-01-30 2001-04-10 Advanced Ion Technology, Inc. Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials
US6236163B1 (en) * 1999-10-18 2001-05-22 Yuri Maishev Multiple-beam ion-beam assembly

Also Published As

Publication number Publication date
GB0113368D0 (en) 2001-07-25
AU2002304513A1 (en) 2002-12-09
WO2002097850A3 (en) 2003-10-16
EP1393340B1 (de) 2008-10-22
US20060231759A1 (en) 2006-10-19
WO2002097850A2 (en) 2002-12-05
EP1393340A2 (de) 2004-03-03
JP2005506656A (ja) 2005-03-03
JP4093955B2 (ja) 2008-06-04

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