DE602007002430D1 - Optisches Interferometer zur Messung von Dickenänderungen - Google Patents

Optisches Interferometer zur Messung von Dickenänderungen

Info

Publication number
DE602007002430D1
DE602007002430D1 DE602007002430T DE602007002430T DE602007002430D1 DE 602007002430 D1 DE602007002430 D1 DE 602007002430D1 DE 602007002430 T DE602007002430 T DE 602007002430T DE 602007002430 T DE602007002430 T DE 602007002430T DE 602007002430 D1 DE602007002430 D1 DE 602007002430D1
Authority
DE
Germany
Prior art keywords
thickness
measuring changes
optical interferometer
interferometer
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007002430T
Other languages
English (en)
Inventor
Maarten Jansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitutoyo Corp
Original Assignee
Mitutoyo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitutoyo Corp filed Critical Mitutoyo Corp
Publication of DE602007002430D1 publication Critical patent/DE602007002430D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G01B9/02028—Two or more reference or object arms in one interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE602007002430T 2006-03-28 2007-03-26 Optisches Interferometer zur Messung von Dickenänderungen Active DE602007002430D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006089265A JP4729423B2 (ja) 2006-03-28 2006-03-28 光学干渉計

Publications (1)

Publication Number Publication Date
DE602007002430D1 true DE602007002430D1 (de) 2009-10-29

Family

ID=38180003

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007002430T Active DE602007002430D1 (de) 2006-03-28 2007-03-26 Optisches Interferometer zur Messung von Dickenänderungen

Country Status (4)

Country Link
US (1) US7471396B2 (de)
EP (1) EP1840502B1 (de)
JP (1) JP4729423B2 (de)
DE (1) DE602007002430D1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5181403B2 (ja) * 2008-12-01 2013-04-10 株式会社高岳製作所 干渉計
US8068234B2 (en) * 2009-02-18 2011-11-29 Kla-Tencor Corporation Method and apparatus for measuring shape or thickness information of a substrate
US8379219B2 (en) * 2011-05-27 2013-02-19 Corning Incorporated Compound interferometer with monolithic measurement cavity
JP6169420B2 (ja) * 2013-06-19 2017-07-26 株式会社ミツトヨ 光学干渉計
US10094653B2 (en) * 2015-01-22 2018-10-09 Boe Technology Group Co., Ltd. Detection device and detection method
KR102319689B1 (ko) * 2015-05-07 2021-11-01 한화테크윈 주식회사 돔 카메라 시스템
US10458936B2 (en) * 2016-05-11 2019-10-29 Corning Incorporated Apparatus and method for the determination of the absolute coefficient of thermal expansion in ultralow expansion materials
JP2019520610A (ja) * 2016-06-21 2019-07-18 株式会社Ｎｔｔドコモ ウェアラブルディスプレイのための照明装置
US10236222B2 (en) * 2017-02-08 2019-03-19 Kla-Tencor Corporation System and method for measuring substrate and film thickness distribution
US10563975B1 (en) * 2018-07-25 2020-02-18 Applejack 199 L.P. Dual-sensor arrangment for inspecting slab of material
EP4141379A1 (de) * 2021-08-27 2023-03-01 Mitutoyo Corporation Polarisierendes fizeau-interferometer

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0835883A (ja) 1994-07-21 1996-02-06 Toshiba Corp マイケルソン干渉計
JPH112512A (ja) * 1997-06-11 1999-01-06 Super Silicon Kenkyusho:Kk ウェーハの光学式形状測定器
JP2963890B2 (ja) 1998-03-09 1999-10-18 株式会社スーパーシリコン研究所 ウェーハの光学式形状測定器
JPH11337321A (ja) * 1998-05-28 1999-12-10 Mitsutoyo Corp 位相シフト干渉縞の同時計測方法及び装置
JP4049349B2 (ja) * 1999-03-29 2008-02-20 フジノン株式会社 両面形状および厚みムラ測定装置
JP2001033215A (ja) 1999-07-23 2001-02-09 Hitachi Electronics Eng Co Ltd ウエハ厚さむら測定装置
AU2001260975A1 (en) * 2000-01-25 2001-08-20 Zygo Corporation Optical systems for measuring form and geometric dimensions of precision engineered parts
JP4400985B2 (ja) * 2000-02-29 2010-01-20 株式会社神戸製鋼所 形状測定装置
JP2002340538A (ja) * 2001-05-14 2002-11-27 Matsushita Electric Ind Co Ltd 薄板材の平坦度測定装置および方法
JP2003232617A (ja) * 2001-12-07 2003-08-22 Kobe Steel Ltd 厚み分布測定装置およびその方法
US6847458B2 (en) 2003-03-20 2005-01-25 Phase Shift Technology, Inc. Method and apparatus for measuring the shape and thickness variation of polished opaque plates
JP2005172844A (ja) 2003-12-05 2005-06-30 Enplas Corp ワイヤグリッド偏光子
US7239397B2 (en) * 2003-12-31 2007-07-03 Corning Incorporated Device for high-accuracy measurement of dimensional changes
US7426039B2 (en) * 2003-12-31 2008-09-16 Corning Incorporated Optically balanced instrument for high accuracy measurement of dimensional change
JP4527986B2 (ja) * 2004-01-07 2010-08-18 旭化成イーマテリアルズ株式会社 ワイヤグリッド型偏光子
US7268887B2 (en) * 2004-12-23 2007-09-11 Corning Incorporated Overlapping common-path interferometers for two-sided measurement

Also Published As

Publication number Publication date
US20070229842A1 (en) 2007-10-04
JP4729423B2 (ja) 2011-07-20
EP1840502B1 (de) 2009-09-16
EP1840502A1 (de) 2007-10-03
JP2007263748A (ja) 2007-10-11
US7471396B2 (en) 2008-12-30

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