DE60120000D1 - Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes - Google Patents

Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes

Info

Publication number
DE60120000D1
DE60120000D1 DE60120000T DE60120000T DE60120000D1 DE 60120000 D1 DE60120000 D1 DE 60120000D1 DE 60120000 T DE60120000 T DE 60120000T DE 60120000 T DE60120000 T DE 60120000T DE 60120000 D1 DE60120000 D1 DE 60120000D1
Authority
DE
Germany
Prior art keywords
determining
lithographic apparatus
abbe distance
abbe
distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60120000T
Other languages
English (en)
Other versions
DE60120000T2 (de
Inventor
Rogier Herman Mathi Groeneveld
Erik Roelof Loopstra
Jacobus Burghoorn
Leon Martin Levasier
Alexander Straaijer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60120000D1 publication Critical patent/DE60120000D1/de
Publication of DE60120000T2 publication Critical patent/DE60120000T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41—WEAPONS
    • F41H—ARMOUR; ARMOURED TURRETS; ARMOURED OR ARMED VEHICLES; MEANS OF ATTACK OR DEFENCE, e.g. CAMOUFLAGE, IN GENERAL
    • F41H7/00—Armoured or armed vehicles
    • F41H7/02—Land vehicles with enclosing armour, e.g. tanks
    • F41H7/04—Armour construction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE60120000T 2000-01-14 2001-01-12 Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes Expired - Lifetime DE60120000T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00300246 2000-01-14
EP00300246 2000-01-14

Publications (2)

Publication Number Publication Date
DE60120000D1 true DE60120000D1 (de) 2006-07-06
DE60120000T2 DE60120000T2 (de) 2006-10-19

Family

ID=8172645

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60120000T Expired - Lifetime DE60120000T2 (de) 2000-01-14 2001-01-12 Lithographischer Apparat mit System zur Bestimmung des Abbe-Abstandes

Country Status (5)

Country Link
US (2) US6730920B2 (de)
JP (1) JP3851780B2 (de)
KR (1) KR100606493B1 (de)
DE (1) DE60120000T2 (de)
TW (1) TW522287B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW522287B (en) * 2000-01-14 2003-03-01 Asml Netherlands Bv Lithographic projection apparatus, method of calibrating a lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured thereby
EP1450211A3 (de) * 2003-02-14 2009-04-15 ASML Netherlands B.V. Vorrichtung und Verfahren zum Ausrichten von Wafern mit verringerter Empfindlichkeit auf Knippneigung
US6891598B2 (en) * 2003-02-14 2005-05-10 Asml Netherlands B.V. Lithographic device and method for wafer alignment with reduced tilt sensitivity
TWI264620B (en) * 2003-03-07 2006-10-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG147288A1 (en) 2003-04-29 2008-11-28 Asml Netherlands Bv Lithographic apparatus, device manufacturing method and angular encoder
US7265364B2 (en) * 2004-06-10 2007-09-04 Asml Netherlands B.V. Level sensor for lithographic apparatus
US7224431B2 (en) * 2005-02-22 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7518703B2 (en) * 2005-06-28 2009-04-14 Asml Netherlands B.V. Lithographic apparatus and method
US7710572B2 (en) * 2006-11-30 2010-05-04 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP2009253209A (ja) * 2008-04-10 2009-10-29 Canon Inc 露光装置及びデバイス製造方法
US8675210B2 (en) * 2009-03-13 2014-03-18 Asml Netherlands B.V. Level sensor, lithographic apparatus, and substrate surface positioning method
EP2228685B1 (de) * 2009-03-13 2018-06-27 ASML Netherlands B.V. Niveausensor für ein lithografisches Gerät und Verfahren zur Herstellung einer Vorrichtung
NL2006130A (en) * 2010-03-12 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102012204674B4 (de) * 2012-03-23 2014-11-27 Carl Zeiss Smt Gmbh Strahlregelungsvorrichtung für einen EUV-Beleuchtungsstrahl

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2694868B2 (ja) * 1987-08-31 1997-12-24 株式会社ニコン 位置検出方法及び装置
JP2606285B2 (ja) * 1988-06-07 1997-04-30 株式会社ニコン 露光装置および位置合わせ方法
JP2704734B2 (ja) * 1988-09-05 1998-01-26 キヤノン株式会社 ステージ位置決め補正方法及び装置
US5053628A (en) * 1989-07-13 1991-10-01 Matsushita Electric Industrial Co., Ltd. Position signal producing apparatus for water alignment
US5200798A (en) * 1990-07-23 1993-04-06 Hitachi, Ltd. Method of position detection and the method and apparatus of printing patterns by use of the position detection method
NL9100215A (nl) * 1991-02-07 1992-09-01 Asm Lithography Bv Inrichting voor het repeterend afbeelden van een maskerpatroon op een substraat.
JP3203719B2 (ja) * 1991-12-26 2001-08-27 株式会社ニコン 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
JPH07211629A (ja) * 1994-01-24 1995-08-11 Canon Inc 位置検出装置及びそれを用いた半導体デバイスの製造方法
JP3666051B2 (ja) * 1995-04-13 2005-06-29 株式会社ニコン 位置合わせ方法及び装置、並びに露光方法及び装置
JPH09199573A (ja) * 1996-01-12 1997-07-31 Canon Inc 位置決めステージ装置およびこれを用いた露光装置
KR970062816A (ko) * 1996-02-13 1997-09-12 박병재 헤드 램프를 이용한 엔진룸 조사 장치
JP4023695B2 (ja) * 1996-03-15 2007-12-19 エーエスエムエル ネザーランズ ビー． ブイ． アラインメント装置及びこの装置が設けられているリソグラフィ装置
KR20010006467A (ko) * 1997-04-18 2001-01-26 오노 시게오 노광 장치, 해당 장치를 이용한 노광 방법 및 회로 장치 제조 방법
AU7552298A (en) * 1997-06-09 1998-12-30 Nikon Corporation Sensor and method for sensing the position of the surface of object, aligner provided with the sensor and method of manufacturing the aligner, and method of manufacturing devices by using the aligner
KR100521704B1 (ko) * 1997-09-19 2005-10-14 가부시키가이샤 니콘 스테이지장치, 주사형 노광장치 및 방법, 그리고 이것으로제조된 디바이스
TW522287B (en) * 2000-01-14 2003-03-01 Asml Netherlands Bv Lithographic projection apparatus, method of calibrating a lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured thereby
TW520469B (en) * 2000-04-10 2003-02-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
KR100606493B1 (ko) 2006-08-01
US20010008273A1 (en) 2001-07-19
TW522287B (en) 2003-03-01
JP2001244194A (ja) 2001-09-07
JP3851780B2 (ja) 2006-11-29
US6730920B2 (en) 2004-05-04
US20040184018A1 (en) 2004-09-23
DE60120000T2 (de) 2006-10-19
KR20010088316A (ko) 2001-09-26

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