DE60035710D1 - Zoom-beleuchtungssystem zur verwendung in der photolithographie - Google Patents

Zoom-beleuchtungssystem zur verwendung in der photolithographie

Info

Publication number
DE60035710D1
DE60035710D1 DE60035710T DE60035710T DE60035710D1 DE 60035710 D1 DE60035710 D1 DE 60035710D1 DE 60035710 T DE60035710 T DE 60035710T DE 60035710 T DE60035710 T DE 60035710T DE 60035710 D1 DE60035710 D1 DE 60035710D1
Authority
DE
Germany
Prior art keywords
photolithography
lighting system
zoom lighting
zoom
lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60035710T
Other languages
English (en)
Other versions
DE60035710T2 (de
Inventor
Jeffrey M Hoffman
Joseph M Kunick
Mark Oskotsky
Lev Ryzhikov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of DE60035710D1 publication Critical patent/DE60035710D1/de
Application granted granted Critical
Publication of DE60035710T2 publication Critical patent/DE60035710T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
    • G02B7/10—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification by relative axial movement of several lenses, e.g. of varifocal objective lens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
DE60035710T 2000-02-16 2000-02-16 Zoom-beleuchtungssystem zur verwendung in der photolithographie Expired - Fee Related DE60035710T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2000/003896 WO2001061411A1 (en) 2000-02-16 2000-02-16 Zoom illumination system for use in photolithography

Publications (2)

Publication Number Publication Date
DE60035710D1 true DE60035710D1 (de) 2007-09-06
DE60035710T2 DE60035710T2 (de) 2007-12-06

Family

ID=21741064

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60035710T Expired - Fee Related DE60035710T2 (de) 2000-02-16 2000-02-16 Zoom-beleuchtungssystem zur verwendung in der photolithographie

Country Status (4)

Country Link
EP (1) EP1256033B1 (de)
JP (1) JP2003523641A (de)
DE (1) DE60035710T2 (de)
WO (1) WO2001061411A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10040898A1 (de) * 2000-08-18 2002-02-28 Zeiss Carl Beleuchtungssystem für die Mikrolithographie
DE10144244A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System, insbesondere für eine Beleuchtungseinrichtung
DE10144243A1 (de) 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
DE10144246A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System für eine Beleuchtungseinrichtung
US6775069B2 (en) 2001-10-18 2004-08-10 Asml Holding N.V. Advanced illumination system for use in microlithography
US7079321B2 (en) 2001-10-18 2006-07-18 Asml Holding N.V. Illumination system and method allowing for varying of both field height and pupil
US6813003B2 (en) 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
US7006295B2 (en) 2001-10-18 2006-02-28 Asml Holding N.V. Illumination system and method for efficiently illuminating a pattern generator
JP4207478B2 (ja) * 2002-07-12 2009-01-14 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置および露光方法
JP4366163B2 (ja) * 2003-09-25 2009-11-18 キヤノン株式会社 照明装置及び露光装置
JP2005294840A (ja) * 2004-03-31 2005-10-20 Asml Holding Nv フィールド高さ及び瞳の変更を許容する照明システム及び方法
EP1708008B1 (de) 2005-04-01 2011-08-17 Semiconductor Energy Laboratory Co., Ltd. Strahlhomogenisator und Laserbestrahlungsvorrichtung
US7532403B2 (en) * 2006-02-06 2009-05-12 Asml Holding N.V. Optical system for transforming numerical aperture
US20080013182A1 (en) * 2006-07-17 2008-01-17 Joerg Ferber Two-stage laser-beam homogenizer
JP4511502B2 (ja) 2006-09-30 2010-07-28 日立ビアメカニクス株式会社 基板露光装置
DE102009045219A1 (de) * 2009-09-30 2011-03-31 Carl Zeiss Smt Gmbh Beleuchtungssystem für die Mikrolithographie

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JPH04369209A (ja) * 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
JP3005203B2 (ja) * 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JPH11176742A (ja) * 1997-12-12 1999-07-02 Nikon Corp 照明光学系と露光装置及び半導体デバイスの製造方法

Also Published As

Publication number Publication date
WO2001061411A1 (en) 2001-08-23
JP2003523641A (ja) 2003-08-05
DE60035710T2 (de) 2007-12-06
EP1256033B1 (de) 2007-07-25
EP1256033A1 (de) 2002-11-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee