DE60034836D1 - Herstellungsverfahren für akustische Oberflächenwellenanordnungen - Google Patents

Herstellungsverfahren für akustische Oberflächenwellenanordnungen

Info

Publication number
DE60034836D1
DE60034836D1 DE60034836T DE60034836T DE60034836D1 DE 60034836 D1 DE60034836 D1 DE 60034836D1 DE 60034836 T DE60034836 T DE 60034836T DE 60034836 T DE60034836 T DE 60034836T DE 60034836 D1 DE60034836 D1 DE 60034836D1
Authority
DE
Germany
Prior art keywords
manufacturing
acoustic wave
surface acoustic
wave devices
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60034836T
Other languages
English (en)
Other versions
DE60034836T2 (de
Inventor
Shigeto Taga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Application granted granted Critical
Publication of DE60034836D1 publication Critical patent/DE60034836D1/de
Publication of DE60034836T2 publication Critical patent/DE60034836T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders; Supports
    • H03H9/10—Mounting in enclosures
    • H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
    • H03H9/1071—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the SAW device
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02929—Means for compensation or elimination of undesirable effects of ageing changes of characteristics, e.g. electro-acousto-migration
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/05—Holders; Supports
    • H03H9/058—Holders; Supports for surface acoustic wave devices
    • H03H9/059—Holders; Supports for surface acoustic wave devices consisting of mounting pads or bumps
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/25—Constructional features of resonators using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/64—Filters using surface acoustic waves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161—Disposition
    • H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161—Cap
    • H01L2924/1615—Shape
    • H01L2924/16195—Flat cap [not enclosing an internal cavity]
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49004—Electrical device making including measuring or testing of device or component part
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49005—Acoustic transducer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49147—Assembling terminal to base
    • Y10T29/49149—Assembling terminal to base by metal fusion bonding

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
DE60034836T 1999-03-02 2000-03-02 Herstellungsverfahren für akustische Oberflächenwellenanordnungen Expired - Lifetime DE60034836T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP05419299A JP3339450B2 (ja) 1999-03-02 1999-03-02 表面波装置の製造方法
JP5419299 1999-03-02

Publications (2)

Publication Number Publication Date
DE60034836D1 true DE60034836D1 (de) 2007-06-28
DE60034836T2 DE60034836T2 (de) 2007-11-29

Family

ID=12963692

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60034836T Expired - Lifetime DE60034836T2 (de) 1999-03-02 2000-03-02 Herstellungsverfahren für akustische Oberflächenwellenanordnungen

Country Status (6)

Country Link
US (1) US6543109B1 (de)
EP (1) EP1033810B1 (de)
JP (1) JP3339450B2 (de)
KR (1) KR20000076704A (de)
CN (1) CN1130822C (de)
DE (1) DE60034836T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3702961B2 (ja) * 2002-10-04 2005-10-05 東洋通信機株式会社 表面実装型ｓａｗデバイスの製造方法
JP3972900B2 (ja) * 2003-04-23 2007-09-05 株式会社村田製作所 表面実装型電子部品の筐体構造
JP3689414B2 (ja) * 2003-06-03 2005-08-31 東洋通信機株式会社 弾性表面波デバイスの製造方法
KR100746330B1 (ko) * 2005-11-24 2007-08-03 한국과학기술원 초음파를 이용한 전자부품간의 접속방법
JP5556893B2 (ja) 2010-08-24 2014-07-23 株式会社村田製作所 超音波発生装置
WO2012127979A1 (ja) * 2011-03-22 2012-09-27 株式会社村田製作所 電子部品モジュールの製造方法及び電子部品モジュール
JP2013046167A (ja) * 2011-08-23 2013-03-04 Seiko Epson Corp 振動デバイス、及び振動デバイスの製造方法
JP5742954B2 (ja) * 2011-10-03 2015-07-01 株式会社村田製作所 超音波発生装置
JP5565544B2 (ja) * 2012-08-01 2014-08-06 株式会社村田製作所 電子部品及び電子部品モジュール

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5992552A (ja) * 1982-11-19 1984-05-28 Hitachi Ltd 半導体装置
JPS62181517A (ja) * 1986-02-05 1987-08-08 Murata Mfg Co Ltd 表面波装置
US5058800A (en) * 1988-05-30 1991-10-22 Canon Kabushiki Kaisha Method of making electric circuit device
JPH04196324A (ja) * 1990-11-28 1992-07-16 Hitachi Ltd バンプ形成方法及び装置並びにこれを適用した電子装置
JPH06350376A (ja) * 1993-01-25 1994-12-22 Matsushita Electric Ind Co Ltd 気密封止された圧電デバイスおよび気密封止パッケージ
US5459368A (en) * 1993-08-06 1995-10-17 Matsushita Electric Industrial Co., Ltd. Surface acoustic wave device mounted module
JPH07154185A (ja) 1993-10-04 1995-06-16 Nec Corp 弾性表面波装置およびその製造方法
FR2714200B1 (fr) * 1993-11-25 1996-12-27 Fujitsu Ltd Dispositif à onde acoustique de surface et son procédé de fabrication.
US5939817A (en) * 1994-09-22 1999-08-17 Nippon Electric Co Surface acoustic wave device
JP3171043B2 (ja) * 1995-01-11 2001-05-28 株式会社村田製作所 弾性表面波装置
JP3301262B2 (ja) * 1995-03-28 2002-07-15 松下電器産業株式会社 弾性表面波装置
JP3328102B2 (ja) * 1995-05-08 2002-09-24 松下電器産業株式会社 弾性表面波装置及びその製造方法
JPH09232899A (ja) 1996-02-23 1997-09-05 Rohm Co Ltd 電子素子のパッケージ実装方法
JPH1032460A (ja) 1996-07-18 1998-02-03 Murata Mfg Co Ltd 弾性表面波装置
JPH1098352A (ja) 1996-09-24 1998-04-14 Toyo Commun Equip Co Ltd 弾性表面波デバイス
JPH10256409A (ja) 1997-03-10 1998-09-25 Toyo Commun Equip Co Ltd 圧電デバイスのパッケージの製造方法
JPH10256415A (ja) 1997-03-10 1998-09-25 Toyo Commun Equip Co Ltd 圧電デバイスのパッケージ構造
JPH10313227A (ja) 1997-05-13 1998-11-24 Murata Mfg Co Ltd 弾性表面波装置
JPH11204681A (ja) * 1998-01-12 1999-07-30 Sumitomo Metal Smi Electron Devices Inc セラミックパッケージの製造方法
US6321444B1 (en) * 2000-04-11 2001-11-27 Japan Radio Co., Ltd. Method of making surface acoustic wave device
EP0961404B1 (de) 1998-05-29 2008-07-02 Fujitsu Limited Akustisches Oberflächenwellenfilter mit verbesserter Unterdrückung ausserhalb eines Durchlassbereichs
US6329739B1 (en) * 1998-06-16 2001-12-11 Oki Electric Industry Co., Ltd. Surface-acoustic-wave device package and method for fabricating the same
JP2000286526A (ja) * 1999-03-30 2000-10-13 Murata Mfg Co Ltd 表面実装構造及びその表面実装構造に用いられる表面実装型電子部品
JP3351402B2 (ja) * 1999-04-28 2002-11-25 株式会社村田製作所 電子素子、弾性表面波素子、それらの実装方法、電子部品または弾性表面波装置の製造方法、および、弾性表面波装置

Also Published As

Publication number Publication date
US6543109B1 (en) 2003-04-08
JP3339450B2 (ja) 2002-10-28
CN1130822C (zh) 2003-12-10
CN1265538A (zh) 2000-09-06
DE60034836T2 (de) 2007-11-29
JP2000252778A (ja) 2000-09-14
EP1033810A2 (de) 2000-09-06
EP1033810B1 (de) 2007-05-16
KR20000076704A (ko) 2000-12-26
EP1033810A3 (de) 2000-09-20

Similar Documents

Publication Publication Date Title
DE60035966D1 (de) Herstellungsverfahren für eine akustische oberflächenwellenvorrichtung
DE60142721D1 (de) Akustische Oberflächenwellenanordnung
DE60144236D1 (de) Akustische oberflächenwellenanordnung
HK1036699A1 (en) Surface acoustic wave devices and method for manufacturing the same
DE69924225D1 (de) Akustische Oberflächenwellenanordnung
DE69931835D1 (de) Doppelabgedichtete schallisolierende Elemente für Ultraschallwellenleiter
DE69926672T2 (de) Akustische Oberflächenwellenanordnung
DE69839312D1 (de) Kodierverfahren für vibrationswellen
DE60231043D1 (de) Oberflächenwellenfilter
DE69839954D1 (de) Filter für akustische Oberflächenwellen
DE60136023D1 (de) Datenstrukturen für Flächenelemente
DE60218552D1 (de) Akustische Oberflächenwellenfilteranordnung
DE60115371D1 (de) Akustisches Oberflächenwellenfilter
DE60238373D1 (de) Akustisches Oberflächenwellenfilter
DE69911387D1 (de) Dämpfungsverfahren für oberflächenwellen
FI982156A0 (fi) Akustisen muuntimen alustan kiinnitysmenetelmä
DE10290650D2 (de) Akustisches Oberflächenwellenbauelement
EP1414149A4 (de) Verfahren zur herstellung eines oberflächenwellenbauelements
SG97148A1 (en) Method of manufacturing a surface acoustic wave element
NO20014545D0 (no) Overflate-akustisk bölgefilter
DE10225189B4 (de) Oberflächenwellenbauelement
DE60034836D1 (de) Herstellungsverfahren für akustische Oberflächenwellenanordnungen
GB2372654B (en) Surface acoustic wave device and manufacturing method therefor
DE69920992D1 (de) Akustische Oberflächenwellenanordnung
DE60311923D1 (de) Akustisches Oberflächenwellenelementherstellungsverfahren

Legal Events

Date Code Title Description
8364 No opposition during term of opposition