DE59700524D1 - Indirektes Plasmatron - Google Patents

Indirektes Plasmatron

Info

Publication number
DE59700524D1
DE59700524D1 DE59700524T DE59700524T DE59700524D1 DE 59700524 D1 DE59700524 D1 DE 59700524D1 DE 59700524 T DE59700524 T DE 59700524T DE 59700524 T DE59700524 T DE 59700524T DE 59700524 D1 DE59700524 D1 DE 59700524D1
Authority
DE
Germany
Prior art keywords
plasma
neutrodes
longitudinal axis
plasma channel
shaped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE59700524T
Other languages
English (en)
Inventor
Klaus Landes
Jochen Zierhut
Ralf Hartmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LANDES, KLAUS, PROF. DR.-ING., 81479 MUENCHEN, DE
Original Assignee
Sulzer Metco AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sulzer Metco AG filed Critical Sulzer Metco AG
Application granted granted Critical
Publication of DE59700524D1 publication Critical patent/DE59700524D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3431—Coaxial cylindrical electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3463—Oblique nozzles
DE59700524T 1996-12-23 1997-11-03 Indirektes Plasmatron Expired - Lifetime DE59700524D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH317196 1996-12-23

Publications (1)

Publication Number Publication Date
DE59700524D1 true DE59700524D1 (de) 1999-11-11

Family

ID=4250164

Family Applications (1)

Application Number Title Priority Date Filing Date
DE59700524T Expired - Lifetime DE59700524D1 (de) 1996-12-23 1997-11-03 Indirektes Plasmatron

Country Status (6)

Country Link
US (1) US5944901A (de)
EP (1) EP0851720B1 (de)
JP (1) JPH10189289A (de)
AT (1) ATE185465T1 (de)
CA (1) CA2225211A1 (de)
DE (1) DE59700524D1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10011274A1 (de) * 2000-03-08 2001-09-13 Wolff Walsrode Ag Plasmabehandelte bahnförmige Werkstoffe
DE10011275A1 (de) * 2000-03-08 2001-09-13 Wolff Walsrode Ag Verfahren zur Oberflächenaktivierung bahnförmiger Werkstoffe
DE10011276A1 (de) * 2000-03-08 2001-09-13 Wolff Walsrode Ag Verwendung eines indirrekten atomosphärischen Plasmatrons zur Oberflächenbehandlung oder Beschichtung bahnförmiger Werkstoffe sowie ein Verfahren zur Behandlung oder Beschichtung bahnförmiger Werkstoffe
PT1326718E (pt) * 2000-10-04 2004-04-30 Dow Corning Ireland Ltd Metodo e aparelho para formar um revestimento
DE10146295A1 (de) * 2001-09-19 2003-04-03 Wipak Walsrode Gmbh & Co Kg Verfahren zum Zusammenfügen von Materialien mittels atmosphärischen Plasma
GB0208261D0 (en) * 2002-04-10 2002-05-22 Dow Corning An atmospheric pressure plasma assembly
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
TW200308187A (en) * 2002-04-10 2003-12-16 Dow Corning Ireland Ltd An atmospheric pressure plasma assembly
NL1021185C2 (nl) * 2002-07-30 2004-02-03 Fom Inst Voor Plasmafysica Inrichting voor het behandelen van een oppervlak van een substraat en een plasmabron.
DE10239875B4 (de) * 2002-08-29 2008-11-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen
GB0323295D0 (en) * 2003-10-04 2003-11-05 Dow Corning Deposition of thin films
DE102004015216B4 (de) * 2004-03-23 2006-07-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Modul und Verfahren für die Modifizierung von Substratoberflächen bei Atmosphärenbedingungen
CN102355789B (zh) * 2004-11-05 2014-06-11 陶氏康宁爱尔兰有限公司 用于等离子体处理表面的工艺
DE102004059549A1 (de) * 2004-12-10 2006-06-22 Mtu Aero Engines Gmbh Verfahren zur Beschichtung eines Werkstücks
GB0509648D0 (en) * 2005-05-12 2005-06-15 Dow Corning Ireland Ltd Plasma system to deposit adhesion primer layers
DE102008018589A1 (de) 2008-04-08 2009-11-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Zünden eines Lichtbogens
TWI498053B (zh) * 2008-12-23 2015-08-21 Ind Tech Res Inst 電漿激發模組
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
US20130129937A1 (en) * 2011-11-23 2013-05-23 United Technologies Corporation Vapor Deposition of Ceramic Coatings
CH712835A1 (de) * 2016-08-26 2018-02-28 Amt Ag Plasmaspritzvorrichtung.
US11834204B1 (en) 2018-04-05 2023-12-05 Nano-Product Engineering, LLC Sources for plasma assisted electric propulsion
CN114189972A (zh) * 2021-12-02 2022-03-15 华中科技大学 一种稳定等离子体放电装置、控制方法和***

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE763709A (fr) * 1971-03-03 1971-08-02 Soudure Autogene Elect Plasma en rideau.
US4948485A (en) * 1988-11-23 1990-08-14 Plasmacarb Inc. Cascade arc plasma torch and a process for plasma polymerization
DE4105408C1 (de) * 1991-02-21 1992-09-17 Plasma-Technik Ag, Wohlen, Ch
FR2674450B1 (fr) * 1991-03-26 1994-01-21 Agence Spatiale Europeenne Procede pour deposer un revetement sur un substrat par projection au plasma, et dispositif pour la mise en óoeuvre du procede.

Also Published As

Publication number Publication date
EP0851720A1 (de) 1998-07-01
JPH10189289A (ja) 1998-07-21
EP0851720B1 (de) 1999-10-06
CA2225211A1 (en) 1998-06-23
ATE185465T1 (de) 1999-10-15
US5944901A (en) 1999-08-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: LANDES, KLAUS, PROF. DR.-ING., 81479 MUENCHEN, DE