DE4293400T1 - Lichtempfindliche Harzzusammensetzung - Google Patents

Lichtempfindliche Harzzusammensetzung

Info

Publication number
DE4293400T1
DE4293400T1 DE19924293400 DE4293400T DE4293400T1 DE 4293400 T1 DE4293400 T1 DE 4293400T1 DE 19924293400 DE19924293400 DE 19924293400 DE 4293400 T DE4293400 T DE 4293400T DE 4293400 T1 DE4293400 T1 DE 4293400T1
Authority
DE
Germany
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19924293400
Other languages
English (en)
Inventor
Shigeru Hagio
Kazuhiko Kohda
Shinichi Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
San Nopco Ltd
Original Assignee
San Nopco Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP26270491A external-priority patent/JPH0695379A/ja
Priority claimed from JP26270391A external-priority patent/JPH0683052A/ja
Priority claimed from JP26270191A external-priority patent/JPH0572735A/ja
Application filed by San Nopco Ltd filed Critical San Nopco Ltd
Publication of DE4293400T1 publication Critical patent/DE4293400T1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE19924293400 1991-09-14 1992-09-11 Lichtempfindliche Harzzusammensetzung Withdrawn DE4293400T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP26270491A JPH0695379A (ja) 1991-09-14 1991-09-14 感光性樹脂組成物
JP26270391A JPH0683052A (ja) 1991-09-14 1991-09-14 感光性樹脂組成物
JP26270191A JPH0572735A (ja) 1991-09-14 1991-09-14 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
DE4293400T1 true DE4293400T1 (de) 1993-10-07

Family

ID=27335155

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19924293400 Withdrawn DE4293400T1 (de) 1991-09-14 1992-09-11 Lichtempfindliche Harzzusammensetzung

Country Status (2)

Country Link
DE (1) DE4293400T1 (de)
WO (1) WO1993006529A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6558875B1 (en) 1999-07-27 2003-05-06 Mitsubishi Chemical Corporation Method for treating photosensitive lithographic printing plate

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60121444A (ja) * 1983-12-06 1985-06-28 Nippon Soda Co Ltd アルカリ現像型感光性樹脂組成物
JPS62121445A (ja) * 1985-11-21 1987-06-02 Kuraray Co Ltd 感光性組成物
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
JP2678761B2 (ja) * 1988-02-27 1997-11-17 日本合成化学工業株式会社 画像形成方法

Also Published As

Publication number Publication date
WO1993006529A1 (en) 1993-04-01

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Legal Events

Date Code Title Description
8180 Miscellaneous part 1

Free format text: ALS MITANMELDER IST NACHZUTRAGEN: IBIDEN CO., LTD., OGAKI, GIFU, JP

8130 Withdrawal