DE3687416D1 - Lichtempfindliche harzzusammensetzung fuer schablonendruck. - Google Patents

Lichtempfindliche harzzusammensetzung fuer schablonendruck.

Info

Publication number
DE3687416D1
DE3687416D1 DE8686900627T DE3687416T DE3687416D1 DE 3687416 D1 DE3687416 D1 DE 3687416D1 DE 8686900627 T DE8686900627 T DE 8686900627T DE 3687416 T DE3687416 T DE 3687416T DE 3687416 D1 DE3687416 D1 DE 3687416D1
Authority
DE
Germany
Prior art keywords
photo
pref
film
polyvinyl alcohol
crosslinkable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE8686900627T
Other languages
English (en)
Other versions
DE3687416T2 (de
Inventor
Kunihiro Ichimura
Keiji Kubo
Shigenobu Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JAPAN AS REPRESENTED BY GENERA
Daicel Corp
Original Assignee
JAPAN AS REPRESENTED BY GENERA
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=15229974&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE3687416(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by JAPAN AS REPRESENTED BY GENERA, Daicel Chemical Industries Ltd filed Critical JAPAN AS REPRESENTED BY GENERA
Publication of DE3687416D1 publication Critical patent/DE3687416D1/de
Application granted granted Critical
Publication of DE3687416T2 publication Critical patent/DE3687416T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE19863687416 1984-07-04 1986-01-06 Lichtempfindliche harzzusammensetzung fuer schablonendruck. Revoked DE3687416T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59138778A JPH0666030B2 (ja) 1984-07-04 1984-07-04 スクリ−ン製版用感光性樹脂組成物
PCT/JP1986/000001 WO1987004271A1 (en) 1984-07-04 1986-01-06 Photosensitive resin composition for screen process

Publications (2)

Publication Number Publication Date
DE3687416D1 true DE3687416D1 (de) 1993-02-11
DE3687416T2 DE3687416T2 (de) 1993-05-27

Family

ID=15229974

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19863687416 Revoked DE3687416T2 (de) 1984-07-04 1986-01-06 Lichtempfindliche harzzusammensetzung fuer schablonendruck.

Country Status (4)

Country Link
EP (1) EP0252150B1 (de)
JP (1) JPH0666030B2 (de)
DE (1) DE3687416T2 (de)
WO (1) WO1987004271A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62247354A (ja) * 1986-04-17 1987-10-28 Daicel Chem Ind Ltd スクリ−ン製版用感光性樹脂組成物
JPH0791990B2 (ja) * 1986-08-15 1995-10-09 トヨタ自動車株式会社 内燃機関の過給圧制御装置
JPS63220138A (ja) * 1987-03-09 1988-09-13 Daicel Chem Ind Ltd スクリ−ン製版用感光性樹脂組成物
GB2226564B (en) * 1988-12-16 1993-03-17 Sericol Group Ltd Photopolymerisable polyvinyl alcohols and compositions containing them
US5148103A (en) * 1990-10-31 1992-09-15 Hughes Aircraft Company Apparatus for testing integrated circuits
US5297532A (en) * 1991-10-16 1994-03-29 Honda Giken Kogyo Kabushiki Kaisha Supercharging pressure control system for supercharged internal combustion engines
GB2263699B (en) * 1992-02-03 1995-11-29 Sericol Ltd Photopolymerizable alcohols and compositions containing them
JPH0964246A (ja) * 1995-08-30 1997-03-07 Nec Corp 半導体チップ評価用ソケット
US5912106A (en) * 1996-09-10 1999-06-15 Ciba Specialty Chemicals Corporation Method for improving photoimage quality
EP1783552B1 (de) 2005-11-03 2015-10-07 Kissel & Wolf GmbH Photopolymerisierbare Zusammensetzung zur Herstellung von Druckformen
US7767381B2 (en) * 2006-05-17 2010-08-03 Murakami Co., Ltd. Photosensitive resin composition, and photosensitive film and stencil for screen printing using the photosensitive composition
BRPI0712624A2 (pt) * 2007-09-07 2012-10-16 Kiian S P A composição fotossensìvel tendo um componente de emulsão e um componente sensibilizador, processo para a preparação de uma composição fotossensìvel e uso de uma composição fotossensìvel
US9081282B1 (en) 2014-02-24 2015-07-14 Eastman Kodak Company Pattern formation using electroless plating and articles
US9389512B2 (en) 2014-09-30 2016-07-12 Eastman Kodak Company Forming conductive metal patterns using water-soluble polymers
CN105153336B (zh) * 2015-10-14 2017-12-08 天津一森材料科技有限公司 一种聚醋酸乙烯‑氰乙基醚化物及其合成方法
WO2022081652A1 (en) 2020-10-13 2022-04-21 Showa Kako Corporation Polyvinyl acetate based photopolymer

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5083101A (de) * 1973-11-21 1975-07-05
US4154614A (en) * 1975-07-02 1979-05-15 Nippon Paint Co., Ltd. Photosensitive diazo composition with graft copolymer for use in printing screen
JPS5562446A (en) * 1978-11-06 1980-05-10 Agency Of Ind Science & Technol Photosensitive resin composition for screen printing plate
JPS5637538A (en) * 1979-09-05 1981-04-11 Toshiba Corp Sludge settling meter
JPS57177143A (en) * 1981-04-24 1982-10-30 Toyobo Co Ltd Photosensitive plate making material
EP0092901B1 (de) * 1982-04-23 1987-10-14 Autotype International Limited Photopolymere
JPS59102232A (ja) * 1982-12-03 1984-06-13 Agency Of Ind Science & Technol スクリーン印刷版製造用感光性材料
JPS6010243A (ja) * 1983-06-30 1985-01-19 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS6010245A (ja) * 1983-06-30 1985-01-19 Agency Of Ind Science & Technol 感光性樹脂組成物
JPH0248105B2 (ja) * 1983-06-30 1990-10-24 Kogyo Gijutsu Incho Kankoseijushisoseibutsu
JPH0583101A (ja) * 1991-09-19 1993-04-02 Olympus Optical Co Ltd クロツク信号切換方式
JPH0585329A (ja) * 1991-09-24 1993-04-06 Mazda Motor Corp 車両のスリツプ制御装置

Also Published As

Publication number Publication date
DE3687416T2 (de) 1993-05-27
JPS6117141A (ja) 1986-01-25
EP0252150B1 (de) 1992-12-30
EP0252150A1 (de) 1988-01-13
EP0252150A4 (de) 1990-03-22
JPH0666030B2 (ja) 1994-08-24
WO1987004271A1 (en) 1987-07-16

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation