DE3584204D1 - Freitragendes schlitzdiffusionsrohrsystem und verfahren und vorrichtung zum laden. - Google Patents

Freitragendes schlitzdiffusionsrohrsystem und verfahren und vorrichtung zum laden.

Info

Publication number
DE3584204D1
DE3584204D1 DE8585305138T DE3584204T DE3584204D1 DE 3584204 D1 DE3584204 D1 DE 3584204D1 DE 8585305138 T DE8585305138 T DE 8585305138T DE 3584204 T DE3584204 T DE 3584204T DE 3584204 D1 DE3584204 D1 DE 3584204D1
Authority
DE
Germany
Prior art keywords
charging
tube system
diffusion tube
supporting slot
slot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585305138T
Other languages
English (en)
Inventor
Andrew J Wollmann
J S Whang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Amtech Systems Inc
Original Assignee
Amtech Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Amtech Systems Inc filed Critical Amtech Systems Inc
Application granted granted Critical
Publication of DE3584204D1 publication Critical patent/DE3584204D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/02—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated of multiple-chamber type
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE8585305138T 1984-07-18 1985-07-18 Freitragendes schlitzdiffusionsrohrsystem und verfahren und vorrichtung zum laden. Expired - Fee Related DE3584204D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/631,929 US4543059A (en) 1984-07-18 1984-07-18 Slotted cantilever diffusion tube system and method and apparatus for loading

Publications (1)

Publication Number Publication Date
DE3584204D1 true DE3584204D1 (de) 1991-10-31

Family

ID=24533358

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585305138T Expired - Fee Related DE3584204D1 (de) 1984-07-18 1985-07-18 Freitragendes schlitzdiffusionsrohrsystem und verfahren und vorrichtung zum laden.

Country Status (4)

Country Link
US (1) US4543059A (de)
EP (1) EP0172653B1 (de)
JP (1) JPS6153721A (de)
DE (1) DE3584204D1 (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
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US4752219A (en) * 1984-10-04 1988-06-21 Btu Engineering Corporation Wafer softlanding system and cooperative door assembly
US4872799A (en) * 1985-05-16 1989-10-10 Btu Engineering Corporation Boat transfer and queuing furnace elevator and method
US4767251A (en) * 1986-05-06 1988-08-30 Amtech Systems, Inc. Cantilever apparatus and method for loading wafer boats into cantilever diffusion tubes
US4699555A (en) * 1986-05-08 1987-10-13 Micrion Limited Partnership Module positioning apparatus
US4728246A (en) * 1986-05-16 1988-03-01 Thermco Systems, Inc. Wafer boat transfer tool
IL79109A (en) * 1986-06-12 1992-08-18 Baruch Indig Porcelain furnace
US4876225A (en) * 1987-05-18 1989-10-24 Berkeley Quartz Lab, Inc. Cantilevered diffusion chamber atmospheric loading system and method
JPH0631718Y2 (ja) * 1987-06-22 1994-08-22 東京エレクトロン東北株式会社 ボ−ト搬送装置
KR960001161B1 (ko) * 1987-09-29 1996-01-19 도오교오 에레구토론 사가미 가부시끼가이샤 열처리장치
JP2686456B2 (ja) * 1988-01-21 1997-12-08 東京エレクトロン株式会社 縦型熱処理装置
JP2590352B2 (ja) * 1987-12-18 1997-03-12 東京エレクトロン株式会社 縦型熱処理装置
JP2683580B2 (ja) * 1988-01-18 1997-12-03 東京エレクトロン株式会社 熱処理炉に対する被処理体の搬送装置及び熱処理方法
US4955808A (en) * 1988-03-09 1990-09-11 Tel Sagami Limited Method of heat-processing objects and device and boat for the same
JP2733681B2 (ja) * 1988-03-09 1998-03-30 東京エレクトロン株式会社 熱処理装置
US4976610A (en) * 1988-12-05 1990-12-11 Cryco Twenty-Two, Inc. Purge cantilevered wafer loading system for LP CVD processes
US5354198A (en) * 1988-12-05 1994-10-11 Cyrco Twenty-Two, Inc. Movable cantilevered purge system
US5178534A (en) * 1989-05-18 1993-01-12 Bayne Christopher J Controlled diffusion environment capsule and system
US5061044A (en) * 1989-05-23 1991-10-29 Citizen Watch Co., Ltd. Ferroelectric liquid crystal display having opposingly inclined alignment films wherein the liquid crystal has one twisted and two aligned states which coexist and a driving method to produce gray scale
US4976612A (en) * 1989-06-20 1990-12-11 Automated Wafer Systems Purge tube with floating end cap for loading silicon wafers into a furnace
US5064367A (en) * 1989-06-28 1991-11-12 Digital Equipment Corporation Conical gas inlet for thermal processing furnace
US4992044A (en) * 1989-06-28 1991-02-12 Digital Equipment Corporation Reactant exhaust system for a thermal processing furnace
US4950156A (en) * 1989-06-28 1990-08-21 Digital Equipment Corporation Inert gas curtain for a thermal processing furnace
US4963090A (en) * 1989-11-03 1990-10-16 United Technologies Corporation Reverse flow furnace/retort system
KR940000499B1 (ko) * 1990-12-03 1994-01-21 삼성전자 주식회사 불순물 확산로의 압력 조절방법 및 그 장치
JPH04243126A (ja) * 1991-01-17 1992-08-31 Mitsubishi Electric Corp 半導体製造装置及びその制御方法
US5248253A (en) * 1992-01-28 1993-09-28 Digital Equipment Corporation Thermal processing furnace with improved plug flow
US5256060A (en) * 1992-01-28 1993-10-26 Digital Equipment Corporation Reducing gas recirculation in thermal processing furnace
US5208961A (en) * 1992-02-28 1993-05-11 National Semiconductor Corporation Semiconductor processing furnace door alignment apparatus and method
JPH05315272A (ja) * 1992-05-13 1993-11-26 Nippon Telegr & Teleph Corp <Ntt> 石英ボート
US5461214A (en) * 1992-06-15 1995-10-24 Thermtec, Inc. High performance horizontal diffusion furnace system
US5409539A (en) * 1993-05-14 1995-04-25 Micron Technology, Inc. Slotted cantilever diffusion tube system with a temperature insulating baffle system and a distributed gas injector system
US5471033A (en) * 1994-04-15 1995-11-28 International Business Machines Corporation Process and apparatus for contamination-free processing of semiconductor parts
US5765982A (en) * 1995-07-10 1998-06-16 Amtech Systems, Inc. Automatic wafer boat loading system and method
US5997588A (en) * 1995-10-13 1999-12-07 Advanced Semiconductor Materials America, Inc. Semiconductor processing system with gas curtain
US5839870A (en) * 1996-03-13 1998-11-24 Novus Corporation Transfer system for use with a horizontal furnace
US6030167A (en) * 1997-08-12 2000-02-29 United Microeletronics Corp. Apparatus for loading wafers into a horizontal quartz tube
US5997963A (en) * 1998-05-05 1999-12-07 Ultratech Stepper, Inc. Microchamber
US6418945B1 (en) 2000-07-07 2002-07-16 Semitool, Inc. Dual cassette centrifugal processor
KR100833057B1 (ko) * 2005-11-23 2008-05-27 주식회사 엘지화학 관형 고정층 촉매 반응기에서 온도를 측정하는 도구 및방법
US7677885B2 (en) * 2007-01-18 2010-03-16 Lite-On Semiconductor Corporation Material supply device for diffusion furnaces
US8662886B2 (en) * 2007-11-12 2014-03-04 Micrel, Inc. System for improved pressure control in horizontal diffusion furnace scavenger system for controlling oxide growth
JP4778546B2 (ja) * 2007-11-30 2011-09-21 東京エレクトロン株式会社 半導体製造装置における地震被害拡散低減方法及び地震被害拡散低減システム
WO2009105635A2 (en) * 2008-02-21 2009-08-27 Saint-Gobain Ceramics & Plastics, Inc. Ceramic paddle
US8053274B2 (en) * 2008-09-30 2011-11-08 Stion Corporation Self cleaning large scale method and furnace system for selenization of thin film photovoltaic materials
CN102945796B (zh) * 2012-11-29 2015-06-03 西安电力电子技术研究所 弥漫式恒压气体携带杂质源扩散工艺管
CH708881B1 (de) * 2013-11-20 2017-06-15 Besi Switzerland Ag Durchlaufofen für Substrate, die mit Bauteilen bestückt werden, und Die Bonder.
AT515531B1 (de) * 2014-09-19 2015-10-15 Siconnex Customized Solutions Gmbh Halterungssystem und Beschickungsverfahren für scheibenförmige Objekte
US11802340B2 (en) * 2016-12-12 2023-10-31 Applied Materials, Inc. UHV in-situ cryo-cool chamber

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5862489A (ja) * 1981-10-07 1983-04-13 株式会社日立製作所 ソフトランデイング装置
US4440538A (en) * 1981-12-30 1984-04-03 Atomel Products Corporation Apparatus for loading and unloading a furnace
US4459104A (en) * 1983-06-01 1984-07-10 Quartz Engineering & Materials, Inc. Cantilever diffusion tube apparatus and method

Also Published As

Publication number Publication date
JPS6153721A (ja) 1986-03-17
EP0172653A3 (en) 1988-02-17
EP0172653B1 (de) 1991-09-25
JPH0263290B2 (de) 1990-12-27
US4543059A (en) 1985-09-24
EP0172653A2 (de) 1986-02-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee