DE3584141D1 - Verfahren zum projizieren eines photoelektrischen bildes. - Google Patents
Verfahren zum projizieren eines photoelektrischen bildes.Info
- Publication number
- DE3584141D1 DE3584141D1 DE8585308461T DE3584141T DE3584141D1 DE 3584141 D1 DE3584141 D1 DE 3584141D1 DE 8585308461 T DE8585308461 T DE 8585308461T DE 3584141 T DE3584141 T DE 3584141T DE 3584141 D1 DE3584141 D1 DE 3584141D1
- Authority
- DE
- Germany
- Prior art keywords
- projecting
- photoelectric image
- photoelectric
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31777—Lithography by projection
- H01J2237/31779—Lithography by projection from patterned photocathode
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59243343A JPS61123135A (ja) | 1984-11-20 | 1984-11-20 | 光電子像転写方法 |
JP59243342A JPS61123134A (ja) | 1984-11-20 | 1984-11-20 | 光電子像転写方法 |
JP59252151A JPS61129826A (ja) | 1984-11-29 | 1984-11-29 | 光電子像の転写方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3584141D1 true DE3584141D1 (de) | 1991-10-24 |
Family
ID=27333131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585308461T Expired - Fee Related DE3584141D1 (de) | 1984-11-20 | 1985-11-20 | Verfahren zum projizieren eines photoelektrischen bildes. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4789786A (de) |
EP (1) | EP0182665B1 (de) |
KR (1) | KR910000756B1 (de) |
DE (1) | DE3584141D1 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6347928A (ja) * | 1986-08-18 | 1988-02-29 | Fujitsu Ltd | 光電子転写用マスク |
JPH01158731A (ja) * | 1987-12-15 | 1989-06-21 | Fujitsu Ltd | 光電子転写露光方法およびこれに用いられるマスク |
EP0334334B1 (de) * | 1988-03-23 | 1995-06-07 | Fujitsu Limited | Photokathoden-Bildprojektionsapparat für die Mustergestaltung auf einer Halbleitervorrichtung |
US4928018A (en) * | 1989-06-29 | 1990-05-22 | Texas Instruments, Incorporated | Thermo-enhanced electron image projector |
US5156942A (en) * | 1989-07-11 | 1992-10-20 | Texas Instruments Incorporated | Extended source E-beam mask imaging system and method |
JP3689516B2 (ja) * | 1997-01-29 | 2005-08-31 | キヤノン株式会社 | 電子ビーム露光装置 |
EP0969325B1 (de) * | 1998-07-01 | 2003-01-15 | ASML Netherlands B.V. | Projektionsbelichtungsgerät |
EP1943561A1 (de) * | 2005-09-16 | 2008-07-16 | Mapper Lithography IP B.V. | Lithographiesystem und projektionsverfahren |
TW200715075A (en) * | 2005-09-16 | 2007-04-16 | Mapper Lithography Ip Bv | Lithography system and projection method |
US9673023B2 (en) * | 2015-05-12 | 2017-06-06 | Applied Materials Israel Ltd. | System for discharging an area that is scanned by an electron beam |
US10168614B1 (en) | 2017-06-14 | 2019-01-01 | Applied Materials Israel Ltd. | On-axis illumination and alignment for charge control during charged particle beam inspection |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3679497A (en) * | 1969-10-24 | 1972-07-25 | Westinghouse Electric Corp | Electron beam fabrication system and process for use thereof |
US3710101A (en) * | 1970-10-06 | 1973-01-09 | Westinghouse Electric Corp | Apparatus and method for alignment of members to electron beams |
FR2146106B1 (de) * | 1971-07-16 | 1977-08-05 | Thomson Csf | |
US3832560A (en) * | 1973-06-13 | 1974-08-27 | Westinghouse Electric Corp | Method and apparatus for electron beam alignment with a member by detecting cathodoluminescence from oxide layers |
FI760019A (de) * | 1976-01-07 | 1977-07-08 | Rauma Repola Oy | |
GB1557064A (en) * | 1976-09-09 | 1979-12-05 | Mullard Ltd | Masks suitable for use in electron image projectors |
JPS5515232A (en) * | 1978-07-19 | 1980-02-02 | Rikagaku Kenkyusho | Electronic ray exposure prototype and elctronic ray exposure method |
JPS57194531A (en) * | 1981-05-26 | 1982-11-30 | Toshiba Corp | Electron beam transfer device |
FR2507232A1 (fr) * | 1981-06-09 | 1982-12-10 | Freyssinet Int Stup | Dispositif de mise en tension de barres de precontrainte et de determination de cette tension |
JPS5877229A (ja) * | 1981-10-31 | 1983-05-10 | Toshiba Corp | パタ−ン転写用マスクおよびその製造方法 |
GB2111299B (en) * | 1981-11-30 | 1986-07-09 | Thermo Electron Corp | High current density photoelectron generators |
US4572956A (en) * | 1982-08-31 | 1986-02-25 | Tokyo Shibaura Denki Kabushiki Kaisha | Electron beam pattern transfer system having an autofocusing mechanism |
GB2142158A (en) * | 1983-05-25 | 1985-01-09 | Philips Electronic Associated | Electron lithography masks |
JPS6066816A (ja) * | 1983-09-22 | 1985-04-17 | Fujitsu Ltd | 電子ビ−ム露光装置 |
-
1985
- 1985-11-20 EP EP85308461A patent/EP0182665B1/de not_active Expired - Lifetime
- 1985-11-20 KR KR8508677A patent/KR910000756B1/ko not_active IP Right Cessation
- 1985-11-20 DE DE8585308461T patent/DE3584141D1/de not_active Expired - Fee Related
-
1988
- 1988-01-15 US US07/144,275 patent/US4789786A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR910000756B1 (en) | 1991-02-06 |
US4789786A (en) | 1988-12-06 |
EP0182665B1 (de) | 1991-09-18 |
EP0182665A2 (de) | 1986-05-28 |
EP0182665A3 (en) | 1987-04-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |