DE3580991D1 - Emissionsplasmaquelle. - Google Patents

Emissionsplasmaquelle.

Info

Publication number
DE3580991D1
DE3580991D1 DE8585101457T DE3580991T DE3580991D1 DE 3580991 D1 DE3580991 D1 DE 3580991D1 DE 8585101457 T DE8585101457 T DE 8585101457T DE 3580991 T DE3580991 T DE 3580991T DE 3580991 D1 DE3580991 D1 DE 3580991D1
Authority
DE
Germany
Prior art keywords
plasma source
emission plasma
emission
source
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585101457T
Other languages
English (en)
Inventor
Peter H Gagne
Peter J Morrisroe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applera Corp
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Application granted granted Critical
Publication of DE3580991D1 publication Critical patent/DE3580991D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Plasma Technology (AREA)
DE8585101457T 1984-03-02 1985-02-11 Emissionsplasmaquelle. Expired - Fee Related DE3580991D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/585,807 US4629940A (en) 1984-03-02 1984-03-02 Plasma emission source

Publications (1)

Publication Number Publication Date
DE3580991D1 true DE3580991D1 (de) 1991-02-07

Family

ID=24343047

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585101457T Expired - Fee Related DE3580991D1 (de) 1984-03-02 1985-02-11 Emissionsplasmaquelle.

Country Status (6)

Country Link
US (1) US4629940A (de)
EP (1) EP0155496B1 (de)
JP (2) JPS60205241A (de)
AU (1) AU3943185A (de)
CA (1) CA1245729A (de)
DE (1) DE3580991D1 (de)

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US5288971A (en) * 1991-08-09 1994-02-22 Advanced Energy Industries, Inc. System for igniting a plasma for thin film processing
US5144206A (en) * 1991-09-10 1992-09-01 Gte Products Corporation Electrodeless HID lamp coupling structure with integral matching network
US5187457A (en) * 1991-09-12 1993-02-16 Eni Div. Of Astec America, Inc. Harmonic and subharmonic filter
US5175472A (en) * 1991-12-30 1992-12-29 Comdel, Inc. Power monitor of RF plasma
US5216330A (en) * 1992-01-14 1993-06-01 Honeywell Inc. Ion beam gun
US5280154A (en) * 1992-01-30 1994-01-18 International Business Machines Corporation Radio frequency induction plasma processing system utilizing a uniform field coil
US5523955A (en) * 1992-03-19 1996-06-04 Advanced Energy Industries, Inc. System for characterizing AC properties of a processing plasma
WO1993021685A1 (en) * 1992-04-16 1993-10-28 Advanced Energy Industries, Inc. Stabilizer for switch-mode powered rf plasma processing
JP3167221B2 (ja) * 1992-05-07 2001-05-21 ザ・パーキン・エルマー・コーポレイション 誘導結合プラズマ発生器
CA2116821C (en) * 1993-03-05 2003-12-23 Stephen Esler Anderson Improvements in plasma mass spectrometry
US5815047A (en) * 1993-10-29 1998-09-29 Applied Materials, Inc. Fast transition RF impedance matching network for plasma reactor ignition
JPH07191764A (ja) * 1993-12-27 1995-07-28 Fujitsu Ltd 高周波電源装置及びプラズマ発生装置
JPH07282771A (ja) * 1995-02-08 1995-10-27 Yokogawa Electric Corp 高周波誘導結合プラズマ分析計のプラズマ点火方法
US5712592A (en) * 1995-03-06 1998-01-27 Applied Materials, Inc. RF plasma power supply combining technique for increased stability
US5977715A (en) * 1995-12-14 1999-11-02 The Boeing Company Handheld atmospheric pressure glow discharge plasma source
US5689215A (en) * 1996-05-23 1997-11-18 Lam Research Corporation Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor
US5770922A (en) * 1996-07-22 1998-06-23 Eni Technologies, Inc. Baseband V-I probe
US6329757B1 (en) 1996-12-31 2001-12-11 The Perkin-Elmer Corporation High frequency transistor oscillator system
GB9708268D0 (en) 1997-04-24 1997-06-18 Gyrus Medical Ltd An electrosurgical instrument
DE19737244A1 (de) * 1997-08-27 1999-03-04 Harald Tobies Vorrichtung und Verfahren zur Regelung der Phasenlage von Hochfrequenzelektroden bei Plasmaprozessen
EP1023819A4 (de) 1997-10-14 2007-10-17 Advanced Energy Ind Inc System zur plasmazündung durch schnellen spannungsanstieg
US6449568B1 (en) 1998-02-27 2002-09-10 Eni Technology, Inc. Voltage-current sensor with high matching directivity
US6958063B1 (en) 1999-04-22 2005-10-25 Soring Gmbh Medizintechnik Plasma generator for radio frequency surgery
CN1241316C (zh) 1999-07-13 2006-02-08 东京电子株式会社 产生感性耦合的等离子的射频电源
US6507155B1 (en) 2000-04-06 2003-01-14 Applied Materials Inc. Inductively coupled plasma source with controllable power deposition
US6472822B1 (en) * 2000-04-28 2002-10-29 Applied Materials, Inc. Pulsed RF power delivery for plasma processing
US7511246B2 (en) 2002-12-12 2009-03-31 Perkinelmer Las Inc. Induction device for generating a plasma
US7106438B2 (en) * 2002-12-12 2006-09-12 Perkinelmer Las, Inc. ICP-OES and ICP-MS induction current
US6995545B2 (en) * 2003-08-18 2006-02-07 Mks Instruments, Inc. Control system for a sputtering system
US7042311B1 (en) * 2003-10-10 2006-05-09 Novellus Systems, Inc. RF delivery configuration in a plasma processing system
DE102004015090A1 (de) 2004-03-25 2005-11-03 Hüttinger Elektronik Gmbh + Co. Kg Bogenentladungserkennungseinrichtung
AU2006223254B2 (en) * 2005-03-11 2012-04-26 Perkinelmer U.S. Llc Plasmas and methods of using them
US8622735B2 (en) * 2005-06-17 2014-01-07 Perkinelmer Health Sciences, Inc. Boost devices and methods of using them
US7742167B2 (en) 2005-06-17 2010-06-22 Perkinelmer Health Sciences, Inc. Optical emission device with boost device
US7459899B2 (en) 2005-11-21 2008-12-02 Thermo Fisher Scientific Inc. Inductively-coupled RF power source
JP4586737B2 (ja) * 2006-02-02 2010-11-24 株式会社島津製作所 Ｉｃｐ分析装置
ATE448562T1 (de) * 2006-11-23 2009-11-15 Huettinger Elektronik Gmbh Verfahren zum erkennen einer bogenentladung in einem plasmaprozess und bogenentladungserkennungsvorrichtung
US7795817B2 (en) * 2006-11-24 2010-09-14 Huettinger Elektronik Gmbh + Co. Kg Controlled plasma power supply
EP1928009B1 (de) * 2006-11-28 2013-04-10 HÜTTINGER Elektronik GmbH + Co. KG Bogenentladungs-Erkennungseinrichtung, Plasma-Leistungsversorgung und Verfahren zum Erkennen von Bogenentladungen
DE502006009308D1 (de) * 2006-12-14 2011-05-26 Huettinger Elektronik Gmbh Bogenentladungs-Erkennungseinrichtung, Plasma-Leistungsversorgung und Verfahren zum Erkennen von Bogenentladungen
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
US9288886B2 (en) 2008-05-30 2016-03-15 Colorado State University Research Foundation Plasma-based chemical source device and method of use thereof
JP2011521735A (ja) 2008-05-30 2011-07-28 コロラド ステート ユニバーシティ リサーチ ファンデーション プラズマを発生させるためのシステム、方法、および装置
US8659335B2 (en) 2009-06-25 2014-02-25 Mks Instruments, Inc. Method and system for controlling radio frequency power
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
JP2013529352A (ja) 2010-03-31 2013-07-18 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
CA2794902A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
DE102011076404B4 (de) 2011-05-24 2014-06-26 TRUMPF Hüttinger GmbH + Co. KG Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung
WO2013046495A1 (ja) * 2011-09-30 2013-04-04 パナソニック株式会社 大気圧プラズマ発生装置及び大気圧プラズマ発生方法
CA2879076C (en) 2012-07-13 2020-11-10 Perkinelmer Health Sciences, Inc. Torches and methods of using them
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation

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US2745067A (en) * 1951-06-28 1956-05-08 True Virgil Automatic impedance matching apparatus
US2742618A (en) * 1951-12-29 1956-04-17 Collins Radio Co Phasing and magnitude adjusting circuit
FR1207566A (fr) * 1958-06-26 1960-02-17 Trt Telecom Radio Electr Perfectionnements aux dispositifs d'accord automatique sur une charge largement variable
US3132313A (en) * 1959-08-13 1964-05-05 Alford Andrew Impedance matching filter
US3366883A (en) * 1965-12-20 1968-01-30 Avco Corp Automatic broad band vswr power control
US3958883A (en) * 1974-07-10 1976-05-25 Baird-Atomic, Inc. Radio frequency induced plasma excitation of optical emission spectroscopic samples
US4207137A (en) * 1979-04-13 1980-06-10 Bell Telephone Laboratories, Incorporated Method of controlling a plasma etching process by monitoring the impedance changes of the RF power
US4373581A (en) * 1981-01-19 1983-02-15 Halliburton Company Apparatus and method for radio frequency heating of hydrocarbonaceous earth formations including an impedance matching technique
US4356458A (en) * 1981-08-31 1982-10-26 Harry H. Leveen Automatic impedance matching apparatus
JPS58135600A (ja) * 1982-02-08 1983-08-12 株式会社日立国際電気 プラズマ励起用高周波電力供給装置
JPS58169051A (ja) * 1982-03-31 1983-10-05 Shimadzu Corp 誘導結合プラズマ光源用電源装置
US4482246A (en) * 1982-09-20 1984-11-13 Meyer Gerhard A Inductively coupled plasma discharge in flowing non-argon gas at atmospheric pressure for spectrochemical analysis

Also Published As

Publication number Publication date
CA1245729A (en) 1988-11-29
JPH0734363Y2 (ja) 1995-08-02
EP0155496B1 (de) 1991-01-02
US4629940A (en) 1986-12-16
JPS60205241A (ja) 1985-10-16
JPH0646359U (ja) 1994-06-24
AU3943185A (en) 1985-09-05
EP0155496A2 (de) 1985-09-25
EP0155496A3 (en) 1987-09-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee