DE3337303C2 - - Google Patents
Info
- Publication number
- DE3337303C2 DE3337303C2 DE19833337303 DE3337303A DE3337303C2 DE 3337303 C2 DE3337303 C2 DE 3337303C2 DE 19833337303 DE19833337303 DE 19833337303 DE 3337303 A DE3337303 A DE 3337303A DE 3337303 C2 DE3337303 C2 DE 3337303C2
- Authority
- DE
- Germany
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17932682A JPS5968735A (ja) | 1982-10-13 | 1982-10-13 | 感光性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3337303A1 DE3337303A1 (de) | 1984-04-19 |
DE3337303C2 true DE3337303C2 (de) | 1987-03-26 |
Family
ID=16063877
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19833337303 Granted DE3337303A1 (de) | 1982-10-13 | 1983-10-13 | Verfahren zur photolithographischen erzeugung von resistschichten und hierfuer verwendbare lichtempfindliche zusammensetzungen |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5968735A (de) |
DE (1) | DE3337303A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3726858A1 (de) * | 1986-08-13 | 1988-02-25 | Sony Corp | Organosiliciumpolymere enthaltendes photoresistmaterial |
US6210861B1 (en) | 1992-08-29 | 2001-04-03 | Klaus Uwe Schonfelder | Tonable radiation sensitive recording material with balanced adhesive properties and process for using the same |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61289345A (ja) * | 1985-05-31 | 1986-12-19 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | リソグラフイ用レジスト |
DE3669211D1 (de) * | 1985-05-31 | 1990-04-05 | Ibm | Schutzlack fuer lithographie und anwendungsverfahren. |
JPS63291053A (ja) * | 1987-05-25 | 1988-11-28 | Nippon Zeon Co Ltd | ポジ型フォトレジスト組成物 |
EP0464614B1 (de) * | 1990-06-25 | 1999-09-29 | Matsushita Electronics Corporation | Licht- oder strahlungsempfindliche Zusammensetzung |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5525418B2 (de) * | 1972-12-20 | 1980-07-05 | ||
JPS50137202A (de) * | 1974-04-22 | 1975-10-31 | ||
JPS516561A (de) * | 1974-07-04 | 1976-01-20 | Yamamoto Kagaku Gosei Kk | |
US4200463A (en) * | 1975-12-19 | 1980-04-29 | Motorola, Inc. | Semiconductor device manufacture using photoresist protective coating |
DE3022473A1 (de) * | 1980-06-14 | 1981-12-24 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
-
1982
- 1982-10-13 JP JP17932682A patent/JPS5968735A/ja active Granted
-
1983
- 1983-10-13 DE DE19833337303 patent/DE3337303A1/de active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3726858A1 (de) * | 1986-08-13 | 1988-02-25 | Sony Corp | Organosiliciumpolymere enthaltendes photoresistmaterial |
US6210861B1 (en) | 1992-08-29 | 2001-04-03 | Klaus Uwe Schonfelder | Tonable radiation sensitive recording material with balanced adhesive properties and process for using the same |
Also Published As
Publication number | Publication date |
---|---|
JPS5968735A (ja) | 1984-04-18 |
DE3337303A1 (de) | 1984-04-19 |
JPH0544665B2 (de) | 1993-07-07 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |