DE3175862D1 - Chemical vapor delivery system and method for controlling the flow of vapor in a chemical vapor delivery system - Google Patents

Chemical vapor delivery system and method for controlling the flow of vapor in a chemical vapor delivery system

Info

Publication number
DE3175862D1
DE3175862D1 DE8181302204T DE3175862T DE3175862D1 DE 3175862 D1 DE3175862 D1 DE 3175862D1 DE 8181302204 T DE8181302204 T DE 8181302204T DE 3175862 T DE3175862 T DE 3175862T DE 3175862 D1 DE3175862 D1 DE 3175862D1
Authority
DE
Germany
Prior art keywords
delivery system
chemical vapor
vapor delivery
controlling
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181302204T
Other languages
English (en)
Inventor
Joseph C Mcmenamin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JC Schumacher Co
Original Assignee
JC Schumacher Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JC Schumacher Co filed Critical JC Schumacher Co
Application granted granted Critical
Publication of DE3175862D1 publication Critical patent/DE3175862D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/87—Controlling the temperature
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/88—Controlling the pressure
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/89—Controlling the liquid level in or supply to the tank
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/90—Feeding the burner or the burner-heated deposition site with vapour generated from solid glass precursors, i.e. by sublimation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Automation & Control Theory (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE8181302204T 1980-05-20 1981-05-19 Chemical vapor delivery system and method for controlling the flow of vapor in a chemical vapor delivery system Expired DE3175862D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15174180A 1980-05-20 1980-05-20

Publications (1)

Publication Number Publication Date
DE3175862D1 true DE3175862D1 (en) 1987-02-26

Family

ID=22540066

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181302204T Expired DE3175862D1 (en) 1980-05-20 1981-05-19 Chemical vapor delivery system and method for controlling the flow of vapor in a chemical vapor delivery system

Country Status (4)

Country Link
EP (1) EP0040540B1 (de)
JP (1) JPS5934420B2 (de)
CA (1) CA1171940A (de)
DE (1) DE3175862D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU563417B2 (en) * 1984-02-07 1987-07-09 Nippon Telegraph & Telephone Public Corporation Optical fibre manufacture
JPS60244333A (ja) * 1984-05-21 1985-12-04 Sumitomo Electric Ind Ltd 原料液補給装置
JP2584633B2 (ja) * 1987-07-20 1997-02-26 アネルバ株式会社 超電導薄膜作成装置
JPH0196922A (ja) * 1987-10-08 1989-04-14 Mitsubishi Rayon Co Ltd 半導体製造装置
JP2567988Y2 (ja) * 1990-06-26 1998-04-08 日本電気株式会社 液体材料ガス化供給装置
US5220515A (en) * 1991-04-22 1993-06-15 Applied Materials, Inc. Flow verification for process gas in a wafer processing system apparatus and method
US6161398A (en) * 1998-04-09 2000-12-19 Lucent Technologies, Inc. Methods of and systems for vapor delivery control in optical preform manufacture
EP1057792B1 (de) * 1999-06-03 2005-08-17 Shin-Etsu Chemical Co., Ltd. Verfahren und Vorrichtung zum Verdampfen von einem flüssigen Glasvorläufer für die Herstellung von Vorformen für optische Fasern
AU2001286404A1 (en) * 2000-08-04 2002-02-18 Arch Specialty Chemicals, Inc. Automatic refill system for ultra pure or contamination sensitive chemicals
DE10059386A1 (de) * 2000-11-30 2002-06-13 Aixtron Ag Verfahren und Vorrichtung zur dosierten Abgabe kleiner Flüssigkeitsvolumenströme
DE102005001671B4 (de) * 2005-01-13 2010-06-10 Qimonda Ag Photolithographieanordnung
DE102008029754B3 (de) * 2008-06-25 2009-12-17 Find, Josef, Dr. Verfahren zur Optimierung von technischen Prozessen für Gas-Flüssig-Phasensysteme
CN103058512B (zh) * 2012-12-19 2015-04-08 江苏亨通光电股份有限公司 一种光纤预制棒制造时控制气态原料流量的装置和方法
DE102017206232A1 (de) * 2017-04-11 2018-10-11 Robert Bosch Gmbh Reinigungssystem und Verfahren für eine automatisierte Reinigung eines Innenraums eines Fahrzeugs
JP2021037434A (ja) * 2019-08-30 2021-03-11 株式会社東芝 蒸気供給装置、蒸気供給方法及び蒸気を用いた試験装置
CN111153590B (zh) * 2019-12-31 2022-03-25 江苏通鼎光棒有限公司 一种高精度的四氯化锗鼓泡装置
KR20230108318A (ko) * 2020-11-19 2023-07-18 램 리써치 코포레이션 다운스트림 (downstream) 압력 센싱을 사용한 승화 (sublimation) 제어

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650151A (en) * 1970-11-18 1972-03-21 Tylan Corp Fluid flow measuring system
GB1580662A (en) * 1976-08-02 1980-12-03 Leemhuis L Variable valui constant volume fluid flow control valve
US4134514A (en) * 1976-12-02 1979-01-16 J C Schumacher Co. Liquid source material container and method of use for semiconductor device manufacturing
US4140735A (en) * 1977-08-15 1979-02-20 J. C. Schumacher Co. Process and apparatus for bubbling gas through a high purity liquid
DE2738531C2 (de) * 1977-08-26 1986-01-30 Lang Apparatebau GmbH, 8227 Siegsdorf Vorrichtung zum Eindosieren einer Zusatzflüssigkeit in eine Hauptflüssigkeit
US4204612A (en) * 1978-05-11 1980-05-27 Foam Controls Inc. System for applying foam insulation

Also Published As

Publication number Publication date
CA1171940A (en) 1984-07-31
JPS5934420B2 (ja) 1984-08-22
JPS5710323A (en) 1982-01-19
EP0040540A2 (de) 1981-11-25
EP0040540B1 (de) 1987-01-21
EP0040540A3 (en) 1982-06-30

Similar Documents

Publication Publication Date Title
DE3175862D1 (en) Chemical vapor delivery system and method for controlling the flow of vapor in a chemical vapor delivery system
GB2108285B (en) Gas flow control system
IL67428A0 (en) Process and device for controlling artificial respiration
JPS56149616A (en) Method and device for automatically controlling substance flow rate in system
ZA823589B (en) Method and system for externally treating the blood
DE3371917D1 (en) Gas flow in plasma treatment processes
GB2099158B (en) Gas flow control apparatus
JPS57137908A (en) Gas flow rate controller
JPS56152652A (en) Controller for flow rate
GB2112867B (en) Apparatus for the selection, metering and delivery of liquids
JPS57189021A (en) Method and device for mass flow rate
JPS56105773A (en) Method and device for controlling flow rate
EP0200235A3 (en) Continuous flow method and apparatus
DE3267805D1 (en) Apparatus and method for controlling mass flow rate in rotary compressors
GB2074348B (en) Method and system for controlling resistance
EP0037579A3 (en) Adaptive-predictive control method and adaptive-predictive control system
JPS5613950A (en) Method and device for controlling flow rate for transport liquid in vein
GB2112177B (en) Flow rate controller
GB8322586D0 (en) Flow rate control and metering means
GB2130274B (en) Flow controlling apparatus
GB2127586B (en) Method and apparatus for controlling modular systems
DE3167113D1 (en) A heater and a method of controlling the combustion in such a heater
ZA815084B (en) Nasal preparations and process for the manufacture thereof
IL63434A0 (en) Apparatus and method for drip irrigation
ZA821425B (en) Drip irrigation unit and method for making same

Legal Events

Date Code Title Description
8364 No opposition during term of opposition