DE19781667T1 - Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle - Google Patents
Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten PlasmaquelleInfo
- Publication number
- DE19781667T1 DE19781667T1 DE19781667T DE19781667T DE19781667T1 DE 19781667 T1 DE19781667 T1 DE 19781667T1 DE 19781667 T DE19781667 T DE 19781667T DE 19781667 T DE19781667 T DE 19781667T DE 19781667 T1 DE19781667 T1 DE 19781667T1
- Authority
- DE
- Germany
- Prior art keywords
- generation method
- inductively coupled
- plasma generation
- coupled plasma
- plasma source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32688—Multi-cusp fields
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/624,010 US5669975A (en) | 1996-03-27 | 1996-03-27 | Plasma producing method and apparatus including an inductively-coupled plasma source |
PCT/US1997/003048 WO1997036022A1 (en) | 1996-03-27 | 1997-03-04 | Plasma producing method and apparatus including an inductively-coupled plasma source |
Publications (1)
Publication Number | Publication Date |
---|---|
DE19781667T1 true DE19781667T1 (de) | 1999-04-08 |
Family
ID=24500251
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19781667A Expired - Fee Related DE19781667B4 (de) | 1996-03-27 | 1997-03-04 | Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle |
DE19781667T Pending DE19781667T1 (de) | 1996-03-27 | 1997-03-04 | Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19781667A Expired - Fee Related DE19781667B4 (de) | 1996-03-27 | 1997-03-04 | Plasmaerzeugungsverfahren und -gerät mit einer induktiv gekoppelten Plasmaquelle |
Country Status (8)
Country | Link |
---|---|
US (1) | US5669975A (de) |
JP (1) | JP3653524B2 (de) |
AU (1) | AU2058397A (de) |
CH (1) | CH696036A5 (de) |
DE (2) | DE19781667B4 (de) |
GB (1) | GB2326974B (de) |
TW (1) | TW340295B (de) |
WO (1) | WO1997036022A1 (de) |
Families Citing this family (77)
Publication number | Priority date | Publication date | Assignee | Title |
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FR2748886B1 (fr) * | 1996-05-15 | 1998-08-21 | Automa Tech Sa | Dispositif de support de cliche pour installation d'exposition a la lumiere d'une piece plane |
US6170428B1 (en) * | 1996-07-15 | 2001-01-09 | Applied Materials, Inc. | Symmetric tunable inductively coupled HDP-CVD reactor |
JPH10223607A (ja) * | 1997-02-03 | 1998-08-21 | Mitsubishi Electric Corp | プラズマ処理装置 |
US6210539B1 (en) | 1997-05-14 | 2001-04-03 | Applied Materials, Inc. | Method and apparatus for producing a uniform density plasma above a substrate |
US6077402A (en) * | 1997-05-16 | 2000-06-20 | Applied Materials, Inc. | Central coil design for ionized metal plasma deposition |
US6361661B2 (en) | 1997-05-16 | 2002-03-26 | Applies Materials, Inc. | Hybrid coil design for ionized deposition |
GB9714142D0 (en) * | 1997-07-05 | 1997-09-10 | Surface Tech Sys Ltd | An arrangement for the feeding of RF power to one or more antennae |
US6479785B1 (en) | 1998-07-09 | 2002-11-12 | Richard J. Fugo | Device for plasma incision of mater with a specifically tuned radiofrequencty electromagnetic field generator |
CN1176636C (zh) * | 1997-10-24 | 2004-11-24 | 理查德·J·富戈 | 用特殊调振射频电磁场发生器的物体等离子云切割方法 |
US5958266A (en) * | 1997-10-24 | 1999-09-28 | Fugo; Richard J. | Method of plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator |
JPH11135438A (ja) * | 1997-10-28 | 1999-05-21 | Nippon Asm Kk | 半導体プラズマ処理装置 |
US6506287B1 (en) | 1998-03-16 | 2003-01-14 | Applied Materials, Inc. | Overlap design of one-turn coil |
US6085688A (en) * | 1998-03-27 | 2000-07-11 | Applied Materials, Inc. | Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor |
US6146508A (en) * | 1998-04-22 | 2000-11-14 | Applied Materials, Inc. | Sputtering method and apparatus with small diameter RF coil |
US6787730B2 (en) | 1998-07-09 | 2004-09-07 | Damian Coccio | Device for plasma incision of matter with a specifically tuned radiofrequency electromagnetic field generator |
US6660134B1 (en) | 1998-07-10 | 2003-12-09 | Applied Materials, Inc. | Feedthrough overlap coil |
EP1144717A4 (de) * | 1998-12-01 | 2003-04-16 | Silicon Genesis Corp | Verbesserter plasmamodus und -verfahren und system für plasmatauchionenimplantation |
US6254745B1 (en) * | 1999-02-19 | 2001-07-03 | Tokyo Electron Limited | Ionized physical vapor deposition method and apparatus with magnetic bucket and concentric plasma and material source |
US6237526B1 (en) | 1999-03-26 | 2001-05-29 | Tokyo Electron Limited | Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
US6474258B2 (en) * | 1999-03-26 | 2002-11-05 | Tokyo Electron Limited | Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
DE19933841A1 (de) * | 1999-07-20 | 2001-02-01 | Bosch Gmbh Robert | Vorrichtung und Verfahren zum Ätzen eines Substrates mittels eines induktiv gekoppelten Plasmas |
AU1606101A (en) * | 1999-11-15 | 2001-05-30 | Lam Research Corporation | Materials and gas chemistries for processing systems |
US6320320B1 (en) | 1999-11-15 | 2001-11-20 | Lam Research Corporation | Method and apparatus for producing uniform process rates |
US6341574B1 (en) | 1999-11-15 | 2002-01-29 | Lam Research Corporation | Plasma processing systems |
US6322661B1 (en) | 1999-11-15 | 2001-11-27 | Lam Research Corporation | Method and apparatus for controlling the volume of a plasma |
US7067034B2 (en) | 2000-03-27 | 2006-06-27 | Lam Research Corporation | Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma |
US6446572B1 (en) | 2000-08-18 | 2002-09-10 | Tokyo Electron Limited | Embedded plasma source for plasma density improvement |
US6459066B1 (en) * | 2000-08-25 | 2002-10-01 | Board Of Regents, The University Of Texas System | Transmission line based inductively coupled plasma source with stable impedance |
US6494998B1 (en) | 2000-08-30 | 2002-12-17 | Tokyo Electron Limited | Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive element |
TW529085B (en) * | 2000-09-22 | 2003-04-21 | Alps Electric Co Ltd | Method for evaluating performance of plasma treatment apparatus or performance confirming system of plasma treatment system |
US6673199B1 (en) | 2001-03-07 | 2004-01-06 | Applied Materials, Inc. | Shaping a plasma with a magnetic field to control etch rate uniformity |
US20050186723A1 (en) * | 2001-06-21 | 2005-08-25 | Kim Hyoung J. | Methods and apparatuses for heat treatment of semiconductor films upon thermally susceptible non-conducting substrates |
JP4181761B2 (ja) * | 2001-06-21 | 2008-11-19 | ジュン キム ヒョン | 熱感受性非導電性基板上の半導体フィルムを熱処理するための方法および装置 |
EP1421606A4 (de) * | 2001-08-06 | 2008-03-05 | Genitech Co Ltd | Geräte für die plasmaverstärkte atomische schichtablagerung (peald) und verfahren zur bildung eines dünnen leitfähigen films damit dafür |
US6820570B2 (en) * | 2001-08-15 | 2004-11-23 | Nobel Biocare Services Ag | Atomic layer deposition reactor |
KR100760291B1 (ko) * | 2001-11-08 | 2007-09-19 | 에이에스엠지니텍코리아 주식회사 | 박막 형성 방법 |
CA2466953A1 (en) * | 2001-11-14 | 2003-08-14 | Blacklight Power, Inc. | Hydrogen power, plasma, and reactor for lasing, and power conversion |
US20030129117A1 (en) * | 2002-01-02 | 2003-07-10 | Mills Randell L. | Synthesis and characterization of a highly stable amorphous silicon hydride as the product of a catalytic hydrogen plasma reaction |
DE10210898A1 (de) * | 2002-03-08 | 2003-09-25 | Ruediger Haaga Gmbh | Vorrichtung zum Sterilisieren von Gegenständen |
US6875624B2 (en) * | 2002-05-08 | 2005-04-05 | Taiwan Semiconductor Manufacturing Co. Ltd. | Combined E-beam and optical exposure semiconductor lithography |
US20040142558A1 (en) * | 2002-12-05 | 2004-07-22 | Granneman Ernst H. A. | Apparatus and method for atomic layer deposition on substrates |
GB2398166B (en) * | 2003-02-07 | 2007-03-28 | Trikon Technologies Ltd | Electrostatic clamping of thin wafers in plasma processing vacuum chamber |
DE102004002243A1 (de) * | 2003-02-07 | 2004-09-16 | Trikon Technologies Limited, Newport | Elektrostatische Klemmhalterung für dünne Wafer in einer Vakuumkammer zur Plasmabearbeitung |
US7601223B2 (en) * | 2003-04-29 | 2009-10-13 | Asm International N.V. | Showerhead assembly and ALD methods |
US7537662B2 (en) * | 2003-04-29 | 2009-05-26 | Asm International N.V. | Method and apparatus for depositing thin films on a surface |
US7188033B2 (en) * | 2003-07-21 | 2007-03-06 | Blacklight Power Incorporated | Method and system of computing and rendering the nature of the chemical bond of hydrogen-type molecules and molecular ions |
WO2005041368A2 (en) | 2003-10-24 | 2005-05-06 | Blacklight Power, Inc. | Novel molecular hydrogen gas laser |
CA2549609A1 (en) * | 2004-01-05 | 2005-07-28 | Blacklight Power, Inc. | Method and system of computing and rendering the nature of atoms and atomic ions |
JP3616088B1 (ja) * | 2004-03-17 | 2005-02-02 | 独立行政法人科学技術振興機構 | マイクロプラズマジェット発生装置 |
WO2005116630A2 (en) * | 2004-05-17 | 2005-12-08 | Blacklight Power, Inc. | Method and system of computing and rendering the nature of the excited electronic states of atoms and atomic ions |
US7691243B2 (en) * | 2004-06-22 | 2010-04-06 | Tokyo Electron Limited | Internal antennae for plasma processing with metal plasma |
US20070198199A1 (en) * | 2004-07-19 | 2007-08-23 | Mills Randell L | Method and system of computing and rendering the nature of the chemical bond of hydrogen-type molecules and molecular ions |
US7138767B2 (en) * | 2004-09-30 | 2006-11-21 | Tokyo Electron Limited | Surface wave plasma processing system and method of using |
KR100599092B1 (ko) * | 2004-11-29 | 2006-07-12 | 삼성전자주식회사 | 구동 주파수 조절에 의한 전자기유도 가속장치 |
CN100595974C (zh) * | 2005-03-30 | 2010-03-24 | 松下电器产业株式会社 | 传输线 |
US7396415B2 (en) * | 2005-06-02 | 2008-07-08 | Asm America, Inc. | Apparatus and methods for isolating chemical vapor reactions at a substrate surface |
TWI414618B (zh) * | 2005-08-26 | 2013-11-11 | 尼康股份有限公司 | A holding device, an assembling system, a sputtering device, and a processing method and a processing device |
US20070264427A1 (en) * | 2005-12-21 | 2007-11-15 | Asm Japan K.K. | Thin film formation by atomic layer growth and chemical vapor deposition |
US20080304522A1 (en) * | 2006-04-04 | 2008-12-11 | Mills Randell L | Catalyst laser |
US8088126B2 (en) | 2006-08-17 | 2012-01-03 | Fugo Richard J | Method and apparatus for plasma incision of cardiovascular tissue |
TW200830941A (en) * | 2007-01-15 | 2008-07-16 | Jehara Corp | Plasma generating apparatus |
US20080241387A1 (en) * | 2007-03-29 | 2008-10-02 | Asm International N.V. | Atomic layer deposition reactor |
KR20090018290A (ko) * | 2007-08-17 | 2009-02-20 | 에이에스엠지니텍코리아 주식회사 | 증착 장치 |
US7678715B2 (en) | 2007-12-21 | 2010-03-16 | Applied Materials, Inc. | Low wet etch rate silicon nitride film |
KR100968132B1 (ko) * | 2008-02-29 | 2010-07-06 | (주)얼라이드 테크 파인더즈 | 안테나 및 이를 구비한 반도체 장치 |
US8383525B2 (en) | 2008-04-25 | 2013-02-26 | Asm America, Inc. | Plasma-enhanced deposition process for forming a metal oxide thin film and related structures |
US20100266765A1 (en) * | 2009-04-21 | 2010-10-21 | White Carl L | Method and apparatus for growing a thin film onto a substrate |
DE202009013281U1 (de) | 2009-10-02 | 2009-12-10 | JUN XIANG INDUSTRIAL SEWING MACHINE CO., LTD., Shunlin City | Bewegliche Flusenableitvorrichtung mit Leitelementen |
DE202009013283U1 (de) | 2009-10-02 | 2009-12-10 | JUN XIANG INDUSTRIAL SEWING MACHINE CO., LTD., Shunlin City | Verschiebbare Ableitvorrichtung für Fuseln |
KR101669083B1 (ko) | 2009-11-27 | 2016-10-25 | 주식회사 원익아이피에스 | 플라즈마 발생장치 |
US9490106B2 (en) | 2011-04-28 | 2016-11-08 | Lam Research Corporation | Internal Faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer TCP coil |
US9293353B2 (en) | 2011-04-28 | 2016-03-22 | Lam Research Corporation | Faraday shield having plasma density decoupling structure between TCP coil zones |
US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
US9029267B2 (en) | 2013-05-16 | 2015-05-12 | Lam Research Corporation | Controlling temperature of a faraday shield |
KR20140137172A (ko) * | 2013-05-22 | 2014-12-02 | 최대규 | 자기 관리 기능을 갖는 원격 플라즈마 시스템 및 이의 자기 관리 방법 |
US9885493B2 (en) | 2013-07-17 | 2018-02-06 | Lam Research Corporation | Air cooled faraday shield and methods for using the same |
CN111192812B (zh) * | 2020-01-07 | 2022-11-25 | 北京北方华创微电子装备有限公司 | 电感耦合装置和半导体处理设备 |
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US4422896A (en) * | 1982-01-26 | 1983-12-27 | Materials Research Corporation | Magnetically enhanced plasma process and apparatus |
US4990229A (en) * | 1989-06-13 | 1991-02-05 | Plasma & Materials Technologies, Inc. | High density plasma deposition and etching apparatus |
US5091049A (en) * | 1989-06-13 | 1992-02-25 | Plasma & Materials Technologies, Inc. | High density plasma deposition and etching apparatus |
US4948458A (en) * | 1989-08-14 | 1990-08-14 | Lam Research Corporation | Method and apparatus for producing magnetically-coupled planar plasma |
US5304279A (en) * | 1990-08-10 | 1994-04-19 | International Business Machines Corporation | Radio frequency induction/multipole plasma processing tool |
JP3128239B2 (ja) * | 1991-05-21 | 2001-01-29 | 東京エレクトロン株式会社 | クラスタツールのソフトエッチングモジュールおよびそのecrプラズマ発生装置 |
US6077384A (en) * | 1994-08-11 | 2000-06-20 | Applied Materials, Inc. | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode |
US5226967A (en) * | 1992-05-14 | 1993-07-13 | Lam Research Corporation | Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber |
JP3254069B2 (ja) * | 1993-01-12 | 2002-02-04 | 東京エレクトロン株式会社 | プラズマ装置 |
US5401350A (en) * | 1993-03-08 | 1995-03-28 | Lsi Logic Corporation | Coil configurations for improved uniformity in inductively coupled plasma systems |
KR100264445B1 (ko) * | 1993-10-04 | 2000-11-01 | 히가시 데쓰로 | 플라즈마처리장치 |
JPH07161493A (ja) * | 1993-12-08 | 1995-06-23 | Fujitsu Ltd | プラズマ発生装置及び方法 |
AP626A (en) * | 1994-01-13 | 1998-01-16 | Certco Llc | Cryptographic system and method with key escrow feature. |
US5540824A (en) * | 1994-07-18 | 1996-07-30 | Applied Materials | Plasma reactor with multi-section RF coil and isolated conducting lid |
JP3105403B2 (ja) * | 1994-09-14 | 2000-10-30 | 松下電器産業株式会社 | プラズマ処理装置 |
DE69510427T2 (de) * | 1994-10-31 | 1999-12-30 | Applied Materials, Inc. | Plasmareaktoren zur Halbleiterscheibenbehandlung |
US5688357A (en) * | 1995-02-15 | 1997-11-18 | Applied Materials, Inc. | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor |
US5556521A (en) * | 1995-03-24 | 1996-09-17 | Sony Corporation | Sputter etching apparatus with plasma source having a dielectric pocket and contoured plasma source |
US5874704A (en) * | 1995-06-30 | 1999-02-23 | Lam Research Corporation | Low inductance large area coil for an inductively coupled plasma source |
US5716451A (en) * | 1995-08-17 | 1998-02-10 | Tokyo Electron Limited | Plasma processing apparatus |
-
1996
- 1996-03-27 US US08/624,010 patent/US5669975A/en not_active Expired - Lifetime
-
1997
- 1997-02-11 TW TW086101671A patent/TW340295B/zh not_active IP Right Cessation
- 1997-03-04 WO PCT/US1997/003048 patent/WO1997036022A1/en active IP Right Grant
- 1997-03-04 AU AU20583/97A patent/AU2058397A/en not_active Abandoned
- 1997-03-04 DE DE19781667A patent/DE19781667B4/de not_active Expired - Fee Related
- 1997-03-04 DE DE19781667T patent/DE19781667T1/de active Pending
- 1997-03-04 GB GB9820829A patent/GB2326974B/en not_active Expired - Fee Related
- 1997-03-04 JP JP53439897A patent/JP3653524B2/ja not_active Expired - Fee Related
- 1997-03-04 CH CH01975/98A patent/CH696036A5/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW340295B (en) | 1998-09-11 |
JP2001503554A (ja) | 2001-03-13 |
US5669975A (en) | 1997-09-23 |
GB9820829D0 (en) | 1998-11-18 |
AU2058397A (en) | 1997-10-17 |
GB2326974B (en) | 2000-11-15 |
JP3653524B2 (ja) | 2005-05-25 |
WO1997036022A1 (en) | 1997-10-02 |
DE19781667B4 (de) | 2007-07-05 |
GB2326974A (en) | 1999-01-06 |
CH696036A5 (de) | 2006-11-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8127 | New person/name/address of the applicant |
Owner name: TOKYO ELECTRON LTD., ORANGEBURG, N.Y., US |
|
8127 | New person/name/address of the applicant |
Owner name: TOKYO ELECTRON LTD., TOKIO/TOKYO, JP |
|
8110 | Request for examination paragraph 44 | ||
8125 | Change of the main classification |
Ipc: H05H 146 |