CN2930194Y - Glow discharge low temperature plasma device - Google Patents
Glow discharge low temperature plasma device Download PDFInfo
- Publication number
- CN2930194Y CN2930194Y CN 200620074948 CN200620074948U CN2930194Y CN 2930194 Y CN2930194 Y CN 2930194Y CN 200620074948 CN200620074948 CN 200620074948 CN 200620074948 U CN200620074948 U CN 200620074948U CN 2930194 Y CN2930194 Y CN 2930194Y
- Authority
- CN
- China
- Prior art keywords
- electrode
- glow discharge
- cavity
- discharge low
- plasma device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Abstract
The utility model relates to a device capable of generating the plasma, in particular to a glow discharge low-temperature plasma device which comprises a chamber, an upper electrode, a lower electrode and the insulating material layer covering the upper electrode and the lower electrode. The glow discharge low-temperature plasma device can make any gaseous material generate even low-temperature plasma near the normal temperature under the condition of high atmospheric pressure with hundreds or thousands pa and low requirements for the vacuum degree of the device. The gas concentration in the plasma generating area is high and can be used for techniques such as material surface process, graft, aggregation or the like with fast speed or for the chemical synthesis and decomposition in the gaseous material reactions.
Description
Technical field
The utility model relates to the device that can produce plasma, specifically the glow discharge low-temp plasma device.
Background technology
Low-temperature plasma near normal temperature can be used for the processing of material surface and the synthetic or decomposition of gaseous matter.The existing device that produces low temperature plasma comprises metallic cavity, top electrode, bottom electrode, upper and lower electrode is at a distance of certain distance, on upper and lower electrode, apply the high-tension electricity of certain power, under the condition of low pressure below tens handkerchiefs or special gas, produce low temperature plasma.The existing device of low temperature plasma that produces is owing to producing low temperature plasma under the condition of low pressure or special gas, vacuum degree to equipment requires high, and the gas concentration of ion plasma is lower, and it is slower to be used for technology medium velocities such as material surface processing, grafting and polymerization.Under high pressure conditions, except that the part special gas, can only produce uneven fluidization tower discharge, thread discharge or columnar dicsharge usually as air, oxygen, nitrogen, water vapour etc.The existing device that produces low temperature plasma can't produce under high pressure conditions uniformly and near the glow discharge of normal temperature.
Summary of the invention
The purpose of this utility model is exactly the shortcoming that exists at the existing device that produces low temperature plasma, propose a kind of can under the high pressure conditions of 500 ~ 5000pa, produce uniformly and, thereby produce uniformly and near the glow discharge low-temp plasma device of the glow discharge plasma of normal temperature near the glow discharge of normal temperature.
In order to realize under the high pressure conditions of 500 ~ 5000pa, producing uniformly and, thereby produce uniformly and near the purpose of the glow discharge plasma of normal temperature, the technical solution adopted in the utility model is near the glow discharge of normal temperature:
The glow discharge low-temp plasma device comprises cavity, top electrode, bottom electrode, and the upper and lower electrode in seal chamber all is insulated material layer and coats.
If the distance of electrode and seal chamber is closer and volume is little again, then can select for use the material of insulation to do cavity.
If cavity is a metal, then at the coated insulation material layer of metallic cavity inwall.
If cavity is a metal, any point is 10～50 times of upper and lower electrode forward surface distance to the distance of cavity wall on the high-field electrode, the forward surface that then upper and lower electrode package is covered with insulation material layer or top electrode and bottom electrode is coated with insulation material layer, cavity inner wall can not established insulation material layer, or at the coated insulation material layer of cavity inner wall, or the coated insulation material layer in part, position of discharge is being arranged near high-field electrode.
On upper and lower electrode, apply the intermediate frequency or the high-frequency ac high-tension electricity of certain power, then can produce uniformly and near the low temperature plasma of normal temperature in the upper and lower electrode inboard that insulation material layer parcel is arranged of two parallel placements.
Other various gaseous materials that comprise air can be applied in the cavity, the low temperature plasma of corresponding gaseous state thing can be produced.
The beneficial effects of the utility model are, can any gaseous material be produced uniformly and near the low temperature plasma of normal temperature at hundreds of, vacuum degree requirement to equipment is low, uses common oil-sealed rotary pump can reach extremely several kPas vacuum requirement of hundreds of simply fast.Because the gas concentration height of plasma slab, technology medium velocities such as material surface processing, grafting and polymerization are fast being used for, and more help chemical synthesis and decomposition in the reaction of gaseous material.Can be applied to the surface modification treatment of various macromolecule membranes, textile, metal and fiber and other material and the synthetic and decomposition of gaseous material.
Description of drawings
Fig. 1 is the structural representation of first embodiment of the utility model;
Fig. 2 is the structural representation of second embodiment of the utility model;
Fig. 3 is the structural representation of the 3rd embodiment of the utility model;
Embodiment
Embodiment one
Fig. 1 is an embodiment of the present utility model, discharge in order to prevent electrode and chamber walls, the cavity wall of present embodiment vacuum cavity 1 adopts insulated cavity body wall 2, and the insulating material of insulated cavity body wall 2 can be materials such as pottery, glass, polyethylene, polypropylene, nylon.Vacuum cavity 1 right side is a vacuum chamber door 6, is provided with sealing ring 5 between vacuum chamber door 6 and the upper and lower cavity wall.The cavity of resorption body wall is provided with bleeds and disappointing interface 7, and the epicoele body wall is provided with and adds atmosphere interface 8.Top electrode 9 and bottom electrode 15 relative being located in the vacuum cavity 1, top electrode 9 links to each other with the high-pressure side of intermediate frequency or radio frequency plasma power supply 21 by top electrode lead-in wire 11, and bottom electrode 15 goes between by bottom electrode and 17 links to each other with the low-pressure end of intermediate frequency or radio frequency plasma power supply 21.Be coated with top electrode insulating barrier 10 on the top electrode 9, be coated with top electrode lead wire insulation layer 12 on the top electrode lead-in wire 11, link to each other with intermediate frequency or radio frequency plasma power supply 21 by top electrode extraction electrode 14, top electrode extraction electrode 14 is coated on top electrode and draws in the insulator 13.Be coated with bottom electrode insulating barrier 16 on the bottom electrode 15, be coated with bottom electrode lead wire insulation layer 18 on the bottom electrode lead-in wire 17, link to each other with intermediate frequency or radio frequency plasma power supply 21 by bottom electrode extraction electrode 20, bottom electrode extraction electrode 20 is coated on bottom electrode and draws in the insulator 19.
During practical operation, close earlier and add atmosphere interface 8 and vacuum chamber door 6, with vacuum pump with the gas in the vacuum cavity 1 from bleeding and disappointing interface 7 is extracted out, make the air pressure in the vacuum cavity 1 be about 500 ~ 5000pa (deciding) on two distance between electrodes.On top electrode 9, bottom electrode 15 extraction electrodes 14 and 20, apply the intermediate frequency or the radio-frequency voltage of certain power again, then just can produce the low temperature plasma 22 of glow discharge in the clearance space between top electrode 9, bottom electrode 15.
If desired, can apply all gases, promptly can produce the low temperature plasma 22 of corresponding atmosphere by adding atmosphere interface 8.
The forward surface of top electrode 9, bottom electrode 15 must be used certain thickness dielectric, coat as materials such as pottery, glass, silicon rubber, quartz glasss, and in other region of interest, as the back side of electrode, electrode outlet line etc., apply good insulation performance when unwanted discharge occurring and handle, make glow discharge only be confined to produce in the forward surface of two electrodes up and down.
Top electrode 9, bottom electrode 15 can be metal materials such as metal coating, wire netting, metal foil or metallic plate, also can be nonmetallic electric conducting materials such as graphite.
Embodiment two
Fig. 2 is second embodiment of the present utility model, the cavity wall of present embodiment vacuum cavity 1 is a wire chamber body wall 3, in order to prevent that electrode and wire chamber body wall 3 from discharging, inner surface at wire chamber body wall 3 is coated with wire chamber body wall insulating barrier 4, and wire chamber body wall insulating barrier 4 has adopted such as materials such as glass, polyethylene, polypropylene, nylon.Other structure of present embodiment is identical with embodiment one, and when specifically implementing, its method of operation is also identical with embodiment one.Present embodiment is applicable on the bigger equipment of the volume ratio of vacuum cavity 1.
Embodiment three
Fig. 3 is the 3rd embodiment of the present utility model, and the cavity wall of present embodiment vacuum cavity 1 is a wire chamber body wall 3.Top electrode 9 is a high-field electrode, and any point is to the distance of the cavity wall forward surface distance greater than top electrode 9, bottom electrode 15 on the top electrode 9, and any point is 10～50 times of forward surface distance of top electrode 9, bottom electrode 15 to the distance of cavity wall on the top electrode 9.The inwall of wire chamber body wall 3 can not established insulation material layer, sometimes in order to prevent that electrode and wire chamber body wall 3 from discharging, and can be at the coated insulating barrier in position that discharge takes place near wire chamber body wall 3 inwalls of top electrode 9.Wire chamber body wall insulating barrier 4 can be located at wire chamber body wall 3 inwalls of top electrode 9 tops and wire chamber body wall 3 inwalls of top electrode 9 lefts.Wire chamber body wall insulating barrier 4 has adopted such as materials such as glass, polyethylene, polypropylene, nylon.Other structure of present embodiment is identical with embodiment one, and when specifically implementing, its method of operation is also identical with embodiment one.Present embodiment is applicable to that any point on the high-field electrode is to the distance of the cavity wall equipment greater than top electrode 9, bottom electrode 15 forward surface distances.
The utility model can also have other execution mode, and the technical scheme that equal replacement of all employings or equivalent transformation form all drops in the claimed scope of the utility model.
Claims (10)
1. the glow discharge low-temp plasma device comprises cavity, top electrode, bottom electrode, it is characterized in that: described top electrode and bottom electrode are coated with insulation material layer.
2. glow discharge low-temp plasma device as claimed in claim 1 is characterized in that: described cavity is the insulation cavity.
3. glow discharge low-temp plasma device as claimed in claim 1 is characterized in that: described cavity is a metallic cavity, and described cavity inner surface is provided with insulation material layer.
4. glow discharge low-temp plasma device as claimed in claim 1, it is characterized in that: described cavity is a metallic cavity, and any point is 10～50 times of upper and lower electrode forward surface distance to the distance of cavity wall on the high-field electrode in described top electrode and the bottom electrode.
5. glow discharge low-temp plasma device as claimed in claim 4 is characterized in that: the forward surface of described top electrode and bottom electrode is coated with insulation material layer.
6. glow discharge low-temp plasma device as claimed in claim 4 is characterized in that: be provided with insulation material layer at the cavity inner surface near high-field electrode.
7. glow discharge low-temp plasma device as claimed in claim 6 is characterized in that: described insulation material layer is located at the cavity inner surface of high-field electrode top and the cavity inner surface of high-field electrode left.
8. glow discharge low-temp plasma device as claimed in claim 1 is characterized in that; Be coated with insulation material layer on the lead-out wire of described top electrode and bottom electrode.
9. glow discharge low-temp plasma device as claimed in claim 1 is characterized in that: the insulation material layer that described top electrode and bottom electrode coat is ceramic layer, glassy layer, silastic-layer or quartz glass layer.
10. as claim 3,6 or 7 described glow discharge low-temp plasma devices, it is characterized in that: it is glassy layer, polyethylene layer, polypropylene layer or nylon layer that described cavity inner surface is provided with insulation material layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200620074948 CN2930194Y (en) | 2006-07-18 | 2006-07-18 | Glow discharge low temperature plasma device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200620074948 CN2930194Y (en) | 2006-07-18 | 2006-07-18 | Glow discharge low temperature plasma device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2930194Y true CN2930194Y (en) | 2007-08-01 |
Family
ID=38308559
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200620074948 Expired - Lifetime CN2930194Y (en) | 2006-07-18 | 2006-07-18 | Glow discharge low temperature plasma device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2930194Y (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103251174A (en) * | 2013-05-07 | 2013-08-21 | 苏州卫鹏机电科技有限公司 | Novel noise elimination and electrode insulation device for vacuum box emptying |
| CN104955258A (en) * | 2014-03-25 | 2015-09-30 | Lg电子株式会社 | Plasma electrode device and method for manufacturing the same |
| CN105555000A (en) * | 2014-10-28 | 2016-05-04 | 南京苏曼等离子科技有限公司 | Normal temperature glow discharge low-temperature plasma material processing device under large discharge interval |
| CN107999469A (en) * | 2017-11-20 | 2018-05-08 | 安徽晓星能源科技有限公司 | A kind of midfrequent AC aura cleans power supply |
| CN108281243A (en) * | 2018-01-29 | 2018-07-13 | 中国科学院电工研究所 | Discharge plasma handles the device and method on micro- laminating structure insulating materials surface |
| CN110677970A (en) * | 2019-08-19 | 2020-01-10 | 西安交通大学 | Flat plate type plasma generating device based on mixed type plasma structure |
| CN110749645A (en) * | 2018-07-24 | 2020-02-04 | 中国科学院上海硅酸盐研究所 | Cage-shaped sample introduction device for glow discharge mass spectrometry and sample testing method |
-
2006
- 2006-07-18 CN CN 200620074948 patent/CN2930194Y/en not_active Expired - Lifetime
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103251174A (en) * | 2013-05-07 | 2013-08-21 | 苏州卫鹏机电科技有限公司 | Novel noise elimination and electrode insulation device for vacuum box emptying |
| CN104955258A (en) * | 2014-03-25 | 2015-09-30 | Lg电子株式会社 | Plasma electrode device and method for manufacturing the same |
| US9646806B2 (en) | 2014-03-25 | 2017-05-09 | Lg Electronics Inc. | Plasma electrode device and method for manufacturing the same |
| CN104955258B (en) * | 2014-03-25 | 2017-07-21 | Lg电子株式会社 | Plasma electrode device and its manufacture method |
| CN105555000A (en) * | 2014-10-28 | 2016-05-04 | 南京苏曼等离子科技有限公司 | Normal temperature glow discharge low-temperature plasma material processing device under large discharge interval |
| CN107999469A (en) * | 2017-11-20 | 2018-05-08 | 安徽晓星能源科技有限公司 | A kind of midfrequent AC aura cleans power supply |
| CN108281243A (en) * | 2018-01-29 | 2018-07-13 | 中国科学院电工研究所 | Discharge plasma handles the device and method on micro- laminating structure insulating materials surface |
| CN108281243B (en) * | 2018-01-29 | 2020-10-30 | 中国科学院电工研究所 | Device and method for treating surface of micro-stack structure insulating material by discharge plasma |
| CN110749645A (en) * | 2018-07-24 | 2020-02-04 | 中国科学院上海硅酸盐研究所 | Cage-shaped sample introduction device for glow discharge mass spectrometry and sample testing method |
| CN110749645B (en) * | 2018-07-24 | 2021-10-01 | 中国科学院上海硅酸盐研究所 | Cage-shaped sample introduction device for glow discharge mass spectrometry and sample testing method |
| CN110677970A (en) * | 2019-08-19 | 2020-01-10 | 西安交通大学 | Flat plate type plasma generating device based on mixed type plasma structure |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN2930194Y (en) | Glow discharge low temperature plasma device | |
| JP4595276B2 (en) | Microwave plasma processing method and apparatus | |
| JP7156648B2 (en) | Carbon nanostructured material and method of forming carbon nanostructured material | |
| JP2011086912A5 (en) | ||
| CN108611623B (en) | Spraying coating device and method for inhibiting secondary electron yield of solid dielectric material | |
| WO2006105955A3 (en) | Apparatus and process for generating, accelerating and propagating beams of electrons and plasma | |
| CN207638962U (en) | The enhanced direct current alternating electrode low-temperature plasma jet array of atmospheric dielectric barrier discharge | |
| CN101802259A (en) | Be used for equipment and the method and the application thereof of the very high frequency plasma assisted CVD under the barometric point | |
| CN104616963A (en) | Plasma spray spectrometry ionization source | |
| JP7260558B2 (en) | Method and apparatus for plasma-induced water splitting | |
| CN1694324A (en) | Method for uniform glow discharge in atmosphere air | |
| CN1937881A (en) | Water electrode medium barrier discharge device | |
| CN106011786B (en) | Atmospheric pressure disperse electric discharge device and metal surface deposition class SiO2Film process | |
| TW201311058A (en) | Atmospheric pressure plasma jet device | |
| CN105555000A (en) | Normal temperature glow discharge low-temperature plasma material processing device under large discharge interval | |
| CN104768316A (en) | Large-discharge-interval normal temperature glow discharge low-temperature plasma material processing device | |
| CN107979907A (en) | The enhanced direct current alternating electrode low-temperature plasma jet array of atmospheric dielectric barrier discharge | |
| CN108130522A (en) | Metal surface depositing Ti O2Film inhibits the method and device of micro discharge | |
| CN2604845Y (en) | Atmospheric radio-frequency and DC mixed cold plasma generator | |
| CN204424207U (en) | A kind of plasma electrospray mass spectrometry ionization source | |
| CN1917120B (en) | Apparatus for processing substrate and apparatus for processing electron source substrate | |
| CN109778146B (en) | Plasma deposition device and deposition method | |
| JP4357661B2 (en) | Carbon nanotube thin film forming apparatus and forming method | |
| CN105714274A (en) | Plasma enhanced chemical vapor deposition equipment and film manufacturing method | |
| JP2010225751A (en) | Device for growing atomic layer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: NANJING SUMAN PLASMA TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: WAN JINGLIN Effective date: 20110425 Free format text: FORMER OWNER: WAN RONGLIN |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 210000 ROOM 102, BUILDING 6, NO. 60, HUJUGUAN, NANJING CITY, JIANGSU PROVINCE TO: 210007 NO. 3, YOUYIHE ROAD, BAIXIA DISTRICT, JIANGSU PROVINCE |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20110425 Address after: Friendship road 210007 No. 3 Baixia District of Jiangsu Province Patentee after: Nanjing Suman PDP Technology CO., Ltd. Address before: 210000. 102, building 6, 60 tiger gap, Nanjing, Jiangsu Co-patentee before: Wan Ronglin Patentee before: Wan Jinglin |
|
| C56 | Change in the name or address of the patentee | ||
| CP02 | Change in the address of a patent holder |
Address after: Friendship road Nanjing Baixia District of Jiangsu Province, No. 3 210007 Patentee after: Nanjing Suman PDP Technology CO., Ltd. Address before: Friendship road 210007 No. 3 Baixia District of Jiangsu Province Patentee before: Nanjing Suman PDP Technology CO., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20070801 |
|
| EXPY | Termination of patent right or utility model |