CN2760753Y - ultrahigh vacuum gas ionization device - Google Patents
ultrahigh vacuum gas ionization device Download PDFInfo
- Publication number
- CN2760753Y CN2760753Y CN 200420054353 CN200420054353U CN2760753Y CN 2760753 Y CN2760753 Y CN 2760753Y CN 200420054353 CN200420054353 CN 200420054353 CN 200420054353 U CN200420054353 U CN 200420054353U CN 2760753 Y CN2760753 Y CN 2760753Y
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- CN
- China
- Prior art keywords
- electrode
- gas ionization
- ionization
- chamber
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 210000004907 gland Anatomy 0.000 claims abstract description 8
- 238000007789 sealing Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 47
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Abstract
The utility model discloses an ultrahigh vacuum gas ionization device. The ionization device comprises a tubular ionization device on a flange plate (1) and an ionization electrode, and particularly, the tubular ionization device is composed of a gas ionization chamber (6) and a sealing chamber (5), one end of the gas ionization chamber (6) is provided with a nozzle (7), the other end of the gas ionization chamber is connected with the sealing chamber (5), and is connected with one end of a concave table on the tubular inner wall of a fixing frame (12) through a convex pipe (10) extending into the gas ionization chamber, the other end of the fixing frame (12) is connected with the flange plate (1) into a whole, the end part of the fixing frame is connected with a gas inlet pipe (14), the other end of the sealing chamber (5) is connected with a convex table on the fixing frame (12) through a rubber ring (2), a pressing sheet (3) and a gland (4), a working electrode (8) is arranged in the gas ionization chamber (6), and a matching electrode (9) surrounds the outside of the gas ionization. The purity and efficiency of gas ionization are high, the cleaning and the replacement of working electrodes of the whole machine are convenient, and the method can be widely applied to various film making equipment.
Description
Technical field the utility model relates to a kind of gas ionization device, especially ultra high vacuum gas ionization device.
Background technology is in the manufacture process of semiconductor device, passivation is carried out on its surface, can reduce of the negative effect of the various defectives of semiconductor surface to device performance, the blocking capability that enhance device stains foreign ion, the electrical characteristics on control and stabilization of semiconductor surface prevent that device is subjected to chemical damage and mechanical damage.And one of measure of preparation high-performance and high-quality surface passivated membrane is to need to use ionization of gas, and at present, people are in order to obtain ionization of gas, normal using gases ionization apparatus.As a kind of " the activated gas device that is used for the vacuum membrane equipment " that discloses among the disclosed Chinese utility model patent specification CN 2265985Y on October 29th, 1997.It is intended to provide a kind of simple in structure, activated gas efficient height, can be directly used in the activated gas device in the vacuum chamber.It constitute ring flange with tapered vacuum discharge tube sealing and fixing in vacuum chamber, two ionization electrodes are in the vacuum discharge tube that is placed in serially.During the gas ionization, working gas is entered in the vacuum discharge tube by air inlet pipe, under formed effect of electric field between two ionization electrodes, generates required ionization of gas.But, this activated gas device exists weak point, at first, and ring flange and insulating material, gas leak phenomenon very easily takes place because of thermal coefficient of expansion than big-difference in the junction between the vacuum discharge tube of making as quartz, glass, pottery etc., makes the of low quality of ionization of gas; Secondly, two ionization electrodes all are arranged in vacuum discharge tube, cause the metal ion that contains harmful ionization electrode in the ionization of gas; Once more, the be placed in discharge lack of homogeneity of two ionization electrodes in the vacuum discharge tube of serial makes the efficient of gas ionization not high; Again time, for fixedlying connected, the difficult problem of existing mutual sealing can't be come the maintenance that carry out necessity to it through dismounting again, more can not replace with corresponding ionization electrode at the gaseous species of need ionization between ionization electrode and vacuum discharge tube.
The summary of the invention the technical problems to be solved in the utility model provides a kind of purity height of ionization of gas for overcoming weak point of the prior art, uses, ultra high vacuum gas ionization device easy to maintenance.
The technical scheme that is adopted comprises that the end on the ring flange is the circular cone nozzle, the other end has the tubulose ionization device of air inlet pipe, and ionization electrode, particularly said tubulose ionization device is made of gas ionization chamber and closed chamber, one end of said gas ionization chamber is a nozzle, the other end and closed chamber join, and an end that has the tubular inner wall concave station of protruding pipe in stretching into closed chamber and fixed mount joins, the other end of fixed mount and ring flange join and are one, its end is connected with air inlet pipe, the other end of said closed chamber and the dome interstation on the fixed mount are through cushion rubber, compressing tablet is connected with gland, said ionization electrode is work electrode and cooperates electrode, one end of said work electrode passes said protruding pipe and places gas ionization chamber, the other end embeds in the tubular inner wall concave station of said fixed mount one end, and said cooperation electrode retaining collar is around in outside the gas ionization chamber.
As the further improvement of technical scheme, the length of described gas ionization chamber is 10～90 millimeters; The diameter of described nozzle is 5～50 microns; Described gland is connected through screw thread with dome interstation on the fixed mount; Be fixedly connected through screw between the tubular inner wall concave station of described work electrode and fixed mount one end; Described screw is three, is mutually 120 degree and is provided with; Be equipped with the electrode flange on the described ring flange, the two ends of the electrode in the said electrode flange connect the output that cooperates electrode and ionization power supply respectively.
Beneficial effect with respect to prior art is, one, tubulose ionization device is only in the vacuum chamber by ring flange institute sealing and fixing, through wherein closed chamber be connected by cushion rubber, compressing tablet and gland with fixed mount that ring flange joins for one, solved under bigger vacuum difference, sealing difficult problem between the gas ionization chamber of ring flange of making by metal and insulating material and tubulose ionization device respectively, thus the purity of gas ionization guaranteed; They are two years old, stretch into protruding pipe in the closed chamber by gas ionization chamber, both can position work electrode, can add atmospheric ionization chamber and support again and be electrically connected distance between the fixed mount of work electrode, prevent that the fixed mount that is made of metal from producing metal ion when ionization of gas, further guaranteed the purity of gas ionization, also can working gas have been introduced gas ionization chamber by the tube cavity of fixed mount through it; Its three, a pair of ionization electrode of the gas ionization indoor and outdoor that are placed in particularly is surrounded on the cooperation electrode outside the gas ionization chamber, makes the glow discharge that is positioned at the indoor gas of two interelectrode gas ionizations even, has improved the efficient of gas ionization widely; Its four, closed chamber is connected by screw thread through cushion rubber, compressing tablet and gland with dome interstation on the fixed mount, makes to be convenient to dismounting therebetween, is beneficial to it is cleaned and change work electrode; They are five years old, work electrode in the embedding fixed mount one end tubular inner wall concave station is after three screws are fixedly connected with it, except that work electrode can being located securely, also can make working gas equably via entering gas ionization chamber around the work electrode, and then be easier to make it under uniform ionization effect of electric field, to be become required gas by ionization better; Its six, the electrode flange that is equipped with on the ring flange had both solved the sealing problem of electrode, made the compact conformation of complete machine again.
Description of drawings is described in further detail optimal way of the present utility model below in conjunction with accompanying drawing.
Fig. 1 is a kind of basic structure schematic diagram of the present utility model.
Embodiment is referring to Fig. 1, ring flange 1 with after chat its on parts all place in the vacuum chamber.Be connected with its fixed mount that is welded as a whole 12 on the ring flange 1 and be equipped with the electrode flange 13 that is tightly connected mutually with it, wherein, the screw thread of fixed mount 12 on its dome platform is tightly connected with an end of the closed chamber 5 of tubulose mutually by gland 4 and cushion rubber 2, compressing tablet 3, and the other end of closed chamber 5 and gas ionization chamber 6 join.The length of gas ionization chamber 6 is 50 millimeters, and its other end is coniform, and this circular cone top is the nozzle 7 of 10 microns of diameters; Gas ionization chamber 6 outer being surrounded with as the copper ring, the indoor silicon rod that is equipped with as work electrode 8 that cooperate electrode 9; The protruding pipe 10 of gas ionization chamber 6 in stretching into closed chamber 5 joins with an end that has the tubular inner wall concave station of fixed mount 12.The other end that work electrode 8 silicon rods pass behind the protruding pipe 10 embeds in the tubular inner wall concave station of aforesaid fixed mount 12, and is fixed thereon through three screws 11 that are mutually 120 degree settings.The end of fixed mount 12 is tightly connected mutually with air inlet pipe 14.The two ends of the electrode in the electrode flange 13 connect the copper ring that cooperates electrode 9 and the output of ionization power supply respectively, and the ionization power supply is selected the AC power of 100KHz, 200W for use.
During use, as around inner chamber by air inlet pipe 14 approach fixed mount 12 successively of the nitrogen of working gas, the work electrode 8 silicon rod bottoms and the inner chamber of protruding pipe 10 enter gas ionization chamber 6, between work electrode 8 silicon rods and cooperation electrode 9 copper rings, under the effect of ionization power electrical field, become to be used to generate the required ionization of gas of silicon nitride passive film by ionization, and via nozzle 7 ejections.
Obviously, those skilled in the art can carry out various changes and modification to ultra high vacuum gas ionization device of the present utility model and not break away from spirit and scope of the present utility model.Like this, if of the present utility model these are revised and modification belongs within the scope of the utility model claim and equivalent technologies thereof, then the utility model also is intended to comprise these changes and modification interior.
Claims (7)
1, a kind of ultra high vacuum gas ionization device, comprise that the end on the ring flange (1) is circular cone nozzle (7), the other end has the tubulose ionization device of air inlet pipe (14), and ionization electrode, it is characterized in that said tubulose ionization device is made of gas ionization chamber (6) and closed chamber (5), one end of said gas ionization chamber (6) is nozzle (7), the other end and closed chamber (5) join, and an end that has the tubular inner wall concave station of protruding pipe (10) in stretching into closed chamber (5) and fixed mount (12) joins, the other end of fixed mount (12) and ring flange (1) join and are one, its end is connected with air inlet pipe (14), dome interstation on the other end of said closed chamber (5) and the fixed mount (12) is through cushion rubber (2), compressing tablet (3) is connected with gland (4), said ionization electrode is work electrode (8) and cooperates electrode (9), one end of said work electrode (8) passes said protruding pipe (10) and places gas ionization chamber (6), the other end embeds in the tubular inner wall concave station of said fixed mount (12) one ends, and said cooperation electrode (9) is surrounded on outside the gas ionization chamber (6).
2, ultra high vacuum gas ionization device according to claim 1, the length that it is characterized in that gas ionization chamber (6) is 10～90 millimeters.
3, ultra high vacuum gas ionization device according to claim 1, the diameter of its feature nozzle (7) is 5～50 microns.
4,, it is characterized in that gland (4) is connected through screw thread with dome interstation on the fixed mount (12) according to claim 1 or 3 described ultra high vacuum gas ionization devices.
5, ultra high vacuum gas ionization device according to claim 1 is characterized in that being fixedly connected through screw (11) between the tubular inner wall concave station of work electrode (8) and fixed mount (12) one ends.
6, ultra high vacuum gas ionization device according to claim 5 is characterized in that screw (11) is three, is mutually 120 degree and is provided with.
7, ultra high vacuum gas ionization device according to claim 1 is characterized in that being equipped with on the ring flange (1) electrode flange (13), and the two ends of the electrode in the said electrode flange (13) connect the output that cooperates electrode (9) and ionization power supply respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420054353 CN2760753Y (en) | 2004-12-09 | 2004-12-09 | ultrahigh vacuum gas ionization device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200420054353 CN2760753Y (en) | 2004-12-09 | 2004-12-09 | ultrahigh vacuum gas ionization device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2760753Y true CN2760753Y (en) | 2006-02-22 |
Family
ID=36082953
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200420054353 Expired - Fee Related CN2760753Y (en) | 2004-12-09 | 2004-12-09 | ultrahigh vacuum gas ionization device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2760753Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102943242A (en) * | 2012-12-05 | 2013-02-27 | 中国电子科技集团公司第十八研究所 | Radio-frequency ionization selenium source device |
| CN101814423B (en) * | 2009-02-23 | 2013-03-13 | 株式会社日立国际电气 | Substrate processing apparatus |
| CN106887375A (en) * | 2016-12-31 | 2017-06-23 | 宁波华仪宁创智能科技有限公司 | Ion source discharge module and its method of work |
| CN110699673A (en) * | 2019-09-05 | 2020-01-17 | 昆明理工大学 | Gas ionization device in ultrahigh vacuum |
-
2004
- 2004-12-09 CN CN 200420054353 patent/CN2760753Y/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101814423B (en) * | 2009-02-23 | 2013-03-13 | 株式会社日立国际电气 | Substrate processing apparatus |
| CN102943242A (en) * | 2012-12-05 | 2013-02-27 | 中国电子科技集团公司第十八研究所 | Radio-frequency ionization selenium source device |
| CN106887375A (en) * | 2016-12-31 | 2017-06-23 | 宁波华仪宁创智能科技有限公司 | Ion source discharge module and its method of work |
| CN106887375B (en) * | 2016-12-31 | 2019-03-05 | 宁波华仪宁创智能科技有限公司 | Ion source discharge module and its working method |
| CN110699673A (en) * | 2019-09-05 | 2020-01-17 | 昆明理工大学 | Gas ionization device in ultrahigh vacuum |
| CN110699673B (en) * | 2019-09-05 | 2021-06-01 | 昆明理工大学 | Gas ionization device in ultrahigh vacuum |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060222 Termination date: 20100111 |