CN221302707U - Auxiliary detection system for pitch angle and parallelism of double crystals - Google Patents
Auxiliary detection system for pitch angle and parallelism of double crystals Download PDFInfo
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- CN221302707U CN221302707U CN202323306576.4U CN202323306576U CN221302707U CN 221302707 U CN221302707 U CN 221302707U CN 202323306576 U CN202323306576 U CN 202323306576U CN 221302707 U CN221302707 U CN 221302707U
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- 239000013078 crystal Substances 0.000 title claims abstract description 71
- 238000001514 detection method Methods 0.000 title claims abstract description 20
- 230000005540 biological transmission Effects 0.000 claims abstract description 4
- 230000009977 dual effect Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 2
- 239000011295 pitch Substances 0.000 description 27
- 230000003287 optical effect Effects 0.000 description 8
- 230000001105 regulatory effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
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- 238000009434 installation Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
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Abstract
The utility model provides an auxiliary detection system for a pitch angle and parallelism of a double crystal. A base walking rail is arranged along the upper end surface of the base; the first base, the second base, the scale plate mounting seat and the objective table are movably mounted on the base walking rail at intervals in sequence and can all walk along the base walking rail; the first alignment laser is arranged on the first base; the second collimating laser is arranged on the second base; the reference scale plate is arranged on the scale plate mounting seat and is provided with a light transmission hole; the light emitting direction of the first collimating laser is the same as the light emitting direction of the second collimating laser, the light emitting directions of the first collimating laser and the second collimating laser face the direction of the reference scale plate, the light emitting directions of the first collimating laser and the second collimating laser can pass through the light passing holes, and the objective table is used for bearing crystals to be tested. The utility model adopts the collimation laser and the method for observing the reflection light spots, can accurately judge the pitching angle of the crystal and the parallelism between the double crystals in real time, and has higher adjustment accuracy and better effect.
Description
Technical Field
The utility model relates to the technical field of optical test tools, in particular to an auxiliary detection system for pitch angle and parallelism of a double crystal.
Background
In the field of optical instruments, it is very important to adjust the pitch angle of crystals or to adjust the relative parallelism and pitch angle between bicrystals. Accurate adjustment of the crystal has an important impact on the performance and accuracy of the optical instrument. For a polycrystalline system, it is necessary to adjust parallelism and pitch angle of the polycrystalline at the same time, and especially for a double-crystal device with different pitches, it is necessary to have versatility of the inspection system.
The adjusting method in the prior art can only adjust single crystal devices or fixed-pitch double crystal devices, cannot be suitable for double crystal devices with different pitch sizes, and has low efficiency and difficult accuracy guarantee.
The prior art solution is: the adjustment methods commonly used in the prior art are to change the position and angle of the crystal by auxiliary means using screws or other adjustable means. This approach is generally only for single crystal devices or fixed pitch bicrystal devices.
Problems of the prior art: because the adjusting device can only adapt to crystals with specific shapes and intervals, the prior art is difficult to adapt to double-crystal devices with different intervals, has certain limitations and defects, and has the problems of low adjusting accuracy, low adjusting efficiency, poor adaptability and the like. Therefore, there is a need to provide a solution that can more conveniently and accurately adjust the pitch angle of device crystals, or the pitch angle and relative parallelism of differently spaced bicrystal device crystals.
Disclosure of utility model
The present utility model aims to solve one of the above technical problems, and provides a method applicable to: the pitch angle and the relative parallelism of the crystals of the double-crystal devices with different pitches are used for assisting the detection system.
The utility model adopts the following technical scheme:
an auxiliary detection system for pitch angle and parallelism of a double crystal, comprising:
and (2) base: a base walking rail is arranged along the upper end surface of the base;
First base, second base, scale plate mount pad and objective table: the base walking rails are movably arranged on the base walking rails at intervals in sequence, and can be all walked along the base walking rails;
a first collimated laser: is arranged on the first base;
A second collimated laser: is arranged on the second base;
reference scale plate: the standard scale plate is arranged on the scale plate mounting seat, and the standard scale plate is provided with a light transmission hole;
The light emitting direction of the first collimating laser is the same as the light emitting direction of the second collimating laser, the light emitting directions of the first collimating laser and the second collimating laser face the direction of the reference scale plate, the light emitting holes can be formed through the object stage, and the object stage is used for bearing crystals to be tested.
In some embodiments of the utility model, the adjustment system further comprises a calibration plate mount, and a calibration plate mounted on the calibration plate mount; the calibration plate mounting seat is arranged on one side far away from the first base relative to the lifting table.
In some embodiments of the present utility model, the light-passing hole is a strip hole disposed in a horizontal direction.
In some embodiments of the present utility model, the reference scale plate is provided with a horizontal scale and a vertical scale.
In some embodiments of the present utility model, the horizontal scale comprises two sections, which are respectively disposed at two sides of the light-passing hole.
In some embodiments of the present utility model, the vertical scale includes two sections, which are respectively disposed at two sides of the light-passing hole.
In some embodiments of the utility model, the second base includes:
The base station: the base walking rail is movably arranged on the base walking rail, and a base walking rail is arranged along the upper end surface of the base, and the direction of the base walking rail is perpendicular to the direction of the base walking rail;
fixing the support plate: the base is fixedly arranged on the base and is positioned at one side of the extending direction of the base walking rail;
Movable supporting block: the movable mounting is arranged on the base walking rail and can move towards the direction approaching or far away from the fixed supporting plate;
The second collimated laser is mounted on the movable support block.
In some embodiments of the utility model, a limiting rod is arranged between the fixed supporting block and the movable supporting block, and the movable supporting block passes through the limiting rod and can move along the limiting rod.
In some embodiments of the present utility model, the base walking rail is a rectangular protruding block disposed opposite to an upper end surface of the base, and grooves matched with the rectangular protruding block in shape are disposed on the first base, the second base, the scale plate mounting seat and a lower end surface of the objective table.
In some embodiments of the utility model, the mounting location of the first collimated laser is configured to: the light emitted by the first collimating laser passes through the horizontal edge of the light passing hole.
Compared with the prior art, the utility model has the technical advantages that:
1. The invention adopts the collimation laser and the method for observing the reflection light spots, can accurately judge the pitching angle of the crystal and the parallelism between the double crystals in real time, and has higher adjustment accuracy and better effect.
2. High adaptability: the distance between the two beams of collimated laser can be adjusted in a certain range, and the device has the advantage of high adaptability of a multi-distance-size bicrystal device. Compared with the adjusting device which can only adapt to the crystal devices with specific spacing in the prior art, the invention has wider application range.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings that are needed in the embodiments or the description of the prior art will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present utility model, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a first view angle structure of an auxiliary detection system for pitch angle and parallelism of a double crystal;
FIG. 2 is a schematic diagram of a second view angle structure of the auxiliary detection system for pitch angle and parallelism of the double crystals;
in the above figures:
1-a base, 101-a base walking rail;
2-a first base;
The device comprises a first base, a second base, a base platform, a base walking rail, a fixed supporting plate, a movable supporting block and a limiting rod, wherein the first base, the second base, the base platform, the base walking rail, the fixed supporting plate, the movable supporting block and the limiting rod are respectively arranged on the first base, the second base, the base platform, the base walking rail, the;
4-a scale plate mounting seat;
5-lifting platform;
6-a first collimated laser;
7-a second collimated laser;
8-reference scale plates, 801-light passing holes, 802-horizontal scales and 803-vertical scales;
9-calibration plate mount, 901-calibration plate.
Detailed Description
In order to make the technical problems, technical schemes and beneficial effects to be solved more clear, the utility model is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the utility model.
It will be understood that when an element is referred to as being "disposed" or "connected" or "fixed" to another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
The present utility model provides an auxiliary detection system for pitch angle and parallelism of a double crystal, and referring to fig. 1 to 2, in some exemplary embodiments of the present utility model, the detection system includes the following structural units.
Base 1: a base walking rail 101 is arranged along the upper end surface of the base 1.
First base 2, second base 3, scale plate mount 4 and objective table 5: the base walking rail 101 is movably arranged on the base walking rail 101 at intervals in sequence, and can walk along the base walking rail 101.
A first collimated laser 6: is mounted on the first base 2;
Second collimated laser 7: mounted on the second base 3;
reference scale 8: the standard scale plate is arranged on the scale plate mounting seat 4, and a light transmission hole 801 is formed in the standard scale plate 8;
The light emitting direction of the first collimating laser 6 is the same as the light emitting direction of the second collimating laser 7, and faces the direction of the reference scale plate 8, and can pass through the light passing hole 801, and the objective table 5 is used for carrying a crystal to be tested.
The first base 2, the second base 3 and the scale plate mounting seat 4 all have height adjusting functions, and the heights of the first collimating laser 6, the second collimating laser 7 and the reference scale plate 8 can be adjusted to adapt to crystals with different sizes.
Wherein, two collimation lasers are respectively connected with independent control switches and can be controlled independently. If the number of the crystals to be tested is one, starting a collimation laser; if there are two crystals to be tested, typically two crystals are connected side by side, and mounted on stage 5. Both crystals are oriented in the direction of the reference scale 8. At this time, the positions of the two collimated lasers in the parallel crystal directions are adjusted so that the two crystals are opposed to the two collimated lasers, respectively. Simultaneously, two collimating lasers are started, and light passes through the light passing hole 801 to be beaten on the crystal and reflected by the crystal. And judging whether the crystal forms a pitch angle of the reflected light or not according to the position of the reflected light on the reference scale plate. And if the crystal has no pitch angle, the crystal is installed and debugged to be qualified.
Wherein, the light-passing hole 801 has a certain width, and the mounting heights of the first collimating laser 6 and the second collimating laser 7 are the same, so as to ensure that both can pass through the light-passing hole 801. In some embodiments, the light passing holes 801 are elongated holes arranged in a horizontal direction. The first collimated laser 6 and the second collimated laser 7 are arranged at intervals in the direction of the parallel elongated holes. The collimated light emitted by the two is emitted from different positions of the light passing hole 801. As a preferred embodiment, the mounting position of the first collimated laser 6 is configured to: the light emitted from the first collimated laser 6 passes through the horizontal edge of the light passing hole 801, i.e., the edge of the elongated hole. This position is more convenient for locating and observing the change of the reflected light.
To enable a more accurate response to the pitch angle situation, in some embodiments of the utility model, the reference scale plate 8 is provided with a horizontal scale 802, as well as a vertical scale 803. After the collimated light irradiates the crystal, the reflected light may generate a deviation in the horizontal direction (parallel angle) or a pitch deviation in the vertical direction (pitch angle) due to the installation error of the crystal. The size of the pitching angle or the parallel angle can be judged according to the value of the scale where the reflected light irradiates, and the processing error condition of the crystal is reflected.
Further, since horizontal deviation or pitch deviation may occur in both directions, in some embodiments of the present utility model, the horizontal scale 802 includes two sections respectively disposed on both sides of the light passing hole 801, and the vertical scale 803 includes two sections respectively disposed on both sides of the light passing hole 801.
Since it is necessary to ensure that the first base 2 and the second base 3 have a horizontal spacing during the test, in order to facilitate adjusting the relative position between the two bases, in some embodiments of the present utility model, one of the two bases is designed as a fixed structure and the other is designed as an adjustable structure. For example, the first base 2 is designed as a fixed structure, i.e. the mounting position of the first collimated laser 6 is fixed and cannot be adjusted relatively, and the emitted light can be irradiated on the first crystal; the second base 3 is designed as an adjustable structure, the installation position of the second collimating laser 7 is adjustable, and the second base 3 specifically includes:
Base station 301: the base walking rail is movably arranged on the base walking rail 101, a base walking rail 302 is arranged along the upper end surface of the base 301, and the direction of the base walking rail 302 is perpendicular to the direction of the base walking rail 101;
fixed support plate 303: fixedly mounted on the base 301 at one side of the extending direction of the base travel rail 302;
Movable support block 304: movably mounted on the base travel rail and movable in a direction approaching or separating from the fixed support plate 303;
The second collimated laser 7 is mounted on a movable support block 304.
In the above structure, the position of the movable supporting block 304 relative to the base 301 is adjustable, so that the relative position of the second collimating laser 7 is adjustable, and the position of the movable supporting block 304 can be adjusted according to the relative positions of the two crystals, so as to ensure that the light emitted by the second collimating laser 7 can irradiate on the second crystal.
In some embodiments of the present utility model, a limiting rod 305 is disposed between the fixed supporting block 303 and the movable supporting block 304, and the movable supporting block 304 passes through the limiting rod 305 and can move along the limiting rod 305. The limiting rod 305 can standardize the movement direction of the movable supporting block 304, so that the position of the second collimating laser 7 is prevented from being adjusted and deviated.
To calibrate the positions of the two collimated lasers, in some embodiments of the utility model, the adjustment system further includes a calibration plate mount 9, and a calibration plate 901 mounted on the calibration plate mount 9; the calibration plate mounting seat 9 is arranged on one side far away from the first base 2 relative to the lifting table 5. The test and adjustment principle of the calibration plate 901 is: if the relative distance between the first collimating laser 6 and the second collimating laser 7 is known to be 2cm, on the premise that the sample to be measured is not mounted on the lifting table 5, two collimated lights are directly beaten on the calibrating plate 10, whether the distance between two light points on the calibrating plate 10 is 2cm is measured, if so, the system is stable, and if not, the system needs to be regulated.
In some embodiments of the present utility model, the base walking rail 101 is a rectangular protruding block disposed opposite to the upper end surface of the base, and the lower end surfaces of the first base 2, the second base 3, the scale plate mounting seat 4, the objective table 5, and the calibration plate mounting seat 9 are all provided with grooves matching the shape of the rectangular protruding block.
In this embodiment, it is assumed that the pitch angle of the crystals in the device and the relative parallelism and pitch angle of the two crystals in the dual crystal device need to be adjusted. The method comprises the following specific steps:
1. Fixing the device with the crystal to be adjusted to the objective table 5, connecting the clamp to the slide rail and adjusting the position and the height;
2. The positions of the two collimating lasers are adjusted and fixed, and the mounting positions of the two collimating lasers are calibrated through a collimating light calibrating plate 901, so that the parallel emission of the two collimating lasers is ensured;
3. The heights of the first collimating laser 6, the second collimating laser 7 and the reference graduation board 8 and the relative positions of the first collimating laser 6 and the second collimating laser 7 are adjusted, so that the collimated light can be emitted from the same optical hole 801 and can be incident on the crystal at normal incidence.
4. When a single crystal device is regulated, only the first collimating laser 7 is started to normally enter the crystal to observe the reflection light spot of the crystal on the reference scale plate 8, and when the crystal is regulated to enable the reflection light spot to be positioned on a horizontal line with the height of the collimating light emergent opening (the emergent position of the light emergent hole 801 through the reference scale plate 8), the pitching angle of the crystal is zero. When the reflected light spot coincides with the exit point, then both the crystal pitch and yaw angles are zero.
5. If certain pitching or deflection angle requirements exist, the adjustment can be performed according to the specific positions of the reflection points on the scales;
6. And observing reflected light of crystal faces of the two crystals, wherein when the reflection points of the two crystals are overlapped with the emergent points of the two collimating lasers, the pitching angle and the deflection angle of the two crystals are zero and are relatively parallel. If a certain pitch or yaw angle is required, refer to the method of item 5.
The utility model can be widely applied to the technical field of optical instruments and optical devices, and is used for adjusting the pitching angle of the crystal and the relative parallelism and pitching angle of the double crystal, thereby improving the performance and the precision of the optical instruments and the optical devices.
The foregoing description of the preferred embodiments of the utility model is not intended to be limiting, but rather is intended to cover all modifications, equivalents, and alternatives falling within the spirit and principles of the utility model.
Claims (10)
1. An auxiliary detection system for pitch angle and parallelism of a double crystal, comprising:
and (2) base: a base walking rail is arranged along the upper end surface of the base;
First base, second base, scale plate mount pad and objective table: the base walking rails are movably arranged on the base walking rails at intervals in sequence, and can be all walked along the base walking rails;
a first collimated laser: is arranged on the first base;
A second collimated laser: is arranged on the second base;
reference scale plate: the standard scale plate is arranged on the scale plate mounting seat, and the standard scale plate is provided with a light transmission hole;
The light emitting direction of the first collimating laser is the same as the light emitting direction of the second collimating laser, the light emitting directions of the first collimating laser and the second collimating laser face the direction of the reference scale plate, the light emitting holes can be formed through the object stage, and the object stage is used for bearing crystals to be tested.
2. The dual crystal pitch and parallelism auxiliary detection system of claim 1, further comprising a calibration plate mount, and a calibration plate mounted on the calibration plate mount; the calibration plate mounting seat is arranged on one side far away from the first base relative to the lifting table.
3. The auxiliary detection system for pitch angle and parallelism of bicrystal of claim 1, wherein the light passing hole is a horizontally arranged elongated hole.
4. A bi-crystal pitch angle and parallelism auxiliary detection system as claimed in claim 1 or claim 3, wherein the reference scale plate is provided with a horizontal scale and a vertical scale.
5. The auxiliary detection system for pitch angle and parallelism of bicrystal of claim 4, wherein said horizontal scale comprises two sections, respectively arranged on both sides of the light passing hole.
6. The auxiliary detection system for pitch angle and parallelism of bicrystal of claim 4, wherein said vertical scale comprises two sections, respectively arranged on both sides of the light passing hole.
7. The dual crystal pitch and parallelism auxiliary detection system of claim 1, wherein the second base comprises:
The base station: the base walking rail is movably arranged on the base walking rail, and a base walking rail is arranged along the upper end surface of the base, and the direction of the base walking rail is perpendicular to the direction of the base walking rail;
fixing the support plate: the base is fixedly arranged on the base and is positioned at one side of the extending direction of the base walking rail;
Movable supporting block: the movable mounting is arranged on the base walking rail and can move towards the direction approaching or far away from the fixed supporting plate;
The second collimated laser is mounted on the movable support block.
8. The auxiliary detection system for pitch angle and parallelism of bicrystal of claim 7, wherein a limit bar is provided between the fixed support block and the movable support block, and the movable support block passes through the limit bar and is movable along the limit bar.
9. The auxiliary detection system for the pitch angle and the parallelism of the bicrystal of claim 1, wherein the base walking rail is a rectangular protruding block arranged opposite to the upper end face of the base, and grooves matched with the rectangular protruding block in shape are formed in the lower end faces of the first base, the second base, the scale plate mounting seat and the objective table.
10. A dual crystal pitch angle and parallelism auxiliary detection system as claimed in claim 1 or 3, wherein the mounting position of the first collimated laser is configured to: the light emitted by the first collimating laser passes through the horizontal edge of the light passing hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202323306576.4U CN221302707U (en) | 2023-12-06 | 2023-12-06 | Auxiliary detection system for pitch angle and parallelism of double crystals |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202323306576.4U CN221302707U (en) | 2023-12-06 | 2023-12-06 | Auxiliary detection system for pitch angle and parallelism of double crystals |
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| Publication Number | Publication Date |
|---|---|
| CN221302707U true CN221302707U (en) | 2024-07-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202323306576.4U Active CN221302707U (en) | 2023-12-06 | 2023-12-06 | Auxiliary detection system for pitch angle and parallelism of double crystals |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN221302707U (en) |
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2023
- 2023-12-06 CN CN202323306576.4U patent/CN221302707U/en active Active
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