CN221282071U

CN221282071U - Centering adjustment mechanism

Info

Publication number: CN221282071U
Application number: CN202322617512.XU
Authority: CN
Inventors: 赵坤; 高鹏飞; 张启辉; 杨华龙; 朱晓亮
Original assignee: Tuojing Technology Shanghai Co ltd
Current assignee: Tuojing Technology Shanghai Co ltd
Priority date: 2023-09-26
Filing date: 2023-09-26
Publication date: 2024-07-05
Anticipated expiration: 2033-09-26

Abstract

The utility model provides a centering adjustment mechanism, comprising: the first jig comprises a first limiting part and a first positioning hole, the first jig is arranged on the upper side of the heating plate centered with the reaction cavity through the first limiting part, and the first positioning hole is arranged at a preset position of the first jig; the second jig comprises a second limiting part and a second positioning hole, the second jig is arranged on the upper side of the reaction cavity liner through the second limiting part, the reaction cavity liner is arranged on the upper side of the reaction cavity, and the second positioning hole is arranged at the preset position of the second jig; the third jig vertically passes through the second positioning hole and the first positioning hole; and the fourth jig comprises a plurality of positioning parts, and the positioning parts of the fourth jig penetrate through a plurality of gaps between the heating disc and the edge ring after the first jig, the second jig and the third jig are disassembled and the edge ring is mounted on the heating disc.

Description

Centering adjustment mechanism

Technical Field

The utility model relates to the field of film deposition, in particular to a centering adjustment mechanism.

Background

In practical applications of thin film deposition, it is generally necessary to perform centering adjustment on key devices such as a reaction chamber, a heating plate, a reaction chamber liner, and a support ring, so as to avoid offset of wafer film formation.

The existing heating plate centering technology only relates to the centering of the reaction cavity and the heating plate, but the centering of the reaction cavity lining, the supporting ring and the heating plate cannot be determined, so that the space centering formed by the heating center of the heating plate, the reaction cavity lining and the spraying plate cannot be realized, and the centering of the supporting ring and the heating plate cannot be realized. Therefore, the prior art cannot prevent the deviation of the distribution and design of the air flow in the cavity and the misalignment of the center of the wafer and the heating center of the heating plate.

In order to overcome the above-mentioned drawbacks of the prior art, there is a need in the art for a centering adjustment technique for effectively suppressing the deviation of the wafer film formation, thereby improving the uniformity of the wafer film formation.

Disclosure of utility model

The following presents a simplified summary of one or more aspects in order to provide a basic understanding of such aspects. This summary is not an extensive overview of all contemplated aspects, and is intended to neither identify key or critical elements of all aspects nor delineate the scope of any or all aspects. Its sole purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description that is presented later.

In order to overcome the defects in the prior art, the utility model provides a centering adjustment mechanism which is used for effectively inhibiting the deviation of the film formation of a wafer, so that the uniformity of the film formation of the wafer is improved.

In particular, the centering adjustment mechanism provided according to the first aspect of the utility model comprises: the first jig comprises a first limiting part and a first positioning hole, wherein the first jig is arranged on the upper side of the heating plate centered with the reaction cavity through the first limiting part, and the first positioning hole is arranged at a preset position of the first jig; the second jig comprises a second limiting part and a second positioning hole, wherein the second jig is arranged on the upper side of a reaction cavity liner through the second limiting part, the reaction cavity liner is arranged on the upper side of the reaction cavity, and the second positioning hole is arranged at the preset position of the second jig; the third jig vertically penetrates through the second positioning hole and the first positioning hole to center the heating plate and the reaction cavity liner; and a fourth jig including a plurality of positioning portions, wherein the plurality of positioning portions of the fourth jig pass through a plurality of gaps between the heating plate and the edge ring after removing the first jig, the second jig and the third jig and installing the edge ring to the heating plate so as to center the heating plate and the edge ring.

Further, in some embodiments of the utility model, the plurality of gaps between the heating plate and the edge ring include an edge gap and/or a center gap. The plurality of positioning parts of the fourth jig comprise edge positioning rings and/or at least one center positioning pin. The edge locating ring passes through an edge gap between the heating plate and the edge ring, and/or the at least one center locating pin passes through a center gap between the heating plate and the edge ring to center the heating plate and the edge ring.

Further, in some embodiments of the utility model, the first height of the center locating pin is greater than the second height of the edge locating ring.

Further, in some embodiments of the present utility model, the diameter and position of the at least one centering pin is adapted to at least one ceramic post mounting hole of the heating plate surface. The at least one center locating pin is removed from the corresponding ceramic post mounting hole after the alignment of the heating plate with the edge ring is completed, to allow it to mount ceramic posts supporting the back surface of the wafer.

Further, in some embodiments of the present utility model, the first limiting portion of the first jig includes three claws. The three clamping claws are positioned at the lower sides of the three tail ends of the tripod body of the first jig. The inner edge shape of the three clamping jaws is matched with the outer edge of the heating plate so as to firmly nest the upper side of the heating plate. The first positioning hole is positioned at the center of the tripod body.

Further, in some embodiments of the present utility model, the second limiting portion of the second jig includes a second ring. The second circular ring is positioned at the lower side of the second disc body of the second jig, the shape of the outer edge of the second circular ring is matched with the inner edge of the upper side of the reaction cavity liner, and the first radius of the second disc body is larger than the second radius of the inner edge of the upper side of the reaction cavity liner, so that the second jig is firmly nested at the upper side of the reaction cavity liner. The second positioning hole is positioned at the center of the second disc body so as to align with the first positioning hole in the pair.

Further, in some embodiments of the present utility model, the third jig is cylindrical, and its size fits the sizes of the first positioning hole and the second positioning hole.

Further, in some embodiments of the present utility model, the centering adjustment mechanism further includes a fifth jig. The fifth jig comprises a third limiting part and a third positioning hole. The fifth jig is mounted on the upper side of the reaction cavity, which is not provided with the reaction cavity liner, through the third limiting part, and the third positioning hole is formed in the preset position of the fifth jig. The third jig vertically passes through the third positioning hole and the first positioning hole so as to center the reaction cavity and the heating plate. The fifth jig is also removed after the centering of the reaction chamber and the heating plate is completed, for mounting the reaction chamber liner to the upper side of the reaction chamber.

Further, in some embodiments of the present utility model, the third limiting portion of the fifth fixture includes a third ring. The third circular ring is positioned at the lower side of the third disc body of the fifth jig, the shape of the outer edge of the third circular ring is matched with the inner edge of the upper side of the reaction cavity, and the third radius of the third disc body is larger than the fourth radius of the inner edge of the upper side of the reaction cavity, so that the fifth jig is firmly nested at the upper side of the reaction cavity. The third positioning hole is positioned at the center of the third disc body so as to align with the first positioning hole in the pair.

Further, in some embodiments of the present utility model, the fifth radius of the second ring is smaller than the sixth radius of the third ring to respectively adapt to the reaction chamber liner and the upper inner edge of the reaction chamber.

Drawings

The above features and advantages of the present utility model will be better understood after reading the detailed description of embodiments of the present disclosure in conjunction with the following drawings. In the drawings, the components are not necessarily to scale and components having similar related features or characteristics may have the same or similar reference numerals.

FIG. 1 illustrates a schematic diagram of a centering heating plate and a reaction chamber provided in accordance with some embodiments of the utility model.

Fig. 2 illustrates a schematic structural diagram of a fifth jig according to some embodiments of the present utility model.

Fig. 3 illustrates a schematic structural diagram of a first jig according to some embodiments of the present utility model.

Fig. 4 illustrates a schematic structural diagram of a third jig according to some embodiments of the present utility model.

FIG. 5 illustrates a schematic diagram of a centering hotplate and a reaction chamber liner provided in accordance with some embodiments of the utility model.

Fig. 6 illustrates a schematic structure of a second jig according to some embodiments of the utility model.

Fig. 7A illustrates a schematic diagram of a centering heating plate and edge ring provided in accordance with some embodiments of the utility model.

Fig. 7B illustrates a schematic cross-sectional view of an edge gap between a heating plate and an edge ring provided in accordance with some embodiments of the utility model.

Fig. 8A illustrates a schematic diagram of a heating plate provided in accordance with some embodiments of the utility model.

Fig. 8B illustrates a schematic diagram of a centering heating plate and edge ring provided in accordance with some embodiments of the utility model.

Reference numerals

10. First jig

111. Tripod body

112. Claw catch

12. First positioning hole

20. Second jig

211. Second disc

212. Second circular ring

22. Second positioning hole

30. Third jig

40. Fourth jig

411. Edge positioning ring

412. Center locating pin

50. Fifth jig

511. Third disc

512. Third circular ring

52. Third positioning hole

601. Reaction chamber lining

602. Heating plate

603. Edge ring

Detailed Description

Further advantages and effects of the present utility model will become apparent to those skilled in the art from the disclosure of the present specification, by describing the embodiments of the present utility model with specific examples. While the description of the utility model will be presented in connection with a preferred embodiment, it is not intended to limit the inventive features to that embodiment. Rather, the purpose of the utility model described in connection with the embodiments is to cover other alternatives or modifications, which may be extended by the claims based on the utility model. The following description contains many specific details for the purpose of providing a thorough understanding of the present utility model. The utility model may be practiced without these specific details. Furthermore, some specific details are omitted from the description in order to avoid obscuring the utility model.

In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.

In addition, the terms "upper", "lower", "left", "right", "top", "bottom", "horizontal", "vertical" as used in the following description should be understood as referring to the orientation depicted in this paragraph and the associated drawings. This relative terminology is for convenience only and is not intended to be limiting of the utility model as it is described in terms of the apparatus being manufactured or operated in a particular orientation.

It will be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various elements, regions, layers and/or sections, these elements, regions, layers and/or sections should not be limited by these terms and these terms are merely used to distinguish between different elements, regions, layers and/or sections. Accordingly, a first component, region, layer, and/or section discussed below could be termed a second component, region, layer, and/or section without departing from some embodiments of the present utility model.

As described above, the conventional heating plate centering technology generally involves only the centering of the reaction chamber and the heating plate, but the centering of the reaction chamber liner, the support ring and the heating plate cannot be determined, and the centering of the heating center of the heating plate and the space formed by the reaction chamber liner and the shower plate cannot be achieved, or the centering of the support ring and the heating plate cannot be achieved. Therefore, the prior art cannot prevent the deviation of the distribution and design of the air flow in the cavity and the misalignment of the center of the wafer and the heating center of the heating plate.

Please refer to fig. 1-4 in combination. FIG. 1 illustrates a schematic diagram of a centering heating plate and a reaction chamber provided in accordance with some embodiments of the utility model. Fig. 2 illustrates a schematic structural diagram of a fifth jig according to some embodiments of the present utility model. Fig. 3 illustrates a schematic structural diagram of a first jig according to some embodiments of the present utility model. Fig. 4 illustrates a schematic structural diagram of a third jig according to some embodiments of the present utility model.

As shown in fig. 1 to 4, the first jig 10 includes a first stopper portion and a first positioning hole 12, wherein the first jig 10 is mounted on an upper side of the heating plate 602 centered to the reaction chamber via the first stopper portion. The first positioning hole 12 is disposed at a predetermined position (e.g., a center position, a plurality of eccentric positions, a plurality of edge positions) of the first jig 10.

Further, in some embodiments of the present utility model, the first limiting portion of the first fixture 10 includes three claws 112, wherein the three claws 112 are located at the lower sides of the three ends of the tripod body 111 of the first fixture 10, and the inner edges thereof are shaped to fit the outer edges of the heating plate 602 so as to firmly nest the upper sides of the heating plate 602. Accordingly, the first positioning hole 12 may be located at the center of the tripod 111 body.

In addition, the centering adjustment mechanism may further include a fifth jig 50. The fifth fixture 50 includes a third limiting portion and a third positioning hole 52. The third limiting portion includes a third ring 512, wherein the third ring 512 is located at the lower side of the third disc 511 body of the fifth fixture 50, the outer edge of the third ring is adapted to the inner edge of the upper side of the reaction chamber, and the third radius of the third disc 511 body is larger than the fourth radius of the inner edge of the upper side of the reaction chamber, so that the fifth fixture 50 is firmly nested in the upper side of the reaction chamber. Corresponding to the first jig 10, the third positioning hole 52 may be located at the center of the third disc 511 body to align with the first positioning hole 12 in the pair.

In addition, the centering mechanism may further include a third jig 30. The third jig 30 may be cylindrical to adapt to the shapes of the first positioning hole 12 and the third positioning hole 52, and the dimensions of the third jig may also adapt to the dimensions of the first positioning hole 12 and the second positioning hole 22.

In this way, in the process of centering the heating plate 602 and the reaction chamber, a technician may first install the first jig 10 on the upper side of the heating plate 602 via the first limiting portion thereof, then install the fifth jig 50 on the upper side of the reaction chamber via the third limiting portion thereof, and then vertically pass the third jig 30 through the third positioning hole 52 of the fifth jig 50 and the first positioning hole 12 of the first jig 10, so as to realize the centering of the reaction chamber and the heating plate 602.

Please continue to refer to fig. 5-6. FIG. 5 illustrates a schematic diagram of a centering hotplate and a reaction chamber liner provided in accordance with some embodiments of the utility model. Fig. 6 illustrates a schematic structure of a second jig according to some embodiments of the utility model.

As shown in fig. 5 to 6, the centering mechanism provided by the present utility model may further include a second jig 20. The second jig 20 includes a second limiting portion and a second positioning hole 22, wherein the second positioning hole 22 is disposed at a preset position of the second jig 20.

Further, in some embodiments of the present utility model, the second limiting portion of the second fixture 20 includes a second ring 212, wherein the second ring 212 is located on the lower side of the second disc 211 body of the second fixture 20, the outer edge of the second ring is shaped to fit the inner edge of the upper side of the reaction chamber liner 601, and the first radius of the second disc 211 body is larger than the second radius of the inner edge of the upper side of the reaction chamber liner 601, so that the second fixture 20 is firmly nested in the upper side of the reaction chamber liner 601. The second positioning hole 22 may be located at the center of the second disc 211 body, corresponding to the first jig 10, so as to align with the first positioning hole 12 in the pair. Further, the fifth radius of the second ring 212 may be smaller than the sixth radius of the third ring 512 to respectively fit the inner liner 601 of the reaction chamber and the upper inner edge of the reaction chamber.

In this way, in the process of centering the heating plate 602 and the reaction chamber liner 601, a technician may remove the fifth jig 50 from the upper side of the reaction chamber, and then install the reaction chamber liner 601 to be centered on the upper side of the reaction chamber. Then, the technician can install the second jig 20 on the upper side of the reaction chamber liner 601 through the second limiting portion thereof, and vertically pass the third jig 30 through the second positioning hole 22 of the second jig 20 and the first positioning hole 12 of the first jig 10, so as to realize the centering of the heating plate 602 and the reaction chamber liner 601.

Please continue to refer to fig. 7A-7B. Fig. 7A illustrates a schematic diagram of a centering heating plate and edge ring provided in accordance with some embodiments of the utility model. Fig. 7B illustrates a schematic cross-sectional view of an edge gap between a heating plate and an edge ring provided in accordance with some embodiments of the utility model.

As shown in fig. 7A to 7B, the centering adjustment mechanism provided by the present utility model may further include a fourth jig 40. The fourth jig 40 includes a plurality of positioning portions such as an edge positioning ring 411 and a center positioning pin 412.

Specifically, in some embodiments of the present utility model, the plurality of gaps between heating plate 602 and edge ring 603 may include an edge gap and/or a center gap. Correspondingly, the plurality of positioning portions of the fourth jig 40 may include an edge positioning ring 411 and/or at least one center positioning pin 412. Here, the edge positioning ring 411 passes through an edge gap between the heating plate 602 and the edge ring 603 to perform centering of the heating plate and the edge ring. At least one centering pin 412 may also pass through the center gap between heating plate 602 and edge ring 603 to also center heating plate 602 with edge ring 603.

Further, in some embodiments of the present utility model, the first height of the center positioning pin 412 is greater than the second height of the edge positioning ring 411, so that the edge positioning ring 411 of the fourth jig 40 is first separated from the edge ring 603 during the removal operation of the fourth jig 40. Here, the fourth jig 40 can avoid the displacement of the edge ring 603 in the process of taking out vertically upward, limited by the center positioning pin 412, thereby ensuring the accuracy of centering adjustment.

In this way, in the process of centering the heating plate 602 and the edge ring 603, a technician may remove the first jig 10, the second jig 20, and the third jig 30 from the heating plate 602, and after installing the edge ring 603 on the heating plate 602, pass the positioning portions of the fourth jig 40 through the gaps between the heating plate 602 and the edge ring 603 to center the heating plate 602 and the edge ring 603.

In addition, please refer to fig. 8A and 8B in combination. Fig. 8A illustrates a schematic diagram of a heating plate provided in accordance with some embodiments of the utility model. Fig. 8B illustrates a schematic diagram of a centering heating plate and edge ring provided in accordance with some embodiments of the utility model.

As shown in fig. 8A and 8B, the surface of the heating plate 602 may be provided with at least one mounting hole for mounting a ceramic support column. The diameter and position of the at least one centering pin 412 may be adapted to at least one ceramic post mounting hole on the surface of the heating plate 602 to multiplex the at least one ceramic post mounting hole to facilitate centering of the heating plate 602 with the edge ring 603. Thereafter, in response to completing the centering of the heating plate 602 with the edge ring 603, the technician may remove the center locating pin 412 from each ceramic column mounting hole for mounting the ceramic column supporting the backside of the wafer during thin film deposition.

In summary, by configuring the first jig, the second jig, the third jig and the fourth jig, the centering adjustment mechanism provided by the utility model can conveniently and reliably realize the centering of the reaction cavity, the heating plate, the reaction cavity lining and the edge ring, thereby effectively inhibiting the deviation of the wafer film formation and improving the uniformity of the wafer film formation.

While, for purposes of simplicity of explanation, the methodologies are shown and described as a series of acts, it is to be understood and appreciated that the methodologies are not limited by the order of acts, as some acts may, in accordance with one or more embodiments, occur in different orders and/or concurrently with other acts from that shown and described herein or not shown and described herein, as would be understood and appreciated by those skilled in the art.

The previous description of the disclosure is provided to enable any person skilled in the art to make or use the disclosure. Various modifications to the disclosure will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other variations without departing from the spirit or scope of the disclosure. Thus, the disclosure is not intended to be limited to the examples and designs described herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A centering adjustment mechanism, comprising:

The first jig comprises a first limiting part and a first positioning hole, wherein the first jig is arranged on the upper side of the heating plate centered with the reaction cavity through the first limiting part, and the first positioning hole is arranged at a preset position of the first jig;

The second jig comprises a second limiting part and a second positioning hole, wherein the second jig is arranged on the upper side of a reaction cavity liner through the second limiting part, the reaction cavity liner is arranged on the upper side of the reaction cavity, and the second positioning hole is arranged at the preset position of the second jig;

The third jig vertically penetrates through the second positioning hole and the first positioning hole to center the heating plate and the reaction cavity liner; and

And the fourth jig comprises a plurality of positioning parts, wherein the positioning parts of the fourth jig penetrate through a plurality of gaps between the heating disc and the edge ring after the first jig, the second jig and the third jig are disassembled, and the edge ring is mounted on the heating disc so as to center the heating disc and the edge ring.

2. The centering adjustment mechanism of claim 1, wherein the plurality of gaps between the heating plate and the edge ring comprise edge gaps and/or center gaps, and the plurality of positioning portions of the fourth fixture comprise edge positioning rings and/or at least one center positioning pin, wherein the edge positioning rings pass through the edge gaps between the heating plate and the edge ring, and/or the at least one center positioning pin passes through the center gaps between the heating plate and the edge ring to center the heating plate and the edge ring.

3. The centering adjustment mechanism of claim 2, wherein a first height of said center locating pin is greater than a second height of said edge locating ring.

4. The centering adjustment mechanism of claim 2, wherein the diameter and position of said at least one centering pin is adapted to at least one ceramic post mounting hole of the surface of said heating plate, wherein said at least one centering pin is removed from the corresponding ceramic post mounting hole after centering of said heating plate with said edge ring is completed to provide for mounting of ceramic posts supporting the wafer backside.

5. The centering adjustment mechanism of claim 1, wherein said first stop portion of said first fixture comprises three jaws, wherein,

The three clamping claws are positioned at the lower sides of the three tail ends of the tripod body of the first jig, the inner edge shapes of the three clamping claws are matched with the outer edge of the heating plate so as to firmly nest the upper sides of the heating plate,

The first positioning hole is positioned at the center of the tripod body.

6. The centering adjustment mechanism of claim 5, wherein said second stop portion of said second fixture comprises a second ring, wherein,

The second circular ring is positioned at the lower side of the second disc body of the second jig, the shape of the outer edge of the second circular ring is matched with the inner edge of the upper side of the reaction cavity liner, the first radius of the second disc body is larger than the second radius of the inner edge of the upper side of the reaction cavity liner, so that the second jig is firmly nested at the upper side of the reaction cavity liner,

The second positioning hole is positioned at the center of the second disc body so as to align with the first positioning hole in the pair.

7. The centering adjustment mechanism of claim 6, wherein said third jig is cylindrical and is sized to fit within said first and second positioning holes.

8. The centering adjustment mechanism of claim 7, further comprising a fifth fixture, wherein said fifth fixture comprises a third stop portion and a third positioning hole, wherein,

The fifth jig is arranged on the upper side of the reaction cavity body which is not provided with the reaction cavity liner through the third limiting part, the third positioning hole is arranged at the preset position of the fifth jig,

The third jig vertically passes through the third positioning hole and the first positioning hole to center the reaction cavity and the heating plate,

The fifth jig is also removed after the centering of the reaction chamber and the heating plate is completed, for mounting the reaction chamber liner to the upper side of the reaction chamber.

9. The centering adjustment mechanism of claim 8, wherein said third stop portion of said fifth fixture comprises a third ring, wherein,

The third circular ring is positioned at the lower side of the third disc body of the fifth jig, the shape of the outer edge of the third circular ring is matched with the inner edge of the upper side of the reaction cavity, the third radius of the third disc body is larger than the fourth radius of the inner edge of the upper side of the reaction cavity, so that the fifth jig is firmly nested at the upper side of the reaction cavity,

The third positioning hole is positioned at the center of the third disc body so as to align with the first positioning hole in the pair.

10. The centering adjustment mechanism of claim 9, wherein a fifth radius of said second ring is smaller than a sixth radius of said third ring to fit said reaction chamber liner and an upper inner edge of said reaction chamber, respectively.