CN220788406U - OVD deposition system induced by electric charge - Google Patents

Abstract

The application relates to an OVD deposition system induced by electric charge, which comprises a core rod clamping seat, an electric charge generator and a deposition blowlamp, wherein the two core rod clamping seats are arranged at intervals to form a containing area for containing a core rod, and the two core rod clamping seats are used for respectively clamping two ends of the core rod; the charge output port of the charge generator faces the accommodating area and is used for depositing the generated positively charged silica on the surface of the core rod; the deposition direction of the deposition burner is toward the receiving area and is used for depositing the generated negatively charged silica on the surface of the mandrel. The application can effectively improve the utilization rate of raw materials.

Description

OVD deposition system induced by electric charge

Technical Field

The utility model relates to the technical field of optical fiber preform manufacturing, in particular to an OVD deposition system induced by electric charges.

Background

The OVD deposition process utilizes oxyhydrogen flame hydrolysis, and carries gaseous silicon material to coat the surface of the core rod layer by layer. The traditional OVD deposition process has low raw material utilization rate, and is not beneficial to control of cost; meanwhile, due to the deposition mode of a plurality of blast lamps, local unevenness of a boot body becomes a stubborn disease of OVD deposition.

In order to solve the two problems, some related technologies provide a flow guiding air pipe, when in use, a reaction torch moves along the axial direction of an optical fiber preform, and when the reaction torch moves along the axial direction of the optical fiber preform, a flow guiding device is used for compressing and guiding reaction flame to the axial direction of the optical fiber preform, so that the reaction flame and the optical fiber preform have more contact area, thereby improving the deposition efficiency, and solving the problems of the prior art that the diameter of a target rod in the earlier deposition stage is smaller, the contact area with oxyhydrogen flame is smaller, and the deposition efficiency is low. However, when the device is used, the angle requirement on the guide pipe is harsh, if abnormal flames are easily sprayed on the guide pipe when a blowtorch appears, the flame spraying pressure is changed when the guide pipe is damaged, and the situation that the flames are not sprayed over against the core rod occurs.

As another related art, a burner feeding device is provided for solving the problem of poor uniformity of light bars in the OVD process of multiple burners. According to the process, the feeding lamp is added on the side face of the cavity, so that the material can be fed to the spot part theoretically, but the material spraying angle is difficult to control under the influence of the flow field. And a large amount of powder from bottom to top is easily accumulated in the feed gap to form a blockage.

In summary, there is no means for solving the above problems in the industry.

Disclosure of Invention

The application provides an OVD deposition system utilizing charge induction, which can effectively improve the utilization rate of raw materials.

In a first aspect, embodiments herein provide an OVD deposition system using charge induction, comprising:

the two mandrel clamping seats are arranged at intervals to form a containing area for containing the mandrel, and the two mandrel clamping seats are used for clamping two ends of the mandrel respectively;

a charge generator having a charge output port facing the receiving region and for depositing the generated positively charged silica on the surface of the mandrel;

and the deposition direction of the deposition spray lamp faces the accommodating area and is used for depositing the generated negatively charged silica on the surface of the core rod.

In one embodiment, the charge generator comprises:

the charge blast lamp is provided with a silicon material channel for ejecting vaporized silicon material and generating positively charged silicon dioxide under oxyhydrogen flame;

the evaporator is communicated with the silicon material channel and is used for vaporizing atomized liquid drop-shaped silicon materials;

an electrospray device which is communicated with the evaporator and is used for atomizing the positively charged liquid silicon material into positively charged liquid drop-shaped silicon material;

and one end of the metal tube is communicated with the electric atomizer, the other end of the metal tube is used for communicating a silicon source, and the metal tube is connected with the anode and the cathode of a power supply and is used for enabling the liquid silicon material conveyed from the silicon source to be positively charged.

In one embodiment, the silicon source is in communication with the metal tube through a control valve.

In one embodiment, the charge blast lamp is further provided with a hydrogen channel and an oxygen channel for generating oxyhydrogen flame;

alternatively, the charge torch is positioned within the oxyhydrogen flame coverage of the deposition torch.

In one embodiment, the metal tube is U-shaped, the middle part of the metal tube is used for communicating a silicon source, and both ends of the metal tube are connected with the electric atomizer.

In one embodiment, the charge generator is arranged on a movable seat, and the movable seat is connected with a driving mechanism for driving the movable seat to reciprocate along the axial direction of the core rod.

In one embodiment, the OVD deposition system further includes:

a metal plate;

and the positive and negative reversing direct current power supply is connected with the metal plate and used for electrifying the metal plate so as to enable positively charged silica and negatively charged silica to gather towards the surface of the core rod.

In one embodiment, when the charge generator, receiving area, deposition burner and metal plate are arranged in sequence, the positive and negative commutating dc power supply is used to negatively charge the metal plate;

when the metal plate, the charge generator, the accommodating area and the deposition burner are arranged in sequence, the positive and negative reversing direct current power supply is used for enabling the metal plate to be positively charged.

In one embodiment, the charge generator is further configured to generate negatively charged silica;

the OVD deposition system further includes:

the diameter gauge is used for measuring the outer diameter of the core rod;

the controller is connected with the deposition blowtorch, the calliper, the positive and negative reversing direct current power supply and the charge generator and is used for: judging whether the outer diameter is abnormal or not according to the measured outer diameter, controlling the oxyhydrogen flame flow of the deposition blowlamp, controlling the current of a positive and negative reversing direct current power supply, and controlling a charge generator to generate silicon dioxide with negative charges or positive charges.

In one embodiment, there are a plurality of deposition torches, each of which is configured with one of the metal plates.

The beneficial effects that technical scheme that this application embodiment provided include at least:

the oxygen atom electronegativity of the silicon dioxide surface is larger and can be combined with a large amount of hydroxyl groups released by oxyhydrogen flame to lead the surface to carry negative charges, so that when the deposition burner is used, the sprayed silicon material is subjected to chemical reaction under the action of oxyhydrogen flame, and the generated silicon dioxide can carry hydroxyl groups, so that the silicon dioxide is changed into the silicon dioxide with negative charges, and further is deposited on the surface of the core rod to form loose bodies.

Based on this, this application utilizes charge generator, makes the silica that produces positive charge to adsorb, deposit on the surface of plug, makes the plug surface positive charge, then utilizes electrostatic adsorption to make the negatively charged silica that the deposition blowtorch produced adhere to the plug surface as far as possible from the beginning of depositing, thereby can effectively improve raw materials utilization, reduction in production cost.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic diagram of an OVD deposition system using charge induction according to an embodiment of the present application;

FIG. 2 is a schematic diagram of a charge generator according to an embodiment of the present disclosure;

FIG. 3 is a schematic diagram of repairing local coarseness provided in an embodiment of the present application;

fig. 4 is a schematic diagram of repairing local bias according to an embodiment of the present application.

In the figure: 1. a core rod clamping seat; 2. a core rod; 3. a charge generator; 30. a charge torch; 31. an electric atomizer; 32. a metal tube; 33. a silicon source; 34. a control valve; 35. an evaporator; 4. a deposition torch; 5. a metal plate; 6. a calliper.

Detailed Description

In order to make the present application solution better understood by those skilled in the art, the following description will clearly and completely describe the technical solution in the embodiments of the present application with reference to the accompanying drawings in the embodiments of the present application, and it is apparent that the described embodiments are only some embodiments of the present application, not all embodiments. All other embodiments, which can be made by one of ordinary skill in the art based on the embodiments herein without making any inventive effort, are intended to be within the scope of the present application.

Referring to fig. 1, an OVD deposition system using charge induction is provided in an embodiment of the present application, which includes a mandrel holder 1, a charge generator 3 and a deposition burner 4, where two mandrel holders 1 are spaced apart to form a receiving area for receiving a mandrel 2, and two mandrel holders 1 are used to respectively hold two ends of the mandrel 2; the charge output port of the charge generator 3 is directed towards the receiving area and is used for depositing the generated positively charged silica on the surface of the core rod 2; the deposition direction of the deposition burner 4 is toward the receiving area and is used to deposit the negatively charged silica generated on the surface of the mandrel 2.

The oxygen atom electronegativity of the silica surface is relatively large and can be combined with a large amount of hydroxyl groups released by oxyhydrogen flame to enable the surface to be negatively charged, so that when the deposition burner 4 is used, sprayed silicon materials are subjected to chemical reaction under the action of oxyhydrogen flame, and generated silica can carry hydroxyl groups, so that the silica becomes negatively charged silica, and further is deposited on the surface of the core rod 2 to form a loose body.

Based on this, this application utilizes charge generator 3, makes the silica that produces positive charge to adsorb, deposit on the surface of plug 2, makes plug 2 surface positive charge, then utilizes electrostatic adsorption to make the silica that deposits torch 4 produced negative charge adhere to the plug surface as far as possible from the beginning of depositing, thereby can effectively improve raw materials utilization ratio, reduction in production cost.

In addition, when the deposition blowlamp is used for spraying to generate silicon dioxide, on one hand, the silicon dioxide can be negatively charged, on the other hand, the driving force of the flow of oxyhydrogen flame of the deposition blowlamp can overcome the repulsive force of the previously deposited negatively charged silicon dioxide to the later negatively charged silicon dioxide, so that the deposition of each layer of silicon dioxide is realized.

Therefore, it can be understood that in the present application, the airflow can be actually controlled, so as to control the flow of oxyhydrogen flame, so as to improve the acting force of the oxyhydrogen flame carrying silicon dioxide to attach to the core rod, and further improve the utilization rate of raw materials, for example, because of electrostatic adsorption, the sprayed negatively charged silicon dioxide can be well deposited on the surface of the core rod, so that the flow of oxyhydrogen flame can be reduced, and the waste of raw materials can be reduced.

It should be noted that, the mandrel holder 1 and the deposition torch 4 may be provided with existing devices, so that on one hand, the applicability of the present application may be ensured, and the present device may be compatible, and on the other hand, the manufacturing cost and the use cost of the present application may be reduced.

In order to achieve the generation of positively charged silica, referring to fig. 2, the charge generator 3 provided herein includes a charge torch 30, an evaporator 35, an electrospray 31, and a metal tube 32, the charge torch 30 being provided with a silicon material passage for the vaporized silicon material to be ejected and to generate positively charged silica under oxyhydrogen flame; the evaporator 35 is communicated with the silicon material channel and is used for vaporizing atomized liquid drop-shaped silicon material; the electrospray device 31 is communicated with the evaporator 35 and is used for atomizing positively charged liquid silicon materials into positively charged droplet-shaped silicon materials; one end of the metal tube 32 is communicated with the electric atomizer 31, the other end is used for being communicated with a silicon source 33, and the metal tube 32 is connected with the positive electrode and the negative electrode of a power supply and is used for making the liquid silicon material conveyed from the silicon source 33 positively charged.

Referring to fig. 2, when in use, the silicon source 33 is communicated with the metal tube 32 through the control valve 34, the control valve 34 is opened, the silicon source 33 can introduce liquid silicon material into the metal tube 32, the liquid silicon material is positively charged under the action of voltage due to the connection of the metal tube 32 with a power supply, the positively charged liquid silicon material enters the electric atomizer 31, the positively charged liquid silicon material is changed into positively charged tiny droplet silicon material under the action of the electric atomization effect of the electric atomizer 31, and then the positively charged tiny droplet silicon material is evaporated and vaporized by the evaporator 35 to form vaporized silicon material, and finally the vaporized silicon material is sprayed out of the silicon material channel of the charge blast lamp 30, and chemical reaction occurs under oxyhydrogen flame, and positively charged silicon dioxide is generated.

It should be noted that, the charge generator 3 may also make the liquid silicon material negatively charged, so as to generate negatively charged silicon dioxide, and the principle is similar to that of generating positively charged silicon dioxide, which is not described herein.

That is, in practice, the charge generator 3 provided in the present application can make the silicon material positively or negatively charged by the action of the voltage according to the actual production needs, and finally chemically react under oxyhydrogen flame to produce positively charged silica or negatively charged silica.

Oxyhydrogen flame for causing chemical reaction of vaporized silicon material ejected from a silicon material passage has various sources.

For example, the charge torch 30 may be the same as the deposition torch 4, that is, the charge torch 30 is further provided with a hydrogen channel and an oxygen channel for generating oxyhydrogen flame, so as to convert vaporized silicon material ejected from the silicon material channel of the charge torch 30 into positively charged silicon dioxide.

As another example, the oxyhydrogen flame of the deposition burner 4 may be utilized to convert vaporized silicon material ejected from the silicon material channel of the charge burner 30 into positively charged silicon dioxide, where the charge burner 30 is positioned within the oxyhydrogen flame coverage of the deposition burner 4.

Referring to fig. 2, the metal tube 32 is U-shaped, and the middle part of the metal tube 32 is used for communicating with the silicon source 33, and two ends of the metal tube 32 are connected with the electrospray device 31.

Because the core rod 2 is relatively long, the surface of the core rod 2 is positively charged for convenience, the charge generator 3 is arranged on a movable seat, and the movable seat is connected with a driving mechanism for driving the movable seat to reciprocate along the axial direction of the core rod 2.

The driving mechanism can adopt a motor, an air cylinder or an oil cylinder, etc.

In order to further increase the utilization rate of raw materials and reduce the production cost, referring to fig. 1, the OVD deposition system further includes a metal plate 5 and a positive and negative commutating dc power source connected to the metal plate 5 and configured to charge the metal plate 5 so as to cause the positively charged silica and the negatively charged silica to gather toward the surface of the core rod 2.

Specifically, referring to fig. 1, when the charge generator 3, the accommodation area, the deposition burner 4, and the metal plate 5 are arranged in this order, the positive-negative-commutation direct current power supply is used to negatively charge the metal plate 5.

At this time, the metal plate 5 is negatively charged, and the deposition torch 4 and the metal plate 5 are positioned on the same side of the mandrel 2, positive charges emitted by the charge generator 3 are accumulated towards the mandrel under the action of electric field force, and the negatively charged metal plate can also play a role in driving negatively charged silicon dioxide powder emitted by the deposition torch 4 to accumulate towards the mandrel, so that the diffusion of the negatively charged silicon dioxide powder towards the periphery is reduced; therefore, the utilization rate of raw materials can be further improved, and the production cost is reduced.

The positive and negative commutating direct current power supply is used to positively charge the metal plate 5 when the metal plate 5, the charge generator 3, the receiving area and the deposition burner 4 are arranged in this order.

At this time, the metal plate 5 has positive charges, and the charge generator 3 and the metal plate 5 are positioned on the same side of the mandrel 2, the positive charges emitted by the charge generator 3 can be pushed to the direction of the mandrel under the action of electric field force, and the positively charged metal plate can also play a role in driving the negatively charged silicon dioxide powder emitted by the deposition burner 4 to gather towards the mandrel, so that the diffusion of the negatively charged silicon dioxide powder towards the periphery is reduced; therefore, the utilization rate of raw materials can be further improved, and the production cost is reduced.

In order to solve the problem that poor local uniformity is easy to occur in the deposition process of the OVD powder rod, the OVD deposition system further comprises a diameter gauge 6 and a controller, wherein the diameter gauge 6 is used for measuring the outer diameter of the mandrel 2, as shown in fig. 1; the controller is connected with the deposition burner 4, the calliper 6, the positive and negative reversing direct current power supply and the charge generator 3 and is used for: judging whether the outer diameter is abnormal or not according to the measured outer diameter, controlling the oxyhydrogen flame flow of the deposition burner 4, the current of the positive and negative reversing direct current power supply and controlling the charge generator 3 to generate silicon dioxide with negative charges or positive charges.

Specifically, the diameter gauge 6 scans the outer diameter of the mandrel 2 to obtain a relatively uniform outer diameter D1 and an abnormal outer diameter D2, and at this time, the electric field strength is changed by adjusting the current of the positive and negative commutation direct current power supply to change the movement speed of the charges, and at the same time, the flow rate of oxyhydrogen flame of the deposition burner 4 can be controlled, and the charge generator 3 is controlled to generate negatively or positively charged silica, so that the uniformity of the powder rod is improved by locally applying the charges. In order to facilitate the local repair of abnormal positions, there are a plurality of deposition torches 4, and each deposition torch 4 is provided with one metal plate 5.

Referring to fig. 3, the diameter gauge 6 scans the outer diameter of the mandrel 2 to obtain a relatively uniform outer diameter D1 and an abnormal outer diameter D2, and the abnormal outer diameter D2 is locally thicker, at this time, the controller can control the charge generator 3 to generate negatively charged silica, control the current of the positive and negative reversing dc power supply, and make the metal plate 5 positively charged, so as to drive the negatively charged silica generated by the charge generator 3 to be emitted to the locally thicker position; and then the metal plate 5 is negatively charged, and the oxyhydrogen flame flow of the deposition torch 4 is controlled, so that the negatively charged silicon dioxide generated by the deposition torch 4 can be deposited at other positions except the locally rough position because the locally rough position is negatively charged and the negative charge amount is more, thereby basically repairing the uniformity of the boot body.

Referring to fig. 4, the diameter gauge 6 scans the outer diameter of the mandrel 2 to obtain a relatively uniform outer diameter D1 and an abnormal outer diameter D2, and the abnormal outer diameter D2 is locally thinned, at this time, the charge generator 3 is controlled by the controller to generate positively charged silica, the current of the positive and negative reversing dc power supply is controlled, the metal plate 5 is negatively charged, and the positively charged silica generated by the charge generator 3 is driven to be emitted to the locally thinned position; and then the oxyhydrogen flame flow of the deposition burner 4 is controlled, and the local fine position is positively charged and the positive charge quantity is more, so that negatively charged silicon dioxide generated by the deposition burner 4 can be more deposited at the local fine position, and the uniformity of a boot body can be basically repaired.

In the description of the present application, it should be noted that the azimuth or positional relationship indicated by the terms "upper", "lower", etc. are based on the azimuth or positional relationship shown in the drawings, and are merely for convenience of description of the present application and simplification of the description, and are not indicative or implying that the apparatus or element in question must have a specific azimuth, be configured and operated in a specific azimuth, and thus should not be construed as limiting the present application. Unless specifically stated or limited otherwise, the terms "mounted," "connected," and "coupled" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.

It should be noted that in this application, relational terms such as "first" and "second" and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising one … …" does not exclude the presence of other like elements in a process, method, article, or apparatus that comprises the element.

The foregoing is merely a specific embodiment of the application to enable one skilled in the art to understand or practice the application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. An OVD deposition system using charge induction, characterized in that it comprises:

the two mandrel clamping seats (1) are arranged at intervals to form a containing area for containing the mandrel (2), and the two mandrel clamping seats (1) are used for clamping two ends of the mandrel (2) respectively;

a charge generator (3), the charge output of the charge generator (3) being directed towards the receiving area and being adapted to deposit the generated positively charged silica on the surface of the mandrel (2);

and a deposition torch (4), wherein the deposition direction of the deposition torch (4) faces the accommodating area, and the deposition torch is used for depositing the generated negatively charged silica on the surface of the mandrel (2).

2. OVD deposition system using charge induction according to claim 1, characterized in that the charge generator (3) comprises:

a charge blast lamp (30), wherein the charge blast lamp (30) is provided with a silicon material channel for ejecting vaporized silicon material and generating positively charged silicon dioxide under oxyhydrogen flame;

an evaporator (35), the evaporator (35) being in communication with the silicon material channel and being adapted to vaporize atomized droplet-like silicon material;

an electrospray device (31) in communication with the evaporator (35) and for atomizing a positively charged liquid silicon material into positively charged droplet-like silicon material;

and one end of the metal tube (32) is communicated with the electric atomizer (31), the other end of the metal tube (32) is used for being communicated with a silicon source (33), and the metal tube (32) is connected with the positive electrode and the negative electrode of a power supply and is used for making the liquid silicon material conveyed from the silicon source (33) positively charged.

3. An OVD deposition system using charge induction as claimed in claim 2, wherein:

the silicon source (33) is in communication with the metal tube (32) through a control valve (34).

4. An OVD deposition system using charge induction as claimed in claim 2, wherein:

the charge blast lamp (30) is also provided with a hydrogen channel and an oxygen channel for generating oxyhydrogen flame;

alternatively, the charge torch (30) is positioned within the oxyhydrogen flame coverage of the deposition torch (4).

5. An OVD deposition system using charge induction as claimed in claim 2, wherein:

the metal tube (32) is U-shaped, the middle part of the metal tube (32) is used for being communicated with the silicon source (33), and two ends of the metal tube (32) are connected with the electric atomizer (31).

6. An OVD deposition system using charge induction as claimed in claim 2, wherein:

the charge generator (3) is arranged on the movable seat, and the movable seat is connected with a driving mechanism for driving the movable seat to axially reciprocate along the core rod (2).

7. The OVD deposition system using charge induction of claim 1, wherein the OVD deposition system further includes:

a metal plate (5);

and the positive and negative reversing direct current power supply is connected with the metal plate (5) and is used for electrifying the metal plate (5) so as to enable positively charged silicon dioxide and negatively charged silicon dioxide to gather towards the surface of the core rod (2).

8. An OVD deposition system using charge induction as claimed in claim 7, wherein:

when the charge generator (3), the accommodating area, the deposition blowlamp (4) and the metal plate (5) are sequentially arranged, the positive and negative reversing direct current power supply is used for enabling the metal plate (5) to be negatively charged;

when the metal plate (5), the charge generator (3), the accommodating area and the deposition burner (4) are arranged in sequence, the positive and negative reversing direct current power supply is used for making the metal plate (5) positively charged.

9. The OVD deposition system using charge induction as claimed in claim 7, wherein,

the charge generator (3) is also used for generating negatively charged silica;

the OVD deposition system further includes:

a diameter gauge (6), the diameter gauge (6) being used for measuring the outer diameter of the mandrel (2);

the controller is connected with the deposition blowtorch (4), the calliper (6), the positive and negative reversing direct current power supply and the charge generator (3) and is used for: judging whether the outer diameter is abnormal or not according to the measured outer diameter, controlling the oxyhydrogen flame flow of the deposition blowlamp (4), controlling the current of a positive and negative reversing direct current power supply, and controlling the charge generator (3) to generate silicon dioxide with negative charges or positive charges.

10. An OVD deposition system using charge induction as claimed in claim 7, wherein:

the number of deposition torches (4) is plural, and each deposition torch (4) is provided with one metal plate (5).