CN220579369U

CN220579369U - Evaporation table

Info

Publication number: CN220579369U
Application number: CN202322335363.8U
Authority: CN
Inventors: 李徐俊
Original assignee: GTA Semiconductor Co Ltd
Current assignee: GTA Semiconductor Co Ltd
Priority date: 2023-08-29
Filing date: 2023-08-29
Publication date: 2024-03-12
Anticipated expiration: 2033-08-29

Abstract

The utility model provides an evaporation table. The evaporation station includes: a chamber; the crucible is arranged at the bottom of the chamber and used for placing a material to be evaporated, and is provided with a crucible opening which faces to the top of the chamber; the water cooling plate is sleeved with the crucible opening; the protection cover is detachably fixed on one side of the water cooling plate, which faces the top of the cavity, and covers the water cooling plate. According to the technical scheme, the detachable protective cover is additionally arranged on the surface of the water cooling plate, so that the protective cover covers the water cooling plate, and the protective cover is removed and replaced by a new protective cover during maintenance; the step of knocking the water-cooled plate by using a screw driver and a hammer to remove the surface metal layer is omitted, the time loss for cleaning the metal layer is reduced, and the service life of the water-cooled plate is prolonged.

Description

Evaporation table

Technical Field

The utility model relates to the field of semiconductor processing, in particular to an evaporation table.

Background

The evaporating table is one physical vapor deposition apparatus and is prepared through setting material to be evaporated in vacuum environment and heating to over the melting point to evaporate the material to be evaporated into vapor phase, and depositing metal atom onto the surface of the substrate. The evaporation of the material to be evaporated includes resistance heating, electron beam focusing heating, radio frequency heating, etc.

The evaporation stage heated by electron beam focusing is called an electron beam evaporation stage. When the high melting point metal is heated to high temperature, the kinetic energy of the electrons on the surface of the metal is larger than the binding energy and escapes. Electrons are collected into a beam with a high energy density. Under the action of the electric field, the electron beam impinges on the surface of the material to be evaporated, and the kinetic energy of the electron beam is converted into heat energy, and the temperature of the heat energy can reach thousands DEG, so that the material to be evaporated is evaporated into gas. The surface of the crucible is provided with the water cooling plate, so that the crucible can be cooled on one hand, and on the other hand, the pollution of the gas formed by evaporation to materials in other crucible openings of the crucible can be prevented.

However, in the evaporation process, the gas formed by evaporation also forms an excessive metal layer on the surface of the water-cooling plate, so that the surface of the water-cooling plate becomes thicker, and at the moment, a tool is required to clean the water-cooling plate; the common cleaning method is to knock the redundant metal layer on the surface of the water-cooled plate by using a screwdriver and a hammer so as to lead the redundant metal layer to fall off, but the cleaning method is easy to cause deformation and excessive loss of the water-cooled plate, thereby reducing the service life of the water-cooled plate.

Disclosure of Invention

The utility model aims to solve the technical problem of providing an evaporation table which can reduce the time loss of cleaning a metal layer and prolong the service life of a water cooling plate.

In order to solve the above-described problems, the present utility model provides an evaporation stand comprising: a chamber; the crucible is arranged at the bottom of the chamber and used for placing a material to be evaporated, and is provided with a crucible opening which faces to the top of the chamber; the water cooling plate is sleeved with the crucible opening; the protection cover is detachably fixed on one side of the water cooling plate, which faces the top of the cavity, and covers the water cooling plate.

In some embodiments, the crucible is a porous crucible.

In some embodiments, the water cooling plate is formed with evaporation holes at positions corresponding to the crucible ports.

In some embodiments, the protective cover is detachably fixed to the surface of the water-cooling plate by a plurality of screws.

In some embodiments, a gap exists between the protective cover and the water cooled plate.

In some embodiments, the protective cover is formed by splicing a plurality of protective structures.

In some embodiments, the material of the protective cover is brass.

In some embodiments, a cooling water source is further included, the cooling water source being disposed outside the chamber and connected to the water cooling plate through a water inlet pipe.

In some embodiments, the crucible further comprises a base secured to the bottom of the chamber, the crucible being mounted within the base.

In some embodiments, an electron beam evaporation source is further included, the electron beam evaporation source being disposed at one side of the chamber for providing an electron beam.

In some embodiments, the substrate plating device further comprises a fixing seat, wherein the fixing seat is arranged at the top of the cavity and is used for fixing the substrate to be plated.

According to the technical scheme, the detachable protective cover is additionally arranged on the surface of the water cooling plate, so that the protective cover covers the water cooling plate, and the protective cover is removed and replaced by a new protective cover during maintenance; the step of knocking the water-cooled plate by using a screw driver and a hammer to remove the surface metal layer is omitted, the time loss for cleaning the metal layer is reduced, and the service life of the water-cooled plate is prolonged.

It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the utility model as claimed. Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but should be considered part of the specification where appropriate.

Drawings

In order to more clearly illustrate the technical solutions of the specific manner of the present utility model, the drawings that are required to be used in the embodiments of the present utility model will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present utility model, and other drawings may be obtained according to these drawings without inventive effort for a person of ordinary skill in the art.

FIGS. 1A to 1B are schematic views showing a first embodiment of an evaporation stage according to the present utility model;

fig. 2A to 2B are schematic views of a second embodiment of the evaporation stage according to the present utility model;

fig. 3A to 3B are schematic views showing a third embodiment of the evaporation stage according to the present utility model.

Detailed Description

The technical solutions of the embodiments of the present utility model will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are only some of the implementation manners of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Example 1

Referring to fig. 1A to fig. 1B, fig. 1A is a front view of a first embodiment of an evaporation stage according to the present utility model, and fig. 1B is a composite schematic view of a protection cover and a water cooling plate of the first embodiment of the evaporation stage according to the present utility model; in fig. 1B, a portion of the protective cover is omitted for ease of viewing the particular composite structure.

As shown in fig. 1A, the evaporation stage includes: chamber 10, crucible 11, water-cooled plate 12, safety cover 13. The crucible 11 is arranged at the bottom of the chamber 10 and is used for placing a material to be evaporated, the crucible 11 is provided with a crucible opening 111, and the crucible opening 111 faces to the top of the chamber 10; the water cooling plate 12 is sleeved with the crucible opening 111; the protection cover 13 is detachably fixed on the side of the water cooling plate 12 facing the top of the chamber 10 and covers the water cooling plate 12.

The water cooling plate 12 is arranged on the surface of the crucible 11, so that on one hand, the crucible 11 can be cooled, and on the other hand, the pollution of the gas formed by evaporation to the materials in other crucible openings 111 of the crucible 11 can be prevented. However, during the evaporation process, the gas formed by the evaporation will form an excessive metal layer on the surface of the water-cooling plate 12, so that the surface of the water-cooling plate becomes thicker, and at this time, a tool is required to clean the water-cooling plate 12; the general cleaning method is to use a screwdriver and a hammer to strike the superfluous metal layer on the surface of the water-cooling plate 12 so as to lead the superfluous metal layer to fall off, however, the cleaning method easily leads to deformation and excessive loss of the water-cooling plate 12, thereby reducing the service life of the water-cooling plate 12.

According to the technical scheme, the detachable protective cover 13 is additionally arranged on the surface of the water cooling plate 12, so that the protective cover 13 covers the water cooling plate 12, an excessive metal layer is formed on the surface of the protective cover 13 by evaporated gas, and the protective cover 13 is removed and replaced by a new protective cover 13 during maintenance; the step of knocking the water-cooling plate 12 by using a screwdriver and a hammer to remove the redundant metal layer can be omitted, the time loss for cleaning the redundant metal layer is reduced, and the service life of the water-cooling plate 12 is prolonged.

In this embodiment, the crucible 11 is a six-hole crucible. The six-hole crucible is provided with 6 crucible openings, and different materials to be evaporated are placed in different crucible openings. When the material to be evaporated of one crucible port is evaporated or different materials need to be evaporated, the next crucible port can be switched in a rotating way. In other embodiments, the crucible 11 may be a single Kong Ganguo or more porous crucible, and the specific choice may be adjusted according to actual production requirements.

As shown in fig. 1B, in this embodiment, the protection cover 13 is detachably fixed to the surface of the water cooling plate 12 by 4 screws 14. In other embodiments, the number of screws 14 may be 6, 8 or more. For example, the protection cover 13 is detachably fixed to the surface of the water cooling plate 12 by 8 screws. By embedding more screws 14, the protective cover 13 and the water cooling plate 12 can be better connected and fixed.

In this embodiment, the position of the protective cover 13 corresponding to the crucible opening 111 is formed with an evaporation hole, and the gas formed by evaporation of the material to be evaporated rises toward the top of the chamber 10 through the evaporation hole. In the present embodiment, the evaporation hole is formed by hollowing out the position of the protective cover 13 corresponding to the crucible opening 111. In other embodiments, the evaporation holes may be formed when the protective cover 13 is molded.

In the present embodiment, the protective cover 13 is formed of only one protective structure to simplify the process of forming the protective cover 13.

In this embodiment, the material of the protective cover 13 is brass. Because the brass is high in strength and has strong wear resistance, the protective cover 13 is formed by brass and covers the surface of the water cooling plate 12, and when a metal layer on the surface of the protective cover 13 is cleaned, the protective cover 13 is not easy to deform and is worn, so that the cost of the protective cover 13 can be further saved.

With continued reference to fig. 1A, in this embodiment, a cooling water source 15 is further included, and the cooling water source 15 is disposed outside the chamber 10 and is connected to the water-cooled panel 12 through a water inlet pipe 151. The water cooling plate 12 is internally provided with a pipe (not shown) through which cold water flows, and cold water in the cooling water source 15 enters the water cooling plate 12 through the water inlet pipe 151, thereby realizing a cooling effect. Further, the pipes for cold water flowing provided inside the water cooling plate 12 may be non-straight pipes, such as spiral pipes, folded linear pipes, etc., so as to increase the contact area with the water cooling plate 12 during the cold water flowing process, and further enhance the cooling effect. Further, a pipe (not shown) through which cold water flows is also provided inside the crucible 11, and the cooling water source 15 may further provide cold water to the crucible 11, so as to further cool the crucible 11.

In this embodiment, the apparatus further comprises a base 16, and the base 16 is fixed at the bottom of the chamber 10. The crucible 11 is installed in the base 16, and the position of the crucible 11, the water cooling plate 12 and other structures can be further fixed by arranging the base 16, and the components of the evaporation table can be conveniently replaced.

In the present embodiment, an electron beam evaporation source 17 is further included, and the electron beam evaporation source 17 is disposed at one side of the chamber 10 for supplying an electron beam. In the present embodiment, the electron beam evaporation source 17 generates an electron beam by heating a high melting point metal. Specifically, the high-melting point metal is a filament. By applying high voltage to the filament, electrons on the surface of the filament obtain enough kinetic energy to escape, and are collected into a beam in an electric field to collide with the material to be evaporated in the crucible 11, the energy of the electron beam is converted into heat energy, the temperature rises, and the material to be evaporated starts to be evaporated. In other embodiments, the electron beam source 17 may also be generated by an e-type electron gun or a hollow cathode electron gun.

In this embodiment, the evaporation stage further includes a fixing base 18, the fixing base 18 is disposed on the top of the chamber 10, and the fixing base 18 is used for fixing a substrate to be coated. The substrate may include a Silicon (Si) substrate, a Germanium (Ge) substrate, a Silicon Germanium (SiGe) substrate, a Silicon-On-Insulator (SOI) substrate, a Germanium-On-Insulator (GOI) substrate, or the like; the substrate may also be a stacked structure, such as a silicon/germanium silicon stack or the like.

Example two

Referring to fig. 2A to fig. 2B, fig. 2A is a front view of a second embodiment of the evaporation stand according to the present utility model, and fig. 2B is a composite schematic view of a protection cover and a water cooling plate of the second embodiment of the evaporation stand according to the present utility model; in fig. 2B, a portion of the protective cover is omitted for ease of viewing the particular composite structure.

As shown in fig. 2A to 2B, the difference from the embodiment shown in fig. 1A to 1B is that, in this embodiment, the protection cover 13 is formed by splicing protection structures 131 and 132. When the protective cover 13 needs to be disassembled and cleaned, only the protective structure 131 or 132 with thicker surface metal layer can be disassembled according to the condition of the metal layer on the surface of the protective cover 13, and the metal layer on the surface of the protective structure 131 or 132 can be cleaned in a targeted manner, so that the time required for disassembly and cleaning is reduced.

In other embodiments, the protective cover 13 may be formed by splicing 4 or more protective structures. Compared with the method of forming the protective cover 13 by only adopting one protective structure, the protective cover 13 can be conveniently detached and cleaned by splicing a plurality of protective structures to form the protective cover 13.

Example III

Referring to fig. 3A to 3B, fig. 3A is a front view of a third embodiment of the evaporation stand according to the present utility model, and fig. 3B is a composite schematic view of a protection cover and a water cooling plate of the third embodiment of the evaporation stand according to the present utility model.

As shown in fig. 3A to 3B, the difference from the embodiment shown in fig. 1A to 1B is that in the present embodiment, a gap w exists between the protective cover 13 and the water cooling plate 12. In practical production applications, the water-cooled plate 12 and the protective cover 13 may be thermally expanded, and since the material of the water-cooled plate 12 and the material of the protective cover 13 are not identical, the thermal expansion coefficients of the two are not identical, and may be extruded during the evaporation process. When the protective cover 13 is attached, a certain gap w is formed between the protective cover and the water cooling plate 12, so that adverse effects caused by thermal expansion can be better solved.

It should be noted that in this document, relational terms such as "first" and "second" and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, the statement "comprises" and "comprising" does not exclude the presence of other elements than those listed in any process, method, article, or apparatus that comprises the element. In addition, the embodiments of the present utility model and the features in the embodiments may be combined with each other without collision. In addition, in the above description, descriptions of well-known components and techniques are omitted so as to not unnecessarily obscure the present utility model.

The embodiments of the present utility model are described in a related manner, and the same similar parts between the embodiments are all mutually referred, and each embodiment is mainly described in the differences from the other embodiments.

The foregoing description is only of the preferred embodiments of the present utility model and is not intended to limit the scope of the present utility model. It should be noted that modifications and adaptations to the present utility model may occur to one skilled in the art without departing from the principles of the present utility model and are intended to be comprehended within the scope of the present utility model.

Claims

1. An evaporation station, comprising:

a chamber;

the crucible is arranged at the bottom of the chamber and used for placing a material to be evaporated, and is provided with a crucible opening which faces to the top of the chamber;

the water cooling plate is sleeved with the crucible opening;

the protection cover is detachably fixed on one side of the water cooling plate, which faces the top of the cavity, and covers the water cooling plate.

2. The evaporation station of claim 1, wherein the crucible is a porous crucible.

3. The evaporation station of claim 1, wherein the protective cover is formed with evaporation holes at positions corresponding to the crucible ports.

4. The evaporation stand according to claim 1, wherein the protective cover is detachably fixed to the surface of the water-cooling plate by a plurality of screws.

5. An evaporation station according to claim 1, wherein a gap exists between the protective cover and the water cooled plate.

6. An evaporation station according to claim 1, wherein the protective cover is formed by a plurality of protective structures spliced together.

7. An evaporation station according to claim 1, wherein the material of the protective cover is brass.

8. An evaporation station according to claim 1, further comprising a cooling water source arranged outside the chamber and connected to the water cooling plate by a water inlet line.

9. The evaporation station of claim 1, further comprising a base secured to a bottom of said chamber, said crucible being mounted within said base.

10. The evaporation station of claim 1, further comprising an electron beam evaporation source disposed on one side of the chamber for providing an electron beam.

11. The evaporation station of claim 1, further comprising a holder disposed on top of the chamber, the holder for holding a substrate to be coated.