CN218547243U - Supporting structure and photoetching machine - Google Patents

Abstract

The utility model provides a bearing structure and lithography machine. The supporting structure comprises an air bag and an air bearing arranged in the air bag; the air bag is arranged in a closed cavity, and the inner space of the air bag is isolated from the closed cavity and communicated with the outer space of the closed cavity. Compared with the prior art, the supporting structure provided by the utility model adopts the air bag to isolate the air bearing from the vacuum environment, the inner space of the air bag is communicated with the outside atmosphere, and the air supply of the air bearing is discharged into the atmosphere environment, so that the vacuum state of the vacuum environment is not influenced; the balance mass module is supported by the support structure, and almost zero-friction movement of the balance mass module is realized. Through setting up the connecting plate, can be convenient for fix bearing structure and supported object mutually to be favorable to controlling the thickness of air film above the air supporting bearing.

Description

Supporting structure and photoetching machine

Technical Field

The utility model relates to a lithography machine technical field especially relates to a bearing structure and lithography machine.

Background

When the photoetching machine exposes a wafer, the wafer bearing table bears the wafer to move according to a certain track, and the wafer bearing table needs to be capable of moving at high acceleration due to the requirement on high yield, wherein the acceleration can reach 2 to 3 times of the acceleration of gravity. The planar motor coil on the sheet bearing platform is used as a motor rotor for driving the sheet bearing platform to move, and the planar motor coil is used as a balance mass module embedded with a magnetic steel array and used as a stator correspondingly. The balance mass module also has the function of bearing the wafer bearing platform. The wafer stage can generate reaction force to the balance mass module when moving at high acceleration. To counteract this reaction force, it is common practice to provide the balance mass module with a certain amount of movement in the xy-plane, with the effect of the reaction force being cancelled by a counter-movement. The balance mass module weighs several tons and is generally supported by a mechanical guide rail, an air-floating guide rail or an air-floating bearing so as to ensure the freedom of movement. The air bearing has the advantages of simple structure, almost zero friction force, high rigidity and large load, and is a preferred support structure.

However, for the euv lithography machine, since the wafer stage, the balance mass module, etc. all work in a specific vacuum environment, the above-mentioned support structure for the balance mass module is not suitable. When the mechanical guide rail works, the sliding block and the guide rail generate mutual friction, particle pollutants can be generated, and if the particles fall on a wafer or a mask, the yield of etching products can be seriously influenced. The air-float guide rail and the air-float bearing need compressed air input to work, and the input air is discharged into the environment, so that the vacuum state of the vacuum environment is influenced.

SUMMERY OF THE UTILITY MODEL

To the not enough among the above-mentioned prior art, the utility model aims at providing a bearing structure, it can keep apart air bearing and vacuum environment, avoids the gas of air bearing input to discharge in the vacuum environment and influence vacuum environment's vacuum state.

The utility model provides a supporting structure, which comprises an air bag and an air bearing arranged in the air bag; the air bag is arranged in a closed cavity, and the inner space of the air bag is isolated from the closed cavity and communicated with the outer space of the closed cavity.

Preferably, the air bag and the wall of the closed chamber enclose a cavity, the air bearing is arranged in the cavity, an opening is formed in the wall of the air bag cage, and the cavity is communicated with the external space of the closed chamber through the opening.

Preferably, the air bag is connected with the wall of the closed chamber in a sealing mode through a flange.

Preferably, an air inlet pipe is connected to an air inlet of the air bearing, and the air inlet pipe penetrates through the opening and extends out of the closed chamber.

Preferably, a gas pipeline is connected to the airbag and is communicated with the external space of the closed chamber through the gas pipeline. An air inlet pipe of the air bearing can extend out of the vacuum chamber through the air pipeline and is communicated with a compressed air source; the gas discharged from the negative gas bearing can be discharged to the external space through the gas pipe without diffusing into the vacuum chamber, thereby not influencing the vacuum degree.

Preferably, the air floatation bearing further comprises a connecting plate which is fixedly arranged on the air bag and is positioned above the air floatation bearing.

Preferably, the connecting plate is made of a high rigidity material.

Preferably, the air floatation bearing further comprises a mounting base, the mounting base is arranged inside the air bag, and the air floatation bearing is mounted at the top of the mounting base.

Preferably, the mounting base is configured as a height-adjustable structure, and the mounting base is used for adjusting the mounting height of the air bearing.

Preferably, the balloon is made of a flexible material.

Preferably, the air bag is made of a rubber material and can withstand an internal pressure of more than 0.1 MPa.

The utility model also provides a lithography machine has the vacuum chamber and sets up balanced mass module in the vacuum chamber, still be provided with in the vacuum chamber as above bearing structure, the inner space of gasbag with the vacuum chamber is isolated and with the outer space of vacuum chamber is linked together, balanced mass module sets up bearing structure is last.

Compared with the prior art, the supporting structure provided by the utility model adopts the air bag to isolate the air bearing from the vacuum environment, the inner space of the air bag is communicated with the outside atmosphere, and the air supply of the air bearing is discharged into the atmosphere environment, so that the vacuum state of the vacuum environment is not influenced; the balance mass module is supported by the support structure, and almost zero-friction movement of the balance mass module is realized. By arranging the connecting plate, the supporting structure and a supported object (such as a balance mass module in a photoetching machine) can be fixed conveniently, and the thickness of an air film above the air bearing can be controlled conveniently. The air bag and the cavity wall of the closed cavity are enclosed together to form a cavity isolated from the closed cavity, the cavity is communicated with the external space of the closed cavity through the opening on the cavity wall of the air bag cage, so that the area of the air bag is reduced as much as possible while the cavity has enough volume, and the whole cavity is more stable.

The utility model discloses the airtight cavity that indicates is not limited to in vacuum environment, can also be sealed have special gas, liquid, perhaps has special requirement's airtight environment to gas disturbance. The support structure is used for isolating the air bearing from a vacuum environment and also can isolate the air bearing from other special closed environments.

The above-mentioned technical features can be combined in various suitable ways or replaced by equivalent technical features as long as the purpose of the invention can be achieved.

Drawings

The invention will be described in more detail hereinafter on the basis of non-limiting examples only and with reference to the accompanying drawings. Wherein:

fig. 1 is a schematic structural diagram of a supporting structure according to an embodiment of the present invention.

Description of the reference numerals:

1. a balancing mass module; 2. a connecting plate; 3. an air bag; 4. a flange; 5. a vacuum cavity wall; 6. an air inlet pipe; 7. opening a hole; 8. installing a base; 9. an air bearing; 10. a gas film; 11. a vacuum chamber; 12. a cavity.

Detailed Description

In order to make the purpose, technical solution and advantages of the present invention clearer, it will be right below that the technical solution of the present invention performs clear and complete description, based on the specific embodiments of the present invention, all other embodiments obtained by those skilled in the art on the premise that creative labor is not made belong to the scope of the present invention.

The use of "first," "second," and similar terms in this disclosure is not intended to indicate any order, quantity, or importance, but rather are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element preceding the word covers the element listed after the word, and does not exclude the possibility that other elements are also covered. "upper", "lower", "left", "right", and the like are used only to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.

In the present disclosure, when a particular device is described as being located between a first device and a second device, intervening devices may or may not be present between the particular device and the first device or the second device. When a particular device is described as being coupled to other devices, that particular device may be directly coupled to the other devices without intervening devices or may be directly coupled to the other devices with intervening devices.

All terms (including technical or scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs unless specifically defined otherwise. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

As shown in fig. 1, the support structure is mounted in a closed cavity, which is a vacuum chamber 11, and it comprises the bladder 3, the connecting plate 2, the mounting base 8 and the air bearings 9, and the arrows in fig. 1 are used to indicate the direction of the gas flow.

The air bag 3 is made of flexible materials, the top of the air bag 3 is hermetically connected with the connecting plate 2, and the air bag and the connecting plate form an air bag assembly together. The connecting plate 2 is connected to the air bag 3 in a high-air-tightness connecting mode, and the low enough vacuum leakage rate is ensured. The connecting plate 2 is preferably made of a material with high rigidity, and the connecting plate 2 is used for connecting and supporting a supported body. The bottom of the gasbag 3 is hermetically connected with the vacuum cavity wall 5 and encloses a cavity 12 together with the vacuum cavity wall 5, the cavity 12 is isolated from the vacuum cavity 11, and the gas in the cavity 12 can not enter the vacuum cavity 11. The gasbag 3 and the vacuum cavity wall 5 are preferably connected by a flange 4, and the gasbag 3 and the flange 4 and the vacuum cavity wall 5 are preferably connected by a high-air-tightness connection mode so as to ensure a sufficiently low vacuum leakage rate. An opening 7 is provided in the vacuum chamber wall 5 of the envelope 3, and the cavity 12 communicates with the space outside the vacuum chamber 11 through the opening 7. The air supply to the air bearing 9 is discharged through the opening 7 to the atmosphere without diffusing into the vacuum chamber 11 and without any influence on the degree of vacuum. The compressed gas source for supplying gas to the gas bearing 9 can be arranged outside the vacuum chamber 11, the gas inlet of the gas bearing 9 is connected with the gas inlet pipe 6, and the gas inlet pipe 6 penetrates through the opening 7 and extends out of the vacuum chamber 11 to be communicated with the compressed gas source.

The mounting base 8 and the air bearing 9 are both arranged in a cavity 12 formed by enclosing the air bag assembly and the vacuum cavity wall 5. The mounting base 8 is mounted on the vacuum chamber wall 5, and the mounting base 8 has a height adjustment function within a certain range. The air bearing 9 is arranged on the installation base 8, and the installation height of the air bearing 9 can be adjusted through the installation base 8. The air bearing 9 is positioned below the connecting plate 2, and the working surface of the air bearing 9 faces the connecting plate 2. Because the air bag 3 has flexibility, the connecting plate 2 and the supported body thereon can move relative to the air bearing 9.

The support structure can be applied to an extreme ultraviolet lithography machine, and a wafer bearing table, a balance mass module 1 and the like of the extreme ultraviolet lithography machine all work in a specific vacuum environment. The support structure is arranged in a vacuum environment of the euv lithography machine for supporting the balancing mass module 1. Specifically, the bottom of the support structure bladder 3 is sealingly connected to the vacuum chamber wall 5 of the vacuum chamber 11 and encloses a cavity 12 with the vacuum chamber wall 5, the cavity 12 is isolated from the vacuum chamber 11, and gas in the cavity 12 does not enter the vacuum chamber 11. An opening 7 is arranged on the vacuum chamber wall 5 of the airbag 3, and the cavity 12 is communicated with the external space of the vacuum chamber 11 through the opening 7. An air inlet pipe 6 is connected to an air inlet of the air bearing 9, and the air inlet pipe 6 penetrates through the opening 7 and extends out of the vacuum chamber 11 to be communicated with a compressed gas source. The connecting plate 2 is fixed on the lower surface of the balance mass module 1 through mechanical connection and moves together with the balance mass module 1. In an euv lithography machine, the bladder is preferably made of a rubber material, and the bladder 3 needs to be able to withstand an internal pressure of more than 0.1 MPa.

When the supporting structure works, compressed air is input into the air bearing 9 from the air inlet pipe 6, and a high-rigidity air film 10 with certain thickness is formed between the working surface of the air bearing 9 and the connecting plate 2, so that the balance mass module 1 can move on the horizontal plane almost without friction. The input gas is discharged from the edge of the air bearing 9 into the interior of the airbag 3, and since the interior of the airbag 3 is completely isolated from the vacuum environment, the gas input to the air bearing 9 is discharged to the atmosphere through the opening 7 in the vacuum chamber wall 5, and does not diffuse into the vacuum chamber 11, and does not have any influence on the vacuum degree.

Finally, it should be noted that: the above embodiments and examples are only used to illustrate the technical solution of the present invention, but not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments and examples, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments or examples may still be modified, or some of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the embodiments or examples of the present invention.

Claims (12)

1. A supporting structure is characterized by comprising an air bag and an air bearing arranged inside the air bag; the air bag is arranged in a closed cavity, and the inner space of the air bag is isolated from the closed cavity and communicated with the outer space of the closed cavity.

2. The support structure of claim 1, wherein the air bag and the wall of the closed chamber enclose a cavity, the air bearing is disposed in the cavity, the wall of the air bag housing is provided with an opening, and the cavity is communicated with the space outside the closed chamber through the opening.

3. The support structure of claim 2, wherein the bladder forms a sealed connection with the wall of the closed chamber via a connecting flange.

4. The support structure of claim 2, wherein an air inlet pipe is connected to an air inlet of the air bearing, and the air inlet pipe extends out of the closed chamber through the opening.

5. The support structure of claim 1, wherein a gas pipe is connected to the air bag and communicates with the space outside the closed chamber through the gas pipe.

6. The support structure of any one of claims 1-5, further comprising a connecting plate fixedly mounted on the air bladder and positioned above the air bearing.

7. The support structure of claim 6, wherein the web is made of a high stiffness material.

8. The support structure of any of claims 1-5, further comprising a mounting base disposed inside the air bladder, the air bearing being mounted on top of the mounting base.

9. The support structure of claim 8, wherein the mounting base is configured as a height adjustable structure, the mounting base being configured to adjust a mounting height of the air bearing.

10. The support structure of any one of claims 1-5, wherein the bladder is made of a flexible material.

11. The support structure of claim 10, wherein the bladder is made of a rubber material and can withstand an internal pressure greater than 0.1 MPa.

12. A lithography machine having a vacuum chamber and a counterbalancing mass module provided within the vacuum chamber, wherein a support structure according to any of claims 1-11 is provided within the vacuum chamber, the interior space of the bladder is isolated from the vacuum chamber and communicates with the exterior space of the vacuum chamber, and the counterbalancing mass module is provided on the support structure.

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