CN217569213U - Integrated developing tank sprayer and developing equipment - Google Patents
Integrated developing tank sprayer and developing equipment Download PDFInfo
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- CN217569213U CN217569213U CN202221182560.XU CN202221182560U CN217569213U CN 217569213 U CN217569213 U CN 217569213U CN 202221182560 U CN202221182560 U CN 202221182560U CN 217569213 U CN217569213 U CN 217569213U
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Abstract
The application provides an integrated developing tank sprayer and developing equipment. The developing tank nozzle comprises a body, a cleaning solution nozzle, a developing solution nozzle, a cleaning solution interface, a developing solution interface and a connecting rod. The cleaning solution interface is used for being connected with a cleaning solution pipeline of the developing device, the developing solution interface is used for being connected with a developing solution pipeline of the developing device, the body is provided with at least one cleaning solution channel and at least one developing solution channel, the cleaning solution interface and the cleaning solution nozzle are both communicated with the cleaning solution channel, and the developing solution interface and the developing solution nozzle are both communicated with the developing solution channel; two rows of cleaning liquid nozzles are respectively arranged at two sides of the developing liquid nozzles which are arranged in a row, and the cleaning liquid nozzles are obliquely arranged on the chamfer-shaped inclined planes at two sides of the bottom of the body. Each cleaning solution channel may be connected to a plurality of cleaning solution interfaces, each developing solution channel may be connected to a plurality of developing solution interfaces, and the developing solution channel may also be connected to a cleaning solution interface. The developing device comprises the integrated developing tank nozzle.
Description
Technical Field
The utility model relates to a semiconductor rubber coating developing device technical field especially relates to an integrated form developing tank shower nozzle and developing device.
Background
The developing device is used for developing and molding the exposed glue-coated silicon wafer in the production process of the integrated circuit. The developing process uses a developer nozzle and a cleaning nozzle. The developing solution nozzle is used for spraying developing solution to enable the exposed photoresist to chemically react with chemical substances in the developing solution, and finally, the exposed graph of the exposure machine is displayed; the cleaning liquid nozzle is used for spraying deionized water (DIW) to clean the residual developing liquid on the developed silicon wafer and the waste liquid generated after the chemical reaction of the developing liquid and the photoresist.
In practical use, due to process requirements, the areas of the developing solution nozzle and the cleaning solution nozzle for spraying or sprinkling the chemical solution generally cover a large area from the edge to the center of the silicon wafer, so that the developing solution nozzle and the cleaning solution nozzle are generally required to be moved by a developing groove mechanical arm to spray or sprinkle the chemical solution to the whole area. When being provided with a plurality of shower nozzles, need set up a plurality of arms and remove these shower nozzles, perhaps need the arm to carry out the change operation of shower nozzle, not only equipment structure is complicated, has higher requirement moreover to control, maintenance.
SUMMERY OF THE UTILITY MODEL
To prior art exist more than not enough, the utility model aims to provide a with developer solution nozzle and washing liquid nozzle integration in an organic whole, and simple structure, the integrated form developer tank shower nozzle of easily controlling to and the developing equipment based on this integrated form developer tank shower nozzle.
In order to achieve the above object, the present invention provides the following technical solutions.
An integrated developing tank nozzle for a developing device, comprising: a body; at least two cleaning solution nozzles and at least one developing solution nozzle; the cleaning liquid interface is used for connecting a cleaning liquid pipeline of the developing equipment; the developing solution interface is used for connecting a developing solution pipeline of the developing device; the body is provided with at least one cleaning liquid channel and at least one developing liquid channel, the cleaning liquid interface and the cleaning liquid nozzle are communicated with the cleaning liquid channel, and the developing liquid interface and the developing liquid nozzle are communicated with the developing liquid channel; and two sides of at least one developing solution nozzle are respectively provided with one cleaning solution nozzle.
In some embodiments, the developer nozzle is disposed at the bottom of the body, and the spraying direction is downward; and the spraying directions of the cleaning liquid nozzles on the two sides of the developing liquid nozzle are obliquely arranged downwards and outwards respectively.
In some embodiments, the developer solution nozzles are at least 2 in number and are arranged in a row; the number of the cleaning liquid nozzles is plural, and the cleaning liquid nozzles are arranged in a line on both sides of the developer nozzles arranged in a line.
In some embodiments, both sides of the bottom of the body have an inverted-angle-shaped slope, the cleaning solution nozzle is disposed on the slope, and the developing solution nozzle is disposed in the middle of the bottom.
In some embodiments, the number of the cleaning liquid channels is 2, each of the cleaning liquid channels communicating with the cleaning liquid nozzle located at one side of the developing liquid nozzle; each cleaning liquid channel is communicated with at least 2 cleaning liquid interfaces.
In some embodiments, the developer passage is in communication with at least one of the cleaning fluid ports.
In some embodiments, the developer passage communicates with at least 2 of the developer ports.
In some embodiments, the developing device further comprises a connecting rod fixed to the body, the connecting rod having a through groove extending in a length direction for adjusting a connecting position of the integrated developing tank shower head and a developing tank mechanical arm of the developing device; the cleaning solution nozzle and the developing solution nozzle are both arranged in the spray pipe shape of the body in a protruding mode.
In some embodiments, each of the cleaning solution ports is adapted to be connected to an independently controlled cleaning solution line; each developing solution interface is used for being connected to the independently controlled developing solution pipeline.
The application also provides developing equipment which comprises any one of the integrated developing tank nozzles; the integrated developing tank sprayer comprises a developing tank mechanical arm, wherein a body of the integrated developing tank sprayer is connected to the developing tank mechanical arm; the developing tank mechanical arm is used for moving the integrated developing tank sprayer to carry out a developing solution spraying process and a cleaning process of the silicon wafer.
The embodiment of the utility model discloses an at least one in the following technological effect has:
1. the developing solution nozzle and the cleaning solution nozzle are integrated into one spray head, so that a developing groove mechanical arm of developing equipment does not need to replace the spray head, and the equipment structure and the control difficulty are simplified;
2. the cleaning liquid nozzles are arranged on the two sides of the developing liquid nozzle and are obliquely arranged, so that the cleaning process can be quickly finished, and meanwhile, the developing liquid nozzle is arranged in the middle of the body, so that the accuracy of the developing liquid spraying process is ensured;
3. by arranging a plurality of cleaning fluid nozzles which are arranged side by side, cleaning fluid can be uniformly sprayed in a large range, and a quick and effective cleaning process is further realized;
4. by arranging a plurality of cleaning liquid interfaces, the same integrated developing tank sprayer can be used for spraying a plurality of different cleaning liquids;
5. by connecting the extra cleaning liquid nozzle on the developing liquid channel, the cleaning liquid can be sprayed by the developing liquid nozzle when needed.
Drawings
The above features, technical features, advantages and modes of realisation of the present invention will be further described in the following detailed description of preferred embodiments thereof, which is to be read in conjunction with the accompanying drawings.
FIG. 1 is a front view of one embodiment of an integrated developer tank showerhead;
FIG. 2 is a perspective view from one perspective of the embodiment of FIG. 1;
FIG. 3 is a top view of the embodiment of FIG. 1;
FIG. 4 is a top view of another embodiment of an integrated developer tank showerhead;
the reference numbers illustrate:
100. the cleaning solution nozzle comprises a body, 200 parts of a cleaning solution nozzle, 300 parts of a developing solution nozzle, 400 parts of a cleaning solution interface, 500 parts of a developing solution interface, 600 parts of a connecting rod and 610 parts of a through groove.
Detailed Description
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following description will explain specific embodiments of the present invention with reference to the accompanying drawings. The drawings in the following description are only examples of the invention, and it will be clear to a person skilled in the art that other drawings and embodiments can be obtained from these drawings without inventive effort.
For the sake of simplicity, only the parts relevant to the present invention are schematically shown in the drawings, and they do not represent the actual structure as a product. In some of the figures, elements having the same structure or function are shown only schematically or only schematically. In this document, "one" means not only "only one" but also a case of "more than one". The term "and/or" as used in this specification and the appended claims refers to and includes any and all possible combinations of one or more of the associated listed items. The terms "first," "second," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
Unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are intended to be inclusive and mean, for example, that they may be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood as a specific case by those skilled in the art.
The integrated developing tank nozzle is used for being mounted to a developing tank of developing equipment, and spraying developing solution on a silicon wafer after an exposure process, so that exposed photoresist and chemical substances in the developing solution perform chemical reaction, and finally, an exposed graph of an exposure machine is displayed; and after the developing process is finished, cleaning liquid such as deionized water and the like is sprayed on the silicon wafer and the developing tank, and the redundant developing liquid on the developed silicon wafer and waste liquid generated after the chemical reaction of the developing liquid and the photoresist are cleaned. As shown in fig. 1, one embodiment of the integrated developing tank shower head includes a body 100 made of an aluminum alloy, at least two cleaning solution nozzles 200, and at least one developing solution nozzle 300; the body 100 is provided with a cleaning liquid interface 400 and a developing solution interface 500, wherein the cleaning liquid interface 400 is used for connecting to a cleaning liquid pipeline of a developing device, and the developing solution interface 500 is used for connecting to a developing solution pipeline of the developing device.
The body 100 has at least one cleaning liquid channel and at least one developing liquid channel (not shown in the figures), and the cleaning liquid interface 400 and the cleaning liquid nozzle 200 are both communicated with the cleaning liquid channel, so as to form a cleaning liquid channel which is sealed to the outside except for an input port of the cleaning liquid interface 400 and a spraying outlet of the cleaning liquid nozzle 200. When the developing device needs to clean the silicon wafer and the developing tank, the cleaning liquid pipeline can be controlled to supply the cleaning liquid to the cleaning liquid interface 400, and the cleaning liquid is sprayed out from the cleaning liquid nozzle 200 to the part needing to be cleaned after passing through the cleaning liquid channel in the body 100. The developing solution interface 500 and the developing solution nozzle 300 are both communicated with a developing solution channel inside the main body 100, and form a developing solution channel sealed from the outside except for an input port of the developing solution interface 500 and a spraying outlet of the developing solution nozzle 300. The developing device can also control the developing solution pipeline to supply the developing solution and spray the developing solution onto the silicon wafer through the developing solution nozzle 300. One cleaning solution nozzle 200 is disposed at each of both sides of at least one developing solution nozzle 300.
In some embodiments, the developer nozzle 300 is disposed at the bottom of the body 100, and the spraying direction is disposed downward; the spray directions of the cleaning liquid nozzles 200 at both sides of the developing liquid nozzle 300 are diagonally set downward and outward, respectively. The application discloses spraying or spraying of washing liquid and developing solution can be accomplished simultaneously to integrated form developing tank shower nozzle, during the in-service use, can be connected to developing tank arm of developing device with body 100, accomplishes washing or spraying to a large scale through the removal of arm, has avoided setting up a plurality of arms or has avoided the arm to change the operation of shower nozzle. The cleaning solution and the developing solution can be supplied through a plastic pipe arranged on the mechanical arm. Since the developer spraying process needs to be performed more accurately, the present application arranges the developer nozzle 300 at the bottom of the body 100 and vertically downward; the control requirement of the cleaning process is relatively low, but the spraying range is large, the developing tank can be preferably sprayed and cleaned at the same time, and the cleaning can be completed quickly, so that more cleaning liquid nozzles 200 are arranged and arranged on two sides of the developing liquid nozzle 300 in an outward inclined manner, the cleaning direction can be enlarged, and the cleaning can be completed quickly under the coordination of the movement of the mechanical arm.
In some embodiments, as shown in fig. 2, the developer nozzles 300 are at least 2 in number and are arranged in a row; the number of the cleaning solution nozzles 200 is plural, and the cleaning solution nozzles are arranged in a line on both sides of the developer nozzles 300 arranged in a line. The cleaning solution nozzles 200 arranged in a line can make the cleaning solution spray more uniformly and can realize a larger flow rate, and simultaneously maintain the flow velocity of the liquid flow sprayed from the nozzles, thereby improving the cleaning efficiency.
In some embodiments, as also shown in fig. 2, both sides of the bottom of the body 100 have an inclined surface in a shape of an inverted horn, the cleaning solution nozzle 200 is disposed on the inclined surface, and the developing solution nozzle 300 is disposed in the middle of the bottom of the body 100.
In some embodiments, the number of cleaning liquid passages is 2, each of which communicates with the cleaning liquid nozzle 200 located on one side of the developing liquid nozzle 00; each cleaning solution channel is in communication with at least 2 cleaning solution interfaces 400. As shown in fig. 3, 2 cleaning liquid passages are respectively provided at the left and right sides of the body 100 in the up-down direction with reference to the orientation of fig. 3, and the left cleaning liquid passage communicates with the left 9 cleaning liquid nozzles 200 and simultaneously communicates with the left 2 cleaning liquid ports 400. In practical applications, the cleaning liquid pipeline of the developing device can provide cleaning liquid to the cleaning liquid nozzle on the left side through any cleaning liquid interface 400 on the left side; when the developing device needs two or more kinds of cleaning liquids, the two kinds of cleaning liquids may be connected to one cleaning liquid interface 400 through respective pipelines, and the cleaning liquid nozzle 200 on the left side may be controlled to spray any one kind of cleaning liquid as needed. The right side may be arranged symmetrically to the left side. The body 100 of the application can be processed into a cleaning solution channel and a developing solution channel on an aluminum alloy material in the horizontal direction through drilling; then, threaded holes for installing the cleaning solution interface 400 and the developing solution interface 500 are processed in the vertical direction, threaded holes for installing the cleaning solution nozzle 200 and the developing solution nozzle 300 are processed at the bottom, and finally, the opening to be blocked (for example, the opening at one end or both ends of the hole processed when the cleaning solution channel and the developing solution channel are processed) is sealed, so that the processing of the body 100 can be completed. The arrangement and processing of the developer and cleaning fluid passages described above will be understood by those skilled in the art and therefore will not be shown in detail in the drawings attached to this specification.
In some embodiments, as shown in fig. 3, the developer passage communicates with at least 2 developer interfaces 500. When the developing device needs two or more developing solutions, the two developing solutions can be connected to one developing solution interface 500 through respective pipelines respectively, and the developing solution nozzle 300 is controlled to spray any one developing solution according to needs.
In some embodiments, as shown in FIG. 4, the developer passage may also be in communication with at least one cleaning fluid interface 400. The cleaning solution interface 400 may be used to clean the developing solution channel and the developing solution nozzle 300, or when a larger flow rate of the cleaning solution is required, the developing solution nozzle 300 may be used to spray the cleaning solution together with the cleaning solution nozzle 200 to achieve a more efficient cleaning operation.
As shown in fig. 1, in some embodiments, the integrated developing tank shower head further includes a connecting rod 600, the connecting rod 600 is fixed to the body 100, and the connecting rod 600 has a through groove 610 extending in a length direction for adjusting a mounting position of the integrated developing tank shower head and a developing tank robot arm of the developing device. The cleaning solution nozzle 200 and the developing solution nozzle 300 are both in the shape of a nozzle protruding from the main body 100.
In some embodiments, each cleaning solution interface 400 is adapted to be connected to an independently controlled cleaning solution line of the developing device; each of the developer interfaces 500 is adapted to be connected to independently controlled developer lines of the developing device. The developing equipment can spray developing solutions of different types or different concentrations and cleaning solutions of different types or different concentrations by controlling the cleaning solution pipelines and the developing solution pipelines, so that a more flexible technological process is realized.
An embodiment of the developing device provided by the application comprises the integrated developing tank sprayer of any one of the foregoing embodiments, and the developing tank of the developing device is further provided with a developing tank mechanical arm, and the developing tank mechanical arm is connected to the body 100 of the integrated developing tank sprayer and used for controlling the integrated developing tank sprayer to scan and move back and forth, so that developing solution spraying operation or cleaning operation on a silicon wafer within a set range is realized.
The foregoing is only a preferred embodiment of the present application and the technical principles employed, and various obvious changes, rearrangements and substitutions may be made without departing from the spirit of the application. Other advantages and effects of the present application will be readily apparent to those skilled in the art from the disclosure herein. The present application is capable of other and different embodiments and its several details are capable of modifications and variations in various respects, all without departing from the spirit of the present application. The features in the above embodiments and embodiments may be combined with each other without conflict.
Claims (10)
1. An integrated developing tank nozzle for a developing device, comprising:
a body;
at least two cleaning solution nozzles and at least one developing solution nozzle;
the cleaning liquid interface is used for connecting a cleaning liquid pipeline of the developing device;
the developing solution interface is used for connecting a developing solution pipeline of the developing device;
the body is provided with at least one cleaning liquid channel and at least one developing liquid channel, the cleaning liquid interface and the cleaning liquid nozzle are communicated with the cleaning liquid channel, and the developing liquid interface and the developing liquid nozzle are communicated with the developing liquid channel;
and two sides of at least one developing solution nozzle are respectively provided with one cleaning solution nozzle.
2. The integrated developer tank showerhead of claim 1,
the developing solution nozzle is arranged at the bottom of the body, and the spraying direction is downward;
and the spraying directions of the cleaning liquid nozzles on the two sides of the developing liquid nozzle are obliquely arranged downwards and outwards respectively.
3. The integrated developer tank showerhead of claim 2,
the number of the developing solution nozzles is at least 2, and the developing solution nozzles are arranged in a row;
the number of the cleaning liquid nozzles is plural, and the cleaning liquid nozzles are arranged in a line on both sides of the developing liquid nozzles arranged in a line.
4. The integrated developer tank showerhead of claim 3,
the both sides of the bottom of body have the inclined plane of chamfer shape, the washing liquid nozzle set up in on the inclined plane, the developer solution nozzle set up in the middle part of bottom.
5. The integrated developer tank showerhead of claim 3,
the number of the cleaning liquid channels is 2, and each cleaning liquid channel is communicated with the cleaning liquid nozzle positioned on one side of the developing liquid nozzle;
each cleaning liquid channel is communicated with at least 2 cleaning liquid interfaces.
6. The integrated developer tank showerhead of any of claims 1 to 5,
the developing solution channel is also communicated with at least one cleaning solution interface.
7. The integrated developer tank showerhead of any of claims 1 to 5,
the developer liquid channel is communicated with at least 2 developer liquid interfaces.
8. The integrated developing vessel showerhead according to any of claims 1 to 5,
the connecting rod is fixed to the body and provided with a through groove extending along the length direction and used for adjusting the connecting position of the integrated developing tank spray head and the developing tank mechanical arm of the developing device;
the cleaning solution nozzle and the developing solution nozzle are both arranged in the spray pipe shape of the body in a protruding mode.
9. The integrated developer tank showerhead of any of claims 1 to 5,
each cleaning liquid interface is used for being connected to the independently controlled cleaning liquid pipeline;
each developing solution interface is used for being connected to the independently controlled developing solution pipeline.
10. A developing apparatus, characterized by comprising:
the integrated developer tank showerhead of any of claims 1 to 9;
the body of the integrated developing tank sprayer is connected to the developing tank mechanical arm;
the developing tank mechanical arm is used for moving the integrated developing tank sprayer to carry out a developing solution spraying process and a cleaning process of the silicon wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221182560.XU CN217569213U (en) | 2022-05-17 | 2022-05-17 | Integrated developing tank sprayer and developing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221182560.XU CN217569213U (en) | 2022-05-17 | 2022-05-17 | Integrated developing tank sprayer and developing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217569213U true CN217569213U (en) | 2022-10-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221182560.XU Active CN217569213U (en) | 2022-05-17 | 2022-05-17 | Integrated developing tank sprayer and developing equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217569213U (en) |
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2022
- 2022-05-17 CN CN202221182560.XU patent/CN217569213U/en active Active
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