CN216237258U - Open-close type shielding component and film deposition device with same - Google Patents
Open-close type shielding component and film deposition device with same Download PDFInfo
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- CN216237258U CN216237258U CN202121454781.3U CN202121454781U CN216237258U CN 216237258 U CN216237258 U CN 216237258U CN 202121454781 U CN202121454781 U CN 202121454781U CN 216237258 U CN216237258 U CN 216237258U
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Abstract
The utility model provides a film deposition device with an open-close type shielding component, which mainly comprises a reaction cavity, a bearing plate and an open-close type shielding component, wherein the middle part of the open-close type shielding component and the bearing plate are positioned in the reaction cavity. The open-close type shielding component comprises a first shielding plate, a second shielding plate and a driving device, wherein the driving device is connected with the first shielding plate and the second shielding plate and is used for driving the first shielding plate and the second shielding plate to swing towards opposite directions. During the deposition process, the driving device drives the first and second shielding plates to move away from each other and switch to an open state. When the cleaning process is performed, the driving device drives the first and second shielding plates to approach each other and switches to a shielding state to shield the bearing plate, thereby preventing the bearing plate from being polluted in the process of cleaning the thin film deposition device.
Description
Technical Field
The utility model relates to a film deposition device with an open-close type shielding component, which mainly shields a bearing disc through the open-close type shielding component so as to avoid polluting the bearing disc in the process of cleaning a processing chamber.
Background
Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD), and Atomic Layer Deposition (ALD) are commonly used thin film deposition equipment and are commonly used in integrated circuit, led, display, and other processes.
The deposition apparatus mainly includes a chamber and a wafer tray, wherein the wafer tray is located in the chamber and is used for carrying at least one wafer. For example, in physical vapor deposition, a target is disposed in the chamber, wherein the target faces the wafer on the wafer carrier. During physical vapor deposition, inert gas and/or reaction gas can be conveyed into the cavity, bias voltage is respectively applied to the target material and the wafer bearing plate, and the loaded wafer is heated through the wafer bearing plate.
The inert gas in the cavity forms ionized inert gas under the action of the high-voltage electric field, and the ionized inert gas is attracted by bias voltage on the target material to bombard the target material. Target atoms or molecules sputtered from the target are attracted by the bias on the wafer carrier plate and deposit on the surface of the heated wafer to form a film on the surface of the wafer.
After a period of time, the inner surface of the chamber forms a deposition film, and thus the chamber needs to be periodically cleaned to prevent the deposition film from falling off during the process and further contaminating the wafer. Furthermore, oxides or other contaminants may also form on the surface of the target, and thus periodic cleaning of the target is also required. Generally, plasma ions are bombarded against the target in the chamber by a burn-in process to remove oxides or other contaminants from the surface of the target.
When the chamber and the target are cleaned, the wafer carrying tray and the wafer in the chamber need to be taken out, or the wafer carrying tray needs to be isolated, so that the wafer carrying tray and the wafer are prevented from being polluted in the cleaning process.
SUMMERY OF THE UTILITY MODEL
Generally, after a certain period of use, the thin film deposition apparatus generally needs to be cleaned to remove the oxide or nitride deposited on the thin film and the target in the chamber. Particles generated during the cleaning process contaminate the carrier plate, thereby requiring isolation of the carrier plate from contaminants. The utility model provides an open-close type shielding component and a film deposition device with the same. The shielding plate operating in the shielding state can be used for shielding the bearing plate so as to avoid the pollution of particles generated when the cavity or the target material is cleaned on the bearing plate.
The present invention provides a thin film deposition apparatus with an openable shielding member, which mainly comprises a reaction chamber, a carrying plate and an openable shielding member. The open-close type shielding component comprises a driving device and two shielding plates, wherein the driving device is connected with and drives the two shielding plates to respectively swing towards opposite directions, so that the two shielding plates are operated in an open state and a shielding state.
When the reaction cavity is cleaned, the driving device drives the two shielding plates to approach each other in a swinging manner, so that the two shielding plates are connected and shield the bearing disc in the accommodating space, and plasma or generated pollution used in the cleaning process is prevented from contacting the bearing disc and/or a substrate borne by the bearing disc. When the deposition process is carried out, the driving device drives the two shielding plates to move away from each other in a swinging mode, and the thin film deposition can be carried out on the substrate in the reaction cavity.
An object of the present invention is to provide a thin film deposition apparatus having an opening/closing type shielding member, in which a complete shielding member is mainly formed by two shielding plates, so that a space required for accommodating the shielding plates can be reduced. In an embodiment of the present invention, the two shielding plates can swing in opposite directions in the accommodating space of the reaction chamber, wherein the two shielding plates can be operated in an open state or a shielding state in the accommodating space of the reaction chamber, so as to simplify the structure of the reaction chamber and reduce the volume of the reaction chamber.
It is an object of the present invention to provide a thin film deposition apparatus having an opening/closing type shielding member, in which a driving device is connected to and supports two shielding plates through two connecting arms, respectively, so as to reduce the load of the connecting arms. In addition, a shielding plate with larger thickness can be further used to prevent the shielding plate from generating high-temperature deformation when the film deposition device is cleaned, and the effect of shielding the bearing disc by the shielding plate is favorably improved.
In order to achieve the above object, the present invention provides a thin film deposition apparatus, comprising: a reaction cavity comprising a containing space; a bearing disc positioned in the containing space and used for bearing at least one substrate; one end of the stopper is connected with the reaction cavity, and the other end of the stopper forms an opening; and an openable shielding member comprising: the first shielding plate is positioned in the accommodating space; the second shielding plate is positioned in the accommodating space; and the driving device is connected with the first shielding plate and the second shielding plate and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are used for shielding the bearing disc.
The utility model provides an open-close type shielding component, which is suitable for a film deposition device and comprises: a first shielding plate; a second shielding plate, wherein the height of the first shielding plate is higher than that of the second shielding plate; and the driving device is connected with the first shielding plate and the second shielding plate and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions so that the first shielding plate and the second shielding plate are switched between an opening state and a shielding state, wherein part of the first shielding plate and part of the second shielding plate in the shielding state are overlapped, and a spacing space is formed between the first shielding plate and the second shielding plate in the opening state.
The thin film deposition device comprises a thin film deposition device and an opening-closing type shielding component, wherein the driving device comprises a shaft sealing device and at least one driving motor, and the driving motor is connected with a first shielding plate and a second shielding plate through the shaft sealing device.
The film deposition device comprises a film deposition device and an opening-closing type shielding component, wherein the shaft sealing device comprises an outer pipe body and a shaft body, the outer pipe body comprises a space for accommodating the shaft body, the driving motor is connected with the first shielding plate through the outer pipe body and connected with the second shielding plate through the shaft body, and the shaft body and the outer pipe body are synchronously driven to rotate in opposite directions.
The film deposition device and the open-close type shielding component comprise a first connecting arm and a second connecting arm, the outer tube body is connected with the first shielding plate through the first connecting arm, and the shaft body is connected with the second shielding plate through the second connecting arm.
The film deposition device and the opening-closing type shielding component comprise a plurality of position sensing units which are arranged in the reaction cavity and are used for sensing the positions of the first shielding plate and the second shielding plate.
The thin film deposition device comprises a thin film deposition device body, a first shielding plate and a second shielding plate, wherein the area of the first shielding plate is larger than that of the second shielding plate.
The utility model has the beneficial effects that: when the reaction cavity is cleaned, the driving device can drive the first shielding plate and the second shielding plate to be close to each other and switch the first shielding plate and the second shielding plate into a shielding state to shield the bearing plate, so that the bearing plate is prevented from being polluted in the process of cleaning the film deposition device.
Drawings
FIG. 1 is a schematic side sectional view of an embodiment of a novel thin film deposition apparatus with an openable and closable shield member according to the present invention in a shield state.
FIG. 2 is a perspective view of an embodiment of an open/close type shielding member of the thin film deposition apparatus according to the present invention in an open state.
FIG. 3 is a perspective view of an embodiment of the present invention in which the shutter member is operated in a shutter state.
Fig. 4 is a schematic perspective cross-sectional view illustrating an embodiment of a driving device for an opening/closing type shielding member according to the present invention.
Fig. 5 is a schematic perspective view of an embodiment of a linking mechanism of an opening/closing type shielding member according to the present invention.
FIG. 6 is a top view of an embodiment of the novel thin film deposition apparatus with an openable and closable shielding member according to the present invention in an open state.
FIG. 7 is a top view of an embodiment of the novel thin film deposition apparatus with an openable and closable shielding member according to the present invention in a shielding state.
Fig. 8 is a plan view showing still another embodiment of the novel thin film deposition apparatus having an opening and closing type shielding member according to the present invention in an opened state.
Description of reference numerals: 10-a thin film deposition device; 100-an opening and closing type shielding member; 11-a reaction chamber; a 111-stop; 112-opening; 12-an accommodating space; 121-cleaning the space; 13-a carrier tray; 141-first connecting arm; 143-a second linker arm; 15-a shield; 151-first shield plate; 152-space; 153-a second shield plate; 161-target material; 163-substrate; 17-a drive device; 171-a drive motor; 173-a shaft seal arrangement; 1731-outer body; 1732-space; 1733-a shaft body; 18-a linkage mechanism; 181-drive gear; 183-a first driven gear; 185-a second driven gear; 19-position sensing unit.
Detailed Description
FIG. 1 is a schematic side cross-sectional view illustrating an embodiment of a thin film deposition apparatus with an openable and closable shielding member in a shielding state according to the present invention. As shown in the figure, the thin film deposition apparatus 10 mainly includes a reaction chamber 11, a carrying tray 13 and an opening-closing type shielding member 100, wherein the reaction chamber 11 includes an accommodating space 12 for accommodating the carrying tray 13 and a part of the opening-closing type shielding member 100.
The susceptor 13 is disposed in the accommodating space 12 of the reaction chamber 11 and is used for supporting at least one substrate 163. Taking the thin film deposition apparatus 10 as a physical vapor deposition chamber as an example, a target 161 is disposed in the reaction chamber 11, wherein the target 161 faces the substrate 163 and the susceptor 13. For example, the target 161 may be disposed on the upper surface of the reaction chamber 11 and face the susceptor 13 and/or the substrate 163 in the accommodating space 12.
Referring to fig. 2 and fig. 3, the opening/closing type shielding member 100 includes a first shielding plate 151, a second shielding plate 153 and a driving device 17, wherein the first shielding plate 151 and the second shielding plate 153 are located in the accommodating space 12. The driving device 17 is connected to the first shielding plate 151 and the second shielding plate 153, and drives the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, for example, the first shielding plate 151 and the second shielding plate 153 swing synchronously around the driving device 17.
In an embodiment of the present invention, the driving device 17 is connected to a first connecting arm 141 and a second connecting arm 143, and is connected to the first shielding plate 151 and the second shielding plate 153 through the first connecting arm 141 and the second connecting arm 143, respectively, wherein the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to swing or rotate in opposite directions through the first connecting arm 141 and the second connecting arm 143, respectively.
The first shielding plate 151 and the second shielding plate 153 may be plate bodies, wherein the first shielding plate 151 and the second shielding plate 153 may have similar areas and shapes, for example, the first shielding plate 151 and the second shielding plate 153 may be semicircular plate bodies. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to close, the first shielding plate 151 and the second shielding plate 153 approach each other to form a disc-shaped shielding member 15, and the carrier tray 13 and/or the substrate 163 is shielded by the shielding member 15.
The first shielding plate 151 and the second shielding plate 153 according to the embodiment of the utility model operate in the shielding state or the first shielding plate 151 and the second shielding plate 153 are connected, which can be defined as that the first shielding plate 151 and the second shielding plate 153 are close to each other until the distance between the two is smaller than a threshold value, for example, smaller than 1 mm. Specifically, the first shielding plate 151 and the second shielding plate 153 do not directly contact each other, so as to prevent particles generated by the first shielding plate 151 and the second shielding plate 153 during the contact process from contaminating the accommodating space 12 of the reaction chamber 11 and/or the susceptor 13.
In an embodiment of the utility model, the first shielding plate 151 and the second shielding plate 153 may be disposed at different heights, for example, the first shielding plate 151 is higher than the second shielding plate 153, when the first shielding plate 151 and the second shielding plate 153 operate in the shielding state, a part of the first shielding plate 151 overlaps a part of the second shielding plate 153, so as to improve the shielding effect of the shielding member 15.
The first shielding plate 151 and the second shielding plate 153 have similar areas and shapes, and are semi-circular plates, which are only an embodiment of the present invention and are not intended to limit the scope of the present invention. In practical applications, the first shielding plate 151 and the second shielding plate 153 may be plates with different areas and shapes, and may also be plates with square, oval or any geometric shape, for example, the area of the first shielding plate 151 may be larger than that of the second shielding plate 153. It is within the scope of the present invention that the shielding member 15 is composed of the first shielding plate 151 and the second shielding plate 153, wherein the first shielding plate 151 and the second shielding plate 153 can shield the carrier tray 13 and/or the substrate 163 when they are closed.
Taking the first shielding plate 151 and the second shielding plate 153 as semicircular plates, the first shielding plate 151 and the second shielding plate 153 have a linear side and a semicircular or arc side, respectively, wherein the linear sides of the first shielding plate 151 and the second shielding plate 153 face each other. When the driving device 17 drives the first shielding plate 151 and the second shielding plate 153 to approach each other, the straight sides of the first shielding plate 151 and the second shielding plate 153 approach each other to form the circular shielding member 15. The first shielding plate 151 and the second shielding plate 153 are connected by straight side edges, which is only an embodiment of the present invention and is not intended to limit the scope of the present invention. In practical applications, the straight side edges of the first shielding plate 151 and the second shielding plate 153 may also be corresponding curved or saw-toothed side edges, so that the carrier tray 13 can be effectively shielded as long as the side edges of the first shielding plate 151 and the second shielding plate 153 can be close to and combined with each other.
In an embodiment of the present invention, as shown in fig. 4, the driving device 17 includes at least one driving motor 171 and a shaft seal 173, wherein the driving motor 171 is connected to the first shielding plate 151 and the second shielding plate 153 by the shaft seal 173. The driving motor 171 is located outside the accommodating space 12 of the reaction chamber 11, and the shaft sealing device 173 passes through and is disposed in the reaction chamber 11, wherein a part of the shaft sealing device 173 is located in the accommodating space 12 of the reaction chamber 11.
The shaft seal 173 includes an outer body 1731 and a shaft 1733. The outer tube 1731 includes a space 1732 for accommodating the shaft 1733, wherein the outer tube 1731 and the shaft 1733 are coaxially disposed, and the outer tube 1731 and the shaft 1733 can rotate relatively. The outer tube 1731 is connected to the first connecting arm 141 and is connected to the first shielding plate 151 via the first connecting arm 141 to swing. The shaft 1733 is connected to the second connecting arm 143, and is connected to and drives the second shielding plate 153 to swing via the second connecting arm 143.
The shaft seal 173 may be a common shaft seal, and is mainly used to isolate the accommodating space 12 of the reaction chamber 11 from the external space so as to maintain the vacuum of the accommodating space 12. In another embodiment of the present invention, the shaft sealing device 173 can be a magnetic fluid shaft seal and includes a plurality of bearings, at least one permanent magnet, at least one magnetic pole piece and at least one magnetic fluid. For example, the bearing may be disposed on the outer surface of the shaft 1733 and between the shaft 1733 and the outer tube 1731, such that the shaft 1733 and the outer tube 1731 may rotate relative to each other. Permanent magnets are disposed on the inner surface of the outer tube 1731 between the two bearings. Two pole pieces are disposed on the inner surface of the outer tube 1731 and between the permanent magnet and the two bearings, respectively. A gap is provided between the pole piece and the outer surface of the shaft 1733, and the magnetic fluid is disposed in the gap. The above-mentioned configuration of the magnetic fluid shaft seal is only an embodiment of the present invention, and is not a limitation to the scope of the present invention.
In an embodiment of the utility model, as shown in fig. 4, the number of the driving motors 171 may be two, and the two driving motors 171 are respectively connected to the outer tube 1731 and the shaft 1733 of the sealing device 173 and respectively drive the outer tube 1731 and the shaft 1733 to synchronously rotate in opposite directions, so as to respectively drive the first shielding plate 151 and the second shielding plate 153 to swing in different directions through the outer tube 1731 and the shaft 1733.
In another embodiment of the present invention, as shown in fig. 5, the number of the driving motors 171 may be one, and the first shielding plate 151 and the second shielding plate 153 are connected and driven to synchronously swing in opposite directions by a linkage mechanism 18 via the first connecting arm 141 and the second connecting arm 143, respectively. Specifically, the linkage mechanism 18 includes a driving gear 181, a first driven gear 183 and a second driven gear 185, wherein the driving gear 181 engages with the first driven gear 183 and the second driven gear 185. The first driven gear 183 is connected to the first shielding plate 151 through the outer body 1731 and the first connecting arm 141, and the second driven gear 185 is connected to the second shielding plate 153 through the shaft 1733 and the second connecting arm 143. When the driving gear 181 rotates, the first driven gear 183 and the second driven gear 185 rotate in opposite directions, and drive the outer tube 1731 and the shaft 1733 to rotate in opposite directions, so as to drive the first shielding plate 151 and the second shielding plate 153 to synchronously swing in opposite directions.
The linkage mechanism 18 includes three gears, which is only one embodiment of the present invention, and in different embodiments, the linkage mechanism 18 may include a plurality of rotating wheels and a plurality of belts, wherein the driving motor 171 is connected to one of the rotating wheels and drives the outer tube 1731 and the shaft 1733 to rotate in opposite directions through the rotating wheels and the belts.
Specifically, the thin film deposition apparatus 10 and/or the shutter member 100 of the present invention can be operated in two states, i.e., an open state and a shielding state, respectively. As shown in fig. 2 and 6, the driving device 17 can drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 are separated from each other and operated in an open state. A space 152 is formed between the first shielding plate 151 and the second shielding plate 153 when the target 161 is operated in the open state, so that the first shielding plate 151 and the second shielding plate 153 are not present between the target 161 and the susceptor 13 and the substrate 163.
The susceptor 13 and the substrate 163 may then be driven toward the target 161, and the gas, such as inert gas, in the accommodating space 12 may impact the target 161 to deposit a thin film on the surface of the substrate 163.
In an embodiment of the utility model, as shown in fig. 1, the accommodating space 12 of the reaction chamber 11 may be provided with a stopper 111, wherein one end of the stopper 111 is connected to the reaction chamber 11, and the other end of the stopper 111 forms an opening 112. When the carrier plate 13 approaches the target 161, it enters or contacts the opening 112 formed by the stopper 111. The reaction chamber 11, the carrier plate 13 and the stopper 111 separate a reaction space in the accommodating space 12, and deposit a thin film on the surface of the substrate 163 in the reaction space, thereby preventing the formation of a deposited thin film on the surfaces of the reaction chamber 11 and the carrier plate 13 outside the reaction space.
Further, as shown in fig. 3 and 7, the driving device 17 may drive the first shielding plate 151 and the second shielding plate 153 to swing in opposite directions, so that the first shielding plate 151 and the second shielding plate 153 approach each other and operate in a shielding state. The closed first shielding plate 151 and the second shielding plate 153 form a shielding member 15, wherein the shielding member 15 is located between the target 161 and the susceptor 13 and is used for shielding the susceptor 13 to isolate the target 161 from the susceptor 13.
The shielding member 15 can separate a cleaning space 121 in the accommodating space 12, wherein the cleaning space 121 is partially overlapped or close to the reaction space. A burn-in process may be performed in the cleaning space 121 to clean the target 161 and the reaction chamber 11 and/or the stopper 111 in the cleaning space 121, and remove oxide, nitride or other contaminants on the surface of the target 161 and the deposited film on the surface of the reaction chamber 11 and/or the stopper 111.
During the cleaning process of the thin film deposition apparatus 10, the susceptor 13 and/or the substrate 163 are shielded or isolated by the shielding member 15 to prevent the substances generated during the cleaning process from contaminating or depositing on the surface of the susceptor 13 and/or the substrate 163.
Specifically, in the present invention, the first shielding plate 151 and the second shielding plate 153 form the shielding member 15, and the first connecting arm 141 and the second connecting arm 143 respectively support the weight of the first shielding plate 151 and the second shielding plate 153, so that the burden on the first connecting arm 141 and the second connecting arm 143 can be reduced.
By using two connecting arms 141/143 to carry the weight of part of the shield plate 151/153, respectively, the thickness or weight of the first shield plate 151 and the second shield plate 153 can be further increased. The thicker first and second shielding plates 151 and 153 prevent high temperature deformation during cleaning of the thin film deposition apparatus 10 and prevent plasma or contamination from contacting the underlying susceptor 13 or substrate 163 through the deformed first and second shielding plates 151 and 153 during cleaning.
In addition, the shielding member 15 is divided into two first shielding plates 151 and two second shielding plates 153 which can be connected and separated from each other, which is more beneficial to reduce the storage space required by the first shielding plates 151 and the second shielding plates 153 in the opening state, and can simplify or adjust the structure of the reaction chamber 11.
In an embodiment of the utility model, as shown in fig. 6 and 7, the first shielding plate 151 and the second shielding plate 153 can be operated in the open state and the shielding state in the accommodating space 12 of the reaction chamber 11 without additionally providing one or more storage chambers for storing the shielding plates in the open state. For example, the volume of the reaction chamber 11 and/or the accommodating space 12 may be slightly larger than the original volume, so that the first shielding plate 151 and the second shielding plate 153 can be opened or closed in the accommodating space 12 of the reaction chamber 11.
In an embodiment of the utility model, a plurality of position sensing units 19 may be further disposed on the reaction chamber 11, wherein the position sensing units 19 face the accommodating space 12 and are configured to sense positions of the first shielding plate 151 and the second shielding plate 153 to determine whether the first shielding plate 151 and the second shielding plate 153 are in an open state. The position sensing unit 19 may be a light sensing unit, for example.
If the first shielding plate 151 and the second shielding plate 153 are not completely opened, the carrier tray 13 is displaced toward the target 161, which may cause the carrier tray 13 to collide with the first shielding plate 151 and the second shielding plate 153, thereby damaging the carrier tray 13, the first shielding plate 151, and/or the second shielding plate 153. In practical applications, the position of the position sensing unit 19 can be adjusted, wherein the first shielding plate 151 and the second shielding plate 153 are opened to a specific angle and then sensed by the position sensing unit 19. Then, the susceptor 13 can approach the target 161 to avoid collision between the susceptor 13 and the first and second shielding plates 151 and 153.
In practical applications, the position of the retractable shielding member 100 in the reaction chamber 11 can be adjusted according to other mechanisms or configurations of the moving lines of the thin film deposition apparatus 10. Taking the accommodating space 12 of the reaction chamber 11 as a square, as shown in fig. 6 and 7, the driving device 17 of the retractable shielding member 100 may be disposed at or near the side of the reaction chamber 11 and/or the accommodating space 12. As shown in fig. 8, the driving device 17 of the retractable shielding member 100 may also be disposed at a corner or a top corner of the reaction chamber 11 and/or the accommodating space 12, so as to facilitate disposing mechanisms such as a substrate feeding port and an exhaust line at a side of the reaction chamber 11.
The utility model has the advantages that:
when the reaction cavity is cleaned, the driving device can drive the first shielding plate and the second shielding plate to be close to each other and switch the first shielding plate and the second shielding plate into a shielding state to shield the bearing plate, so that the bearing plate is prevented from being polluted in the process of cleaning the film deposition device.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, i.e., all equivalent variations and modifications in the shape, structure, characteristics and spirit of the present invention described in the claims should be included in the scope of the present invention.
Claims (6)
1. A thin film deposition apparatus, comprising:
a reaction cavity comprising a containing space;
a bearing disc which is positioned in the containing space and is used for bearing at least one substrate;
one end of the stopper is connected with the reaction cavity, and the other end of the stopper forms an opening; and
an openable shade member comprising:
a first shielding plate located in the accommodating space;
a second shielding plate located in the accommodating space;
and the driving device is connected with the first shielding plate and the second shielding plate and respectively drives the first shielding plate and the second shielding plate to swing towards opposite directions so as to switch the first shielding plate and the second shielding plate between an opening state and a shielding state, wherein the first shielding plate and the second shielding plate in the shielding state are close to each other and are used for shielding the bearing disc.
2. The apparatus according to claim 1, wherein the driving device comprises a shaft sealing device and at least one driving motor, and the driving motor is connected to the first shielding plate and the second shielding plate via the shaft sealing device.
3. The apparatus of claim 2, wherein the shaft seal device comprises an outer tube and a shaft, the outer tube includes a space for receiving the shaft, the driving motor is connected to the first shielding plate through the outer tube and connected to the second shielding plate through the shaft, and the shaft and the outer tube are synchronously driven to rotate in opposite directions.
4. The thin film deposition apparatus as claimed in claim 3, comprising a first connecting arm and a second connecting arm, wherein the outer tube is connected to the first shielding plate through the first connecting arm, and the outer tube is connected to the second shielding plate through the second connecting arm.
5. The apparatus of claim 1, comprising a plurality of position sensing units disposed in the reaction chamber and configured to sense positions of the first shielding plate and the second shielding plate.
6. The thin film deposition apparatus according to claim 1, wherein the first shielding plate is higher than the second shielding plate, and a part of the first shielding plate overlaps a part of the second shielding plate in the shielding state.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121454781.3U CN216237258U (en) | 2021-06-29 | 2021-06-29 | Open-close type shielding component and film deposition device with same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121454781.3U CN216237258U (en) | 2021-06-29 | 2021-06-29 | Open-close type shielding component and film deposition device with same |
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| CN216237258U true CN216237258U (en) | 2022-04-08 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115537753A (en) * | 2021-06-29 | 2022-12-30 | 鑫天虹(厦门)科技有限公司 | Open-close type shielding component and film deposition machine station with same |
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2021
- 2021-06-29 CN CN202121454781.3U patent/CN216237258U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115537753A (en) * | 2021-06-29 | 2022-12-30 | 鑫天虹(厦门)科技有限公司 | Open-close type shielding component and film deposition machine station with same |
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