CN215050645U - Double-sided winding film coating machine adopting high-power electron beam evaporation - Google Patents
Double-sided winding film coating machine adopting high-power electron beam evaporation Download PDFInfo
- Publication number
- CN215050645U CN215050645U CN202121418453.8U CN202121418453U CN215050645U CN 215050645 U CN215050645 U CN 215050645U CN 202121418453 U CN202121418453 U CN 202121418453U CN 215050645 U CN215050645 U CN 215050645U
- Authority
- CN
- China
- Prior art keywords
- coating
- roller
- electron beam
- power
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model relates to a double-sided winding coating machine adopting high-power electron beam evaporation, which comprises a vacuum chamber, wherein an unwinding roller, a first coating mechanism, a second coating mechanism and a winding roller are sequentially arranged in the vacuum chamber along a substrate running path; the first coating mechanism is used for coating one surface of the base material, and comprises a first coating roller and a first coating area, wherein a first evaporation source is arranged in the first coating area; the second coating mechanism is used for coating the other side of the base material and comprises a second coating roller and a second coating area, and a second evaporation source is arranged in the second coating area; the vacuum chamber is also provided with a first electron gun and a second electron gun, the electron beam emitted by the first electron gun faces the first evaporation source, and the electron beam emitted by the second electron gun faces the second evaporation source. The utility model discloses can carry out two-sided evaporation coating film in succession to the energy of high-power electron beam evaporation coating film is big, and rete deposition efficiency is high, can realize the big batch even filming of big width substrate.
Description
Technical Field
The utility model relates to a vacuum coating equipment technical field, concretely relates to adopt two-sided coiling coating machine of high-power electron beam coating by vaporization.
Background
At present, an E-type electron gun is mainly used for evaporation coating of the electron beam evaporation coating, the power of the E-type electron gun is low, the capacity of a crucible of the E-type electron gun is limited, and the E-type electron gun is only suitable for laboratories or small-batch trial production and is not suitable for continuous, rapid and large-scale coating processing.
SUMMERY OF THE UTILITY MODEL
To the technical problem who exists among the prior art, the utility model aims at: the double-sided winding film plating machine adopting the high-power electron beam evaporation can continuously carry out double-sided evaporation film plating, has high power of an electron gun and large crucible capacity, and is suitable for large-batch film plating processing of large-width large-roll-diameter base materials.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
a double-sided winding film plating machine adopting high-power electron beam evaporation comprises a vacuum chamber, wherein an unwinding roller, a first film plating mechanism, a second film plating mechanism and a winding roller are sequentially arranged in the vacuum chamber along a substrate running path, and a plurality of guide rollers are also arranged on the substrate running path; the first coating mechanism is used for coating one surface of a base material and comprises a first coating roller and a first coating area, a first ion cleaning device is arranged at an inlet of the first coating roller, a first evaporation source is arranged in the first coating area, and the spraying direction of the first evaporation source faces one surface of the base material; the second coating mechanism is used for coating the other side of the base material and comprises a second coating roller and a second coating area, a second ion cleaning device is arranged at an inlet of the second coating roller, a second evaporation source is arranged in the second coating area, and the spraying direction of the second evaporation source faces to the other side of the base material; the vacuum chamber is also provided with a first electron gun and a second electron gun, the electron beam emitted by the first electron gun faces the first evaporation source, and the electron beam emitted by the second electron gun faces the second evaporation source.
Furthermore, the outlet of the unwinding roller is also provided with a first winding diameter tracking system, and the inlet of the winding roller is also provided with a second winding diameter tracking system.
Furthermore, the first winding diameter tracking system comprises a first swing frame, a first guide roller, a first power roller and a first fixed roller are arranged on the first swing frame, the first power roller is used for driving the first swing frame to swing, the distance between the first guide roller and the substrate on the unwinding roller is kept consistent, and the substrate coming out of the unwinding roller sequentially passes through the first guide roller, the first power roller and the first fixed roller and enters the first coating roller through the guide roller.
Furthermore, the second roll diameter tracking system comprises a second swing frame, a second guide roller, a second power roller and a second fixed roller are arranged on the second swing frame, the second power roller is used for driving the second swing frame to swing, the distance between the second guide roller and the base material on the winding roller is kept consistent, and the base material coming out of the second coating roller passes through the guide roller, sequentially passes through the second fixed roller, the second power roller and the second guide roller and enters the winding roller.
Furthermore, the first evaporation source comprises a first crucible, a coating material is filled in the first crucible, an electron beam emitted by the first electron gun faces the first crucible, and a first water-cooling baffle is arranged on the first crucible.
Furthermore, the second evaporation source comprises a second crucible, a coating material is filled in the second crucible, an electron beam emitted by the second electron gun faces the second crucible, and a second water-cooling baffle is arranged on the second crucible.
Furthermore, the number of the first evaporation sources is at least one, the number of the first electron guns is at least one, and the first evaporation sources correspond to the first electron guns; the number of the second evaporation sources is at least one, the number of the second electron guns is at least one, and the second evaporation sources correspond to the second electron guns.
Furthermore, the first electron gun and the second electron gun are both provided with a linear scanning system.
Further, the power of the first electron gun and the second electron gun is 20kw-1000 kw.
Furthermore, partition plates are arranged between the first coating area and the vacuum chamber, and gaps for the base materials to pass through are reserved between the partition plates and the first coating roller and between the partition plates and the second coating roller.
In general, the utility model has the advantages as follows:
the utility model discloses can carry out two-sided evaporation coating film in succession, improve production efficiency and coating film stability by a wide margin to the power of electron gun is big, and the crucible capacity is big, and the energy of high-power electron beam evaporation coating film is big, makes rete deposition efficiency high, and the homogeneity is good, can realize the big batch even filming of big width substrate, and development prospect is wide.
Drawings
Fig. 1 is a schematic structural diagram of a first embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a second embodiment of the present invention.
Fig. 3 is a schematic structural diagram of a third embodiment of the present invention.
Fig. 4 is a schematic structural diagram of a fourth embodiment of the present invention.
Fig. 5 is a schematic structural diagram of a fifth embodiment of the present invention.
Fig. 6 is a schematic structural diagram of a sixth embodiment of the present invention.
Fig. 7 is a left side view of the first and second electron guns of the first embodiment of the present invention.
Fig. 8 is a left side view of the first and second electron guns in the first embodiment of the present invention.
Wherein: the device comprises a vacuum chamber 1, an unwinding roller 2, a guide roller 3, a first coating roller 4, a first ion cleaning device 5, a first coating area 6, a winding roller 7, a first crucible 8, a first water-cooling baffle 9, a first electron gun 10, a second coating roller 11, a second coating area 12, a second ion cleaning device 13, a second crucible 14, a second water-cooling baffle 15, a second electron gun 16, a partition plate 17, a first swing frame 18, a first guide roller 19, a first power roller 20, a first fixed roller 21, a second power frame 22, a second guide roller 23, a second guide roller 24, a second fixed roller 25 and a base material 26.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Example one
This embodiment is primarily suitable for plating metal or non-metal films on conventional substrates.
As shown in fig. 1, a double-sided winding coating machine adopting high-power electron beam evaporation comprises a vacuum chamber, wherein an unwinding roller, a first coating mechanism, a second coating mechanism and a winding roller are sequentially arranged in the vacuum chamber along a substrate running path, and a plurality of guide rollers are also arranged on the substrate running path; the first coating mechanism is used for coating one surface of a base material and comprises a first coating roller and a first coating area, a first ion cleaning device is arranged at an inlet of the first coating roller, a first evaporation source is arranged in the first coating area, and the spraying direction of the first evaporation source faces one surface of the base material; the second coating mechanism is used for coating the other side of the base material and comprises a second coating roller and a second coating area, a second ion cleaning device is arranged at an inlet of the second coating roller, a second evaporation source is arranged in the second coating area, and the spraying direction of the second evaporation source faces to the other side of the base material; the vacuum chamber is also provided with a first electron gun and a second electron gun, the electron beam emitted by the first electron gun faces the first evaporation source, and the electron beam emitted by the second electron gun faces the second evaporation source.
As shown in fig. 1, the first evaporation source includes a first crucible, the first crucible is filled with a coating material, an electron beam emitted by a first electron gun faces the first crucible, and a first water-cooled baffle is disposed on the first crucible. The second evaporation source comprises a second crucible, a coating material is filled in the second crucible, an electron beam emitted by the second electron gun faces the second crucible, and a second water-cooling baffle is arranged on the second crucible. In this embodiment, the first crucible and the second crucible are both strip-shaped crucibles, and the first water-cooling baffle and the second water-cooling baffle are both movable water-cooling baffles. Before film coating, the film material in the crucible is pre-melted, part of the film material is evaporated upwards during pre-melting, the water-cooling baffle is arranged above the crucible and can shield the film material evaporated upwards, after pre-melting is finished, the water-cooling baffle is moved away during formal film coating, the electron beam emitted by the electron gun is emitted onto the film material in the crucible, and the film material is evaporated upwards onto the base material.
The number of the first evaporation sources is at least one, the number of the first electron guns is at least one, and the first evaporation sources correspond to the first electron guns, namely the first evaporation sources and the first electron guns are arranged in a one-to-one correspondence manner; the number of the second evaporation sources is at least one, the number of the second electron guns is at least one, and the second evaporation sources correspond to the second electron guns, namely the second evaporation sources and the second electron guns are arranged in a one-to-one correspondence mode.
Fig. 7 shows a scanning state in which one electron gun is installed in the width direction of the substrate, that is, one first electron gun is installed on the left side of the vacuum chamber and one second electron gun is installed on the right side of the vacuum chamber.
Fig. 8 shows a scanning state in which two electron guns are mounted in the width direction of the substrate, that is, two first electron guns are mounted on the left side of the vacuum chamber and two second electron guns are mounted on the right side of the vacuum chamber.
The linear scanning systems are arranged on the first electron gun and the second electron gun, the electron beams emitted by the electron guns are scanned according to the length designed by the scanning systems, and due to the fact that the scanning speed is high, the film materials in the crucible can be evaporated in the scanning length at the same time, namely, the film materials of the long-strip-shaped crucible in the length direction are evaporated at the same time. The power of the first electron gun and the second electron gun is 20-1000 kw, which can be selected according to the process requirements.
The first ion cleaning device is used for carrying out ion cleaning on one surface of the base material, and the second ion cleaning device is used for carrying out ion cleaning on the other surface of the base material; the dust particles on the surface of the base material can be removed through ion cleaning, and the binding force between the base material and the film layer is improved. The first ion cleaning device and the second ion cleaning device both perform ion cleaning by a strip ion source or bombardment.
As shown in fig. 1, partition plates are arranged between the first coating area and the vacuum chamber, and gaps for the base material to pass through are reserved between the partition plates and the first coating roller and between the partition plates and the second coating roller. By arranging the partition plate, the coating material can be prevented from splashing on other parts in the coating process.
As shown in fig. 1, the shape of the vacuum chamber is a square, a cylinder, or any other shape, and in the present embodiment, the vacuum chamber is generally square; in this embodiment, in the vacuum chamber, the unwinding roller is located right above, the winding roller is located right below, the first coating mechanism is located on the left side, and the second coating mechanism is located on the right side.
The working principle of the utility model is as follows:
the conventional substrate comes out of the unwinding roller and passes through the guide roller and the first coating roller, when entering the first coating roller, the first ion cleaning device can perform ion cleaning on one surface of the substrate, when passing through the first coating roller, the substrate can enter the first coating area, the first coating area is internally provided with a first crucible, a film material is filled in the first crucible, an electron beam emitted by a first electron gun is irradiated on the film material of the first crucible, the film material is upwards evaporated onto the substrate, and one surface of the substrate is coated; the substrate coming out of the first coating roller passes through the guide roller and the second coating roller, one surface of the substrate which is coated is tightly attached to the second coating roller, the other surface of the substrate which is not coated is exposed outside, when the substrate enters the second coating roller, the second ion cleaning device can carry out ion cleaning on the other surface of the substrate, when the substrate passes through the second coating roller, the substrate enters a second coating area, a second crucible is arranged in the second coating area, a coating material is filled in the second crucible, an electron beam emitted by a second electron gun is irradiated onto the coating material of the second crucible, the coating material is upwards evaporated onto the substrate, and the other surface of the substrate is coated; then the substrate enters a wind-up roll through a guide roll to be wound, and double-sided coating of the substrate is completed.
Example two
As shown in fig. 2, the present embodiment is different from the first embodiment in that the shape of the vacuum chamber is different, and in the present embodiment, the vacuum chamber is generally cylindrical.
EXAMPLE III
As shown in fig. 3, the present embodiment is different from the first embodiment in that the positions of the components in the vacuum chamber are different, in the present embodiment, in the vacuum chamber, the unwinding roller is located at the upper left, the winding roller is located at the lower left, the first coating mechanism is located at the upper right, the second coating mechanism is located at the lower right, and the first electron gun and the second electron gun are both installed at the right side of the vacuum chamber.
Example four
As shown in fig. 4, the present embodiment is different from the first embodiment in that the positions of the components in the vacuum chamber are different, in the present embodiment, in the vacuum chamber, the unwinding roller is located at the lower left, the winding roller is located at the upper left, the first coating mechanism is located at the lower right, the second coating mechanism is located at the upper right, and the first electron gun and the second electron gun are both installed at the right side of the vacuum chamber.
EXAMPLE five
The present embodiment is mainly suitable for plating metal or non-metal films on ultra-thin substrates.
As shown in fig. 5, the difference between this embodiment and the first embodiment is that in this embodiment, a first winding diameter tracking system is further disposed at the exit of the unwinding roller, and a second winding diameter tracking system is further disposed at the entrance of the winding roller.
As shown in fig. 5, the first winding diameter tracking system includes a first swing frame, a first guide roller, a first power roller and a first fixed roller are arranged on the first swing frame, the first power roller is used for driving the first swing frame to swing, the distance between the first guide roller and the substrate on the unwinding roller is kept consistent, and the substrate coming out of the unwinding roller sequentially passes through the first guide roller, the first power roller and the first fixed roller and enters the first coating roller through the guide roller.
The first rolling diameter tracking system changes according to the rolling diameter change of the base material on the unwinding roller, namely the distance between a first guide roller on the first rolling diameter tracking system and the base material on the unwinding roller is kept consistent, and a first power roller drives the first swing frame to swing so as to drive the first guide roller to swing, so that the first guide roller changes along with the rolling diameter change of the base material on the unwinding roller and keeps consistent with the distance of the base material on the unwinding roller. By providing the first roll diameter tracking system, wrinkles caused by the ultra-thin substrate being too far from the first guide roll can be prevented.
As shown in fig. 5, the second roll diameter tracking system includes a second swing frame, a second guide roller, a second power roller and a second fixed roller are arranged on the second swing frame, the second power roller is used for driving the second swing frame to swing, the distance between the second guide roller and the substrate on the wind-up roll is kept consistent, and the substrate coming out of the second coating roll passes through the guide roller, sequentially passes through the second fixed roller, the second power roller and the second guide roller, and enters the wind-up roll.
The second roll diameter tracking system changes according to the change of the roll diameter of the base material on the winding roll, namely the distance between a second guide roller on the second roll diameter tracking system and the base material on the winding roll is kept consistent, and a second power roller drives a second swing frame to swing to further drive the second guide roller to swing, so that the second guide roller changes along with the change of the roll diameter of the base material on the winding roll and keeps consistent with the distance between the second guide roller and the base material on the winding roll. By providing the second roll diameter tracking system, wrinkles caused by the ultra-thin substrate being too far away from the second guide roll can be prevented.
When the utility model is used, the ultrathin substrate comes out of the unwinding roller, and sequentially passes through the first guide roller, the first power roller and the first fixed roller, the first power roller can drive the first swing frame to swing, and further drive the first guide roller to swing, so that the first guide roller changes along with the change of the winding diameter of the substrate on the unwinding roller, and keeps consistent with the distance of the substrate on the unwinding roller, and then passes through the guide roller and the first coating roller; the substrate coming out of the first coating roller passes through the guide roller and the second coating roller, one surface of the substrate which is coated is tightly attached to the second coating roller, the other surface of the substrate which is not coated is exposed outside, when the substrate enters the second coating roller, the second ion cleaning device can carry out ion cleaning on the other surface of the substrate, when the substrate passes through the second coating roller, the substrate enters a second coating area, a second crucible is arranged in the second coating area, a coating material is filled in the second crucible, an electron beam emitted by a second electron gun is irradiated onto the coating material of the second crucible, the coating material is upwards evaporated onto the substrate, and the other surface of the substrate is coated; the substrate coming out of the second coating roller passes through the guide roller and sequentially passes through the second fixed roller, the second power roller and the second guide roller, the second power roller can drive the second swing frame to swing, the second guide roller is driven to swing, the second guide roller is changed along with the change of the winding diameter of the substrate on the winding roller and keeps consistent with the distance between the substrate and the winding roller, and finally the substrate enters the winding roller to be wound, so that double-sided coating of the substrate is completed.
EXAMPLE six
As shown in fig. 6, the present embodiment is different from the fifth embodiment in that the shape of the vacuum chamber is different, and in the present embodiment, the vacuum chamber is generally cylindrical.
Generally speaking, the utility model discloses can carry out two-sided evaporation coating film in succession, improve production efficiency and coating film stability by a wide margin to the power of electron gun is big, and the crucible capacity is big, and the energy of high-power electron beam evaporation coating film is big, makes rete deposition efficiency high, and the homogeneity is good, can realize the big batch even filming of large width substrate, and development prospect is wide.
The above embodiments are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be equivalent replacement modes, and all are included in the scope of the present invention.
Claims (10)
1. The utility model provides an adopt two-sided winding coating machine of high-power electron beam coating by vaporization which characterized in that: the device comprises a vacuum chamber, wherein an unwinding roller, a first coating mechanism, a second coating mechanism and a winding roller are sequentially arranged in the vacuum chamber along a base material running path, and a plurality of guide rollers are also arranged on the base material running path; the first coating mechanism is used for coating one surface of a base material and comprises a first coating roller and a first coating area, a first ion cleaning device is arranged at an inlet of the first coating roller, a first evaporation source is arranged in the first coating area, and the spraying direction of the first evaporation source faces one surface of the base material; the second coating mechanism is used for coating the other side of the base material and comprises a second coating roller and a second coating area, a second ion cleaning device is arranged at an inlet of the second coating roller, a second evaporation source is arranged in the second coating area, and the spraying direction of the second evaporation source faces to the other side of the base material; the vacuum chamber is also provided with a first electron gun and a second electron gun, the electron beam emitted by the first electron gun faces the first evaporation source, and the electron beam emitted by the second electron gun faces the second evaporation source.
2. The double-sided winding coating machine adopting high-power electron beam evaporation as claimed in claim 1, wherein: the exit of unreeling the roller still is equipped with first book footpath tracking system, and the entrance of wind-up roll still is equipped with the second and rolls up footpath tracking system.
3. The double-sided winding coating machine adopting high-power electron beam evaporation coating of claim 2, characterized in that: the first winding diameter tracking system comprises a first swing frame, a first guide roller, a first power roller and a first fixed roller are arranged on the first swing frame, the first power roller is used for driving the first swing frame to swing, the distance between the first guide roller and a substrate on the unwinding roller is kept consistent, and the substrate coming out of the unwinding roller sequentially passes through the first guide roller, the first power roller and the first fixed roller and enters the first coating roller through the guide roller.
4. The double-sided winding coating machine adopting high-power electron beam evaporation coating of claim 2, characterized in that: the second roll diameter tracking system comprises a second swing frame, a second guide roller, a second power roller and a second fixed roller are arranged on the second swing frame, the second power roller is used for driving the second swing frame to swing in a deflection mode, the distance between the second guide roller and the base material on the winding roller is kept consistent, and the base material coming out of the second coating roller passes through the guide roller, sequentially passes through the second fixed roller, the second power roller and the second guide roller and enters the winding roller.
5. The double-sided winding coating machine adopting high-power electron beam evaporation as claimed in claim 1, wherein: the first evaporation source comprises a first crucible, a coating material is filled in the first crucible, an electron beam emitted by a first electron gun faces the first crucible, and a first water-cooling baffle plate is arranged on the first crucible.
6. The double-sided winding coating machine adopting high-power electron beam evaporation as claimed in claim 1, wherein: the second evaporation source comprises a second crucible, a coating material is filled in the second crucible, an electron beam emitted by the second electron gun faces the second crucible, and a second water-cooling baffle is arranged on the second crucible.
7. The double-sided winding coating machine adopting high-power electron beam evaporation as claimed in claim 1, wherein: the number of the first evaporation sources is at least one, the number of the first electron guns is at least one, and the first evaporation sources correspond to the first electron guns; the number of the second evaporation sources is at least one, the number of the second electron guns is at least one, and the second evaporation sources correspond to the second electron guns.
8. The double-sided winding coating machine adopting high-power electron beam evaporation as claimed in claim 1, wherein: and the first electron gun and the second electron gun are respectively provided with a linear scanning system.
9. The double-sided winding coating machine adopting high-power electron beam evaporation as claimed in claim 1, wherein: the power of the first electron gun and the second electron gun is 20kw-1000 kw.
10. The double-sided winding coating machine adopting high-power electron beam evaporation as claimed in claim 1, wherein: and the first coating area, the second coating area and the vacuum chamber are provided with a partition plate, and gaps for the base materials to pass through are reserved between the partition plate and the first coating roller and between the partition plate and the second coating roller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121418453.8U CN215050645U (en) | 2021-06-24 | 2021-06-24 | Double-sided winding film coating machine adopting high-power electron beam evaporation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202121418453.8U CN215050645U (en) | 2021-06-24 | 2021-06-24 | Double-sided winding film coating machine adopting high-power electron beam evaporation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215050645U true CN215050645U (en) | 2021-12-07 |
Family
ID=79202191
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202121418453.8U Active CN215050645U (en) | 2021-06-24 | 2021-06-24 | Double-sided winding film coating machine adopting high-power electron beam evaporation |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215050645U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115323330A (en) * | 2022-07-19 | 2022-11-11 | 广东腾胜科技创新有限公司 | Electron beam evaporation coating equipment with valve isolation evaporation chamber and winding chamber |
-
2021
- 2021-06-24 CN CN202121418453.8U patent/CN215050645U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115323330A (en) * | 2022-07-19 | 2022-11-11 | 广东腾胜科技创新有限公司 | Electron beam evaporation coating equipment with valve isolation evaporation chamber and winding chamber |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100497728C (en) | Method for depositing magnetic film on flexible substrate | |
| US4692233A (en) | Vacuum coating apparatus | |
| US4767641A (en) | Plasma treatment apparatus | |
| US4693803A (en) | Vacuum coating apparatus | |
| CN215050645U (en) | Double-sided winding film coating machine adopting high-power electron beam evaporation | |
| CN108165949B (en) | Magnetron sputtering winding film plating machine | |
| CN216891172U (en) | Roll-to-roll equipment for electron beam evaporation double-sided coating | |
| CN113265623A (en) | Double-sided winding film coating machine adopting high-power electron beam evaporation | |
| CN108374150B (en) | Vacuum coating equipment | |
| CN112795895A (en) | Vacuum film penetrating mechanism for winding type vacuum film coating machine | |
| CN210886216U (en) | Multi-chamber multi-functional reel-to-reel film coating machine capable of coating multi-layer film in reciprocating mode | |
| CN216891198U (en) | Novel volume to volume vacuum coating equipment of vacuum container structure | |
| CN216006007U (en) | Wire vacuum coating equipment | |
| CN100487156C (en) | Metal plate belt vacuum film coating equipment | |
| CN214572211U (en) | Vacuum film penetrating mechanism for winding type vacuum film coating machine | |
| CN205710901U (en) | Multiple roll single chamber double-side rolling is around filming equipment | |
| CN211367715U (en) | Novel belted steel vacuum coating equipment | |
| CN109930119A (en) | Vacuum coater | |
| CN207418855U (en) | A kind of flexible copper-clad plate winding film plating system of carrying magnetic electrode device | |
| CN2934268Y (en) | Metal plate belt vacuum film coating equipment | |
| CN220564706U (en) | Arc-shaped target magnetron sputtering roll-to-roll double-sided coating equipment | |
| CN110004425B (en) | Winding type ion enhanced magnetic control optical silicon oxide coating device and method | |
| CN218291093U (en) | Double-sided multi-station winding type vacuum coating machine | |
| KR20160116990A (en) | Roll-To-Roll Sputtering System | |
| CN216663226U (en) | Double-sided coating device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |