CN214488078U - Photoetching plate cleaning device - Google Patents
Photoetching plate cleaning device Download PDFInfo
- Publication number
- CN214488078U CN214488078U CN202022159929.2U CN202022159929U CN214488078U CN 214488078 U CN214488078 U CN 214488078U CN 202022159929 U CN202022159929 U CN 202022159929U CN 214488078 U CN214488078 U CN 214488078U
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- CN
- China
- Prior art keywords
- photoetching plate
- photoetching
- cleaning
- plate
- basket
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- 238000001259 photo etching Methods 0.000 title claims abstract description 113
- 238000004140 cleaning Methods 0.000 title claims abstract description 78
- 239000003960 organic solvent Substances 0.000 claims abstract description 23
- 210000003813 thumb Anatomy 0.000 claims abstract description 20
- 238000000206 photolithography Methods 0.000 claims description 13
- 238000005406 washing Methods 0.000 claims description 9
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 20
- 238000000034 method Methods 0.000 abstract description 15
- 239000000428 dust Substances 0.000 abstract description 14
- 239000002245 particle Substances 0.000 abstract description 12
- 238000001459 lithography Methods 0.000 abstract description 5
- 238000004506 ultrasonic cleaning Methods 0.000 abstract description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 238000002508 contact lithography Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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- Cleaning By Liquid Or Steam (AREA)
Abstract
The utility model discloses a photoetching plate cleaning device. The photoetching plate cleaning device comprises a photoetching plate cleaning basket arranged in an organic solvent resistant container, and the photoetching plate cleaning basket comprises a bracket for placing a photoetching plate; the edge of the photoetching plate cleaning flower basket is provided with a thumb groove for taking the photoetching plate. Firstly, placing a photoresist contact surface of a photoetching plate on a bracket of a photoetching plate cleaning basket downwards; then, putting the photoetching plate cleaning basket into an organic solvent resistant container filled with an organic solvent; and finally, putting the organic solvent resistant container, the photoetching plate and the photoetching plate cleaning basket into an ultrasonic cleaning machine for cleaning. The utility model relates to a simple structure, easy operation can be at centre gripping lithography plate under the prerequisite of contactless container, and the lithography plate use face can be put into down, can reduce the photoresist residue that has broken away from in the cleaning process, dust particle fall back to the lithography plate surface and produce secondary pollution's probability, improve the lithography plate life-span.
Description
Technical Field
The utility model relates to a photoetching board belt cleaning device belongs to and receives processing technology field a little.
Background
The micro-nano processing technology is an optimized design, processing, assembly, system integration and application technology of sub-millimeter, micron and nano-scale elements and components or systems formed by the elements, is an important component of advanced manufacturing, is one of marks for measuring the high-end manufacturing level of the state, has the characteristics of multidisciplinary intersection and extreme manufacturing elements, and plays a key role in promoting technological progress, promoting industrial development, pulling technological progress, ensuring national defense safety and the like. In the micro-processing technology, because each element and connecting wire in the integrated circuit are very fine and can reach the level of micron or even nanometer, if the integrated circuit is polluted by dust particles, metal and organic matters in the manufacturing process, the functions of the circuit in the chip are easily damaged, short circuit or open circuit is formed, the failure of the integrated circuit is caused, and the formation of geometric characteristics is influenced, so that in the chip processing process of the integrated circuit, besides the cleanliness of the process room is ensured, external pollution sources are eliminated, and pollution sources from containers and devices which are in contact with the wafer also need to be eliminated. At present, a contact lithography is generally used in a laboratory level lithography process, and since a reticle is in direct contact with a photoresist on a wafer during the contact lithography, the used reticle carries a certain amount of photoresist residues, dust particles and the like, and in order to prevent an integrated circuit from being failed and a geometry from being damaged, the reticle subjected to the contact lithography needs to be carefully cleaned. At present, the most common method is to clean the photolithography mask by a wet process, i.e. organic solvents such as acetone and isopropanol are used to clean the photoresist residues and dust particles on the photolithography mask, however, the laboratory-level photolithography mask cleaning usually directly sprays acetone on the surface of the photolithography mask to clean the photoresist residues; then spraying isopropanol on the surface of the photoetching plate for cleaning residual acetone solvent; and finally, drying by using nitrogen. Although the scheme is simple and easy to operate, photoresist residues and dust particles on the surface of the photoetching plate are difficult to completely remove, and the circuit structure of the chip is directly seriously affected by the polluted photoetching plate, so that the chip is affected and even made to lose efficacy, and therefore, the seriously polluted photoetching plate can only be discarded because the seriously polluted photoetching plate cannot reach the performance standard of the chip, and the service life of the photoetching plate is seriously shortened.
SUMMERY OF THE UTILITY MODEL
The utility model discloses the technical problem that will solve is: the technical problem that a proper photoetching plate cleaning device is lacked in the photoetching plate cleaning process at present.
In order to solve the above problem, the utility model discloses the technical scheme who takes is: the photoetching plate cleaning device is characterized by comprising a photoetching plate cleaning basket arranged in an organic solvent resistant container, wherein the photoetching plate cleaning basket comprises a bracket for placing a photoetching plate; in order to conveniently grab the photoetching plate, at least one thumb groove for taking the photoetching plate is arranged at the edge of the photoetching plate cleaning basket, and in order to better and conveniently take the photoetching plate, the depth of the thumb groove is 2-3 mm lower than the bottom surface of the support; in order to conveniently move the photoetching plate to clean the flower basket, a handle of the photoetching plate cleaning flower basket is arranged in the direction vertical to the thumb groove. The matched organic solvent resistant container is usually made of Teflon material, so that no metal pollutant is additionally introduced in the cleaning process of the photoetching plate.
Preferably, in order to bear the photoetching plate and reduce the pollution caused by contacting the photoetching plate, the width of the photoetching plate support is 2-3 mm, and the thickness of the photoetching plate support is 2-5 mm. Because the edge of the photoetching plate is not provided with patterns, the support with the width of 2-3 mm can not abrade the photoetching plate when contacting the photoetching plate, and can ensure that the part of the photoetching plate containing the photoetching patterns can be cleaned by 100%.
More preferably, the bottom surface of the support is not less than 5mm away from the bottom of the reticle cleaning basket in order to allow sufficient space for photoresist residues and dust particles to fall off the reticle into the organic solvent, thereby reducing the probability of the photoresist residues and dust particles falling back onto the reticle.
Preferably, in order to conveniently grab the photoetching plate, thumb grooves are arranged at two sides of the photoetching plate cleaning flower basket; in order to reduce the grabbing difficulty of the photoetching plate to the maximum extent, the depth of the thumb groove is 2-3 mm lower than the bottom surface of the support.
Preferably, the thumb groove is rectangular and square in shape, and the width of the thumb groove is larger than that of the thumb.
Preferably, in order to conveniently move the photoetching plate cleaning basket, a handle is arranged on the photoetching plate cleaning basket, and in order to facilitate operation, the handle is vertical to the direction of the thumb groove; the handle is connected with the photoetching plate cleaning flower basket through a screw or directly integrated with the photoetching plate cleaning flower basket.
More preferably, the cross-section of the handle is square, polygonal or circular.
Preferably, in order to reduce the photoresist residues and dust particles from being cleaned to fall back to the photoetching plate again to the maximum extent, the bottom of the photoetching plate cleaning flower basket is of a hollow structure; the peripheral frame shape of the hollow part of the hollow structure is square, polygonal or circular.
Preferably, the bottom of the photoetching plate cleaning flower basket is of a hollow structure.
Preferably, in order to prevent other pollutants from being introduced, the material of the photoetching plate cleaning device is teflon and organic plastic resistant.
The use method of the photoetching plate cleaning device comprises the following steps: firstly, placing a photoresist contact surface of a photoetching plate on a bracket of a photoetching plate cleaning basket downwards through a thumb groove; pouring an organic solvent into an organic solvent resistant container, then putting the photoetching plate cleaning basket loaded with the photoetching plate into the organic solvent resistant container through a handle, and ensuring that the whole photoetching plate is soaked in the organic solvent; and putting the organic solvent resistant container, the photoetching plate and the photoetching plate cleaning basket into an ultrasonic cleaning machine for ultrasonic cleaning. The contact surface of the photoresist of the photoetching plate is arranged downwards, which is beneficial to the photoresist residues and dust particles to fall into the organic solvent.
Preferably, the photolithography plate is washed with acetone, and then the acetone reagent on the photolithography plate is washed with isopropanol or ethanol; and drying the cleaned photoetching plate by using nitrogen or drying the photoetching plate by using a drying machine.
The ultrasonic cleaning machine is used for assisting in cleaning the photoetching plate, and the ultrasonic vibration can help photoresist residues and dust particles on the photoetching plate to fall into an organic solvent, so that the photoetching plate is cleaned to the maximum extent, the time for cleaning the photoetching plate is shortened, and the working efficiency is improved.
The utility model provides a photoetching board cleaning method can be at centre gripping photoetching board under the prerequisite of contactless solvent container, puts into the washing container with photoetching board use face down and washs to can reduce the photoresist residue that has broken away from in the cleaning process, dust particle etc. fall back to photoetching board surface and produce secondary pollution's probability.
Compared with the prior art, the utility model discloses following beneficial effect has:
1. the utility model provides a photoetching plate cleaning device, which solves the problem that a laboratory has no related cleaning device; meanwhile, the corrosivity of organic solvents such as acetone and isopropanol is considered, the hand grips and the thumb grooves lower than the photoetching plate support are added, so that the operator is effectively protected, the operability is improved to the maximum extent, and the practicability is high. Meanwhile, the device is simple in design, easy to process and low in manufacturing cost.
2. The utility model discloses traditional photoetching board cleaning methods has been changed, can put into the washing container with the face down of photoetching board contact photoresist under the prerequisite of contactless container to can reduce and fall back to the surface once more and produce secondary pollution's probability at photoetching board cleaning process photoresist residue, dust granule etc. that have broken away from the surface.
3. The utility model relates to a photoetching board belt cleaning device bottom hollow structure can prevent photoetching board contact container bottom, can effectual reduction from contact container such as photoetching board surface break away from at the bottom of the back contact container such as photoresist residue, dust granule fall back to the surface once more and produce secondary pollution's probability.
4. The utility model relates to a photoetching board belt cleaning device's photoetching board places the support and is greater than 5mm apart from the distance of container bottom, has increased the distance between photoetching board and the container bottom, can effectual reduction from photoetching board surface break away from photoresist residue, dust particle etc. fall back to the surface once more and produce secondary pollution's probability.
5. The utility model discloses cooperation ultrasonic cleaner uses, can furthest's cleaing away the residue on the photoetching board to furthest's washing photoetching board, and shorten the time of wasing the photoetching board, improve work efficiency, and improve the life of photoetching board.
6. The utility model is suitable for an all technologies that need wash the photoetching board in the processing field are received to the declining, have extensive commonality.
Drawings
Fig. 1 is a schematic structural view of a photolithography plate cleaning apparatus provided in the present invention;
FIG. 2 is a schematic structural view of a cleaning basket for a photolithography plate;
FIG. 3 is a schematic structural view of a reticle cleaning basket loaded with a reticle;
FIG. 4 is a hollow structure of the bottom of the reticle cleaning basket;
FIG. 5 is a hollow structure of the bottom of the light-etched plate cleaning basket.
Detailed Description
In order to make the present invention more comprehensible, preferred embodiments are described in detail below with reference to the accompanying drawings.
Examples
As shown in fig. 1-3, the device for cleaning a photolithography mask provided by the present invention comprises a photolithography mask cleaning basket disposed in an organic solvent-resistant container 5, wherein the photolithography mask cleaning basket comprises a support 3 for placing a photolithography mask; the edge symmetry that the photoetching board washd the basket of flowers is equipped with two thumb grooves 2 that are used for taking the photoetching board, and the degree of depth in thumb groove 2 is less than 2 ~ 3mm of the bottom surface of support 3.
The width of support 3 is 2 ~ 3mm, and thickness is 2 ~ 5 mm. The thumb groove 2 is rectangular and square.
The handle 1 is arranged on the photoetching plate cleaning flower basket, and the handle 1 is fixedly connected with the photoetching plate cleaning flower basket through a screw or is integrated with the photoetching plate cleaning flower basket into a whole. The cross section of the handle 1 is square, rectangular or round.
The interior of the photoetching plate cleaning flower basket is of a hollow structure (shown in figure 5) or a hollow structure (shown in figure 4); the peripheral frame of the hollow part of the hollow structure is square, rectangular or circular. The distance between the bottom surface of the bracket 3 and the bottom of the photoetching plate cleaning flower basket is not less than 5 mm.
The material of the photoetching plate cleaning device is Teflon and organic plastic.
The use method of the photoetching plate cleaning device comprises the following steps: firstly, placing a photoresist contact surface of a photoetching plate 4 downwards on a bracket 3 of a photoetching plate cleaning basket through a thumb groove 2; pouring an organic solvent into the organic solvent resistant container 5, then putting the photoetching plate cleaning basket loaded with the photoetching plate 4 into the organic solvent resistant container 5, and ensuring that the whole photoetching plate 4 is soaked in the organic solvent; and putting the organic solvent resistant container 5, the photoetching plate and the photoetching plate cleaning basket into an ultrasonic cleaning machine for cleaning. The photoetching plate 4 is firstly cleaned by acetone and then cleaned again by isopropanol or ethanol; the cleaned reticle 4 is dried by nitrogen or dried by a drier.
Claims (9)
1. The device for cleaning the photoetching plate is characterized by comprising a photoetching plate cleaning basket arranged in an organic solvent resistant container (5), wherein the photoetching plate cleaning basket comprises a support (3) for placing the photoetching plate; the edge of the photoetching plate cleaning basket is provided with at least one thumb groove (2) for taking the photoetching plate, and the depth of the thumb groove (2) is lower than the bottom surface of the support (3).
2. The cleaning device for the photolithography plate according to claim 1, wherein the depth of the thumb groove (2) is 2 to 3mm lower than the bottom surface of the holder (3); the width of the support (3) is 2-3 mm, and the thickness is 2-5 mm.
3. A reticle cleaning device according to claim 1, characterized in that the thumb well (2) is rectangular in shape.
4. The cleaning device for the reticle defined in claim 1 wherein the reticle cleaning basket is provided with a handle (1), the handle (1) is connected and fixed with the reticle cleaning basket by screws or is integrated with the reticle cleaning basket.
5. A reticle cleaning device according to claim 4, characterized in that the cross-section of the handle (1) is polygonal or circular.
6. The reticle washing apparatus of claim 1, wherein the bottom of the reticle washing basket is hollow; the peripheral frame shape of the hollow part of the hollow structure is a polygon.
7. The reticle washing apparatus of claim 1, wherein the bottom of the reticle washing basket is hollow.
8. The reticle washing apparatus according to claim 6 or 7, characterized in that the bottom surface of the holder (3) is not less than 5mm from the bottom of the reticle washing basket.
9. The reticle cleaning apparatus of claim 1, wherein the reticle cleaning apparatus is made of an organic-resistant plastic.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022159929.2U CN214488078U (en) | 2020-09-27 | 2020-09-27 | Photoetching plate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022159929.2U CN214488078U (en) | 2020-09-27 | 2020-09-27 | Photoetching plate cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214488078U true CN214488078U (en) | 2021-10-26 |
Family
ID=78196630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202022159929.2U Active CN214488078U (en) | 2020-09-27 | 2020-09-27 | Photoetching plate cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214488078U (en) |
-
2020
- 2020-09-27 CN CN202022159929.2U patent/CN214488078U/en active Active
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| GR01 | Patent grant | ||
| GR01 | Patent grant |