CN213739666U - Compound multi-functional two-sided winding coating machine - Google Patents
Compound multi-functional two-sided winding coating machine Download PDFInfo
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- CN213739666U CN213739666U CN202022594812.7U CN202022594812U CN213739666U CN 213739666 U CN213739666 U CN 213739666U CN 202022594812 U CN202022594812 U CN 202022594812U CN 213739666 U CN213739666 U CN 213739666U
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Abstract
The utility model relates to the technical field of vacuum coating equipment, in particular to a composite multifunctional double-sided winding coating machine, which comprises a vacuum container, wherein a winding and unwinding chamber, a first coating mechanism and a second coating mechanism are arranged in the vacuum container; the first film coating mechanism comprises a first film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the first film coating roller; the second film coating mechanism comprises a second film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the second film coating roller; an unwinding roller, a first guide roller, a second guide roller and a winding roller are arranged in the winding and unwinding chamber, and the film base material coming out of the unwinding roller sequentially passes through the first guide roller, the first coating roller, the second guide roller and the winding roller. The utility model discloses a composite coating film function and the continuous two-sided coating film of film substrate of magnetron sputtering coating film and evaporation coating film's function have improved the quality and the production efficiency of coating film.
Description
Technical Field
The utility model relates to a vacuum coating equipment technical field, concretely relates to compound multi-functional two-sided winding coating machine.
Background
At present, the flexible material is generally coated on one side by adopting a single mode of evaporation coating or sputtering coating and the like. The evaporation coating is a deposition film forming by heating and gasifying a coating material in a vacuum state, and has the advantages of high coating speed, high efficiency, high process temperature, low yield and poor coating uniformity and bonding force. The sputtering coating is a coating formed by bombarding target material sputtering material particles by glow discharge ionized gas, has good coating stability, good uniformity and compact coating, but has slow coating efficiency and low productivity, and can not meet the requirement of high-efficiency production. The single film coating mode and the single-side film coating mode are adopted, so that the film coating quality and the production efficiency are not improved.
SUMMERY OF THE UTILITY MODEL
To the technical problem who exists among the prior art, the utility model aims at: the composite multifunctional double-sided winding film coating machine can realize the combination of magnetron sputtering film coating and evaporation film coating for film coating, can realize the continuous double-sided film coating of a film substrate, and improves the film coating quality and the production efficiency.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
a composite multifunctional double-sided winding coating machine comprises a vacuum container, wherein a winding and unwinding chamber for winding a film substrate, a first coating mechanism for coating one side of the film substrate and a second coating mechanism for coating the other side of the film substrate are arranged in the vacuum container; the first film coating mechanism comprises a first film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the first film coating roller; the second film coating mechanism comprises a second film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the second film coating roller; an unwinding roller, a first guide roller, a second guide roller and a winding roller are arranged in the winding and unwinding chamber, a film substrate coming out of the unwinding roller sequentially passes through the first guide roller, the first coating roller, the second guide roller and the winding roller, magnetic control targets are arranged in the sputtering coating area, and an evaporation source is arranged in the evaporation coating area.
Further, the first film coating mechanism comprises a first film coating roller, and a first sputtering film coating area, a first evaporation film coating area and a second sputtering film coating area are sequentially arranged along the circumferential direction of the first film coating roller; the second film coating mechanism comprises a second film coating roller, and a third sputtering film coating area, a second evaporation film coating area and a fourth sputtering film coating area are sequentially arranged along the circumferential direction of the second film coating roller.
Furthermore, a partition air-separating device is arranged between the winding and unwinding chamber and the first sputtering coating area, between the first sputtering coating area and the first evaporation coating area, between the first evaporation coating area and the second sputtering coating area, between the second sputtering coating area and the winding and unwinding chamber, between the winding and unwinding chamber and the third sputtering coating area, between the third sputtering coating area and the second evaporation coating area, between the second evaporation coating area and the fourth sputtering coating area, and between the fourth sputtering coating area and the winding and unwinding chamber, and gaps for the thin film base materials to pass through are reserved between the partition air-separating device and the first coating roller and between the partition air-separating device and the second coating roller.
Furthermore, the winding and unwinding chamber, the first sputtering coating area, the first evaporation coating area, the second sputtering coating area, the third sputtering coating area, the second evaporation coating area and the fourth sputtering coating area are all provided with a vacuum air pumping unit.
Furthermore, a vacuum measuring system is arranged on the vacuum container.
Further, the working vacuum degree of the first evaporation coating area and the second evaporation coating area is 9 multiplied by 10-2Pa-1×10-3Pa。
Furthermore, the working vacuum degree of the first sputtering coating area, the second sputtering coating area, the third sputtering coating area and the fourth sputtering coating area is 1 multiplied by 10-1Pa-1Pa。
Further, the evaporation source is a resistance heating evaporation source, an induction heating evaporation source, an electron beam heating evaporation source or a strip linear evaporation source.
Furthermore, the magnetic control target is a plane magnetic control target or a cylinder magnetic control target.
Further, the shape of the vacuum container is square, cylindrical or any other shape.
In general, the utility model has the advantages as follows:
1. the utility model realizes the composite coating function of magnetron sputtering coating, evaporation coating and magnetron sputtering coating by adopting the mode of combining the sputtering coating area, the evaporation coating area and the sputtering coating area, and solves the problem of single-mode coating; and two coating rollers are adopted, so that the function of continuous double-sided coating of the film base material is realized, and the problem of single-sided coating is solved. The utility model discloses have sputter coating and evaporation coating concurrently to can realize the continuous two-sided coating film of film substrate, show the homogeneity that has improved the coating film and the adhesive force of rete, reduce the temperature of processing procedure simultaneously by a wide margin, improve the quality of product, improve production efficiency and product percent of pass.
2. The utility model discloses a receive and release room, first coating mechanism and second coating mechanism and all be located same vacuum vessel, improved the space utilization of equipment.
3. The utility model discloses a set up the subregion and separate the gas device, ensure that each district can not influence ground work each other, exert respective advantage separately, realize the multilayer coating film of many districts, improve production efficiency.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
Wherein: the device comprises a vacuum container 1, a winding and unwinding chamber 2, a first coating roller 3, a second coating roller 4, a first sputtering coating area 5, a first evaporation coating area 6, a second sputtering coating area 7, a third sputtering coating area 8, a second evaporation coating area 9, a fourth sputtering coating area 10, a winding roller 11, a winding roller 12, a first guide roller 13, a second guide roller 14, a winding roller 15, a magnetron target 16, an evaporation source 17, a partition gas isolation device 17, a vacuum air extractor 18 and a vacuum measurement system 19.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
As shown in fig. 1, a composite multifunctional double-sided winding coating machine comprises a vacuum container, wherein a winding and unwinding chamber for winding a film substrate, a first coating mechanism for coating one side of the film substrate, and a second coating mechanism for coating the other side of the film substrate are arranged in the vacuum container; the first film coating mechanism comprises a first film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the first film coating roller; the second film coating mechanism comprises a second film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the second film coating roller; an unwinding roller, a first guide roller, a second guide roller and a winding roller are arranged in the winding and unwinding chamber, a film substrate coming out of the unwinding roller sequentially passes through the first guide roller, the first coating roller, the second guide roller and the winding roller, magnetic control targets are arranged in the sputtering coating area, and an evaporation source is arranged in the evaporation coating area.
As shown in fig. 1, in the present embodiment, the first coating mechanism includes a first coating roller, and a first sputter coating region, a first evaporation coating region, and a second sputter coating region are provided in this order along a circumferential direction of the first coating roller; the second film coating mechanism comprises a second film coating roller, and a third sputtering film coating area, a second evaporation film coating area and a fourth sputtering film coating area are sequentially arranged along the circumferential direction of the second film coating roller.
As shown in fig. 1, a partitioning air-separating device is arranged between the winding and unwinding chamber and the first sputtering coating region, between the first sputtering coating region and the first evaporation coating region, between the first evaporation coating region and the second sputtering coating region, between the second sputtering coating region and the winding and unwinding chamber, between the winding and unwinding chamber and the third sputtering coating region, between the third sputtering coating region and the second evaporation coating region, between the second evaporation coating region and the fourth sputtering coating region, and between the fourth sputtering coating region and the winding and unwinding chamber, and gaps for the thin film base materials to pass through are reserved between the partitioning air-separating device and the first coating roller and the second coating roller. A partition gas-isolating device is arranged between the two adjacent spaces, so that each space forms a relatively closed environment and is not influenced by other spaces, and the stability of the coating is ensured; gaps are reserved between the partition gas-isolating device and the first coating roller and between the partition gas-isolating device and the second coating roller, so that the film base material can conveniently pass through each partition to complete the coating process.
As shown in fig. 1, the winding and unwinding chamber, the first sputtering coating region, the first evaporation coating region, the second sputtering coating region, the third sputtering coating region, the second evaporation coating region, and the fourth sputtering coating region are all provided with a vacuum air extractor set. The winding and unwinding chamber and each area are provided with a vacuum air pumping unit, so that different working vacuum degrees and working atmospheres in different spaces can be guaranteed.
As shown in fig. 1, a vacuum measurement system is disposed on the vacuum container to measure the pressure value in the vacuum container. The shape of the vacuum container is square, cylindrical or any other shape.
The temperature range of the evaporation source is 300-5000 ℃, the working vacuum degree of the first evaporation coating area and the second evaporation coating area is 9 multiplied by 10-2Pa-1×10-3Pa。
The working vacuum degree of the first sputtering coating area, the second sputtering coating area, the third sputtering coating area and the fourth sputtering coating area is 1 multiplied by 10-1Pa-1Pa。
The spraying direction of the evaporation source faces the film base material, and the evaporation source is a resistance heating evaporation source, an induction heating evaporation source, an electron beam heating evaporation source or a strip linear evaporation source.
The sputtering direction of the magnetron targets faces to the film substrate, the magnetron targets are planar magnetron targets or cylindrical magnetron targets, the number of the magnetron targets in each sputtering coating area is 1 or more than 1, and the power supply of the magnetron targets is a direct current power supply, a medium frequency power supply or a radio frequency power supply.
The working principle of the utility model is as follows:
the film substrate comes out of the unwinding roller and passes through the first guide roller and the first coating roller, when passing through the first coating roller, the film substrate enters the first sputtering coating area, the magnetron target in the first sputtering coating area can plate a first layer film on one surface of the film substrate, then the film substrate enters the first evaporation coating area, the evaporation source in the first evaporation coating area can plate a second layer film on one surface of the film substrate, then the film substrate enters the second sputtering coating area, the magnetron target in the second sputtering coating area can plate a third layer film on one surface of the film substrate, and thus the composite coating on one surface of the film substrate is completed; then the film substrate passes through a second coating roller, one surface of the film substrate coated with three films is tightly attached to the second coating roller, the other surface of the film substrate which is not coated is exposed outside, when the film substrate passes through the second coating roller, the film substrate enters a third sputtering coating area, a magnetron target in the third sputtering coating area can coat the first film on the other surface of the film substrate, then the film substrate enters a second evaporation coating area, an evaporation source in the second evaporation coating area can coat the second film on the other surface of the film substrate, then the film substrate enters a fourth sputtering coating area, and a magnetron target in the fourth sputtering coating area can coat the third film on the other surface of the film substrate, so that the composite coating on the other surface of the film substrate is finished; and then the film substrate is wound by a second guide roller and a winding roller to complete the continuous double-sided composite coating process.
In general, the utility model realizes the composite coating function of magnetron sputtering coating, evaporation coating and magnetron sputtering coating by adopting the combination of the sputtering coating area, the evaporation coating area and the sputtering coating area, and solves the problem of single-mode coating; and two coating rollers are adopted, so that the function of continuous double-sided coating of the film base material is realized, and the problem of single-sided coating is solved. The utility model discloses have sputter coating and evaporation coating concurrently to can realize the continuous two-sided coating film of film substrate, show the homogeneity that has improved the coating film and the adhesive force of rete, reduce the temperature of processing procedure simultaneously by a wide margin, improve the quality of product, improve production efficiency and product percent of pass. The utility model discloses a receive and release room, first coating mechanism and second coating mechanism and all be located same vacuum vessel, improved the space utilization of equipment. The utility model discloses a set up the subregion and separate the gas device, ensure that each district can not influence ground work each other, exert respective advantage separately, realize the multilayer coating film of many districts, improve production efficiency.
The above embodiments are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be equivalent replacement modes, and all are included in the scope of the present invention.
Claims (10)
1. The utility model provides a compound multi-functional two-sided winding coating machine which characterized in that: the device comprises a vacuum container, wherein a winding and unwinding chamber for winding a film substrate, a first film coating mechanism for coating one surface of the film substrate and a second film coating mechanism for coating the other surface of the film substrate are arranged in the vacuum container; the first film coating mechanism comprises a first film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the first film coating roller; the second film coating mechanism comprises a second film coating roller, and at least one sputtering film coating area and one evaporation film coating area are arranged along the circumferential direction of the second film coating roller; an unwinding roller, a first guide roller, a second guide roller and a winding roller are arranged in the winding and unwinding chamber, a film substrate coming out of the unwinding roller sequentially passes through the first guide roller, the first coating roller, the second guide roller and the winding roller, magnetic control targets are arranged in the sputtering coating area, and an evaporation source is arranged in the evaporation coating area.
2. The compound multifunctional double-sided winding coating machine of claim 1, characterized in that: the first film coating mechanism comprises a first film coating roller, and a first sputtering film coating area, a first evaporation film coating area and a second sputtering film coating area are sequentially arranged along the circumferential direction of the first film coating roller; the second film coating mechanism comprises a second film coating roller, and a third sputtering film coating area, a second evaporation film coating area and a fourth sputtering film coating area are sequentially arranged along the circumferential direction of the second film coating roller.
3. The compound multifunctional double-sided winding coating machine of claim 2, characterized in that: the winding and unwinding device comprises a winding and unwinding chamber, a winding and unwinding chamber and a winding and unwinding chamber, wherein the winding and unwinding chamber is provided with a first film coating roller and a second film coating roller, the winding and unwinding chamber is provided with a winding and unwinding chamber, the winding and unwinding chamber is provided with a first film coating roller and a second film coating roller, and the winding and unwinding chamber is provided with a winding and unwinding chamber.
4. The compound multifunctional double-sided winding coating machine of claim 2, characterized in that: and the winding and unwinding chamber, the first sputtering coating area, the first evaporation coating area, the second sputtering coating area, the third sputtering coating area, the second evaporation coating area and the fourth sputtering coating area are all provided with a vacuum air pumping unit.
5. The compound multifunctional double-sided winding coating machine of claim 1, characterized in that: the vacuum container is provided with a vacuum measuring system.
6. The compound multifunctional double-sided winding coating machine of claim 2, characterized in that: the working vacuum degree of the first evaporation coating area and the second evaporation coating area is 9 multiplied by 10-2Pa-1×10-3Pa。
7. The compound multifunctional double-sided winding coating machine of claim 2, characterized in that: the working vacuum degree of the first sputtering coating area, the second sputtering coating area, the third sputtering coating area and the fourth sputtering coating area is 1 multiplied by 10-1Pa-1Pa。
8. The compound multifunctional double-sided winding coating machine of claim 1, characterized in that: the evaporation source is a resistance heating evaporation source, an induction heating evaporation source, an electron beam heating evaporation source or a strip linear evaporation source.
9. The compound multifunctional double-sided winding coating machine of claim 1, characterized in that: the magnetic control target is a plane magnetic control target or a cylinder magnetic control target.
10. The compound multifunctional double-sided winding coating machine of claim 1, characterized in that: the shape of the vacuum container is square, cylindrical or any other shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022594812.7U CN213739666U (en) | 2020-11-11 | 2020-11-11 | Compound multi-functional two-sided winding coating machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202022594812.7U CN213739666U (en) | 2020-11-11 | 2020-11-11 | Compound multi-functional two-sided winding coating machine |
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| CN213739666U true CN213739666U (en) | 2021-07-20 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114525491A (en) * | 2022-02-28 | 2022-05-24 | 广东腾胜科技创新有限公司 | Roll-to-roll vacuum coating equipment and coating method for novel vacuum container structure |
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2020
- 2020-11-11 CN CN202022594812.7U patent/CN213739666U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114525491A (en) * | 2022-02-28 | 2022-05-24 | 广东腾胜科技创新有限公司 | Roll-to-roll vacuum coating equipment and coating method for novel vacuum container structure |
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