CN213708477U

CN213708477U - Local air supply adjustable glow discharge device of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment

Info

Publication number: CN213708477U
Application number: CN202022066274.4U
Authority: CN
Inventors: 陈特超; 曾武杨; 唐电; 杨彬; 杨志权
Original assignee: Hunan Red Sun Photoelectricity Science and Technology Co Ltd
Current assignee: Hunan Red Sun Photoelectricity Science and Technology Co Ltd
Priority date: 2020-09-18
Filing date: 2020-09-18
Publication date: 2021-07-16
Anticipated expiration: 2030-09-18

Abstract

The utility model discloses a flat PECVD equipment's local adjustable glow discharge device of supplying gas, including last electrode plate, lower electrode plate and the mechanism of supplying gas, the reaction chamber comprises chamber lid and cavity, it installs on the chamber lid to go up the electrode plate, the bottom plate of cavity is located to the lower electrode plate, it includes end box and a plurality of main line to go up the electrode plate, the lower terminal surface of end box is for spraying the board, a plurality of main lines are the matrix and distribute the up end at end box, send quick-witted mechanism to include a plurality of subassemblies of supplying gas, subassembly and main line one-to-one of supplying gas, the subassembly of supplying gas is including supplying gas the branch pipe and locating flowmeter and the control valve on the branch pipe of supplying gas, the branch pipe of supplying gas is connected with the main line that corresponds. The utility model discloses to send the mechanism to fall into multiunit branch road of sending gas, through flowmeter and control valve regulation local area's air inlet rate, air current size, the gas quantity of electrode plate on the equilibrium, the coating film speed that realizes the reacting chamber keeps unanimous, can increase substantially the homogeneity of coating film, and then improved the conversion efficiency of battery greatly.

Description

Local air supply adjustable glow discharge device of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment

Technical Field

The utility model relates to a solar cell prepares the field, especially relates to a local adjustable glow discharge device of supplying gas of flat PECVD equipment.

Background

The tunnel oxide passivation contact (TOPCon) has the characteristics of remarkably reduced interface recombination, higher filling factor, higher conversion efficiency and the like, is developed rapidly, becomes a research hotspot of a novel passivation technology, and is widely applied to monocrystalline silicon solar cells, polycrystalline silicon solar cells and the like.

The flat plate type PECVD comprises: the method has the advantages of low requirement on deposition temperature, high deposition rate, stability and controllability, good stability of film forming uniformity, fewer pinholes, difficult cracking and the like, and is widely applied to the industrial production of preparing TOPCon batteries.

The existing flat plate type PECVD mainly comprises a reaction chamber, an upper electrode plate, a lower electrode plate and the like, a parallel flat plate type structure is adopted, the upper electrode plate and the lower electrode plate form plasma through glow discharge under the vacuum condition, the productivity is required to be large, the energy consumption is low, in order to meet the requirement of large productivity, a mode of increasing the sheet loading amount once can only be adopted, the sheet loading amount is increased, the area of the electrode plate needs to be increased, the discharge uniformity of the electrode plate can not well meet the requirement of a TOPCon battery, the local plasma density is low, the glow uniformity is poor, the battery conversion efficiency is low, the area of the electrode plate is large, the power supply leading-in point position is single, the electric field distribution on the electrode plate is uneven, the glow uniformity is influenced, the current flat plate type PECVD equipment can not well meet the requirements.

SUMMERY OF THE UTILITY MODEL

The to-be-solved technical problem of the utility model is to overcome the not enough of prior art, provide one kind and can increase substantially the homogeneity of coating film, and then improved the local of the flat PECVD equipment of the conversion efficiency of battery and supplied gas adjustable glow discharge device greatly.

In order to solve the technical problem, the utility model discloses a following technical scheme:

the utility model provides a local adjustable glow discharge device of supplying gas of flat PECVD equipment, includes last electrode plate, lower electrode plate and the mechanism of supplying gas, go up electrode plate and lower electrode plate interval and set up in the reaction chamber of PECVD equipment, the reaction chamber comprises chamber lid and cavity, it installs on the chamber lid to go up the electrode plate, the electrode plate is located on the bottom plate of cavity down, it includes end box and a plurality of main lines to go up the electrode plate, the lower terminal surface of end box is for spraying the board, a plurality of main lines are the matrix and distribute at the up end of end box, and each main line upwards extends to outside the chamber lid, the mechanism of supplying gas includes a plurality of subassemblies of supplying gas, subassembly and main line one-to-one, the subassembly of supplying gas is including supplying gas branch pipe and locating flowmeter and the control valve on the branch pipe of supplying gas, the branch pipe of supplying gas is connected with the main line that corresponds.

As a further improvement of the technical scheme, a flow equalizing plate is arranged in the bottom box, and a plurality of uniformly distributed flow equalizing holes are formed in the flow equalizing plate.

As a further improvement of the technical scheme, the flow equalizing plate is vertically and adjustably arranged in the bottom box.

As a further improvement of the technical scheme, the axis of the uniform flow hole and the axis of the main pipeline are staggered.

As a further improvement of the above technical solution, the air supply branch pipe is an insulated pipe having a function of blocking electrical contact between the main pipe and the air supply mechanism.

As a further improvement of the technical scheme, cavity cover flanges are arranged at two ends of the cavity cover, the bottom box is arranged between the two cavity cover flanges, and the bottom surface of the spraying plate is flush with the bottom surfaces of the cavity cover flanges.

As a further improvement of the technical scheme, a plurality of electrode binding posts are distributed on the upper end face of the bottom box, the electrode binding posts are all connected with a matching circuit, and the matching circuit is connected with a power supply.

As a further improvement of the technical scheme, the bottom box is arranged on the cavity cover through a support column, the upper end of the support column penetrates through the cavity cover, the lower end of the support column is fixedly connected with the bottom box, and the support column is insulated from the cavity cover through an insulating sleeve.

As a further improvement of the technical scheme, a vacuum insulating plate is arranged between the bottom box and the cavity cover and sleeved on the support column; and a vacuum sealing ring is arranged between the vacuum insulating plate and the cavity cover and between the vacuum insulating plate and the bottom box.

As a further improvement of the technical scheme, the lower electrode plate is a load plate, and the load plate is communicated with the cavity bottom plate through a plurality of copper strips.

Compared with the prior art, the utility model has the advantages of:

(1) the utility model discloses a local gas supply adjustable glow discharge device of flat PECVD equipment, through dividing into the mechanism of supplying gas into multiunit branch road of supplying gas, according to the homogeneity of coating film, can adjust the inlet velocity and the local air current size of local region through flowmeter and control valve, the balanced upper electrode plate intermediate position gas volume is greater than marginal gas volume, realizes that the coating film rate of whole reacting chamber keeps unanimous, can improve the homogeneity of coating film by a wide margin, and then has improved the conversion efficiency of battery greatly; meanwhile, the multiple groups of air supply branches can simplify the equipment types, reduce the later maintenance cost and reduce the manufacturing cost of the equipment.

(2) The utility model discloses a local of flat PECVD equipment send gas adjustable glow discharge device introduces the uniform flow board in the upper electrode board, can promote the homogeneity of gas in electrode subassembly, promotes gaseous ionization rate, and then the homogeneity of lifting means coating film.

(3) The utility model discloses a flat PECVD equipment's local adjustable glow discharge device of supplying gas adopts the mode that low-power and electrode subassembly are single to be matchd, can be equipped with many connecting wire, improves the homogeneity of electron on the plate electrode, improves the effective utilization ratio of power.

Drawings

Fig. 1 is a schematic structural diagram of the present invention.

Fig. 2 is a schematic structural view between the upper electrode plate and the chamber cover in the present invention.

Fig. 3 is a schematic structural view of the upper electrode plate of the present invention.

Fig. 4 is a plan view of the upper electrode plate of the present invention.

The reference numerals in the figures denote:

1. an upper electrode plate; 101. an air supply chamber; 102. a flow homogenizing chamber; 11. a bottom case; 12. a main pipeline; 13. a spray plate; 131. spraying a hole; 14. a flow homogenizing plate; 141. flow homogenizing holes; 15. an electrode terminal; 2. a lower electrode plate; 3. an air supply mechanism; 31. an air supply assembly; 311. an air supply branch pipe; 312. a flow meter; 313. a control valve; 4. a reaction chamber; 5. a chamber cover; 51. a cavity cover flange; 6. a cavity; 61. a matching circuit; 62. a power source; 71. a support pillar; 72. an insulating sleeve; 73. a vacuum insulation plate; 74. and (5) a vacuum sealing ring.

Detailed Description

The invention is described in further detail below with reference to the drawings and specific examples.

As shown in fig. 1 to 4, the partial gas supply adjustable glow discharge device of the flat PECVD apparatus of this embodiment includes an upper electrode plate 1, a lower electrode plate 2 and a gas supply mechanism 3, the upper electrode plate 1 and the lower electrode plate 2 are arranged in a reaction chamber 4 of the PECVD apparatus at an interval, the reaction chamber 4 is composed of a chamber cover 5 and a cavity 6, the upper electrode plate 1 is mounted on the chamber cover 5, the lower electrode plate 2 is arranged on a bottom plate of the cavity 6, the upper electrode plate 1 includes a bottom box 11 and a plurality of main pipelines 12, a lower end surface of the bottom box 11 is a spray plate 13, the plurality of main pipelines 12 are distributed on an upper end surface of the bottom box 11 in a matrix form, each main pipeline 12 extends upwards to the outside of the chamber cover 5, the gas supply mechanism 3 includes a plurality of gas supply assemblies 31, the gas supply assemblies 31 correspond to the main pipelines 12 one by one, the gas supply assemblies 31 include a gas supply branch 311 and a flow meter 312 and a control valve 313, the air supply branch pipes 311 are connected to the corresponding main lines 12. Spray plate 13 has dense capillary spray holes 131 distributed thereon.

The gas supply mechanism 3 is divided into a plurality of paths, each path of gas reaches each main pipeline 12 of the upper electrode plate 1 through the gas supply branch pipe 311, the flow meter 312 and the control valve 313, the gas is supplied into the bottom box 11 through the main pipeline 12 by the main pipeline 12, and finally is sprayed out from the spray holes 131 on the spray plate 13 to enter the reaction chamber 4 for glow discharge.

By dividing the gas supply mechanism 3 into a plurality of groups of gas supply branches, according to the uniformity of film coating, the gas inlet rate and the local gas flow of a local area can be adjusted through the flow meter 312 and the control valve 313, the gas quantity at the middle position of the upper electrode plate 1 is balanced to be larger than the gas quantity at the edge, the film coating rate of the whole reaction chamber 4 is kept consistent, the uniformity of film coating can be greatly improved, and the conversion efficiency of the battery is greatly improved; meanwhile, the multiple groups of air supply branches can simplify the equipment types, reduce the later maintenance cost and reduce the manufacturing cost of the equipment. The number of sets of the air supply assemblies 31 can be determined according to the size of the upper electrode plate 1, and in the present embodiment, 9 sets of the air supply assemblies 31 and 9 main pipelines 12 are taken as an example, and are arranged on the upper electrode plate 1 in 3 rows and 3 columns.

In this embodiment, a flow-equalizing plate 14 is disposed in the bottom case 11, and a plurality of uniformly distributed flow-equalizing holes 141 are disposed on the flow-equalizing plate 14. The uniform flow plate 14 divides the bottom box 11 into two chambers, a gas supply chamber 101 and a uniform flow chamber 102, and gas firstly enters the gas supply chamber 101 on the upper layer through the main pipeline 12, then enters the uniform flow chamber 102 from the uniform flow holes 141 on the uniform flow plate 14, and finally is sprayed out from the spray holes 131 on the spray plate 13. The flow equalizing plate 14 is introduced into the electrode assembly, so that the uniformity of gas in the electrode assembly can be improved, the ionization rate of the gas can be improved, and the coating uniformity of equipment can be improved. Preferably, the uniform flow plate 14 is adjustable in height in the upper electrode plate 1 for matching the gas split at different flow rates.

In this embodiment, the axis of the uniform flow hole 141 and the axis of the main pipeline 12 are staggered, so that the process gas can be prevented from directly entering the uniform flow chamber 102 from the uniform flow hole 141 through the main pipeline 12, and the uniformity of the process gas can be increased.

In this embodiment, the gas supply branch pipe 311 is an insulating pipe for blocking the electrical contact between the main pipe 12 and the gas supply mechanism 3, so as to prevent the occurrence of an electrical short circuit between the gas supply mechanism 3 and the upper electrode plate 1, thereby causing a sparking phenomenon.

In this embodiment, the cavity cover 5 has two end portions provided with the cavity cover flanges 51, the upper electrode plate 1 (the bottom case 11) is disposed between the two cavity cover flanges 51, and the bottom surface of the shower plate 13 is flush with the bottom surface of the cavity cover flanges 51, which is for convenience of size calculation.

In this embodiment, a plurality of electrode terminals 15 are disposed on the upper end surface of the bottom case 11, the plurality of electrode terminals 15 are all connected to the matching circuit 61, and the matching circuit 61 is connected to the power source 62. The upper electrode plate 1 is electrically connected to a power source 62 by an electrode post 15 through a matching circuit 61, and the matching circuit 61 is connected to the power source 62 through a coaxial RF cable. Each electrode binding post 15 evenly distributed is on last electrode plate 1, and a plurality of electrode binding posts 15 can be connected to matching circuit 61, can improve electron like this and go up the homogeneity of electrode plate 1, promote the effective utilization of power. The power source 62 may include a radio frequency power source, a microwave power source, a direct current high voltage power source, a pulse power source, which is preferably used in this embodiment, to provide a high potential for the PECVD apparatus to ionize, dissociate, and excite the process gas. The mode that adopts low-power and electrode subassembly single matching can be equipped with many connecting wires, improves the homogeneity of electron on upper electrode board 1, improves the effective utilization ratio of power.

In this embodiment, the bottom box 11 is installed on the cavity cover 5 through the supporting column 71, the upper end of the supporting column 71 penetrates through the cavity cover 5, the lower end of the supporting column 71 is fixedly connected with the bottom box 11, and the supporting column 71 is insulated from the cavity cover 5 through the insulating sleeve 72. A vacuum insulating plate 73 is arranged between the bottom box 11 and the cavity cover 5, and the vacuum insulating plate 73 is sleeved on the supporting column 71. A vacuum sealing ring 74 is arranged between the vacuum insulating plate 73 and the cavity cover 5 and the bottom box 11. The vacuum insulation plate 73 is used for isolating the electric connection between the upper electrode plate 1 and the cavity cover 5, a gap is formed between the upper electrode plate 1 and the cavity cover flange 51 of the cavity cover 5 (or the gap is filled with the insulation plate), the phenomenon of sparking during discharging is avoided, the vacuum sealing ring 74 is used for preventing vacuum leakage of the reaction chamber 4, and therefore the matching circuit 61 can be connected with the plurality of electrode binding posts 15 under the condition that the vacuum of the reaction chamber is not affected.

In this embodiment, the lower electrode plate 2 is a load plate, the load plate is communicated with the bottom plate of the cavity 6 through a plurality of copper strips, and the cavity 6 is grounded. The load plate is preferably made of conductive material such as aluminum, stainless steel, copper, graphite or silicon carbide, and the lower electrode plate 2 made of aluminum is preferably used in this embodiment.

Although the present invention has been described with reference to the preferred embodiments, it is not intended to limit the present invention. The technical solution of the present invention can be used by anyone skilled in the art to make many possible variations and modifications, or to modify equivalent embodiments, without departing from the scope of the technical solution of the present invention, using the technical content disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments by the technical entity of the present invention should fall within the protection scope of the technical solution of the present invention.

Claims

1. A local air supply adjustable glow discharge device of a flat plate type PECVD device is characterized in that: including last electrode plate (1), bottom plate (2) and mechanism (3) of supplying gas, go up electrode plate (1) and bottom plate (2) interval setting in reaction chamber (4) of PECVD equipment, reaction chamber (4) comprises chamber lid (5) and cavity (6), it installs on chamber lid (5) to go up electrode plate (1), bottom plate (2) are located on the bottom plate of cavity (6), go up electrode plate (1) and include end box (11) and a plurality of main pipeline (12), the lower terminal surface of end box (11) is for spraying board (13), a plurality of main pipeline (12) are the matrix and distribute at the up end of end box (11), and each main pipeline (12) upwards extend to outside chamber lid (5), mechanism (3) of supplying gas includes a plurality of subassembly (31) of supplying gas, subassembly (31) of supplying gas and main pipeline (12) one-to-one, the air supply assembly (31) comprises air supply branch pipes (311), and flow meters (312) and control valves (313) which are arranged on the air supply branch pipes (311), wherein the air supply branch pipes (311) are connected with corresponding main pipelines (12).

2. A glow discharge apparatus with adjustable local gas supply for a flat plate PECVD apparatus according to claim 1, characterized in that: a flow homogenizing plate (14) is arranged in the bottom box (11), and a plurality of uniformly distributed flow homogenizing holes (141) are formed in the flow homogenizing plate (14).

3. A glow discharge apparatus with adjustable local gas supply for a flat plate PECVD apparatus according to claim 2, characterized in that: the flow equalizing plate (14) is vertically and adjustably arranged in the bottom box (11).

4. A glow discharge apparatus with adjustable local gas supply for a flat plate PECVD apparatus according to claim 2, characterized in that: the axis of the uniform flow hole (141) and the axis of the main pipeline (12) are staggered.

5. A glow discharge apparatus with adjustable local gas supply for a flat-plate PECVD device as in any one of the claims 1 to 4, wherein: the air feeding branch pipe (311) is an insulated pipeline which can block the electric contact between the main pipeline (12) and the air feeding mechanism (3).

6. A glow discharge apparatus with adjustable local gas supply for a flat-plate PECVD device as in any one of the claims 1 to 4, wherein: cavity lid flange (51) are equipped with at chamber lid (5) both ends, between two chamber lid flange (51) are located in end box (11), the bottom surface of shower plate (13) is parallel and level with the bottom surface of chamber lid flange (51).

7. A glow discharge apparatus with adjustable local gas supply for a flat-plate PECVD device as in any one of the claims 1 to 4, wherein: the upper end face of the bottom box (11) is provided with a plurality of electrode binding posts (15), the electrode binding posts (15) are connected with a matching circuit (61), and the matching circuit (61) is connected with a power supply (62).

8. A glow discharge apparatus with adjustable local gas supply for a flat-plate PECVD device as in any one of the claims 1 to 4, wherein: the bottom box (11) is installed on the cavity cover (5) through a support column (71), the upper end of the support column (71) penetrates through the cavity cover (5), the lower end of the support column is fixedly connected with the bottom box (11), and the support column (71) is insulated from the cavity cover (5) through an insulating sleeve (72).

9. A glow discharge apparatus with adjustable local gas supply for a flat-plate PECVD device as in any one of the claims 1 to 4, wherein: a vacuum insulating plate (73) is arranged between the bottom box (11) and the cavity cover (5), and the vacuum insulating plate (73) is sleeved on the supporting column (71); and a vacuum sealing ring (74) is arranged between the vacuum insulating plate (73) and the cavity cover (5) and between the vacuum insulating plate and the bottom box (11).

10. A glow discharge apparatus with adjustable local gas supply for a flat-plate PECVD device as in any one of the claims 1 to 4, wherein: the lower electrode plate (2) is a load plate, and the load plate is communicated with the bottom plate of the cavity (6) through a plurality of copper strips.