CN213026131U - OLED display panel and display device - Google Patents

Abstract

An OLED display panel and a display device, wherein the OLED display panel includes: a substrate comprising a plurality of discrete pixel regions; a barrier layer covering an edge region of the pixel region, the barrier layer having a recess therein, the recess being located on a central region of the pixel region; a pixel core layer on the barrier layer and the pixel region of the substrate, the pixel core layer comprising: the light-emitting layer and the functional layer are stacked, and the functional layer located on the central area of the pixel area is recessed towards the substrate relative to the functional layer located above the barrier layer. The OLED display panel can improve the transverse electric leakage phenomenon.

Description

OLED display panel and display device

Technical Field

The utility model relates to a show technical field, concretely relates to OLED display panel and display device.

Background

An Organic Light-Emitting Diode (OLED) display, also called an Organic electroluminescent display, is a new flat panel display. Compared with the existing liquid crystal display, the OLED display has a series of advantages of self-luminescence, wide viewing angle, ultralight, ultrathin property, high brightness, low power consumption, fast response and the like, and the response speed can reach 1000 times of that of the liquid crystal display, so that the OLED display becomes a very popular flat panel display product at home and abroad and has wide application prospect. The structure of the OLED display comprises: a substrate glass; an anode, an organic functional layer and a cathode sequentially stacked on the substrate glass; and a cover plate encapsulated on the glass substrate. The organic functional layer comprises a hole transport layer, a light emitting layer, an electron transport layer and an electron injection layer.

However, the conventional OLED display panel has a lateral leakage phenomenon.

SUMMERY OF THE UTILITY MODEL

The to-be-solved technical problem of the utility model lies in overcoming the problem of the horizontal electric leakage phenomenon among the prior art in the OLED display panel.

In order to solve the technical problem, the utility model provides a OLED display panel, include: a substrate comprising a plurality of discrete pixel regions; a barrier layer covering an edge region of the pixel region, the barrier layer having a recess therein, the recess being located on a central region of the pixel region; a pixel core layer on the barrier layer and the pixel region of the substrate, the pixel core layer comprising: the light-emitting layer and the functional layer are stacked, and the functional layer located on the central area of the pixel area is recessed towards the substrate relative to the functional layer located above the barrier layer.

Optionally, the recess penetrates the barrier layer; the functional layer comprises a first functional area positioned on the central area of the pixel area and a second functional area positioned above the barrier layer, and the size of the contact surface of the first functional area and the second functional area in the direction vertical to the surface of the substrate is smaller than the thickness of the first functional area and smaller than the thickness of the second functional area. Optionally, an included angle between the side wall of the recess and the bottom surface of the recess is 90 to 110 degrees.

Optionally, the side wall of the recess is perpendicular to the bottom surface of the recess; the longitudinal section of the first functional area is rectangular.

Optionally, the side walls of the recess are inclined, the top opening of the recess is larger than the bottom opening, and the bottom ends of the side walls of the recess are intersected together; the distance from the first functional area to the substrate decreases progressively from the boundary of the central area of the pixel area and the edge area of the pixel area to the central point of the pixel area.

Optionally, an included angle between the side wall of the recess and the surface of the substrate is 30-45 degrees.

Optionally, the material of the barrier layer includes a photoresist material; the thickness of the barrier layer on the edge area of the pixel area is 50 nm to 200 nm.

Optionally, the substrate further includes a pixel spacer region located between adjacent pixel regions; the blocking layer further extends onto the pixel spacers of the substrate; the OLED display panel further includes: the anode layer is positioned on the pixel area of the substrate and the barrier layer, and the anode layer on the pixel area is positioned at the bottom of the pixel core layer; a pixel defining layer on the pixel spacer region of the substrate, the pixel defining layer covering the blocking layer on the pixel spacer region, the pixel defining layer having a pixel defining opening therein; the position of the light-emitting layer corresponds to the pixel defining opening, and the functional layer also extends above the pixel defining layer; a cathode layer over the pixel core layer.

Optionally, the functional layer includes at least one of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

The utility model also provides a display device, include the utility model discloses a OLED display panel.

The utility model discloses technical scheme has following advantage:

1. the utility model discloses technical scheme provides an OLED display panel, because the marginal area in the pixel district has set up the barrier layer, consequently the functional layer is raised in the part of barrier layer top for the functional layer that is located on the central zone of pixel district is for being located the functional layer orientation of barrier layer top the base plate concave yield, and then make the horizontal electric leakage phenomenon between the different pixel districts obtain effectual improvement.

Secondly, the functional layer above the barrier layer is recessed towards the substrate, so that the microcavity effect between the cathode layer and the anode layer in the OLED display panel is properly weakened, the light angle of the OLED display panel is not limited to the position near the direction perpendicular to the substrate, and the image distortion phenomenon is improved when the OLED display panel is observed at a large angle relative to the direction perpendicular to the substrate in the large-angle direction, so that the viewing angle effect is improved. The effect of improving the visual angle effect is achieved without circuit compensation or adjustment by adding other optical film layers. The process is simplified, and the production cost is reduced.

And secondly, the functional layer on the central area of the pixel area is recessed towards the substrate relative to the functional layer above the barrier layer, so that the total internal light reflection effect and the waveguide effect of the OLED display panel are effectively reduced, and the light extraction rate is improved.

Secondly, when the OLED display panel is the flexible OLED display panel, the bending stress of the OLED panel when the OLED panel is bent can be effectively released through the depression in the blocking layer, the bending times are increased, and the bending times are increased by more than 20%, so that the display panel is protected.

2. Furthermore, the material of the blocking layer comprises a light resistance material, and the light resistance material has good light transmission performance, so that the light transmission performance of the OLED display panel cannot be influenced by the arrangement of the blocking layer. And the photoresist material is easily patterned with smaller feature sizes, so that the recess in the barrier layer is easily formed.

3. Further, the recess extends through the barrier layer; the functional layer includes a first functional region on a central region of the pixel region and a second functional region over the barrier layer. Because the size of the contact surface of the first functional area and the second functional area in the direction vertical to the surface of the substrate is smaller than the thickness of the first functional area and smaller than the thickness of the second functional area, the effective section through which current flows in the functional layer is reduced, and the transverse leakage phenomenon among different pixel areas is inhibited.

4. Further, the side walls of the recess are inclined, the top opening of the recess is larger than the bottom opening, and the bottom ends of the side walls of the recess are intersected together; the functional layer comprises a first functional area positioned on the central area of the pixel area, and the distance from the first functional area to the substrate is decreased progressively from the junction of the central area of the pixel area and the edge area of the pixel area to the central point of the pixel area. Therefore, the path length of the current flowing in the functional layer is extended, and thus the lateral leakage phenomenon between different pixel regions is suppressed.

5. The utility model provides a display device, including foretell OLED display substrate board, owing to set up the barrier layer at the marginal area in pixel district, consequently the functional layer is raised in the part of barrier layer top for the functional layer that is located on the central zone in pixel district is for being located the functional layer orientation of barrier layer top the base plate concave yield, and then make the horizontal electric leakage phenomenon between the different pixel districts obtain effectual improvement.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the technical solutions in the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.

Fig. 1 to 4 are schematic structural diagrams illustrating a process of manufacturing an OLED display panel;

fig. 5 is a schematic structural diagram of an OLED display panel according to an embodiment of the present invention;

fig. 6 to 9 are schematic structural views illustrating another OLED display panel manufacturing process;

fig. 10 is a schematic structural diagram of an OLED display panel according to another embodiment of the present invention.

Detailed Description

The OLED display panel includes a pixel core layer including: and a light-emitting layer and a functional layer which are stacked. In order to enable the OLED display panel to be produced more simply and rapidly, in the preparation process of each functional layer of the OLED display panel, the OLED display panel is prepared in an integrated mode, namely the functional layers among pixels are completely communicated in parallel, transverse current can exist, pixel interference is caused by the transverse current, the OLED display panel can generate transverse electric leakage, and poor display is caused. For example, when the green pixel is in a bright state and the red and blue pixels are in a dark state, the red and blue sub-pixels, which are originally in the dark state, are also in a weak light-emitting state due to a lateral leakage current between the sub-pixels.

Based on this, the utility model provides a OLED display panel, include: a substrate comprising a plurality of discrete pixel regions; a barrier layer covering an edge region of the pixel region, the barrier layer having a recess therein, the recess being located on a central region of the pixel region; a pixel core layer on the barrier layer and the pixel region of the substrate, the pixel core layer comprising: the light-emitting layer and the functional layer are stacked, and the functional layer located on the central area of the pixel area is recessed towards the substrate relative to the functional layer located above the barrier layer. The OLED display panel can improve the transverse electric leakage phenomenon.

The following describes the manufacturing process of the OLED display panel of this embodiment in detail with reference to the accompanying drawings.

Referring to fig. 1, a substrate 100 is provided, the substrate 100 comprising a number of discrete pixel regions a.

It should be noted that fig. 1 only shows one pixel region a, and does not represent the number of pixel regions a, which is merely an example.

The substrate 100 further includes a pixel spacer region B between adjacent pixel regions a.

The pixel region a includes an edge region a1 of the pixel region a and a center region a0 of the pixel region a.

In one embodiment, the ratio of the lateral width of the edge region a1 to the lateral width of the central region a0 is 0.5-1.

With continued reference to fig. 1, a barrier layer 110 covering an edge region a1 of the pixel region a is formed on a substrate 100, the barrier layer 110 having a recess 111 therein, the recess 111 being located on a central region a0 of the pixel region a.

The blocking layer 110 also extends onto the pixel space region B of the substrate 100.

The material of the barrier layer 110 includes a photoresist material.

The method of forming the barrier layer 110 includes: forming a photoresist film on the substrate 100; the photoresist film is exposed and developed to form the blocking layer 110.

In the present application, the barrier layer 110 is made of a photoresist material, which has the following advantages: the light resistance material has good light transmission, so that the light transmission of the OLED display panel cannot be influenced by the arrangement of the barrier layer. And the photoresist material is easily patterned with smaller feature sizes, so that the recess in the barrier layer is easily formed.

If the thickness of the blocking layer 110 is too thick, the anode layer on the pixel region a is discontinuous, and light leakage is easily caused; if the thickness of the blocking layer 110 is too thin, the effect of improving the lateral leakage phenomenon between different pixel regions is reduced. Therefore, in one embodiment, the thickness of the barrier layer 110 is set to occupy 1/3-3/4 of the thickness of the subsequent anode layer, and the thickness of the barrier layer 110 on the edge region A1 of the pixel region A is set to be 50-200 nm.

In this embodiment, the number of the recesses 111 is several, and the recesses 111 are arranged in an array.

In one embodiment, an included angle between the sidewall of the recess 111 and the bottom surface of the recess 111 is 90 degrees to 110 degrees.

It should be noted that the arrangement of the included angle between the sidewall of the recess 111 and the bottom surface of the recess 111 and the arrangement of the ratio of the thickness of the barrier layer 110 to the thickness of the subsequent anode layer determine: the size of the contact surface of the subsequent first functional region and the second functional region in the direction perpendicular to the substrate surface is smaller than the thickness of the first functional region and smaller than the thickness of the second functional region.

In this embodiment, the sidewall of the recess 111 is perpendicular to the bottom surface of the recess 111.

Referring to fig. 2, an anode layer 120 is formed on the pixel region a of the substrate 100 and the barrier layer 110.

The anode layer 120 comprises an Al electrode, an Ag electrode, an Mg/Ag composite electrode, or an Al/ITO electrode, an Ag/ITO electrode, an Mg/Ag/ITO electrode.

In this embodiment, the anode layers 120 in the adjacent pixel regions a are separated from each other, and the cathode layers in the subsequent adjacent pixel regions a are connected together, and the cathode layers are film layers. Accordingly, the OLED display panel is used to form an Active-matrix organic light-emitting diode (AMOLED). In this embodiment, the anode layers 120 are arranged in an array.

In other embodiments, the anode layer and the subsequent cathode layer are arranged in rows and columns. Specifically, the anode layers are arranged in rows and the subsequent cathode layers are arranged in columns, or the cathode layers are arranged in rows and the subsequent anode layers are arranged in columns. Accordingly, the OLED display panel is used to form a Passive matrix organic light-emitting diode (PMOLED). Accordingly, the anode layer also overlies a portion of the barrier layer.

In this embodiment, the barrier layer 110 is present such that the anode layer 120 located on the central region a0 of the pixel region a is recessed toward the substrate 100 with respect to the anode layer 120 located above the barrier layer 110. The anode layer 120 positioned on the central area a0 of the pixel area a is filled at least in the recess 111 (refer to fig. 1).

In this embodiment, the side wall of the recess 111 is perpendicular to the bottom surface of the recess 111, and accordingly, the anode layer 120 on the central area a0 of the pixel area a has a rectangular longitudinal cross-section.

In other embodiments, for the anode layer 120 on the central area a0 of the pixel area a, the longitudinal section of the anode layer 120 is trapezoidal or other shape.

Referring to fig. 3, a pixel defining layer 130 is formed on the pixel spacer region B of the substrate 100, the pixel defining layer 130 covers the blocking layer 110 on the pixel spacer region B, and the pixel defining layer 130 has a pixel defining opening therein.

The pixel defining opening is positioned on the pixel area A.

Referring to fig. 4, after the pixel defining layer 130 is formed, a pixel core layer is formed on the pixel region a of the substrate 100 and the blocking layer 110, the pixel core layer including: the light emitting layer 140 and the functional layer 150 are stacked, the functional layers 150 of different pixel regions a are connected, and the functional layer located in the central region a0 of the pixel region a is recessed toward the substrate 100 with respect to the functional layer 150 located above the barrier layer 110.

The functional layer 150 includes at least one of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

The functional layer 150 also extends over the pixel defining layer 130 such that the functional layer 150 is connected over different pixel regions.

In this embodiment, the functional layer 150 includes a bottom functional layer 150a and a top functional layer 150b, the bottom functional layer 150a is located below the light emitting layer 140, and the top functional layer 150b is located above the light emitting layer 140.

The functional layers 150 of the different pixel regions a are connected, and the functional layers 150 also extend over the pixel space regions B.

Specifically, the bottom functional layers 150a of different pixel regions a are connected, the bottom functional layers 150a further extend to the pixel spacing regions B, the top functional layers 150B of different pixel regions a are connected, and the top functional layers 150B further extend to the pixel spacing regions B.

The underlayer functional layer 150a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 150b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

The position of the light emitting layer 140 corresponds to the pixel defining opening.

In this embodiment, the bottom functional layer 150a located in the central area a0 of the pixel area a is recessed toward the substrate 100 relative to the bottom functional layer 150a located above the barrier layer 110, and the top functional layer 150b located in the central area a0 of the pixel area a is recessed toward the substrate 100 relative to the top functional layer 150b located above the barrier layer 110.

The functional layer 150 includes a first functional region located on a central region a0 of the pixel region a and a second functional region located above the barrier layer 110, and a dimension of a contact surface of the first and second functional regions in a direction perpendicular to the surface of the substrate 100 is smaller than a thickness of the first functional region and smaller than a thickness of the second functional region.

Specifically, the bottom functional layer 150a includes a first bottom functional region located in the central region a0 of the pixel region a and a second bottom functional region located above the barrier layer 110, and a dimension of a contact surface of the first bottom functional region and the second bottom functional region in a direction perpendicular to the surface of the substrate 100 is smaller than a thickness of the first bottom functional region and smaller than a thickness of the second bottom functional region. The top functional layer 150b includes a first top functional region located on the central region a0 of the pixel region a and a second top functional region located above the barrier layer 110, and a size of a contact surface of the first and second top functional regions in a direction perpendicular to the surface of the substrate 100 is smaller than a thickness of the first top functional region and smaller than a thickness of the second top functional region.

In this embodiment, the bottom functional layer 150a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 150b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

In one embodiment, the total thickness of the bottom functional layer 150a is greater than the total thickness of the top functional layer 150 b.

Referring to fig. 5, a cathode layer 160 is formed over the pixel core layer.

In this embodiment, because the blocking layer is disposed in the edge region of the pixel region, the portion of the functional layer above the blocking layer is raised, so that the functional layer located in the central region of the pixel region is recessed toward the substrate relative to the functional layer located above the blocking layer, and further, the lateral leakage phenomenon between different pixel regions is effectively improved.

Because the size of the contact surface of the first functional area and the second functional area in the direction vertical to the surface of the substrate is smaller than the thickness of the first functional area and smaller than the thickness of the second functional area, the effective section through which current flows in the functional layer is reduced, and the transverse leakage phenomenon among different pixel areas is inhibited.

Secondly, as the functional layer above the barrier layer is recessed towards the substrate, the microcavity effect between the cathode layer and the anode layer inside the OLED display panel is properly reduced, so that the light angle of the OLED display panel is not limited to the vicinity of the direction perpendicular to the substrate, and the image distortion phenomenon is improved when the OLED display panel is observed at a large angle relative to the direction perpendicular to the substrate in a large-angle direction, thereby improving the viewing angle effect. The effect of improving the visual angle effect is achieved without circuit compensation or adjustment by adding other optical film layers. The process is simplified, and the production cost is reduced.

And secondly, the functional layer on the central area of the pixel area is recessed towards the substrate relative to the functional layer above the barrier layer, so that the total internal light reflection effect and the waveguide effect of the OLED display panel are effectively reduced, and the light extraction rate is improved.

Secondly, when the OLED display panel is the flexible OLED display panel, the bending stress of the OLED panel when the OLED panel is bent can be effectively released through the depression in the blocking layer, the bending times are increased, and the bending times are increased by more than 20%, so that the display panel is protected.

Accordingly, the present embodiment further provides an OLED display panel, referring to fig. 5, including: a substrate 100, the substrate 100 comprising a plurality of discrete pixel regions a; a barrier layer 110 covering an edge area a1 of the pixel area a, the barrier layer 110 having a recess 111 therein, the recess 111 being located on a central area a0 of the pixel area a; a pixel core layer on the blocking layer 110 and the pixel region a of the substrate 100, the pixel core layer including: the light emitting layer 140 and the functional layer are stacked, and the functional layer 150 located on the central region a0 of the pixel region a is recessed toward the substrate 100 with respect to the functional layer 150 located above the barrier layer 110.

The substrate 100 further includes a pixel spacer region B between adjacent pixel regions a.

The pixel region a includes an edge region a1 of the pixel region a and a center region a0 of the pixel region a.

In one embodiment, the ratio of the lateral width of the edge region a1 to the lateral width of the central region a0 is 0.5-0.1.

The recess 111 penetrates the barrier layer 140.

The included angle between the side wall of the recess 111 and the bottom surface of the recess 111 is 90-110 degrees. In this embodiment, the sidewall of the recess 111 is perpendicular to the bottom surface of the recess 111.

The functional layer 150 includes at least one of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

The functional layer 150 also extends over the pixel defining layer 130 such that the functional layer 150 is connected over different pixel regions.

In this embodiment, the functional layer 150 includes a bottom functional layer 150a and a top functional layer 150b, the bottom functional layer 150a is located below the light emitting layer 140, and the top functional layer 150b is located above the light emitting layer 140.

The functional layers 150 of the different pixel regions a are connected, and the functional layers 150 also extend over the pixel space regions B.

Specifically, the bottom functional layers 150a of different pixel regions a are connected, the bottom functional layers 150a further extend to the pixel spacing regions B, the top functional layers 150B of different pixel regions a are connected, and the top functional layers 150B further extend to the pixel spacing regions B.

The underlayer functional layer 150a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 150b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

The position of the light emitting layer 140 corresponds to the pixel defining opening.

In this embodiment, the bottom functional layer 150a located in the central area a0 of the pixel area a is recessed toward the substrate 100 relative to the bottom functional layer 150a located above the barrier layer 110, and the top functional layer 150b located in the central area a0 of the pixel area a is recessed toward the substrate 100 relative to the top functional layer 150b located above the barrier layer 110.

The functional layer 150 includes a first functional region located on a central region a0 of the pixel region a and a second functional region located above the barrier layer 110, and a dimension of a contact surface of the first and second functional regions in a direction perpendicular to the surface of the substrate 100 is smaller than a thickness of the first functional region and smaller than a thickness of the second functional region.

Specifically, the bottom functional layer 150a includes a first bottom functional region located in the central region a0 of the pixel region a and a second bottom functional region located above the barrier layer 110, and a dimension of a contact surface of the first bottom functional region and the second bottom functional region in a direction perpendicular to the surface of the substrate 100 is smaller than a thickness of the first bottom functional region and smaller than a thickness of the second bottom functional region. The top functional layer 150b includes a first top functional region located on the central region a0 of the pixel region a and a second top functional region located above the barrier layer 110, and a size of a contact surface of the first and second top functional regions in a direction perpendicular to the surface of the substrate 100 is smaller than a thickness of the first top functional region and smaller than a thickness of the second top functional region.

In this embodiment, the bottom functional layer 150a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 150b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

In one embodiment, the total thickness of the bottom functional layer 150a is greater than the total thickness of the top functional layer 150 b.

In this embodiment, the side wall of the recess is perpendicular to the bottom surface of the recess; the longitudinal section of the first functional area is rectangular.

The material of the barrier layer 110 includes a photoresist material.

The blocking layer 110 also extends onto the pixel space region B of the substrate 100.

The OLED display panel further includes: the anode layer is positioned on the pixel area of the substrate and the barrier layer, and the anode layer on the pixel area is positioned at the bottom of the pixel core layer; a pixel defining layer on the pixel spacer region of the substrate, the pixel defining layer covering the blocking layer on the pixel spacer region, the pixel defining layer having a pixel defining opening therein; the position of the light-emitting layer corresponds to the pixel defining opening, and the functional layer also extends above the pixel defining layer; a cathode layer over the pixel core layer.

The functional layer comprises at least one of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer and an electron injection layer.

The barrier layer 110 has a thickness of 50 nm to 200 nm. The thickness of the barrier layer 110 occupies 1/3-3/4 of the thickness of the anode layer.

Fig. 6 is an OLED display panel according to another embodiment of the present invention. The process of fabricating the OLED display panel will be described in detail with reference to fig. 6 to 10.

Referring to fig. 6, a substrate 200 is provided, the substrate 200 including a number of discrete pixel regions M.

It should be noted that fig. 6 only shows one pixel region M, and does not represent the number of pixel regions M, which is merely an example.

The substrate 200 further includes a pixel space region N between adjacent pixel regions M.

The pixel region M includes an edge region M1 of the pixel region M and a center region M0 of the pixel region M.

In one embodiment, the ratio of the lateral width of the edge region M1 to the lateral width of the central region M0 is 0.5-1.

With continued reference to fig. 6, a barrier layer 210 covering an edge region M1 of the pixel region M is formed on a substrate 200, the barrier layer 210 having a recess 211 therein, the recess 211 being located on a central region M0 of the pixel region M.

The blocking layer 210 also extends onto the pixel space region N of the substrate 200.

The material of the barrier layer 210 comprises a photoresist material.

The method of forming the barrier layer 210 includes: forming a photoresist film on the substrate 200; the photoresist film is exposed and developed to form the blocking layer 210.

In the present application, the barrier layer 210 is made of a photoresist material, which has the following advantages: the light resistance material has good light transmission, so that the light transmission of the OLED display panel cannot be influenced by the arrangement of the barrier layer. And the photoresist material is easily patterned with smaller feature sizes, so that the recess in the barrier layer is easily formed.

If the thickness of the barrier layer 210 is too thick, the subsequent film formation may be non-uniform; if the thickness of the blocking layer 210 is too thin, the effect of improving the lateral leakage phenomenon between different pixel regions is reduced. Thus, in one embodiment, the barrier layer 210 is provided with a thickness that occupies 1/3-3/4 of the thickness of an anode layer subsequently disposed on the barrier layer 210. The barrier layer 210 located on the edge region M1 of the pixel region M has a thickness of 50 nm to 200 nm.

In this embodiment, the number of the recesses 211 is several, and the recesses 211 are arranged in an array.

In this embodiment, the sidewalls of the recess 211 are inclined, the top opening of the recess 211 is larger than the bottom opening, and the bottom ends of the sidewalls of the recess 211 meet together. The included angle between the side wall of the recess 211 and the surface of the substrate 200 is 30-45 degrees.

In this embodiment, the longitudinal cross-sectional shape of the recess 211 is a triangle.

Referring to fig. 7, an anode layer 220 is formed on the pixel region M of the substrate 200 and the barrier layer 210.

The anode layer 220 comprises an Al electrode, an Ag electrode, an Mg/Ag composite electrode, or an Al/ITO electrode, an Ag/ITO electrode, and an Mg/Ag/ITO electrode.

In this embodiment, the barrier layer 210 is present such that the anode layer 220 located on the central region M0 of the pixel region M is recessed toward the substrate 200 with respect to the anode layer 220 located above the barrier layer 210. The anode layer 220 positioned on the central area M0 of the pixel area M is filled at least in the recess 211 (refer to fig. 6).

In this embodiment, for the anode layer 220 on the central region M0 of the pixel region M, the longitudinal section of the anode layer 220 is triangular. In other embodiments, for the anode layer 220 on the central region M0 of the pixel region M, the longitudinal section of the anode layer 220 is in other shapes.

Referring to fig. 8, a pixel defining layer 230 is formed on the pixel space region N of the substrate 200, the pixel defining layer 230 covering the blocking layer 210 on the pixel space region N, the pixel defining layer 230 having a pixel defining opening therein.

The pixel defining port is located on the pixel region M.

Referring to fig. 9, after the pixel defining layer 230 is formed, the pixel core layer is formed on the pixel region M of the substrate 200 and the blocking layer 210, the pixel core layer including: the light emitting layer 240 and the functional layer 250 are stacked, the functional layers 250 of different pixel regions M are connected, the position of the light emitting layer 240 corresponds to the pixel defining opening, and the functional layer 250 located in the central region M0 of the pixel region M is recessed toward the substrate 200 relative to the functional layer 250 located above the barrier layer 210.

Specifically, in this embodiment, the functional layer 250 includes a first functional region located on the central region M0 of the pixel region M, and the distance from the first functional region to the substrate 200 decreases from the boundary between the central region M0 of the pixel region M and the edge region M1 of the pixel region M to the center point of the pixel region M. Since the distance from the first functional region to the substrate 200 decreases from the boundary between the central region M0 of the pixel region M and the edge region M1 of the pixel region M to the center point of the pixel region M, the path length through which the current in the functional layer flows is extended, and thus the lateral leakage phenomenon between different pixel regions is suppressed.

The anode layer 220 on the pixel region M is positioned at the bottom of the pixel core layer.

The functional layer 250 includes at least one of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

The functional layer 250 also extends over the pixel defining layer 230 such that the functional layer 250 is connected over different pixel regions M.

In this embodiment, the functional layer 250 includes a bottom functional layer 250a and a top functional layer 250b, the bottom functional layer 250a is located below the light emitting layer 240, and the top functional layer 250b is located above the light emitting layer 240.

The functional layers 250 of the different pixel regions M are connected, and the functional layers 250 also extend over the pixel space regions N.

Specifically, the bottom functional layers 250a of different pixel regions M are connected, the bottom functional layers 250a further extend to the pixel spacing regions N, the top functional layers 250b of different pixel regions M are connected, and the top functional layers 250b further extend to the pixel spacing regions M.

The lower functional layer 250a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 250b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

The position of the light emitting layer 240 corresponds to the pixel defining opening.

In this embodiment, the bottom functional layer 250a located in the central region M0 of the pixel region M is recessed toward the substrate 200 with respect to the bottom functional layer 250a located above the barrier layer 210, and the top functional layer 250b located in the central region M0 of the pixel region M is recessed toward the substrate 200 with respect to the top functional layer 250b located above the barrier layer 210.

The bottom functional layer 250a includes a first bottom functional region located on the central region M0 of the pixel region M, and the distance from the first bottom functional region to the substrate 200 decreases from the boundary between the central region M0 of the pixel region M and the edge region M1 of the pixel region M to the center point of the pixel region M.

The top functional layer 250b includes a first top functional region located on the central region M0 of the pixel region M, and the distance from the first top functional region to the substrate 200 decreases from the boundary between the central region M0 of the pixel region M and the edge region M1 of the pixel region M to the center point of the pixel region M.

In this embodiment, the bottom functional layer 250a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 250b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

In one embodiment, the total thickness of the bottom functional layer 250a is greater than the total thickness of the top functional layer 250 a.

In this embodiment, the longitudinal cross section of the functional layer is triangular. In other embodiments, the functional layer has a longitudinal cross-section of other shapes.

Referring to fig. 10, a cathode layer 260 is formed over the pixel core layer.

Accordingly, the present embodiment further provides an OLED display panel, referring to fig. 10, including: a substrate 200, wherein the substrate 200 comprises a plurality of discrete pixel regions M; a barrier layer 210 covering an edge region M1 of the pixel region M, the barrier layer 210 having a recess 211 therein, the recess 211 being located on a central region M0 of the pixel region M; a pixel core layer on the blocking layer 210 and the pixel region M of the substrate 200, the pixel core layer including: the light emitting layer 240 and the functional layer 250 are stacked, the functional layer 250 located on the central region M0 of the pixel region M is recessed toward the substrate 200 relative to the functional layer 250 located above the barrier layer 210, the functional layer 250 includes a first functional region located on the central region M0 of the pixel region M, and the distance from the first functional region to the substrate 200 decreases from the boundary between the central region M0 of the pixel region M and the edge region M1 of the pixel region M to the center point of the pixel region M.

The sidewalls of the recess 211 are inclined, the top opening of the recess 211 is larger than the bottom opening, and the bottom ends of the sidewalls of the recess 211 meet together. The included angle between the side wall of the recess 211 and the surface of the substrate 200 is 30-45 degrees.

The material of the barrier layer 210 comprises a photoresist material.

The barrier layer 210 located on the edge region M1 of the pixel region M has a thickness of 50 nm to 200 nm. The thickness of the barrier layer 210 occupies 1/3-3/4 of the thickness of an anode layer subsequently positioned on the barrier layer 210.

The substrate 200 further includes a pixel space region N between adjacent pixel regions M; the blocking layer 210 also extends onto the pixel space region N of the substrate 200.

The OLED display panel further includes: an anode layer 220 on the barrier layer 210 and the pixel region M of the substrate 200, the anode layer 220 on the pixel region M being located at the bottom of the pixel core layer; a pixel defining layer on the pixel spacing region N of the substrate 200, the pixel defining layer covering the blocking layer 210 on the pixel spacing region N, the pixel defining layer 230 having a pixel defining opening therein; the position of the light emitting layer 240 corresponds to the pixel defining opening, and the functional layer 250 also extends above the pixel defining layer 230; a cathode layer 260 over the pixel core layer.

The functional layer 250 includes at least one of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

The functional layer 250 also extends over the pixel defining layer 230 such that the functional layer 250 is connected over different pixel regions M.

In this embodiment, the functional layer 250 includes a bottom functional layer 250a and a top functional layer 250b, the bottom functional layer 250a is located below the light emitting layer 240, and the top functional layer 250b is located above the light emitting layer 240.

The functional layers 250 of the different pixel regions M are connected, and the functional layers 250 also extend over the pixel space regions N.

Specifically, the bottom functional layers 250a of different pixel regions M are connected, the bottom functional layers 250a further extend to the pixel spacing regions N, the top functional layers 250b of different pixel regions M are connected, and the top functional layers 250b further extend to the pixel spacing regions M.

The lower functional layer 250a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 250b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

The position of the light emitting layer 240 corresponds to the pixel defining opening.

In this embodiment, the bottom functional layer 250a located in the central region M0 of the pixel region M is recessed toward the substrate 200 with respect to the bottom functional layer 250a located above the barrier layer 210, and the top functional layer 250b located in the central region M0 of the pixel region M is recessed toward the substrate 200 with respect to the top functional layer 250b located above the barrier layer 210.

The bottom functional layer 250a includes a first bottom functional region located on the central region M0 of the pixel region M, and the distance from the first bottom functional region to the substrate 200 decreases from the boundary between the central region M0 of the pixel region M and the edge region M1 of the pixel region M to the center point of the pixel region M.

The top functional layer 250b includes a first top functional region located on the central region M0 of the pixel region M, and the distance from the first top functional region to the substrate 200 decreases from the boundary between the central region M0 of the pixel region M and the edge region M1 of the pixel region M to the center point of the pixel region M.

In this embodiment, the bottom functional layer 250a includes at least one of a hole injection layer, a hole transport layer, and a hole blocking layer. The top functional layer 250b includes at least one of an electron blocking layer, an electron transport layer, and an electron injection layer.

In one embodiment, the total thickness of the bottom functional layer 250a is greater than the total thickness of the top functional layer 250 a.

In this embodiment, the longitudinal cross section of the functional layer is triangular. In other embodiments, the functional layer has a longitudinal cross-section of other shapes.

The utility model discloses still another embodiment provides a display device, including foretell OLED display panel.

It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications can be made without departing from the scope of the invention.

Claims (10)

1. An OLED display panel, comprising:

a substrate comprising a plurality of discrete pixel regions;

a barrier layer covering an edge region of the pixel region, the barrier layer having a recess therein, the recess being located on a central region of the pixel region;

a pixel core layer on the barrier layer and the pixel region of the substrate, the pixel core layer comprising: the light-emitting layer and the functional layer are stacked, and the functional layer located on the central area of the pixel area is recessed towards the substrate relative to the functional layer located above the barrier layer.

2. The OLED display panel of claim 1, wherein the recess extends through the barrier layer;

the functional layer comprises a first functional area positioned on the central area of the pixel area and a second functional area positioned above the barrier layer, and the size of the contact surface of the first functional area and the second functional area in the direction vertical to the surface of the substrate is smaller than the thickness of the first functional area and smaller than the thickness of the second functional area.

3. The OLED display panel of claim 2, wherein an included angle between the side wall of the recess and the bottom surface of the recess is 90-110 degrees.

4. The OLED display panel of claim 2, wherein the sidewalls of the recess are perpendicular to the bottom surface of the recess; the longitudinal section of the first functional area is rectangular.

5. The OLED display panel of claim 1, wherein the sidewalls of the recess are sloped, the top opening of the recess is larger than the bottom opening, and the bottom ends of the sidewalls of the recess meet together;

the functional layer comprises a first functional area positioned on the central area of the pixel area, and the distance from the first functional area to the substrate is decreased progressively from the junction of the central area of the pixel area and the edge area of the pixel area to the central point of the pixel area.

6. The OLED display panel of claim 5, wherein an angle between a sidewall of the recess and the surface of the substrate is between 30 degrees and 45 degrees.

7. The OLED display panel of claim 1, wherein the material of the barrier layer comprises a photoresist material; the thickness of the barrier layer on the edge area of the pixel area is 50 nm to 200 nm.

8. The OLED display panel of claim 1, wherein the substrate further includes a pixel spacer region between adjacent pixel regions; the blocking layer further extends onto the pixel spacers of the substrate;

the OLED display panel further includes: the anode layer is positioned on the pixel area of the substrate and the barrier layer, and the anode layer on the pixel area is positioned at the bottom of the pixel core layer; a pixel defining layer on the pixel spacer region of the substrate, the pixel defining layer covering the blocking layer on the pixel spacer region, the pixel defining layer having a pixel defining opening therein; the position of the light-emitting layer corresponds to the pixel defining opening, and the functional layer also extends above the pixel defining layer; a cathode layer over the pixel core layer.

9. The OLED display panel of claim 1, wherein the functional layer comprises at least one of a hole injection layer, a hole transport layer, a hole blocking layer, an electron transport layer, and an electron injection layer.

10. A display device comprising the OLED display panel according to any one of claims 1 to 9.

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