CN212770969U - Etching solution processing apparatus - Google Patents
Etching solution processing apparatus Download PDFInfo
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- CN212770969U CN212770969U CN202021677760.3U CN202021677760U CN212770969U CN 212770969 U CN212770969 U CN 212770969U CN 202021677760 U CN202021677760 U CN 202021677760U CN 212770969 U CN212770969 U CN 212770969U
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Abstract
An etching liquid processing apparatus comprising: a diffusion dialysis tank, a recovery liquid storage tank and a recovery pipeline; the diffusion dialysis tank is communicated with the recovery liquid storage tank through a recovery pipeline; a dialysis mechanism is arranged in the diffusion dialysis box and comprises a plurality of ion exchange membranes, a plurality of first partition plates and a plurality of second partition plates, the first partition plates and the second partition plates are oppositely arranged in the diffusion dialysis box, one end of each ion exchange membrane is connected with one first partition plate, the other end of each ion exchange membrane is connected with one second partition plate, and the ion exchange membranes are sequentially and oppositely arranged; through first division board, second division board and ion exchange membrane, divided dialysis room and diffusion room in the diffusion dialysis case, in the acid radical ion in the etching waste liquid takes place the diffusion dialysis and passes ion exchange membrane and enter into the diffusion room, retrieves to the recovery liquid storage box at last in, this etching liquid processing apparatus saves space, is convenient for retrieve the acid solution in the etching waste liquid, can practice thrift the recovery cost simultaneously.
Description
Technical Field
The utility model relates to an etching solution production technical field, in particular to etching solution processing apparatus.
Background
The etching solution widely used at present comprises acidic copper chloride, alkaline copper chloride, ferric chloride, ammonium persulfate and the like, the etching solution is used for carving by eroding the characteristics of materials, the etching solution is used for eroding a metal layer on a substrate in the manufacturing process of a circuit board in industrial production, a required circuit is carved on the substrate, the acidic etching is a common etching mode, when the concentration of copper ions or cuprous ions in the acidic etching solution is increased to a certain value in the etching process, the etching solution cannot stably and rapidly etch the copper foil, and the etching solution is used as etching waste liquid.
The acid etching waste liquid contains a large amount of strong acid solution polluted by heavy metals, and the direct discharge of the strong acid solution can cause environmental pollution; the electrolytic regeneration method is used for electrolyzing copper ions in the acidic waste liquid by ionizing the acidic waste liquid, and simultaneously reducing the waste liquid into the acidic solution for etching recycling. However, the chemical neutralization method cannot recover the acid in the waste liquid, the equipment required by the electrolytic regeneration method is complicated, a large amount of electric power is consumed during electrolysis, and the recovery cost is high.
SUMMERY OF THE UTILITY MODEL
Accordingly, there is a need for an etching solution treatment apparatus.
The utility model provides an above-mentioned technical problem's technical scheme as follows: an etching liquid processing apparatus comprising: a diffusion dialysis tank, a recovery liquid storage tank and a recovery pipeline;
a dialysis mechanism is arranged in the diffusion dialysis tank, the dialysis mechanism comprises a plurality of ion exchange membranes, a plurality of first partition plates and a plurality of second partition plates, each first partition plate is perpendicular to the bottom in the diffusion dialysis tank, the first partition plates are arranged on the same straight line, each second partition plate is perpendicular to the bottom in the diffusion dialysis tank, the second partition plates are arranged on the same straight line, the first partition plates and the second partition plates are oppositely arranged in the diffusion dialysis tank, one end of each ion exchange membrane is connected with one first partition plate, the other end of each ion exchange membrane is connected with one second partition plate, and the ion exchange membranes are sequentially oppositely arranged;
the first partition plate, the second partition plate and the ion exchange membrane isolate the inside of the diffusion dialysis box into a dialysis chamber and a diffusion chamber, and the diffusion chamber is communicated with the recovery liquid storage box through the recovery pipeline.
In one embodiment, one of the first dividing walls is connected to a side wall of the diffusion dialysis cassette.
In one embodiment, one of the second divider plates is attached to a sidewall of the diffusion dialysis cassette.
In one embodiment, the ion exchange membrane is an anion exchange membrane.
In one embodiment, the number of the first partition plates is the same as the number of the second partition plates.
In one embodiment, the side wall of the diffusion dialysis tank is provided with a liquid inlet and a liquid outlet, and the liquid inlet and the liquid outlet penetrate through the side wall of the diffusion dialysis tank.
In one embodiment, the device further comprises a driving pump, a liquid inlet pipe and a liquid outlet pipe, wherein one end of the liquid inlet pipe is inserted into the dialysis chamber through the liquid inlet, one end of the liquid outlet pipe is inserted into the dialysis chamber through the liquid outlet, a first valve is arranged on the liquid outlet pipe, the driving pump is arranged on the liquid inlet pipe, and the driving pump is used for providing power for conveying the etching waste liquid to be treated into the dialysis chamber.
In one embodiment, a water inlet conduit is further included, the water inlet conduit being in communication with the diffusion chamber.
In one embodiment, a second valve is disposed on the recovery conduit.
The utility model has the advantages that: the utility model provides a pair of etching solution processing apparatus for when retrieving the acid solution in the etching waste liquid, through each first division board and each second division board all sets up perpendicularly bottom in the diffusion dialysis incasement, and each ion exchange membrane's one end all with one first division board is connected, each ion exchange membrane's the other end all with one the second division board is connected, each relative setting in proper order between the ion exchange membrane, will separate into dialysis chamber and diffusion chamber in the diffusion dialysis incasement, the etching waste liquid is carried to the dialysis chamber, through the selective permeability of ion exchange membrane, the acid radical ion in the etching waste liquid takes place diffusion dialysis and passes ion exchange membrane gets into in the diffusion chamber, retrieve to in the recovery liquid storage box at last, this etching solution processing apparatus saves space, is convenient for retrieve the acid solution in the etching waste liquid, and meanwhile, the recovery cost can be saved.
Drawings
Fig. 1 is a schematic cross-sectional view of an etching solution processing apparatus according to an embodiment.
In the drawings, 10, an etching solution treatment apparatus; 100. a diffusion dialysis chamber; 110. a first side plate; 120. a second side plate; 130. a third side plate; 140. a fourth side plate; 200. a recovery liquid storage tank; 210. a recovery pipeline; 220. a water inlet pipe; 230. a second valve; 310. a first partition plate; 320. a second partition plate; 400. an ion exchange membrane; 510. a dialysis chamber; 520. a diffusion chamber; 600. driving the pump; 610. a liquid inlet pipe; 620. a liquid outlet pipe; 630. a first valve.
Detailed Description
It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict. The following will combine the drawings of the embodiments of the present invention to further describe the technical solution of the present invention, and the present invention is not limited to the following specific embodiments.
It should be understood that the same or similar reference numerals in the drawings of the embodiments correspond to the same or similar parts. In the description of the present invention, it should be understood that if there are terms such as "upper", "lower", "front", "rear", "left", "right", "top", "bottom", etc., indicating orientations or positional relationships based on the orientations or positional relationships shown in the drawings, the description is merely for convenience of description and simplicity of description, but does not indicate or imply that the equipment or components referred to must have specific orientations, be constructed in specific orientations, and be operated, and therefore, the terms describing the positional relationships in the drawings are only used for illustrative purposes and are not to be construed as limitations of the present patent, and those skilled in the art will understand the specific meanings of the terms according to specific situations.
As shown in fig. 1, in one embodiment, an etching liquid processing apparatus 10 includes: a diffusion dialysis tank 100, a recovery liquid storage tank 200, and a recovery pipeline 210; a dialysis mechanism is arranged in the diffusion dialysis tank 100, the dialysis mechanism comprises a plurality of ion exchange membranes 400, a plurality of first partition plates 310 and a plurality of second partition plates 320, each first partition plate 310 is arranged perpendicular to the bottom of the diffusion dialysis tank 100, the first partition plates 310 are arranged on the same straight line, each second partition plate 320 is arranged perpendicular to the bottom of the diffusion dialysis tank 100, the second partition plates 320 are arranged on the same straight line, the first partition plates 310 and the second partition plates 320 are arranged in the diffusion dialysis tank 100 in an opposite mode, one end of each ion exchange membrane 400 is connected with one first partition plate 310, the other end of each ion exchange membrane 400 is connected with one second partition plate 320, and the ion exchange membranes 400 are arranged in sequence in an opposite mode; the first partition plate 310, the second partition plate 320 and the ion exchange membrane 400 partition the inside of the diffusion dialysis tank 100 into a dialysis chamber 510 and a diffusion chamber 520, and the diffusion chamber 520 is communicated with the recovery liquid storage tank 200 through the recovery pipe 210.
In this embodiment, the diffusion dialysis cassette 100 includes a bottom plate, a first side plate 110, a second side plate 120, a third side plate 130, a fourth side plate 140, and a top plate, wherein the first side plate 110, the second side plate 120, the third side plate 130, and the fourth side plate 140 are all disposed on the bottom plate, the first side plate 110, the second side plate 120, the third side plate 130, and the fourth side plate 140 are sequentially connected end to form a chamber, the top plate is disposed opposite to the bottom plate, and the top plate covers a frame formed by the first side plate 110, the second side plate 120, the third side plate 130, and the fourth side plate 140, so as to form the diffusion dialysis cassette 100 with a closed space. Each of the first dividing plates 310 is vertically disposed on the bottom plate, and each of the first dividing plates 310 is located close to the first side plate 110, each of the first dividing plates 310 are arranged on the same straight line, that is, each of the first separation plates 310 is disposed in parallel with the first side plate 110, and correspondingly, each of the second separation plates 320 is vertically disposed on the bottom plate, and each of the second partition plates 320 is positioned adjacent to the third side plate 130, each of the second partition plates 320 is arranged on the same line, that is, each of the second separation plates 320 is disposed in parallel with the third side plate 130, each of the first separation plates 310 is staggered with each of the second separation plates 320, for example, the first and second partition plates 310 and 320 are arranged in one direction in the order of the first and second partition plates 310 and 320, the first and second partition plates 310 and 310, and the second partition plate 320.
Further, the number of the first separation plates 310 is the same as that of the second separation plates 320, one side of one of the first separation plates 310 is connected with the side wall of the diffusion dialysis cassette 100, that is, one of the first separation plates 310 close to the fourth side plate 140 is connected with the fourth side plate 140, one side of one of the second separation plates 320 is connected with the side wall of the diffusion dialysis cassette 100, that is, one of the second separation plates 320 close to the second side plate 120 is connected with the second side plate 120, the height of the first separation plate 310 is matched with that of the diffusion dialysis cassette 100, and the height of the second separation plate 320 is matched with that of the diffusion dialysis cassette 100.
In this embodiment, the other end of each ion exchange membrane 400 is connected to one second partition plate 320, and the ion exchange membranes 400 are sequentially and oppositely disposed, that is, the ion exchange membrane 400 is fixed between the first partition plate 310 and the second partition plate 320, it should be noted that the manner of fixing the ion exchange membrane 400 between the first partition plate 310 and the second partition plate 320 can be implemented by using an existing structure, which belongs to the technology known to those skilled in the art, and the description of the embodiment is not repeated. Through the first partition plate 310, the second partition plate 320 and the ion exchange membrane 400, the chamber in the diffusion dialysis tank 100 is partitioned into a dialysis chamber 510 and a diffusion chamber 520, the dialysis chamber 510 is used for accommodating etching waste liquid, the diffusion chamber 520 is used for accommodating diffusion liquid, the diffusion liquid is water, and the diffusion chamber 520 is communicated with the recovery liquid storage tank 200 through the recovery pipeline 210.
Illustratively, the utility model provides an etching solution processing apparatus 10, when being used for retrieving the acid solution in the etching waste solution, through each said first partition plate 310 and each said second partition plate 320 all set up the bottom in said diffusion dialysis tank 100 perpendicularly, and one end of each said ion exchange membrane 400 all is connected with a said first partition plate 310, the other end of each said ion exchange membrane 400 all is connected with a said second partition plate 320, set up relatively in proper order between each said ion exchange membrane 400, separate into dialysis chamber 510 and diffusion chamber 520 in said diffusion dialysis tank 100, the etching waste solution is transported to said dialysis chamber 510, through the selective permeability of said ion exchange membrane 400, acid radical ions in the etching waste solution diffuse dialysis and pass through said ion exchange membrane 400 and enter into said diffusion chamber 520, finally retrieve to in said recovery solution storage tank 200, this etching solution processing apparatus 10 saves space, is convenient for retrieve the acid solution in the etching waste liquid, can practice thrift the recovery cost simultaneously.
To achieve the recovery of the acidic solution from the spent etching solution, in one embodiment, the ion exchange membrane 400 is an anion exchange membrane. Specifically, since the etching waste liquid in this embodiment is an acidic etching waste liquid, the ion exchange membrane 400 is an anion exchange membrane, the ion exchange membrane 400 has selective permeability, the concentration difference is a driving force of dialysis, the acidic etching waste liquid and water having different concentrations are separated by the ion exchange membrane 400, and acid ions permeate the ion exchange membrane 400 from the side having a high concentration and diffuse to the side having a low concentration, so that an acidic solution, that is, an acid solution, can be recovered from the acidic etching liquid. Further, the ion exchange membrane 400 may also be a cation exchange membrane, in which case, the etching solution treatment apparatus 10 may be used to recover an alkaline solution, i.e., an alkaline solution, from the alkaline etching waste solution, and may recover an acid from the acidic etching waste solution or an alkali from the alkaline etching waste solution without additional energy.
To facilitate the transfer of the spent etching solution into the dialysis chamber 510, in one embodiment, the diffusion dialysis cassette 100 has a liquid inlet and a liquid outlet formed in the side walls thereof, and the liquid inlet and the liquid outlet penetrate the side walls of the diffusion dialysis cassette 100. Specifically, the liquid inlet is disposed on the fourth side plate 140, and the liquid outlet is disposed on the second side plate 120, that is, the liquid inlet and the liquid outlet are disposed opposite to each other, and the liquid inlet and the liquid outlet penetrate through the side wall of the diffusion dialysis chamber 100, and both the liquid inlet and the liquid outlet are communicated with the dialysis chamber 510. Furthermore, the etching solution processing apparatus 10 further includes a driving pump 600, a liquid inlet pipe 610 and a liquid outlet pipe 620, wherein one end of the liquid inlet pipe 610 is inserted into the dialysis chamber 510 through the liquid inlet, one end of the liquid outlet pipe 620 is inserted into the dialysis chamber 510 through the liquid outlet, the liquid inlet pipe 610, the dialysis chamber 510 and the liquid outlet pipe 620 form a conveying path of the etching waste solution, that is, the etching waste solution can enter the dialysis chamber 510 through the liquid inlet pipe 610, and then is discharged out of the dialysis chamber 510 through the liquid outlet pipe 620, the driving pump 600 is disposed on the liquid inlet pipe 610, the driving pump 600 is configured to provide power for conveying the etching waste solution to be processed into the dialysis chamber 510, so that the etching waste solution can be conveyed into the dialysis chamber 510, the liquid outlet pipe 620 is provided with a first valve 630, and the opening and closing of the liquid outlet pipe 620 is controlled by the first valve 630, namely, when acid is recovered from the etching waste liquid, the first valve 630 is closed; when the acid recovery from the spent etching solution is completed, the first valve 630 is opened to discharge the spent etching solution from the dialysis chamber 510, and then the driving pump 600 continues to convey the spent etching solution to be treated to the dialysis chamber 510 for the next recovery of the acid solution.
To facilitate the delivery of the diffusion fluid into the diffusion chamber 520, in one embodiment, an inlet conduit 220 is further included, the inlet conduit 220 being in communication with the diffusion chamber 520. Specifically, a first through hole and a second through hole are formed in the side wall of the diffusion dialysis tank 100, the first through hole and the second through hole both penetrate through the side wall of the diffusion dialysis tank 100, that is, the first through hole and the second through hole are communicated with the diffusion chamber 520, the first through hole is arranged on the second side plate 120, the second through hole is arranged on the fourth side plate 140, that is, the first through hole and the second through hole are oppositely arranged, one end of the water inlet pipe 220 is inserted into the diffusion chamber 520 through the first through hole, one end of the recovery pipe 210 is inserted into the diffusion chamber 520 through the second through hole, the water inlet pipe 220, the diffusion chamber 520 and the recovery pipe 210 form a conveying path for etching waste liquid, that is, the diffusion liquid can enter the diffusion chamber 520 through the water inlet pipe 220, and then is discharged out of the diffusion chamber 520 through the recovery pipe 210, that is, the direction of the diffusion liquid is opposite to the direction of the etching waste liquid, and further, a second valve 230 is provided on the recovery pipe 210, and the second valve 230 controls the opening and closing of the recovery pipe 210, one end of the recovery pipe 210 is communicated with the diffusion chamber 520, and the other end of the recovery pipe 210 is communicated with the recovery liquid storage tank 200, so that the recovered acid solution can be stored in the recovery liquid storage tank 200,
in order to better observe the height of the waste etching solution and the diffusion solution in the diffusion dialysis chamber 100, in one embodiment, a transparent window is arranged on the side wall of the diffusion dialysis chamber 100. Specifically, the quantity of transparent window is 2, one transparent window sets up on first curb plate 110, another transparent window sets up on the third curb plate 130, through transparent window can observe etching waste liquid and diffusion liquid and be in the height in diffusion dialysis case 100 avoids etching waste liquid and diffusion liquid high too high, overflows diffusion dialysis case 100 plays the effect of warning suggestion.
It is obvious that the above embodiments of the present invention are only examples for clearly illustrating the present invention, and are not limitations to the embodiments of the present invention. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. Any modification, equivalent replacement, and improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.
Claims (9)
1. An etching solution processing apparatus, comprising: a diffusion dialysis tank, a recovery liquid storage tank and a recovery pipeline;
a dialysis mechanism is arranged in the diffusion dialysis tank, the dialysis mechanism comprises a plurality of ion exchange membranes, a plurality of first partition plates and a plurality of second partition plates, each first partition plate is perpendicular to the bottom in the diffusion dialysis tank, the first partition plates are arranged on the same straight line, each second partition plate is perpendicular to the bottom in the diffusion dialysis tank, the second partition plates are arranged on the same straight line, the first partition plates and the second partition plates are oppositely arranged in the diffusion dialysis tank, one end of each ion exchange membrane is connected with one first partition plate, the other end of each ion exchange membrane is connected with one second partition plate, and the ion exchange membranes are sequentially oppositely arranged;
the first partition plate, the second partition plate and the ion exchange membrane isolate the inside of the diffusion dialysis box into a dialysis chamber and a diffusion chamber, and the diffusion chamber is communicated with the recovery liquid storage box through the recovery pipeline.
2. The apparatus of claim 1, wherein one of the first partition plates is connected to a side wall of the diffusion dialysis chamber.
3. The etching solution treatment apparatus according to claim 2, wherein one of the second partition plates is connected to a side wall of the diffusion dialysis chamber.
4. The etching solution treatment apparatus according to claim 1, wherein the ion exchange membrane is an anion exchange membrane.
5. The etching liquid processing apparatus according to claim 1, wherein the number of the first partition plates is the same as the number of the second partition plates.
6. The apparatus of claim 1, wherein the diffusion dialysis chamber has a liquid inlet and a liquid outlet on a sidewall thereof, and the liquid inlet and the liquid outlet penetrate the sidewall of the diffusion dialysis chamber.
7. The apparatus according to claim 6, further comprising a driving pump, a liquid inlet pipe and a liquid outlet pipe, wherein one end of the liquid inlet pipe is inserted into the dialysis chamber through the liquid inlet, one end of the liquid outlet pipe is inserted into the dialysis chamber through the liquid outlet, the liquid outlet pipe is provided with a first valve, the driving pump is arranged on the liquid inlet pipe, and the driving pump is used for providing power for conveying the waste etching solution to be treated into the dialysis chamber.
8. The etching liquid treatment apparatus according to any one of claims 1 to 7, further comprising a water inlet pipe, the water inlet pipe communicating with the diffusion chamber.
9. The etching liquid treatment apparatus according to any one of claims 1 to 7, wherein the recovery pipe is provided with a second valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021677760.3U CN212770969U (en) | 2020-08-12 | 2020-08-12 | Etching solution processing apparatus |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021677760.3U CN212770969U (en) | 2020-08-12 | 2020-08-12 | Etching solution processing apparatus |
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| CN212770969U true CN212770969U (en) | 2021-03-23 |
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| CN202021677760.3U Active CN212770969U (en) | 2020-08-12 | 2020-08-12 | Etching solution processing apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117358061A (en) * | 2023-10-19 | 2024-01-09 | 信阳师范学院 | Device and method for rapidly and efficiently preparing monoionic bentonite |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117358061A (en) * | 2023-10-19 | 2024-01-09 | 信阳师范学院 | Device and method for rapidly and efficiently preparing monoionic bentonite |
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