CN212692795U - Direct monitoring device for optical film forming of laser light source - Google Patents
Direct monitoring device for optical film forming of laser light source Download PDFInfo
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- CN212692795U CN212692795U CN202021179057.XU CN202021179057U CN212692795U CN 212692795 U CN212692795 U CN 212692795U CN 202021179057 U CN202021179057 U CN 202021179057U CN 212692795 U CN212692795 U CN 212692795U
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Abstract
The utility model belongs to the technical field of the vacuum coating technique and specifically relates to a laser source optics film forming direct monitoring device, its characterized in that: the monitoring system comprises a laser light source transmitter and a laser light source receiver, a laser monitoring light path is formed between the laser light source transmitter and the laser light source receiver, and the laser light source receiver is connected with a data processor which converts an optical signal of the laser monitoring light path into information capable of reflecting the thickness of a thin film on the coated substrate. The utility model has the advantages that: the monitoring precision is high, the optical axis does not need to be adjusted, and the use is convenient; and the spectrum can be measured in the middle of the coating process, and the correction can be carried out, so that the coating precision is improved.
Description
Technical Field
The utility model belongs to the technical field of the vacuum coating technique and specifically relates to a laser light source optics film forming direct monitoring device.
Background
The direct film thickness monitoring system is an optical detection method for acquiring the thickness of a film on a coated substrate by detecting the change of light before and after passing through the coated substrate. In the prior art, a monitoring light source adopts white light, but when incident light of the white light is not light with a single wavelength but light with a central wavelength in a range of +/_ x, the received light is a spectrometer, the resolution of the spectrometer is too poor, the spectrum of light with very close wavelengths cannot be resolved, the measured spectrum can be deformed, and further, the monitoring data is misaligned, so that the significance of monitoring is lost.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a laser light source optics film forming direct monitoring device according to above-mentioned prior art is not enough, adopts laser light source to carry out the direct monitoring of penetrating formula as the film thickness of control light path on to the coating film substrate, can realize the detection of film thickness and thick change of membrane.
The utility model discloses the purpose is realized accomplishing by following technical scheme:
the utility model provides a laser source optics film forming direct monitoring device, can realize detecting film thickness and the thick change of membrane on the coating film substrate which characterized in that: the monitoring device comprises a laser light source transmitter and a laser light source receiver, wherein a laser monitoring light path is formed between the laser light source transmitter and the laser light source receiver, and the laser light source receiver is connected with a data processor which converts an optical signal of the laser monitoring light path into information capable of reflecting the thickness of a thin film on a coated substrate.
The light source transmitter comprises a laser power source, a laser transmitting lens and a photointerrupter, the laser light source is connected with the photointerrupter through an optical fiber, the photointerrupter is connected with the laser transmitting lens through an optical fiber, and laser emitted by the laser power source is transmitted to the light source receiver from the laser transmitting lens.
The light source receiver comprises a laser receiving lens, a detector, a data processor and a power meter, wherein the laser receiving lens is connected with the detector through an optical fiber, the detector is respectively connected with the data processor and the power meter, and the data processor is connected with a chopping controller of the photointerrupter.
The laser light source transmitter and the laser light source receiver are respectively connected with a displacement mechanism, and the displacement mechanism can drive a monitoring optical path formed by the laser light source transmitter and the laser light source receiver to displace along the extending direction of a film coating on the coated substrate.
The utility model has the advantages that: the monitoring precision is high, the optical axis does not need to be adjusted, and the use is convenient; and the spectrum can be measured in the middle of the coating process, and the correction can be carried out, so that the coating precision is improved.
Drawings
FIG. 1 is a schematic structural view of the present invention in the form of an upper light projection arrangement;
fig. 2 is a schematic structural view of the lower light projection arrangement of the present invention.
Detailed Description
The features of the present invention and other related features are described in further detail below by way of example in conjunction with the accompanying drawings to facilitate understanding by those skilled in the art:
as shown in fig. 1-2, the symbols 1-16 in the figures are respectively represented as: the device comprises a vacuum coating chamber 1, a coated substrate 2, light path antifouling glass 3, light penetrating glass 4, a laser power supply 5, a photointerrupter 6, an optical fiber coupler 7, a laser light source transmitter 8, a laser light source receiver 9, a detector 10, a data processor 11, a power meter 12, a chopping controller 13, a software control box 14, a control box 15 and a displacement mechanism 16.
The first embodiment is as follows: the optical film forming direct optical monitoring device in the embodiment can realize detection of the thickness and the thickness change of the film on the coated substrate. As shown in fig. 1, a vacuum coating chamber 1 is a process chamber of a coating process, and a coated substrate 2 is loaded inside the vacuum coating chamber 1 in a flat plate shape. The coated substrate 2 in the vacuum coating chamber 1 can generate films with various functions on the surface of the substrate through a coating process.
As shown in fig. 1, the optical film forming direct optical monitoring system in this embodiment includes two monitoring optical paths with the same architecture, and the two monitoring optical paths can respectively and independently detect the thickness of the film on the coated substrate 2.
Specifically, each monitoring optical path includes a set of opposing laser light source transmitter 8 and laser light source receiver 9, and the laser light source transmitter 8 and the laser light source receiver 9 are positioned opposite to each other and the monitoring optical path formed therebetween penetrates through the coated substrate 2, i.e. the laser light source transmitter 8 can transmit the monitoring light source to the laser light source receiver 9 and the monitoring light source penetrates through the coated substrate 2. In this embodiment, as shown in fig. 1, a monitoring system in the form of an upper light projection arrangement is used, i.e., a laser light source transmitter 8 is located below the coated substrate 2, a laser light source receiver 9 is located above the coated substrate 2, and a monitoring light source penetrates the coated substrate 2 from bottom to top. In order to ensure the precision of the film thickness detection, a monitoring light path formed between the laser source transmitter 8 and the laser source receiver 9 is vertical to the coated substrate 2. The two laser light source transmitters 8 are arranged in a falling difference mode with a high level and a low level, so that mutual interference between the two laser light source transmitters is avoided.
As shown in fig. 1, the monitoring optical path used in the present embodiment is a laser optical path. The laser power source 5 is connected to a photointerrupter 6 for controlling the wavelength of the laser light through an optical fiber as a laser light emission source, and the photointerrupter 6 is connected to and controlled by a chopping controller 13. The photointerrupter 6 is connected with the optical fiber coupler 7 through an optical fiber to uniformly split the laser beam so as to form two laser monitoring light paths. The optical fiber coupler 7 is respectively connected with the two laser source transmitters 8 of the two monitoring light paths through optical fibers, so that the two laser source transmitters 8 can both emit laser to the laser source receiver 9.
As shown in fig. 1, two laser light source receivers 9 are respectively connected to their corresponding detectors 10 through optical fibers, and the detectors 10 are used for detecting and acquiring optical signals of laser light received from the laser light source receivers 9. The detector 10 is connected with the data processor 11 through signal lines respectively, and the data processor 11 converts the transmitted optical signal of the laser into a signal capable of reflecting the thickness information of the film on the coated substrate 2, thereby realizing the detection of the thickness of the film. In this embodiment, the data processor 11 may convert the optical signal into a voltage signal for output. Meanwhile, the two data processors 11 are also respectively connected with a power meter 12 and a chopping controller 13, wherein the power meter 12 is used for measuring the power and the variation of the voltage signal converted by the data input processor 11, and the chopping controller 13 is used for providing a wavelength control parameter of laser to the data processor 11 as a reference for the data processing and converting processes of the data processor 11, so as to improve the accuracy of the film thickness detection.
As shown in fig. 1, the control box 15 is used to centrally place the laser power supply 5, the photointerrupter 6, the detector 10, the data processor 11, the power meter 12, and the chopping controller 13 to improve the integrity and the integrity of the apparatus.
As shown in fig. 1, the embodiment further includes a software control box 14, and the software control box 14 is respectively connected to the laser power supply 5, the data processor 11, and the power meter 12 through data lines to form connection control and data interaction, so as to facilitate collection and processing of the film thickness detection result.
As shown in fig. 1, a displacement mechanism 16 is disposed below the laser light source transmitter 8, and the displacement mechanism 16 can drive the laser light source transmitter 8 to displace in the horizontal direction, thereby adjusting the penetration position of the monitoring optical path on the coated substrate 2. When the substrate is the flat plated film substrate 2 in the embodiment, the monitoring light path can be horizontally displaced along the film coating direction of the plated film substrate 2; the horizontal position of the laser source receiver 9 corresponding to the laser source transmitter 8 can also be adjusted to a certain extent, so as to ensure the requirement of accurately forming a monitoring light path between the two. In some embodiments, the displacement mechanism 16 may be implemented using a slide mechanism or a roller mechanism, among others.
The monitoring system in this embodiment includes the following working processes during monitoring:
the laser emitted by the laser power supply 5 is transmitted to a laser source transmitter 8 (which can adopt a laser lens) through an optical fiber, and the laser penetrates through the coated substrate 2 after being focused by the laser lens and is transmitted to a laser source receiver 9. The fixed-frequency optical signal is obtained by the chopper controller 13, processed by the data processor 11, and converted into a voltage signal for output. The transmittance (voltage value) of the coated substrate 2 changes along with the evaporation and adhesion of the coating material in the coating process of the coated substrate 2, thereby realizing the detection of the thickness of the film and the change of the thickness of the film. And when the coating is finished, the film thickness at the position can be determined by detecting the transmittance of the coated substrate 2.
Example two: the difference between the present embodiment and the first embodiment is: as shown in fig. 2, the monitoring system in the form of a downward projection arrangement is adopted in the present embodiment, that is, the laser source transmitter 8 is located above the coated substrate 2, the detector 10 is directly disposed below the coated substrate 2 as a laser source receiver, and the monitoring light source penetrates through the coated substrate 2 from top to bottom. Compared with the first embodiment, the monitoring effect is ensured, the equipment cost can be reduced, the application range of the monitoring system arrangement can be further expanded, the first embodiment is matched with the second embodiment to better adapt to vacuum coating of different models, and the operation convenience is improved. As shown in fig. 2, the two detectors 10 are arranged in a high-low falling height type arrangement to avoid interference between the two detectors.
The above embodiments are embodied as follows: no matter the first embodiment adopting the upper light projection type arrangement form or the second embodiment adopting the lower light projection type arrangement form, the light path antifouling glass 3 and the light penetrating glass 4 are arranged below the vacuum coating chamber 1, wherein the light penetrating glass 4 is used for monitoring the penetration and penetration of the light path from the inside and the outside of the vacuum coating chamber 1, and the light path antifouling glass 3 is used for protecting the light path. The light path antifouling glass 3 and the light penetrating glass 4 are obliquely arranged at a certain angle, so that film materials and the like are prevented from falling on the light path penetrated by laser and affecting the light quantity. Meanwhile, the inclination angles of the optical path antifouling glass 3 and the light penetrating glass 4 can be set to be complementary, so that the refraction influence generated when the monitoring light source penetrates through the optical path antifouling glass 3 and the light penetrating glass 4 is reduced or completely avoided.
The detector 10 and the data processor 11 are connected through a BNC signal line. The data processor 11 is connected with the power meter 12 through a signal wire.
In addition to the dual optical path used in the two embodiments, a single optical path of a laser source may be used to monitor the coated substrate 2 for specific applications. In some embodiments, if there is a need to increase the number of monitoring optical paths, the number of monitoring optical paths may also be increased according to design requirements.
The optical film forming direct type optical monitoring device in the embodiment adopts the laser light source as the monitoring light source, the light incidence is high monochromatic light, the purity is very pure, light splitting is not needed, only noise is filtered, the monitoring wavelength repeatability is better, the wavelength resolution is higher, the measured spectral accuracy in the film forming process by using the laser source is very high, and the correction can be carried out according to the measured spectral condition in the process.
Although the conception and the embodiments of the present invention have been described in detail with reference to the drawings, those skilled in the art will recognize that various changes and modifications can be made therein without departing from the scope of the appended claims, and therefore, the description thereof is not repeated herein.
Claims (4)
1. The utility model provides a laser source optics film forming direct monitoring device, can realize detecting film thickness and the thick change of membrane on the coating film substrate which characterized in that: the monitoring device comprises a laser light source transmitter and a laser light source receiver, wherein a laser monitoring light path is formed between the laser light source transmitter and the laser light source receiver, and the laser light source receiver is connected with a data processor which converts an optical signal of the laser monitoring light path into information capable of reflecting the thickness of a thin film on a coated substrate.
2. The apparatus for directly monitoring optical film formation of a laser light source according to claim 1, wherein: the light source transmitter comprises a laser power source, a laser transmitting lens and a photointerrupter, the laser light source is connected with the photointerrupter through an optical fiber, the photointerrupter is connected with the laser transmitting lens through an optical fiber, and laser emitted by the laser power source is transmitted to the light source receiver from the laser transmitting lens.
3. The apparatus for directly monitoring optical film formation of a laser light source according to claim 1, wherein: the light source receiver comprises a laser receiving lens, a detector, a data processor and a power meter, wherein the laser receiving lens is connected with the detector through an optical fiber, the detector is respectively connected with the data processor and the power meter, and the data processor is connected with a chopping controller of the photointerrupter.
4. The apparatus for directly monitoring optical film formation of a laser light source according to claim 1, wherein: the laser light source transmitter and the laser light source receiver are respectively connected with a displacement mechanism, and the displacement mechanism can drive a monitoring optical path formed by the laser light source transmitter and the laser light source receiver to displace along the extending direction of a film coating on the coated substrate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202021179057.XU CN212692795U (en) | 2020-06-23 | 2020-06-23 | Direct monitoring device for optical film forming of laser light source |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202021179057.XU CN212692795U (en) | 2020-06-23 | 2020-06-23 | Direct monitoring device for optical film forming of laser light source |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113512712A (en) * | 2021-06-01 | 2021-10-19 | 东莞隆润光学技术有限公司 | Film thickness correction plate and optical direct monitoring coating equipment |
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- 2020-06-23 CN CN202021179057.XU patent/CN212692795U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113512712A (en) * | 2021-06-01 | 2021-10-19 | 东莞隆润光学技术有限公司 | Film thickness correction plate and optical direct monitoring coating equipment |
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