CN212688178U - Microwave shielding tube magnetic field enhancement flat PECVD equipment - Google Patents
Microwave shielding tube magnetic field enhancement flat PECVD equipment Download PDFInfo
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- CN212688178U CN212688178U CN202021456885.3U CN202021456885U CN212688178U CN 212688178 U CN212688178 U CN 212688178U CN 202021456885 U CN202021456885 U CN 202021456885U CN 212688178 U CN212688178 U CN 212688178U
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Abstract
The utility model relates to the field of plasma production, in particular to a microwave shielding tube magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) device, which comprises a shell and at least two plasma generating devices arranged in the shell along the feeding direction, wherein a substrate table is arranged below the plasma generating devices, coaxial circular waveguides are arranged in the plasma generating devices, an upper air inlet pipe is arranged at the top of each plasma generating device, and lower air inlet pipes are arranged at two sides of the bottom of each plasma generating device; the bottom of the shell is communicated with a vacuum unit; the coaxial circular waveguide comprises a quartz glass tube, a copper antenna and a microwave shielding tube which are coaxially arranged, the quartz glass tube is arranged outside the copper antenna, the microwave shielding tube is arranged between the quartz glass tube and the copper antenna, and openings are formed in the upper end and the lower end of the side wall of the microwave shielding tube. The utility model provides a improve the PECVD equipment of the produced plasma's of microwave plasma source length, axial homogeneity and stability to promote productivity and performance.
Description
Technical Field
The utility model relates to a plasma production field especially relates to a dull and stereotyped PECVD equipment of microwave shield pipe magnetic field reinforcing.
Background
With the rapid development of low-temperature plasma technology in the fields of large-scale integrated circuits, solar cells, plasma display devices, diamond-like carbon and pure diamond films, etc., a plasma generating device capable of generating large-area uniform, low-pressure, high-density and stable plasma is urgently needed in the industry. Among the many plasma generating devices, the flat plate type PECVD apparatus has many unique advantages due to the use of a magnetic field enhanced linear microwave plasma source: the structure is simple, and the problem of impurity pollution caused by electrode insertion does not exist; the microwave excitation is adopted to obtain higher plasma density; because the linear structure only needs to ensure the uniformity of the plasma in the axial direction, a plurality of linear microwave plasma sources are arranged side by side to obtain the large-area uniform plasma; the magnetic field generated by the bar magnets on the two sides of the quartz glass tube can restrain the plasma to obtain higher plasma density.
In recent years, in order to reduce the cost, the industry is dedicated to the size upgrade of the flat plate type PECVD equipment, the width of the flat plate type PECVD equipment is continuously increased in the industry, the number of axial silicon wafers is increased from 5 to more, and the purpose of improving the productivity is further achieved. However, there are several problems associated with production in larger width plants: the increased width of the apparatus results in reduced axial uniformity of the generated plasma, a plasma density distribution decaying axially from both ends, and even no plasma is generated in the middle region of the apparatus. One of the current solutions in industry is to continuously increase the input microwave power at both ends of the coaxial circular waveguide, but when the input microwave power is increased to meet the process requirements, the limit power of the microwave source is reached. The solution has the disadvantages that on one hand, the microwave source is in an overload state for a long time, the service life of the microwave source is seriously reduced, and on the other hand, the excessive microwave power can cause the temperature in the coaxial circular waveguide to be too high, so that the quartz glass tube has the risk of melting; the second solution in the industry is to keep the microwave power below the microwave source limit power, and improve the plasma axial uniformity by reducing the vacuum chamber pressure, but reducing the vacuum chamber pressure requires a higher-performance vacuum unit, which means a great increase in cost; the stability of the equipment is reduced, the quality of the process is reduced and the continuous working time of the equipment is reduced only by changing the process parameters.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a dull and stereotyped PECVD equipment of microwave shield pipe magnetic field reinforcing to solve above-mentioned problem, provide the PECVD equipment of length, axial homogeneity and stability of the produced plasma of an improvement microwave plasma source, in order to promote productivity and performance.
In order to achieve the above object, the utility model provides a following scheme:
a microwave shielding tube magnetic field enhancement flat PECVD device comprises a shell and at least two plasma generating devices arranged in the shell along a feeding direction, wherein a substrate table is arranged below the plasma generating devices, coaxial circular waveguides are arranged in the plasma generating devices, an upper air inlet pipe is arranged at the top of each plasma generating device, and lower air inlet pipes are arranged on two sides of the bottom of each plasma generating device; the bottom of the shell is communicated with a vacuum unit;
the coaxial circular waveguide comprises a quartz glass tube, a copper antenna and a microwave shielding tube which are coaxially arranged, the quartz glass tube is arranged on the outer side of the copper antenna, the microwave shielding tube is arranged between the quartz glass tube and the copper antenna, and openings are formed in the upper end and the lower end of the side wall of the microwave shielding tube.
Preferably, the plasma generating device comprises a shielding cover and a bar magnet arranged on the upper surface of the shielding cover, the bar magnet is arranged on the outer side wall of the shielding cover, the upper air inlet pipe is arranged at the top of the shielding cover, and the lower air inlet pipe is arranged at two sides of the bottom of the shielding cover; the cross section of the shielding case is isosceles trapezoid.
Preferably, the housing and the shielding case are made of non-magnetic or weakly magnetic stainless steel materials, and the stainless steel material is any one of stainless steels 304, 321, 316 and 310.
Preferably, the bar magnet is made of an alloy permanent magnet material or a ferrite permanent magnet material, the alloy permanent magnet material is rubidium-nickel-cobalt-NdNiCo, and the ferrite permanent magnet material is any one of Cu-Ni-Fe, Fe-Co-Mo and Fe-Co-V, AlMnC.
Preferably, copper antenna, microwave shield pipe material are red copper, the copper antenna is solid cylinder, and radius range is 3 ~ 5mm, the length of copper antenna is greater than the width of casing, the copper antenna both ends are connected with the microwave source.
Preferably, the inner diameter range of the microwave shielding pipe is 7-12 mm, the outer diameter range of the microwave shielding pipe is 9-14 mm, the opening is prismatic, the small ends of the prismatic shape of the opening are arranged at two ends of the microwave shielding pipe, and the large end of the middle of the prismatic shape of the opening is arranged in the middle of the microwave shielding pipe.
Preferably, the dielectric constant of the quartz glass tube is 3.5-4.7, the inner diameter of the quartz glass tube is 10-15 mm, the outer diameter of the quartz glass tube is 12-17 mm, and the quartz glass tube is communicated with the atmosphere.
Preferably, a heating plate is arranged below the substrate table.
The utility model discloses has following technological effect:
a coaxial microwave shielding tube is introduced on the basis of the existing flat plate type PECVD equipment, and the shape of a shielding cover and the configuration of a bar magnet are optimized. Firstly, an opening coaxial microwave shielding tube is introduced between a copper inner conductor of a coaxial circular waveguide and a quartz glass tube, so that the transmission of microwaves can be promoted, microwave energy can still be transmitted to the middle area of a PECVD device with a longer width, and then plasma is generated in the middle area of the device;
secondly, by optimizing the shape of the shielding case and the configuration of the strip magnets, the density of the generated plasma can be improved, and the axial uniformity and stability of the plasma generated by the linear microwave plasma source in the flat-plate PECVD equipment are enhanced;
finally, the substrate stage with changeable height and the heating plate with controllable temperature can further control the energy of ions and active groups in the plasma, and the controllability and flexibility of the device are improved. The utility model discloses reduced the development degree of difficulty of the flat PECVD equipment of industrial bigger size, compared with current flat PECVD equipment, not only can improve the productivity, reduce cost can also improve its performance.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive labor.
FIG. 1 is a schematic view of the axial cross-section structure of the present invention;
FIG. 2 is a schematic view of the radial cross-section structure of the present invention;
FIG. 3 is a schematic view of the radial cross-section structure of the plasma generator of the present invention;
fig. 4 is a schematic view of the radial cross-section structure of the coaxial circular waveguide of the present invention;
fig. 5 is a schematic view of the coaxial circular waveguide of the present invention;
fig. 6 is a schematic view of the top view structure of the coaxial circular waveguide of the present invention.
Wherein, 1 is bar magnet, 2 is last intake pipe, 3 is the quartz glass pipe, 4 is the copper antenna, 5 is the microwave shielding pipe, 501 is the opening, 6 is lower intake pipe, 7 is the substrate platform, 8 is the hot plate, 9 is the casing, 10 is the vacuum unit, 11 is the shield cover.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention is described in detail with reference to the accompanying drawings and the detailed description.
The first embodiment is as follows:
referring to fig. 1-6, the present embodiment provides a magnetic field enhanced flat PECVD apparatus for a microwave shielding tube, including a housing 9, three plasma generation devices disposed inside the housing 9 along a feeding direction, a substrate table 7 disposed below the plasma generation devices, a coaxial circular waveguide disposed inside the plasma generation devices, a length of the plasma generation devices being greater than a width of the housing 9, an upper inlet tube 2 disposed at a top of the plasma generation devices, and lower inlet tubes 6 disposed at two sides of a bottom of the plasma generation devices; the bottom of the shell 9 is communicated with a vacuum unit 10; both ends are equipped with the gate of switch about casing 9 for pending sample business turn over.
The coaxial circular waveguide comprises a quartz glass tube 3, a copper antenna 4 and a microwave shielding tube 5 which are coaxially arranged, the quartz glass tube 3 is arranged outside the copper antenna 4, the microwave shielding tube 5 is arranged between the quartz glass tube 3 and the copper antenna 4, and openings 501 are formed in the upper end and the lower end of the side wall of the microwave shielding tube 5. The gas introduced from the upper gas inlet pipe 2 forms plasma on the outer surface of the quartz glass tube 3 under the action of a microwave electric field, and then collides with the gas introduced from the lower gas inlet pipe 6 through drift diffusion to ionize the gas, and the sample to be processed is placed on the substrate table 7 to complete film deposition. A microwave shielding tube 5 is introduced between a copper antenna 4 of a coaxial circular waveguide and a quartz glass tube 3, so that microwaves can be transmitted in the microwave shielding tube 5, openings 501 are formed in the upper end and the lower end of the side wall of the microwave shielding tube 5, and the microwaves are released from the openings 501 in the transmission process of the microwave shielding tube 5, so that the distance from the microwave transmission to the middle of equipment is increased.
According to a further optimized scheme, the plasma generating device comprises a shielding cover 11 and a bar magnet 1 arranged on the upper surface of the shielding cover 11, the bar magnet 1 is arranged on the outer side wall of the shielding cover 11, an upper air inlet pipe 2 is arranged at the top of the shielding cover 11, and a lower air inlet pipe 6 is arranged at the bottom of the shielding cover 11; the cross section of the shield case 11 is an isosceles trapezoid. The bar magnet 1 is a rectangular column, the length of the bar magnet is equal to that of the shielding case 11, the bar magnet is tightly attached to the outer side of the shielding case 11, two same bar magnets 1 are arranged above the shielding case 11, one bar magnet 1 is respectively arranged on two sides of the shielding case 11, and the magnetic field intensity generated can be controlled by the magnetization intensity and the size of the bar magnet 1. Through setting up shield cover 11 to isosceles trapezoid, the angle of control bar magnet 1 magnetic field that can be better to strengthen the concentration degree of plasma.
In a further optimized scheme, the shell 9 and the shielding case 11 are made of non-magnetic or weakly magnetic stainless steel materials, and the stainless steel material is any one of stainless steels 304, 321, 316 and 310.
According to the further optimized scheme, the bar magnet 1 is made of an alloy permanent magnet material or a ferrite permanent magnet material, the alloy permanent magnet material is rubidium-nickel-cobalt-NdNiCo, and the ferrite permanent magnet material is any one of Cu-Ni-Fe, Fe-Co-Mo and Fe-Co-V, AlMnC.
According to the further optimization scheme, the copper antenna 4 and the microwave shielding tube 5 are made of red copper, the copper antenna 4 is a solid cylinder with the radius of 4mm, the length of the copper antenna 4 is larger than the width of the shell 9, and the two ends of the copper antenna 4 are connected with microwave sources.
According to the further optimized scheme, the inner diameter of the microwave shielding tube 5 is 10mm, the outer diameter of the microwave shielding tube 5 is 12mm, the opening 501 is prismatic, the prismatic small end of the opening 501 is arranged at two ends of the microwave shielding tube 5, and the prismatic middle large end of the opening 501 is arranged in the middle of the microwave shielding tube 5. The opening 501 is prismatic, microwaves are gradually weakened in the process of being transmitted from two ends to the middle of the shielding tube 5, the large end of the middle of the prismatic shape is arranged in the middle of the microwave shielding tube 5, the more the weakened microwaves are closer to the middle, the larger the transmitted quantity is, and therefore the microwaves transmitted to the outside are more uniform.
According to the further optimization scheme, the dielectric constant of the quartz glass tube 3 is 3.5-4.7, the inner diameter of the quartz glass tube 3 is 13mm, the outer diameter of the quartz glass tube 3 is 15mm, and the quartz glass tube 3 is communicated with the atmosphere. Air is introduced for cooling the copper antenna 4.
In a further optimized scheme, a heating plate 8 is arranged below the substrate table 7. The substrate table 7 is connected with an electric lifter, the heating plate 8 is connected with a power supply, the electric lifter is used for adjusting the height of the substrate table 7, and the temperature of the heating plate 8 can be adjusted according to different process requirements to obtain the optimal deposition condition.
The upper gas inlet pipe 2 and the lower gas inlet pipe 6 are filled with gas, wherein the gas is inert gas, oxidizing gas, reducing gas, hydrocarbon gas or gasified liquid, and mixed gas of silane, argon, hydrogen and silane or hydrocarbon gas. The gas which is generally more difficult to ionize is introduced from the upper gas inlet pipe 2, and the gas which is easy to ionize is introduced from the lower two-side gas inlet pipe 6. The microwave source has a frequency of 2.45GHz and can adopt a continuous wave mode or a pulse mode.
The utility model discloses a theory of operation:
the utility model discloses an use with copper antenna 1 as the inner conductor, the outside is around the coaxial transmission waveguide as the outer conductor at quartz glass pipe 3, makes the microwave pass through with plasma interact along the surface propagation of quartz glass pipe 3. The gas introduced from the upper gas inlet pipe 2 forms plasma on the outer surface of the quartz glass tube 3 under the action of a microwave electric field, and then collides with the gas introduced from the lower gas inlet pipe 6 through drift diffusion to ionize the gas, and the sample to be processed is placed on the substrate table 7 to complete film deposition. According to the theory of coaxial transmission lines, a copper microwave shielding tube 5 is introduced between a copper antenna 4 of a coaxial circular waveguide and a quartz glass tube 3, so that microwave transmission to the middle of the coaxial circular waveguide can be promoted, and the microwave enters a shell 9 at the upper opening and the lower opening of the microwave shielding tube 5 to interact with gas to generate plasma; the configuration of the trapezoidal shielding case 11 and the surrounding bar magnets 1 can not only restrict the distribution of plasma and increase the collision frequency of electrons in an effective range so as to increase the density of the plasma, but also obviously improve the axial uniformity and stability of the plasma generated by the linear microwave plasma source.
Example two:
the PECVD apparatus of this embodiment is different from the first embodiment only in that: the copper antenna 4 is a solid cylinder with a radius of 3mm, the inner diameter of the microwave shielding tube 5 is 7mm, the outer diameter of the microwave shielding tube 5 is 9mm, the inner diameter of the quartz glass tube 3 is 10mm, and the outer diameter of the quartz glass tube 3 is 12 mm.
Example three:
the PECVD apparatus of this embodiment is different from the first embodiment only in that: the copper antenna 4 is a solid cylinder with the radius of 5mm, the inner diameter of the microwave shielding tube 5 is 12mm, the outer diameter of the microwave shielding tube 5 is 14mm, the inner diameter of the quartz glass tube 3 is 15mm, and the outer diameter of the quartz glass tube 3 is 17 mm.
In the description of the present invention, it is to be understood that the terms "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are merely for convenience of description of the present invention, and do not indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
The above-mentioned embodiments are only intended to describe the preferred embodiments of the present invention, but not to limit the scope of the present invention, and those skilled in the art should also be able to make various modifications and improvements to the technical solution of the present invention without departing from the spirit of the present invention, and all such modifications and improvements are intended to fall within the scope of the present invention as defined in the appended claims.
Claims (8)
1. A microwave shielding tube magnetic field enhanced flat PECVD equipment is characterized in that: the plasma generator comprises a shell (9) and at least two plasma generating devices arranged in the shell (9) along a feeding direction, wherein a substrate table (7) is arranged below the plasma generating devices, coaxial circular waveguides are arranged in the plasma generating devices, an upper air inlet pipe (2) is arranged at the top of each plasma generating device, and lower air inlet pipes (6) are arranged on two sides of the bottom of each plasma generating device; the bottom of the shell (9) is communicated with a vacuum unit (10);
coaxial circular waveguide is including coaxial quartz glass pipe (3), copper antenna (4), the microwave shielding pipe (5) that sets up, quartz glass pipe (3) are in the copper antenna (4) outside, microwave shielding pipe (5) set up between quartz glass pipe (3), copper antenna (4), both ends are equipped with opening (501) about microwave shielding pipe (5) lateral wall.
2. The PECVD apparatus of a microwave shielding tube magnetic field enhanced plate, which is characterized in that: the plasma generating device comprises a shielding cover (11) and a bar magnet (1) arranged on the upper surface of the shielding cover (11), the bar magnet (1) is arranged on the outer side wall of the shielding cover (11), the upper air inlet pipe (2) is arranged at the top of the shielding cover (11), and the lower air inlet pipes (6) are arranged on two sides of the bottom of the shielding cover (11); the cross section of the shielding case (11) is isosceles trapezoid.
3. The PECVD apparatus of a microwave shielding tube magnetic field enhanced plate, which is characterized in that: the shell (9) and the shielding case (11) are made of non-magnetic or weak-magnetic stainless steel materials, and the stainless steel materials are any one of stainless steel 304, 321, 316 and 310.
4. The PECVD apparatus of a microwave shielding tube magnetic field enhanced plate, which is characterized in that: the bar magnet (1) is made of an alloy permanent magnet material or a ferrite permanent magnet material.
5. The PECVD apparatus of a microwave shielding tube magnetic field enhanced plate, which is characterized in that: copper antenna (4), microwave shielding pipe (5) material are red copper, copper antenna (4) are solid cylinder, and radius range is 3 ~ 5mm, copper antenna (4) length is greater than casing (9) width, copper antenna (4) both ends are connected with the microwave source.
6. The PECVD apparatus of a microwave shielding tube magnetic field enhanced plate, which is characterized in that: microwave shielding pipe (5) internal diameter scope is 7 ~ 12mm, microwave shielding pipe (5) external diameter scope is 9 ~ 14mm, opening (501) are the prism, the tip setting of opening (501) prism is in microwave shielding pipe (5) both ends, the middle part main aspects setting of opening (501) prism is in the centre of microwave shielding pipe (5).
7. The PECVD apparatus of a microwave shielding tube magnetic field enhanced plate, which is characterized in that: the quartz glass tube (3) is characterized in that the dielectric constant is 3.5-4.7, the inner diameter range of the quartz glass tube (3) is 10-15 mm, the outer diameter range of the quartz glass tube (3) is 12-17 mm, and the quartz glass tube (3) is communicated with the atmosphere.
8. The PECVD apparatus of a microwave shielding tube magnetic field enhanced plate, which is characterized in that: and a heating plate (8) is arranged below the substrate table (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021456885.3U CN212688178U (en) | 2020-07-22 | 2020-07-22 | Microwave shielding tube magnetic field enhancement flat PECVD equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021456885.3U CN212688178U (en) | 2020-07-22 | 2020-07-22 | Microwave shielding tube magnetic field enhancement flat PECVD equipment |
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| Publication Number | Publication Date |
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| CN212688178U true CN212688178U (en) | 2021-03-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021456885.3U Withdrawn - After Issue CN212688178U (en) | 2020-07-22 | 2020-07-22 | Microwave shielding tube magnetic field enhancement flat PECVD equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111690913A (en) * | 2020-07-22 | 2020-09-22 | 中南大学 | Microwave shielding pipe and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment |
-
2020
- 2020-07-22 CN CN202021456885.3U patent/CN212688178U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111690913A (en) * | 2020-07-22 | 2020-09-22 | 中南大学 | Microwave shielding pipe and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment |
| CN111690913B (en) * | 2020-07-22 | 2023-06-23 | 中南大学 | Microwave shielding tube and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment |
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| AV01 | Patent right actively abandoned | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20210312 Effective date of abandoning: 20230623 |
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| AV01 | Patent right actively abandoned |
Granted publication date: 20210312 Effective date of abandoning: 20230623 |