CN212199404U - Revolution and rotation film coating device for coating film - Google Patents

Revolution and rotation film coating device for coating film Download PDF

Info

Publication number
CN212199404U
CN212199404U CN202020699553.1U CN202020699553U CN212199404U CN 212199404 U CN212199404 U CN 212199404U CN 202020699553 U CN202020699553 U CN 202020699553U CN 212199404 U CN212199404 U CN 212199404U
Authority
CN
China
Prior art keywords
rotating frame
rotation
revolution
driving device
small
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202020699553.1U
Other languages
Chinese (zh)
Inventor
余海春
戴晓东
陈韶华
卜钦钦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optorun Shanghai Co Ltd
Original Assignee
Optorun Shanghai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Optorun Shanghai Co Ltd filed Critical Optorun Shanghai Co Ltd
Priority to CN202020699553.1U priority Critical patent/CN212199404U/en
Application granted granted Critical
Publication of CN212199404U publication Critical patent/CN212199404U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

The utility model relates to the technical field of film preparation, in particular to a revolution and rotation film coating device for film coating, which comprises a vacuum cavity, a large rotating frame and a small rotating frame, wherein the large rotating frame and the small rotating frame are both arranged inside the vacuum cavity, the small rotating frame is arranged on the large rotating frame, and the small rotating frame and the large rotating frame form a rotating fit; the large rotating frame is connected with a revolution driving device, the revolution driving device is arranged outside the vacuum cavity, the revolution driving device is connected with and drives the large rotating frame to revolve in the vacuum cavity, the small rotating frame is connected with a rotation driving device, the rotation driving device is arranged inside the vacuum cavity, and the rotation driving device is connected with and drives the small rotating frame to rotate on the large rotating frame; the large rotating frame and the small rotating frame are cylindrical rotating frames. The utility model has the advantages that: by adjusting the rotating speed ratio of revolution to rotation, the distribution of deposition time can be changed, the uniformity of the thickness of the film is improved, and the prepared film has the advantages of better uniformity, high sputtering efficiency and the like.

Description

Revolution and rotation film coating device for coating film
Technical Field
The utility model belongs to the technical field of the film preparation technique and specifically relates to a revolution and rotation coating device for coating film.
Background
There are two common methods for preparing optical films, one is sputtering and the other is evaporation. In the sputtering method, ions are generally used to bombard the surface of the target material, and atoms of the target material are bombarded out and deposited on the surface of the substrate to form a film. In the evaporation method, an optical thin film is generally deposited on the surface of the substrate by means of electron beam or thermal evaporation.
The conventional film forming apparatus improves the uniformity of a deposited film on the surface of a substrate by a revolution and rotation structure of a substrate tray (workpiece tray). The uniformity and precision of the deposited film on the substrate surface are closely related to the revolution/rotation speed ratio of the substrate tray (workpiece tray). And the revolution and rotation speed ratios required for obtaining the high-uniformity film by different coating materials are different. With the continuous expansion of the application of optical films, more and more products are coated with films to improve the service performance of the optical films, but for products with complex curved surface structures, no better equipment is available for realizing the coating of the surfaces of the optical films.
Disclosure of Invention
The utility model aims at providing a revolution and rotation coating device for coating film according to above-mentioned prior art is not enough, realizes revolution and rotation through setting up big revolving rack and little revolving rack to can change the distribution that bears the coating film product deposition time that receives on little revolving rack, thereby improve film thickness's homogeneity.
The utility model discloses the purpose is realized accomplishing by following technical scheme:
the utility model provides a revolution and rotation coating device for coating film which characterized in that: the device comprises a vacuum cavity, a large rotating frame and a small rotating frame, wherein the large rotating frame and the small rotating frame are both arranged in the vacuum cavity, the small rotating frame is arranged on the large rotating frame, and the large rotating frame and the small rotating frame form rotating fit; the large rotating frame is connected with a revolution driving device, the revolution driving device is arranged outside the vacuum cavity, the revolution driving device is connected with and drives the large rotating frame to revolve in the vacuum cavity, the small rotating frame is connected with a rotation driving device, the rotation driving device is arranged inside the vacuum cavity, and the rotation driving device is connected with and drives the small rotating frame to rotate on the large rotating frame; the large rotating frame and the small rotating frame are cylindrical rotating frames.
The rotation fit between the small rotating frame and the large rotating frame means that the rotation rotating shaft of the small rotating frame is arranged on the large rotating frame, and the rotation rotating shaft and the frame body of the large rotating frame form shaft hole fit, so that the rotation rotating shaft can rotate under the connection drive of the rotation driving device.
The revolution driving device comprises a motor, a synchronous belt wheel and a magnetic fluid, wherein the motor is connected with the magnetic fluid through the synchronous belt wheel, and the magnetic fluid is fixedly connected with the large rotating frame.
The rotation driving device is a vacuum motor which is fixedly arranged on the large rotating frame.
The vacuum motor is connected with a motor slip ring through an electrode lead-in flange, and the motor slip ring is a power part of the vacuum motor.
The vacuum motor is provided with a cooling water pipeline.
And a plurality of small rotating frames are uniformly arranged along the circumference of the large rotating frame at intervals.
The utility model has the advantages that: by adjusting the rotating speed ratio of revolution to rotation, the distribution of deposition time can be changed, the uniformity of the thickness of the film is improved, and the prepared film has the advantages of better uniformity, high sputtering efficiency and the like; the revolution and rotation speed control system is suitable for coating of products with complex curved surface structures, revolution and rotation speeds can be respectively controlled by the revolution and rotation speed control system, and flexibility in coating process design is higher; the operation stability is better, and the service life is longer.
Drawings
Fig. 1 is a schematic structural view of the present invention;
fig. 2 is a schematic perspective view of the present invention.
Detailed Description
The features of the present invention and other related features are described in further detail below by way of example in conjunction with the accompanying drawings to facilitate understanding by those skilled in the art:
as shown in fig. 1-2, reference numerals 1-12 are respectively shown as: the device comprises a vacuum cavity 1, a driving motor 2, a synchronous pulley 3, a motor slip ring 4, an electrode leading-in flange 5, a water channel lantern ring 6, a magnetic fluid 7, an insulating flange 8, a large rotating frame 9, a vacuum motor 10, a small rotating frame 11 and a cooling water pipeline 12.
Example (b): as shown in fig. 1 and fig. 2, the revolution and rotation coating device for coating in this embodiment includes a vacuum chamber 1, a large rotating stand 9 and a small rotating stand 11, wherein the large rotating stand 9 and the small rotating stand 11 are both disposed inside the vacuum chamber 1; during film coating, the inside of the vacuum cavity 1 is a vacuum environment (vacuum side), the large rotating frame 9 and the small rotating frame 11 are both positioned in the vacuum environment, and the small rotating frame 11 is used for carrying a film coating product.
Referring to fig. 1 and 2, the large rotating frame 9 is a cylindrical structure, and the magnetic fluid 7 is fixedly installed at the center of the large rotating frame, that is, the large rotating frame 9 rotates in the vacuum chamber 1 under the driving of the magnetic fluid 7 serving as a rotating shaft. The magnetic fluid 7 is a sealing rotating shaft for vacuum equipment, the vacuum side of the magnetic fluid is connected with a large rotating frame 9, the atmosphere is directly connected with a driving motor 2 serving as a power system, and the driving motor are in transmission fit through the synchronous belt wheel 3. The rotating speed of the large rotating frame 9 in the vacuum cavity 1 can be adjusted by adjusting the rotating speed of the driving motor 2.
The small rotating frames 11 are a plurality of cylindrical rotating frames which are fixedly arranged on the large rotating frame 9, the small rotating frames 11 are uniformly arranged at intervals along the circumferential direction of the large rotating frame 9, and each small rotating frame 11 can independently rotate on the large rotating frame 9. Specifically, as shown in fig. 1 and 2, a rotation rotating shaft is disposed at the center of each small rotating frame 11, two ends of the rotation rotating shaft are respectively matched with the shaft holes formed between the frame bodies of the large rotating frame 9, and one end of the rotation rotating shaft is connected to a vacuum motor 10; the rotation rotating shaft drives the small rotating frame 11 body to rotate on the large rotating frame 9 under the drive of the vacuum motor 10. The rotation speed of the small turret 11 on the large turret 9 can be adjusted by adjusting the rotation speed of the vacuum motor 10.
During film coating, the large rotating frame 9 and the small rotating frames 11 positioned in the vacuum cavity 1 both rotate, the large rotating frame 9 revolves under the driving of the driving motor 2, and each small rotating frame 11 rotates under the driving of the correspondingly connected vacuum motor 10; by adjusting the rotating speed ratio of revolution to rotation, the distribution of the coating material deposition time borne by the coating product carried on the small rotating frame 11 can be changed, so that the uniformity of the thickness of the film is improved, the coating device is particularly suitable for coating the product with a complex curved surface structure, and the flexibility in coating process design is stronger.
In the embodiment, in specific implementation: the revolution driving system of the large rotating frame 9 and the rotation system of the small rotating frame 11 are isolated by the vacuum chamber 1, namely, the revolution driving system is positioned outside the vacuum chamber 1 (on the atmosphere side), and the rotation driving system is positioned inside the vacuum chamber 1 (on the vacuum side).
Therefore, in order to introduce the power and cooling system driven by rotation into the vacuum chamber 1, the motor power line of the vacuum motor 10 is introduced into the vacuum chamber 1 through the motor slip ring 4, the electrode introduction flange 5 and the magnetic fluid 7, and the sealing effect is achieved. Specifically, as shown in fig. 1, a motor slip ring 4 is installed outside the vacuum chamber 1, and is connected with an electrode (not shown in the figure) as a motor power line of a vacuum motor 10, the electrode is fixedly installed through an electrode introduction flange 5 and enters the inside of the vacuum chamber 1, and is connected with the vacuum motor 10 through a magnetic fluid 7, so that power is introduced into the vacuum motor 10 located in the vacuum chamber 1 from the atmosphere side outside the vacuum chamber 1, thereby driving the small turret 11 to rotate.
As shown in fig. 1, in order to improve the operation stability of the vacuum motor 10 and to make the service life thereof longer, the vacuum motor 10 may be further connected with a cooling water line 12, and the cooling water line 12 is introduced into the vacuum chamber 1 through the waterway collar 6. As shown in the arrow direction in fig. 1, cooling water is introduced from the atmosphere side position of the magnetic fluid 7, is connected to the large rotating frame 9 through a water channel in the magnetic fluid 7 body, and a circle of copper pipe water channel is attached to the large rotating frame 9 to cool the large rotating frame 9 and the vacuum motor 10, then returns to the magnetic fluid 7 body, and finally is discharged from the atmosphere side position of the magnetic fluid 7.
In order to realize the insulation between the rotating frame and the equipment main body, an insulating flange 8 is arranged at the connecting position between the rotating frame and the equipment main body, so that the rotating frame and the equipment are prevented from being gradually communicated with each other, and the insulation is realized.
Although the conception and the embodiments of the present invention have been described in detail with reference to the drawings, those skilled in the art will recognize that various changes and modifications can be made therein without departing from the scope of the appended claims, and therefore, the description thereof is not repeated herein.

Claims (7)

1. The utility model provides a revolution and rotation coating device for coating film which characterized in that: the device comprises a vacuum cavity, a large rotating frame and a small rotating frame, wherein the large rotating frame and the small rotating frame are both arranged in the vacuum cavity, the small rotating frame is arranged on the large rotating frame, and the large rotating frame and the small rotating frame form rotating fit; the large rotating frame is connected with a revolution driving device, the revolution driving device is arranged outside the vacuum cavity, the revolution driving device is connected with and drives the large rotating frame to revolve in the vacuum cavity, the small rotating frame is connected with a rotation driving device, the rotation driving device is arranged inside the vacuum cavity, and the rotation driving device is connected with and drives the small rotating frame to rotate on the large rotating frame; the large rotating frame and the small rotating frame are cylindrical rotating frames.
2. The revolution and rotation coating device for coating according to claim 1, wherein: the rotation fit between the small rotating frame and the large rotating frame means that the rotation rotating shaft of the small rotating frame is arranged on the large rotating frame, and the rotation rotating shaft and the frame body of the large rotating frame form shaft hole fit, so that the rotation rotating shaft can rotate under the connection drive of the rotation driving device.
3. The revolution and rotation coating device for coating according to claim 1, wherein: the revolution driving device comprises a motor, a synchronous belt wheel and a magnetic fluid, wherein the motor is connected with the magnetic fluid through the synchronous belt wheel, and the magnetic fluid is fixedly connected with the large rotating frame.
4. The revolution and rotation coating device for coating according to claim 1, wherein: the rotation driving device is a vacuum motor which is fixedly arranged on the large rotating frame.
5. The revolution and rotation coating device for coating according to claim 4, wherein: the vacuum motor is connected with a motor slip ring through an electrode lead-in flange, and the motor slip ring is a power part of the vacuum motor.
6. The revolution and rotation coating device for coating according to claim 4, wherein: the vacuum motor is provided with a cooling water pipeline.
7. The revolution and rotation coating device for coating according to claim 1, wherein: and a plurality of small rotating frames are uniformly arranged along the circumference of the large rotating frame at intervals.
CN202020699553.1U 2020-04-30 2020-04-30 Revolution and rotation film coating device for coating film Active CN212199404U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202020699553.1U CN212199404U (en) 2020-04-30 2020-04-30 Revolution and rotation film coating device for coating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202020699553.1U CN212199404U (en) 2020-04-30 2020-04-30 Revolution and rotation film coating device for coating film

Publications (1)

Publication Number Publication Date
CN212199404U true CN212199404U (en) 2020-12-22

Family

ID=73831665

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202020699553.1U Active CN212199404U (en) 2020-04-30 2020-04-30 Revolution and rotation film coating device for coating film

Country Status (1)

Country Link
CN (1) CN212199404U (en)

Similar Documents

Publication Publication Date Title
CA1225364A (en) Magnetron cathode sputtering apparatus
US4062319A (en) Vacuum treating apparatus
US6203619B1 (en) Multiple station apparatus for liquid source fabrication of thin films
US4943363A (en) Cathode sputtering system
CN100392147C (en) Pair target twin magnetic controlled sputtering ion plating deposition device
CN102534527B (en) Magnetron sputtering source and magnetron sputtering equipment
CN111826624A (en) HIPIMS sputtering method and HIPIMS sputtering system
CN105714256A (en) Method for low-temperature preparation of DLC film through magnetron sputtering
CN110760808B (en) Curved surface screen magnetron sputtering assembly
CN212199404U (en) Revolution and rotation film coating device for coating film
CN110527966B (en) Horizontal magnetron sputtering equipment for long pipe coating
CN211734462U (en) Curved surface screen magnetron sputtering subassembly
WO2023221572A1 (en) Coating system
CN107815659A (en) A kind of optical fiber cylindrical side uniform coated devices and methods therefor
CN116121690A (en) Coating preparation device
JPH0350832B2 (en)
CN210420144U (en) Sputtering film forming device
JPH0794711B2 (en) Rotary table for ion plating device
JP3056222B2 (en) Sputtering apparatus and sputtering method
CN211311572U (en) Physical vapor deposition equipment
JPH07292471A (en) Sputtering method
CN210215522U (en) Equipment for evaporating and plating terbium or dysprosium on surface of magnetic material
CN103147056A (en) Moving field vacuum coating magnetron sputtering source
CN111254403A (en) Magnetron sputtering cavity for improving uniformity of metal oxide film
CN211771529U (en) Two-position multi-target ion beam deposition device

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant