CN211999903U - Coating equipment for manufacturing double-sided transparent conductive oxide film - Google Patents
Coating equipment for manufacturing double-sided transparent conductive oxide film Download PDFInfo
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- CN211999903U CN211999903U CN201922024613.XU CN201922024613U CN211999903U CN 211999903 U CN211999903 U CN 211999903U CN 201922024613 U CN201922024613 U CN 201922024613U CN 211999903 U CN211999903 U CN 211999903U
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Abstract
The utility model discloses a coating equipment for manufacturing double-sided transparent conductive oxide films, which at least comprises a first coating cavity (1) and a second coating cavity (2), and a transmission belt (3) which is used for transmitting a coating support plate and traverses the first coating cavity and the second coating cavity, wherein coating sources are respectively arranged in the first coating cavity and the second coating cavity, and when the support plate to be coated passes through the first coating cavity and the second coating cavity in sequence, the coating sources are used for coating the double sides of the support plate to be coated with the transparent conductive oxide films; the utility model provides a shortcoming of ion coating film and sputter coating film, effectively solve the coating film dust to the influence of TCO film quality and product efficiency, when especially being fit for high efficiency film silicon/crystal silicon heterojunction solar cell's front and back continuous production, the direction is by the dust that the accumulated formation of upper film stack of lower up coating film source caused and produce the defect, just the utility model discloses an equipment and method are applicable in the coating film source of multiple TCO material and different patterns that have different performance.
Description
Technical Field
The utility model relates to a solar cell panel manufacture equipment especially relates to a can effectively avoid dust pollution's coating equipment to two-sided transparent conductive oxide film of solar cell panel preparation.
Background
In the TCO film manufacturing process of the SHJ solar cell, some magnetron sputtering coating equipment and method are selected, and TCO coating is continuously carried out on the front surface and the back surface in the coating equipment under the condition that a cell piece does not need to be turned over; some of the ion plating apparatuses and methods select Reactive Plasma Deposition (RPD) equipment and methods, after one surface is plated, the cell is turned over, and then the other surface is plated. However, the conversion efficiency of the battery is low due to the influence of plasma bombardment damage in magnetron sputtering coating on the amorphous silicon thin film. In the RPD equipment, the coating of the front surface and the back surface can be realized only by turning over the battery, although the bombardment and the damage to the amorphous silicon film are small in the TCO coating process, the conversion efficiency of the battery is obviously improved, but the defects of complex equipment structure and high operation cost exist.
In the prior art, there is a coating apparatus for producing a double-sided transparent conductive oxide film, in which an ion coating source and a sputter coating source are integrated at the same time. However, the equipment still has the defects that dust generated in the production process can be deposited on the shielding plate of the upper top cover on the inner side of the cavity, the dust is generated after falling due to temperature change during actual deposition and is attached to the upper surface of the substrate to be coated, the design sequence of the cavity is that the coating source is placed from bottom to top in the front, and when the upper coating source and the lower coating source are placed in the rear, the dust generated above the lower coating source and the upper coating source can cause the quality of a film deposited by the upper coating source and the lower coating source to be reduced. In addition, once the dust is coated by the TCO, the dust cannot be removed, which increases the defect rate of the appearance of the battery, and also causes a poor dark spot during the EL detection, which finally decreases the conversion efficiency of the battery.
Therefore, it is an urgent technical problem in the art to design a coating apparatus capable of effectively avoiding dust pollution and manufacturing a double-sided transparent conductive oxide film for a solar cell panel.
SUMMERY OF THE UTILITY MODEL
In order to solve the above defects existing in the prior art, the utility model provides a can effectively avoid dust pollution, and to the coating equipment of the two-sided transparent conductive oxide film of solar cell panel preparation.
The utility model discloses a technical scheme be the coating equipment of design preparation two-sided transparent conductive oxide film, it includes first coating film chamber and second coating film chamber at least, crosses the transmission band that is used for transmitting solar cell panel in first and second coating film chamber, and first and second coating film intracavity is equipped with the coating film source respectively, when solar cell panel passes first and second coating film chamber in proper order, the coating film source is to the transparent conductive oxide film of solar cell panel two-sided plating system.
And a dust removal cavity for removing dust is arranged between the first film coating cavity and the second film coating cavity.
In the first coating cavity, a coating source is positioned above the conveying belt; and in the second coating cavity, the coating source is positioned below the transmission belt.
When three or more coating cavities are integrated in the coating equipment at the same time, the coating source is arranged in the coating cavity above the conveying belt and is arranged in front of the coating cavity below the conveying belt.
An electric partition plate is arranged at the position of the dust removing cavity, which is connected with the first film coating cavity and the second film coating cavity, so that the first film coating cavity, the dust removing cavity and the second film coating cavity are divided into independent cavities; and an electrostatic dust collector is arranged in the dust removing cavity and above the conveying belt.
The top of the dust removal cavity is provided with a lower airflow generator, and the bottom of the dust removal cavity is provided with an air outlet port.
A dust labyrinth is arranged inside the dust removing cavity and below the conveying belt; a plurality of partition plates are alternately extended out of the side wall of the dust removal cavity to form a zigzag dust labyrinth.
The bottom in dust removal chamber is equipped with the concentrated chamber of dust, the port of giving vent to anger is located between dust labyrinth and the concentrated chamber of dust.
And an access door is arranged on the side wall of the dust removing cavity.
The coating source comprises a sputtering coating source and an ion coating source; the sputtering coating source adopts one of a target magnetron sputtering coating source, a direct current sputtering coating source, an alternating current pulse sputtering coating source and a radio frequency alternating current sputtering coating source; the ion coating source adopts one of a reactive plasma deposition ion coating source and an electron beam evaporation ion coating source.
The utility model provides a technical scheme's beneficial effect is:
the utility model provides a shortcoming of ion coating film and sputter coating film, effectively solve the coating film dust to the influence of TCO film quality and product efficiency, when especially being fit for high efficiency film silicon/crystal silicon heterojunction solar cell's front and back continuous production, the direction is by the dust that the accumulated product of upper film of lower up coating film source caused and produce the defect, just the utility model discloses an equipment and method are applicable in the coating film source of multiple TCO material and different types that have different performance.
Drawings
The invention is explained in more detail below with reference to exemplary embodiments and the accompanying drawings, in which:
FIG. 1 is a schematic structural diagram of a solar cell panel with transparent conductive oxide films plated on both sides;
FIG. 2 is a schematic view of a structure of a coating apparatus according to a preferred embodiment of the present invention;
fig. 3 is a side view of the dust-removing chamber according to the preferred embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention will be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
FIG. 1 shows a schematic diagram of a solar cell panel structure, which is useful in the present inventionThe front and back surfaces are plated with transparent conductive oxide films. The icon 21 indicates an electrode, the icon 22 indicates a TCO layer, and the icon 23 indicates P-Type-doped silicon-based film, designated by the reference numeral 24 as an intrinsic silicon-based film, designated by the reference numeral 25 as an n-type single crystal silicon-based layer, designated by the reference numeral 26 as n-And (3) forming a silicon-based doped thin film. The transparent conductive oxide film is made of one of tin-doped indium oxide, aluminum-doped indium oxide, tungsten-doped indium oxide, titanium-doped indium oxide, cesium-doped indium oxide, aluminum-doped zinc oxide, gallium-doped zinc oxide and aluminum-gallium-doped zinc oxide. The utility model aims to solve the technical problem that a coating equipment of two-sided preparation transparent conductive oxide film is provided, avoid the dust to TCO film quality and product efficiency's influence.
The utility model discloses a coating equipment of preparation two-sided transparent conductive oxide film, refer to the coating equipment structure sketch map that fig. 2 shows, it includes first coating film chamber 1 and second coating film chamber 2 at least, crosses the transmission band 3 that is used for transmitting solar cell panel in first and second coating film chamber, and first and second coating film intracavity is equipped with the coating film source respectively. When the transmission band 3 bears the solar cell panel and sequentially passes through the first coating cavity and the second coating cavity, the coating sources are used for coating transparent conductive oxide films on the front side and the back side of the solar cell panel.
In a preferred embodiment, a dust removal cavity 12 for removing dust is arranged between the first coating cavity 1 and the second coating cavity 2. The solar panel is coated with a film on one side in the first film coating cavity 1, the solar panel is subjected to dust removal treatment when passing through the dust removal cavity 12, and then the other side of the solar panel is coated with a film in the second film coating cavity 2. The prepared battery has high appearance yield and high EL yield, the coating quality is improved, and the large-scale mass production can be realized.
In a preferred embodiment, in the first coating cavity, the coating source is positioned above the conveying belt; and in the second coating cavity, the coating source is positioned below the transmission belt.
When three or more coating cavities are integrated in the coating equipment at the same time, the coating source is arranged in the coating cavity above the conveying belt and is arranged in front of the coating cavity below the conveying belt.
In a preferred embodiment, the coating source in the first coating cavity adopts a sputtering coating source 4, and the coating source 5 in the second coating cavity adopts an ion coating source.
In a preferred embodiment, the dust removing cavity 12 is provided with an electric partition plate at the position connecting the first film coating cavity 1 and the second film coating cavity 2, so as to divide the first film coating cavity, the dust removing cavity and the second film coating cavity into independent cavities. The electric clapboard is opened only when the solar cell panel passes through, and the electric clapboard is closed tightly during film coating. The first film coating cavity 1 and the second film coating cavity 2 both adopt vacuum cavities. With reference to the side view of the dust-collecting chamber shown in fig. 3, and with reference to fig. 2, it can be seen that inside the dust-collecting chamber, above the conveyor belt 3, there is an electrostatic precipitator 17. When the solar cell panel passes through the dust removal cavity, the electrostatic dust removal device is started to remove dust on the solar cell panel and the conveying belt; and after the solar cell panel leaves, the electrostatic dust removal device is closed.
In the preferred embodiment, the dust-removing chamber 12 is provided with a lower airflow generator 11 at the top and an air outlet port 13 at the bottom. When the conveying belt 3 bears the silicon wafer and passes through the dedusting cavity, the lower airflow generator and the electrostatic dedusting device are sequentially opened, and when the conveying belt 3 leaves the dedusting cavity, the electrostatic precipitator is closed.
In a preferred embodiment, a dust labyrinth 14 is arranged inside the dust removing cavity 12 and below the conveyor belt 3; a plurality of partition plates are alternately extended out of the side wall of the dust removal cavity to form a zigzag dust labyrinth. The dust labyrinth prolongs the length of the dust channel in a limited space, so that dust cannot flow back.
In a preferred embodiment, the bottom end of the dust removing cavity 12 is provided with a dust concentration cavity 15, and the air outlet port 13 is located between the dust labyrinth 14 and the dust concentration cavity 15. The dust falling from the dust labyrinth way stays in the dust concentration cavity, and the dust level in each cavity can be maintained.
In the preferred embodiment, an access door is provided on the sidewall of the dust removing chamber 12. Dust remaining in the dust collection chamber can be easily removed during routine maintenance.
The coating source comprises a sputtering coating source and an ion coating source, and the sputtering coating source 4 adopts one of a target magnetron sputtering coating source, a direct current sputtering coating source, an alternating current pulse sputtering coating source and a radio frequency alternating current sputtering coating source; the ion coating source 5 adopts one of a reactive plasma deposition ion coating source and an electron beam evaporation ion coating source.
The utility model discloses, be provided with the dust removal chamber between the coating film chamber, can effectively completely cut off the dust of getting rid of, and sputter coating film source (from top to bottom) in proper order is first, and ion coating film source (from bottom to top) forms transparent conductive oxide film on the different surfaces of treating the coating film base plate. After the TCO film is prepared by the sputtering coating source, a good protective film can be formed, and even when the ion coating source is used for coating, dust produced above the TCO film falls on the upper surface, so that the appearance and the conversion efficiency of the battery cannot be influenced. After the process is finished, the dust can be removed by a dust removal mode.
The foregoing examples are illustrative only and are not intended to be limiting. Any equivalent modifications or variations without departing from the spirit and scope of the present application should be included in the claims of the present application.
Claims (8)
1. A coating equipment for manufacturing double-sided transparent conductive oxide films is characterized in that: the solar cell panel coating device at least comprises a first coating cavity (1), a second coating cavity (2) and a transmission belt (3) which penetrates through the first coating cavity and the second coating cavity and is used for transmitting a solar cell panel, wherein coating sources are respectively arranged in the first coating cavity and the second coating cavity, and when the solar cell panel sequentially penetrates through the first coating cavity and the second coating cavity, the coating sources are used for coating transparent conductive oxide thin films on two sides of the solar cell panel;
a dust removal cavity (12) for removing dust is arranged between the first film coating cavity (1) and the second film coating cavity (2);
an electric partition plate is arranged at the position of the dust removing cavity (12) connecting the first film coating cavity (1) and the second film coating cavity (2) so as to divide the first film coating cavity, the dust removing cavity and the second film coating cavity into independent cavities; an electrostatic dust collector (17) is arranged in the dust removing cavity and above the conveying belt (3).
2. The coating apparatus for producing a double-sided transparent conductive oxide thin film according to claim 1, wherein: in the first coating cavity, a coating source is positioned above the conveying belt; and in the second coating cavity, the coating source is positioned below the transmission belt.
3. The coating apparatus for producing a double-sided transparent conductive oxide thin film according to claim 2, wherein: when the coating equipment is integrated with three or more coating cavities, the coating cavities of the coating sources above the conveying belt are arranged in front of the coating cavities of the coating sources below the conveying belt.
4. The coating apparatus for producing a double-sided transparent conductive oxide thin film according to claim 1, wherein: the top of the dust removing cavity (12) is provided with a lower airflow generator (11), and the bottom is provided with an air outlet port (13).
5. The coating apparatus for producing a double-sided transparent conductive oxide thin film according to claim 4, wherein: a dust labyrinth way (14) is arranged inside the dust removing cavity (12) and below the conveying belt (3); a plurality of partition plates are alternately extended out of the side wall of the dust removal cavity to form a zigzag dust labyrinth.
6. The coating apparatus for producing a double-sided transparent conductive oxide thin film according to claim 5, wherein: the bottom in dust removal chamber (12) is equipped with dust concentration chamber (15), outlet port (13) are located between dust labyrinth way (14) and dust concentration chamber (15).
7. The coating apparatus for producing a double-sided transparent conductive oxide thin film according to claim 6, wherein: an access door is arranged on the side wall of the dust removing cavity (12).
8. The coating apparatus for producing a double-sided transparent conductive oxide thin film according to claim 3, wherein: the film coating source comprises a sputtering film coating source and an ion film coating source, and the sputtering film coating source (4) adopts one of a target magnetron sputtering film coating source, a direct current sputtering film coating source, an alternating current pulse sputtering film coating source and a radio frequency alternating current sputtering film coating source; the ion coating source (5) adopts one of a reactive plasma deposition ion coating source and an electron beam evaporation ion coating source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922024613.XU CN211999903U (en) | 2019-11-21 | 2019-11-21 | Coating equipment for manufacturing double-sided transparent conductive oxide film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922024613.XU CN211999903U (en) | 2019-11-21 | 2019-11-21 | Coating equipment for manufacturing double-sided transparent conductive oxide film |
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| CN211999903U true CN211999903U (en) | 2020-11-24 |
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| CN201922024613.XU Active CN211999903U (en) | 2019-11-21 | 2019-11-21 | Coating equipment for manufacturing double-sided transparent conductive oxide film |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110747446A (en) * | 2019-11-21 | 2020-02-04 | 深圳市捷佳伟创新能源装备股份有限公司 | Coating equipment for manufacturing double-sided transparent conductive oxide film |
| CN113430497A (en) * | 2021-07-28 | 2021-09-24 | 中威新能源(成都)有限公司 | Double-sided coating method and double-sided coating equipment for flexible substrate |
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2019
- 2019-11-21 CN CN201922024613.XU patent/CN211999903U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110747446A (en) * | 2019-11-21 | 2020-02-04 | 深圳市捷佳伟创新能源装备股份有限公司 | Coating equipment for manufacturing double-sided transparent conductive oxide film |
| CN113430497A (en) * | 2021-07-28 | 2021-09-24 | 中威新能源(成都)有限公司 | Double-sided coating method and double-sided coating equipment for flexible substrate |
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