CN210826345U

CN210826345U - Equipment for microwave plating of nano-diamond film

Info

Publication number: CN210826345U
Application number: CN201921459399.4U
Authority: CN
Inventors: 蔡茜; 付斗才
Original assignee: Chengdu Daoqihong Environmental Technology Co ltd
Current assignee: Sichuan Bluehand Technology Co.,Ltd.
Priority date: 2019-09-04
Filing date: 2019-09-04
Publication date: 2020-06-23
Anticipated expiration: 2029-09-04

Abstract

The utility model discloses an equipment of nanometer diamond film is plated to microwave mainly comprises microwave generator, microwave emission loudspeaker, technology intake pipe, microwave shielding layer, rotatory tray, water cooling system, vacuum system and coating film casing, and wherein the coating film casing is the cavity that has sealing performance. When the device works, the process gas enters the microwave transmitting horn through the gas inlet pipe, the process gas is cracked and plasmatized by microwaves, and carbon atoms are used as carbon source materials of the diamond-plated film after cracking and plasmatization. The utility model realizes SP2 and SP3 type nano diamond coating by changing microwave frequency and process gas medium. The microwave coating efficiency is remarkable, the thickness of the coated nano-diamond film is uniform, the surface is smooth and flat, the substrate to be coated is not easy to damage, and the method has a very wide application prospect in various industrial fields.

Description

Equipment for microwave plating of nano-diamond film

Technical Field

The utility model relates to a plate nano-diamond film's technical field, especially relate to a microwave plates nano-diamond film's equipment.

Background

With the development of large-capacity, high-speed and low-price semiconductor coating substrates and the like, the realization of various high-dielectric coatings and other coatings with special properties is of great importance. The defects of redistribution, dislocation formation, stacking fault and the like of a diffusion surface, which are caused by high temperature, of the traditional thermal oxidation and thermal chemical vapor deposition methods are a limiting factor of a coating technology, and the coating technology is the basis of the current low-dimensional materials. The microwave plated nano diamond film has the advantages of good step coverage, high deposition rate, extremely thin film layer, high purity, capability of multi-layer repeated film plating and the like.

The diamond film has excellent characteristics in the aspects of mechanics, thermal, optics, electricity and the like, and has very wide application prospects in high technology and various industrial fields. Since the 80 s, the research on the gas phase synthesis of diamond films has been greatly advanced, and a plurality of methods for growing diamond films have been successively established. Among them, the chemical vapor deposition method is rapidly developed, and the quality of the grown diamond film is high. The microwave has higher gas decomposition and ionization rate, is higher in the analog process, and has good plasma transport capacity only under the irradiation of the microwave, when the process gas source is used for coating. Two-dimensional materials such as SP2 or SP3 type films and the like can be obtained, and the bonding capability of the two-dimensional materials and a base material is good, but related equipment with simple structure and convenient operation does not exist at present. Therefore, it is necessary to develop a simple and easy device for microwave plating of nano-diamond film.

SUMMERY OF THE UTILITY MODEL

In order to overcome the defects, the inventor of the utility model continuously reforms and innovates through long-term exploration and trial and multiple experiments and efforts, provides equipment for microwave plating of the nano-diamond film, and has the advantages of high plating efficiency, good plating quality, simple required equipment, easy operation and low cost.

In order to realize the purpose, the utility model adopts the technical scheme that: the microwave coating device mainly comprises a microwave generator, a process air inlet pipe, a microwave shielding layer, a rotary tray, a cooling coil, a water cooling system, a vacuum system and a coating shell, wherein the coating shell is a cavity with sealing performance, the microwave shielding layer is arranged on the inner wall of the coating cavity, the rotary tray is arranged at the inner bottom, the microwave generator is communicated with the inside of the coating shell, the process air inlet pipe is communicated with the inside of the coating shell, the cooling coil is arranged in the coating shell and is connected with the water cooling system, and the vacuum system is communicated with the inside of the coating shell.

Microwave shielding layers are arranged on the periphery of the inner wall and the periphery of the outer wall of the coated shell to reduce multiple reflections of high-frequency microwaves and effectively reduce the microwaves escaping from the built-in microwave shielding layers.

The process gas enters the process gas inlet pipe by opening the process control valve, is guided into the microwave transmitting horn, is cracked and plasmatized by microwaves, and is used as a carbon source material of the diamond-plated film after being cracked and plasmatized.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: the microwave generator comprises a microwave source electric signal, a resonant cavity, a microwave attenuator, a waveguide tube and a microwave transmitting horn, wherein the microwave source electric signal and the resonant cavity are positioned outside the coating cavity, the waveguide tube is arranged on the coating cavity and communicated with the coating cavity, the microwave transmitting horn is connected to the tail end of the waveguide tube positioned in the coating cavity, and the microwave attenuator is arranged in the waveguide tube. Wherein the process air inlet pipe is communicated with a microwave transmitting horn on a microwave generator

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: two or more than two microwave transmitting horns are arranged in the coating shell, and microwaves with different frequencies and powers are transmitted simultaneously, so that the purpose of simultaneously carrying out diamond composite coating in SP2 or SP3 types is realized.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: the process gas inlet at the process gas inlet pipe can be different according to the types of the diamond-plated films, various process gases can be arranged, methane and acetylene are preferably adopted, and helium and argon are preferably adopted as the protective gas. Various other elements can be independently input to enable the plated film to be the required chemical composition.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: the coated shell is made of austenitic stainless steel, such as 304 or 316, and preferably 304 stainless steel.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: the vacuum degree of the coating shell is maintained by an external vacuum system, the pressure of the coating shell is maintained at a micro vacuum degree, and the best vacuum degree is maintained between 0.1 Pa and 0.5 Pa.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: microwave gets into and disperses behind the microwave emission loudspeaker, can obtain large tracts of land deposit film, and the time that coating film thickness can adjust the deposit is guaranteed, the utility model discloses in order to obtain super thick film, can also carry out a lot of annealing in order to eliminate stress among the deposition process.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: the device, which measures that the radiation has been reduced to the level of a few microwatts, is only less than 15% of the radiation of a mobile phone, and has no influence on the health of workers.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: the external vacuum system is connected with the bottommost part of the coating shell, so that the growth of the diamond film is facilitated, and the cleaning property and structure are optimized.

According to the utility model discloses an equipment of nanometer diamond film is plated to microwave, its further preferred technical scheme is: the coating cavity is spherical or cylindrical, so that the emission of microwaves can be effectively reduced, and the coating effect and quality are influenced.

According to the utility model provides an in equipment of microwave plating nanometer diamond film, its further preferred technical scheme is: an air exhaust valve is arranged on the connecting pipeline of the external vacuum system and the coating shell. Therefore, the specific vacuum degree in the coating shell can be maintained, the smooth proceeding of the coating process is ensured, and meanwhile, non-deposition impurity gas in the gas phase is discharged out of the coating shell.

Compared with the prior art the utility model has the advantages of as follows:

the device for plating the nano-diamond film by using the microwave saves energy and materials in the process of plating the film and reduces the cost.

The equipment for plating the nano-diamond film by using the microwave has good film plating effect, few pinholes and cracks and no bending and cracking phenomena.

And 3, the equipment for plating the nano-diamond film by using the microwave can be used for plating the film in a step-by-step manner so as to obtain the multilayer composite diamond film.

And 4, the equipment for plating the nano-diamond film by using the microwave has wide selection range of base materials, such as foamed nickel, foamed copper, ceramic and the like, and has good adaptability to post-processing of compounding and the like.

And 5, the equipment for plating the nano-diamond film by using the microwave does not pollute and damage the environment in the whole process.

For the traditional diamond-plated film, the utility model has the characteristics of simple process, low cost, environment-friendly coating process, high coating density, hard coating hardness, extremely small coating porosity, good coating adhesiveness, more thorough coating and the like; with the rapid development of high and new technology and various industrial fields in China, the device and the method have wider application prospect in preparing diamond.

The utility model realizes the compounding and the nano-crystallization of the SP2 and SP3 type diamonds by changing the power and the frequency of the microwave. Compared with the conventional coating process, the microwave coating deposition speed can be increased by 10-100 times or even higher. Has wide application prospect in high technology and various industrial fields.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention, and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.

FIG. 1 is a schematic view of the whole structure of the microwave nano-diamond film plating apparatus of the present invention.

The numbers in the figures are respectively: the microwave heating device comprises a microwave generator 100, a microwave source electric signal 1, a resonant cavity 2, a microwave attenuator 3, a waveguide tube 4, a microwave transmitting horn 5, a process air inlet pipe 6, a process control valve 7, a coating shell 8, a microwave shielding layer 9, a rotary tray 10, a cooling coil 11, a water cooling system 12, an air exhaust valve 13 and a vacuum system 14.

Detailed Description

To make the objects, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention are clearly and completely described below, and it is obvious that the described embodiments are some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work all belong to the protection scope of the present invention. Thus, the detailed description of the embodiments of the present invention provided below is not intended to limit the scope of the claimed invention, but is merely representative of selected embodiments of the present invention.

It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it may not be further defined and explained in subsequent figures.

Examples

As shown in fig. 1: the equipment for microwave plating of the nano diamond film mainly comprises a microwave generator 100, a microwave transmitting loudspeaker 5, a process air inlet pipe 6, a process control valve 7, a microwave shielding layer 9, a rotary tray 10, a cooling coil pipe 11, a water cooling system 12, an air suction valve 13, a vacuum system 14 and a film plating shell 8, wherein the film plating shell 8 is a cavity with sealing performance. The vacuum system 14 is conventional system equipment in the art, and is generally a complete vacuum system consisting of a vacuum pump, a PLC program control system, an air storage tank, a vacuum pipeline, a vacuum valve, an overseas filter assembly, and the like. The water cooling system 12 is also conventional in the art and is constructed, for example, from a tank/tank and a pump, such that the tank/tank, pump and cooling coil form a recirculating water cooling system.

The microwave generator 100 in this embodiment is composed of a microwave source electrical signal 1, a resonant cavity 2, a microwave attenuator 3, a waveguide tube 4 and a microwave transmitting horn 5, wherein the microwave generator body is disposed outside the coating casing, and the microwave transmitting horn is disposed in the coating casing. One or more than two microwave generators can be arranged according to the requirement. Meanwhile, the embodiment is also provided with process air inlet pipes with the number corresponding to that of the microwave generators, and the number of the air inlet pipes can be correspondingly increased or decreased according to actual needs.

The coated housing 8 is cylindrical, but may be circular or have other shapes, but is more advantageous to reduce the reflection of microwaves when circular or cylindrical.

The periphery of the coated shell 8 is provided with a microwave shielding layer 9 to reduce multiple reflections of high-frequency microwaves, and the outside of the whole coated shell 8 can also be provided with a microwave shielding layer 9 to effectively reduce the microwaves escaping from the built-in microwave shielding layer 9.

The process gas enters a process gas inlet pipe 6 by opening a process control valve 7, is guided into a microwave transmitting horn 5, is cracked and plasmatized by microwaves, and is used as a carbon source material of the diamond-plated film after being cracked and plasmatized.

Wherein the vacuum system 14 and the water cooling system 12 are arranged outside the coating shell 8, the vacuum system 14 is communicated with the bottom of the coating shell 8, and the air suction valve 13 is arranged on a connecting pipe of the vacuum system 14 and the coating shell 8, thereby realizing the maintenance of the specific vacuum degree in the coating shell 8, wherein the vacuum degree of the shell is 2 × 10^-2Pa, the working pressure is mostly between 0.1 Pa and 0.5Pa, and the microwave is emitted from a microwave transmitting horn, so that the large pressure is obtainedThe thickness of the deposited film can be ensured by adjusting the deposition time. To obtain ultra-thick films, multiple anneals may be used during deposition to relieve stress.

The utility model discloses a be used for diamond coating, the technology of process gas intake pipe department is admitted air and can be according to the kind difference of gilding diamond film, can set up multiple process gas, preferably adopts methane and acetylene, and the protective gas preferably adopts helium and argon gas. Various other elements can be independently input to enable the plated film to be the required chemical composition.

The coated shell in this embodiment is made of austenitic stainless steel, such as 304 or 316, preferably 304 stainless steel.

In this embodiment, the external vacuum system 14 is located at the bottom of the coating housing 8, which is beneficial to the growth of the diamond film and the optimization of the cleaning characteristics and structure.

In this embodiment, the external vacuum system 14 is a vacuum pump, and the water cooling system 12 is composed of a cooling water tank and a water pump.

The work flow of the product of the embodiment is as follows: first, the suction valve 13 is opened, the vacuum pump of the vacuum system 14 is started, and the air in the coating housing 8 is exhausted, and the pressure in the coating housing 8 is also reduced. The water cooling system 12 is started to perform cold circulation on the circulating water. The process gas enters from the process gas inlet pipe 6, the microwave generator is started at the same time, the process gas is cracked under the action of microwaves after entering, and the base material is subjected to chemical vapor deposition under the action of the ionic carbon source and the microwave field, so that the purpose of coating is achieved. The vacuum system 14, on the one hand, maintains the required pressure of the coating shell and, on the other hand, exhausts the cracked non-carbon source gas out of the coating shell. The water cooling system 12 dissipates heat generated by microwave heating in the coating shell through circulating water to maintain normal process temperature.

In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

In the present disclosure, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may comprise direct contact between the first and second features, or may comprise contact between the first and second features not directly. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. The first feature being "under," "below," and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or merely indicates that the first feature is at a lower level than the second feature.

The above is only a preferred embodiment of the present invention, and it should be noted that the above preferred embodiment should not be considered as limiting the present invention, and the protection scope of the present invention should be subject to the scope defined by the claims. It will be apparent to those skilled in the art that various modifications and enhancements can be made without departing from the spirit and scope of the invention, and such modifications and enhancements are intended to be within the scope of the invention.

Claims

1. The equipment for microwave plating of the nano-diamond film is characterized in that: the microwave coating device mainly comprises a microwave generator, a process air inlet pipe, a microwave shielding layer, a rotary tray, a cooling coil, a water cooling system, a vacuum system and a coating shell, wherein the coating shell is a cavity with sealing performance, the microwave shielding layer is arranged on the inner wall of the coating cavity, the rotary tray is arranged at the inner bottom, the microwave generator is communicated with the inside of the coating shell, the process air inlet pipe is communicated with the inside of the coating shell, the cooling coil is arranged in the coating shell and is connected with the water cooling system, and the vacuum system is communicated with the inside of the coating shell.

2. The apparatus of claim 1, wherein the microwave generator comprises a microwave source electrical signal, a resonant cavity, a microwave attenuator, a waveguide tube and a microwave transmitting horn, the microwave source electrical signal and the resonant cavity are located outside the coating cavity, the waveguide tube is installed on the coating cavity and communicated with the coating cavity, the microwave transmitting horn is connected to the end of the waveguide tube located in the coating cavity, and the microwave attenuator is installed in the waveguide tube.

3. The apparatus for microwave coating of nano-diamond film according to claim 2, wherein the process inlet pipe is connected to a microwave emitting horn.

4. The microwave nano-diamond film coating equipment according to claim 1, wherein the coating chamber is spherical or cylindrical.

5. The apparatus of claim 1, wherein the inside wall and the outside wall of the coating casing are provided with microwave shielding layers.

6. The apparatus of claim 1, wherein a process control valve is disposed on the process inlet pipe.

7. The apparatus of claim 1, wherein a suction valve is installed on a connection pipe between the vacuum system and the coating housing.

8. The microwave nano-diamond film coating equipment according to claim 1, wherein the vacuum degree in the coating shell is maintained between 0.1 Pa and 0.5 Pa.

9. The apparatus of claim 1, wherein the coating shell is made of austenitic stainless steel.

10. The apparatus of claim 1, wherein a vacuum system is connected to the bottom of the coating housing.