CN209647166U - A kind of cleaning device of quartz wafer - Google Patents
A kind of cleaning device of quartz wafer Download PDFInfo
- Publication number
- CN209647166U CN209647166U CN201920109958.2U CN201920109958U CN209647166U CN 209647166 U CN209647166 U CN 209647166U CN 201920109958 U CN201920109958 U CN 201920109958U CN 209647166 U CN209647166 U CN 209647166U
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- quartz wafer
- placing groove
- support plate
- spring
- welded
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Abstract
The utility model provides a kind of cleaning device of quartz wafer, including material carrier platform, left spring, left cushion, placing groove, right cushion, right spring, support plate, bracket, electric pushrod, limiting slot and limit are slided, the material carrier platform is mounted on support plate medium position, the left spring is welded in placing groove on left side, the left cushion is mounted on left spring right end, the placing groove is provided on material carrier platform upper surface, the right cushion is mounted on right spring left end, lower part is arranged in bracket in the support plate, the bracket is welded on medium position in service sink, the electric pushrod is mounted in limiting slot on upper side, and electric pushrod lower end and position limiting slide block are welded to connect, the position limiting slide block is welded on support plate left side, and position limiting slide block is mounted in limiting slot, to preventing when realizing quartz wafer cleaning Protective function, the utility model is structurally reasonable, and protection effect is good, and it is convenient to operate, practical.
Description
Technical field
The utility model is a kind of cleaning device of quartz wafer, belongs to electronic components processing equipment field.
Background technique
Quartz wafer in the prior art in the process of cleaning, is easily impacted by cleaning solution, and quartz wafer is caused to clean
Cleaning equipment is collided in the process, causes quartz wafer surface scratching, quartz wafer is caused to do over again or scrap, so being badly in need of wanting one
The cleaning device of quartz wafer is planted to solve the above-mentioned problem.
Utility model content
In view of the deficienciess of the prior art, the utility model aim is to provide a kind of cleaning device of quartz wafer, with
The problems mentioned above in the background art are solved, the utility model is structurally reasonable, and protection effect is good, and it is convenient to operate, practical.
To achieve the goals above, the utility model is achieved through the following technical solutions: a kind of quartz wafer
Cleaning device, including inlet tube, service sink and drain pipe, the inlet tube are mounted on the upside of service sink front end face, described clear
Cleaning assembly is installed, the drain pipe is mounted on service sink right side lower part, and the cleaning assembly includes material carrier platform, a left side in wash pool
Spring, left cushion, placing groove, right cushion, right spring, support plate, bracket, electric pushrod, limiting slot and position limiting slide block,
The material carrier platform is mounted on support plate medium position, and the left spring is welded in placing groove on left side, the left cushion
It is mounted on left spring right end, the placing groove is provided on material carrier platform upper surface, and the right cushion is mounted on right spring left end,
The support plate is arranged in bracket lower part, the bracket and is welded on medium position in service sink, and the electric pushrod is mounted on
In limiting slot on upper side, and electric pushrod lower end and position limiting slide block are welded to connect, and the position limiting slide block is welded on a support plate left side
On end face, and position limiting slide block is mounted in limiting slot.
Further, three groups or more liquid-leadage holes, three groups of the above liquid-leadage holes etc. are opened up in the placing groove on lower end surface
Away from being arranged in placing groove on lower end surface.
Further, the inlet tube is connected by connection hose with cleaning solution conveying equipment, the drain pipe annular
Switch valve is installed on side.
Further, the placing groove is equipped with three groups or more, and three groups of the above placing grooves are laterally equidistantly arranged in material containing
On platform upper surface.
Further, the electric pushrod is connected by connecting line with external power supply and control switch, the control
Switch is mounted on bracket left side.
The utility model has the beneficial effects that a kind of cleaning device of quartz wafer of the utility model, because of the utility model
It is added to material carrier platform, left spring, left cushion, placing groove, right cushion, right spring, support plate, bracket, electric pushrod, limit
Slot and limit are slided, and the design is by the gap location before quartz wafer to be placed on to left cushion and right cushion, then passes through
Material carrier platform in support plate is moved in service sink by electric pushrod, and in quartz wafer cleaning process, quartz wafer collision is left
Cushion or right cushion, left cushion and right cushion protect quartz wafer, avoid quartz wafer surface
It scratches, to realize safeguard function when quartz wafer cleaning, solves original quartz wafer in the process of cleaning, pole
It is impacted vulnerable to cleaning solution, causes quartz wafer to collide cleaning equipment in the process of cleaning, cause quartz wafer surface scratching, cause
The problem of quartz wafer is done over again or scrapped, the utility model is structurally reasonable, and protection effect is good, and it is convenient to operate, practical.
Detailed description of the invention
Upon reading the detailed description of non-limiting embodiments with reference to the following drawings, other spies of the utility model
Sign, objects and advantages will become more apparent upon:
Fig. 1 is a kind of structural schematic diagram of the cleaning device of quartz wafer of the utility model;
Fig. 2 is the structural schematic diagram of cleaning assembly in a kind of cleaning device of quartz wafer of the utility model;
Fig. 3 is enlarged structure schematic diagram at the A of cleaning assembly in a kind of cleaning device of quartz wafer of the utility model;
In figure: 1- cleaning assembly, 2- inlet tube, 3- service sink, 4- drain pipe, 101- material carrier platform, 102- left spring, 103-
Left cushion, 104- placing groove, the right cushion of 105-, the right spring of 106-, 107- support plate, 108- bracket, 109- electric pushrod,
110- limiting slot, 111- position limiting slide block.
Specific embodiment
To be easy to understand the technical means, creative features, achievement of purpose, and effectiveness of the utility model, below
In conjunction with specific embodiment, the utility model is further described.
Fig. 1-Fig. 3 is please referred to, the utility model provides a kind of technical solution: a kind of cleaning device of quartz wafer, including
Inlet tube 2, service sink 3 and drain pipe 4, inlet tube 2 are mounted on the upside of 3 front end face of service sink, and cleaning group is installed in service sink 3
Part 1, drain pipe 4 are mounted on 3 right side lower part of service sink.
Cleaning assembly 1 includes material carrier platform 101, left spring 102, left cushion 103, placing groove 104, right cushion 105, the right side
Spring 106, support plate 107, bracket 108, electric pushrod 109, limiting slot 110 and position limiting slide block 111, material carrier platform 101 are installed
In 107 medium position of support plate, left spring 102 is welded in placing groove 104 on left side, and left cushion 103 is mounted on left bullet
102 right end of spring, placing groove 104 are provided on 101 upper surface of material carrier platform, and right cushion 105 is mounted on right 106 left end of spring, branch
Fagging 107 is arranged in bracket 108 lower part, bracket 108 and is welded on medium position in service sink 3, and electric pushrod 109 is mounted on limit
In the slot 110 of position on upper side, and 109 lower end of electric pushrod and position limiting slide block 111 are welded to connect, and position limiting slide block 111 is welded on branch
On 107 left side of fagging, and position limiting slide block 111 is mounted in limiting slot 110, in use, first by quartz wafer from
Gap between left cushion 103 and right cushion 105 is put into placing groove 104, then runs electronic push away by control switch
Bar 109 stretches, and electric pushrod 109 drives position limiting slide block 111 to move down in limiting slot 110, and position limiting slide block 111 drives support
Plate 107 moves down, and support plate 107 drives material carrier platform 101 to move down, after material carrier platform 101 is completely into service sink 3,
Cleaning solution is delivered in service sink 3, and is rinsed to quartz wafer by electric pushrod 109 out of service, inlet tube 2, is rushing
During washing, quartz wafer squeezes left cushion 103 and right cushion 105, and left cushion 103 compresses left spring 102, and the right side is slow
It rushes pad 105 and compresses right spring 106, left spring 102 and right spring 106 absorb the impact force of quartz wafer, avoid
The case where quartz wafer scratches, to realize safeguard function when quartz wafer cleaning.
Three groups or more liquid-leadage holes are opened up in placing groove 104 on lower end surface, three groups or more liquid-leadage holes are equidistantly arranged in placing groove
In 104 on lower end surface, it is delivered in placing groove 104 convenient for cleaning solution by liquid-leadage hole.
Inlet tube 2 is connected by connection hose with cleaning solution conveying equipment, and switch is installed in 4 annular side of drain pipe
Valve, convenient for the input and output of cleaning solution.
Placing groove 104 is equipped with three groups or more, and three groups or more placing grooves 104 are laterally equidistantly arranged in 101 upper surface of material carrier platform
On, convenient for being cleaned while multiple groups quartz wafer.
Electric pushrod 109 is connected by connecting line with external power supply and control switch, and control switch is mounted on bracket
On 108 left sides, run convenient for control electric pushrod 109.
The basic principles and main features of the present invention and the advantages of the present invention have been shown and described above, for
For those skilled in the art, it is clear that the present invention is not limited to the details of the above exemplary embodiments, and without departing substantially from this
In the case where the spirit or essential attributes of utility model, the utility model can be realized in other specific forms.Therefore, no matter
From the point of view of which point, the present embodiments are to be considered as illustrative and not restrictive, and the scope of the utility model is by institute
Attached claim rather than above description limit, it is intended that will fall within the meaning and scope of the equivalent elements of the claims
All changes are embraced therein.It should not treat any reference in the claims as limiting related right
It is required that.
In addition, it should be understood that although this specification is described in terms of embodiments, but not each embodiment is only wrapped
Containing an independent technical solution, this description of the specification is merely for the sake of clarity, and those skilled in the art should
It considers the specification as a whole, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
The other embodiments being understood that.
Claims (5)
1. a kind of cleaning device of quartz wafer, including inlet tube (2), service sink (3) and drain pipe (4), it is characterised in that:
The inlet tube (2) is mounted on the upside of service sink (3) front end face, installs cleaning assembly (1) in the service sink (3), the row
Liquid pipe (4) is mounted on service sink (3) right side lower part;
The cleaning assembly (1) includes material carrier platform (101), left spring (102), left cushion (103), placing groove (104), right slow
Punching pad (105), right spring (106), support plate (107), bracket (108), electric pushrod (109), limiting slot (110) and limit
Sliding block (111), the material carrier platform (101) are mounted on support plate (107) medium position, and the left spring (102) is welded on placement
On slot (104) interior left side, the left cushion (103) is mounted on left spring (102) right end, and the placing groove (104) opens up
On material carrier platform (101) upper surface, the right cushion (105) is mounted on right spring (106) left end, the support plate (107)
It is arranged in bracket (108) interior lower part, the bracket (108) is welded on service sink (3) interior medium position, the electric pushrod
(109) it is mounted on limiting slot (110) interior upper side, and electric pushrod (109) lower end and position limiting slide block (111) are welded to connect,
The position limiting slide block (111) is welded on support plate (107) left side, and position limiting slide block (111) is mounted on limiting slot (110)
It is interior.
2. a kind of cleaning device of quartz wafer according to claim 1, it is characterised in that: in the placing groove (104)
Three groups or more liquid-leadage holes are opened up on lower end surface, three groups of the above liquid-leadage holes are equidistantly arranged on placing groove (104) interior lower end surface.
3. a kind of cleaning device of quartz wafer according to claim 1, it is characterised in that: the inlet tube (2) passes through
Connection hose is connected with cleaning solution conveying equipment, installs switch valve in drain pipe (4) annular side.
4. a kind of cleaning device of quartz wafer according to claim 1, it is characterised in that: the placing groove (104) sets
There are three groups or more, three groups of the above placing grooves (104) are laterally equidistantly arranged on material carrier platform (101) upper surface.
5. a kind of cleaning device of quartz wafer according to claim 1, it is characterised in that: the electric pushrod (109)
It is connected by connecting line with external power supply and control switch, the control switch is mounted on bracket (108) left side.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201920109958.2U CN209647166U (en) | 2019-01-23 | 2019-01-23 | A kind of cleaning device of quartz wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201920109958.2U CN209647166U (en) | 2019-01-23 | 2019-01-23 | A kind of cleaning device of quartz wafer |
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CN209647166U true CN209647166U (en) | 2019-11-19 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111327283A (en) * | 2020-03-31 | 2020-06-23 | 浙江一晶科技股份有限公司 | Production equipment for processing columnar crystals |
CN113441472A (en) * | 2021-07-01 | 2021-09-28 | 深圳市科源信科技有限公司 | Gas-liquid cleaning device for quartz crystal oscillator high-frequency wafer |
-
2019
- 2019-01-23 CN CN201920109958.2U patent/CN209647166U/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111327283A (en) * | 2020-03-31 | 2020-06-23 | 浙江一晶科技股份有限公司 | Production equipment for processing columnar crystals |
CN111327283B (en) * | 2020-03-31 | 2023-06-30 | 浙江一晶科技股份有限公司 | Production facility is used in processing of post brilliant |
CN113441472A (en) * | 2021-07-01 | 2021-09-28 | 深圳市科源信科技有限公司 | Gas-liquid cleaning device for quartz crystal oscillator high-frequency wafer |
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