CN208738195U - A kind of solar energy etching machine bench reconstruction structure - Google Patents
A kind of solar energy etching machine bench reconstruction structure Download PDFInfo
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- CN208738195U CN208738195U CN201821666147.4U CN201821666147U CN208738195U CN 208738195 U CN208738195 U CN 208738195U CN 201821666147 U CN201821666147 U CN 201821666147U CN 208738195 U CN208738195 U CN 208738195U
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- China
- Prior art keywords
- etching machine
- machine bench
- water tank
- solar energy
- connecting tube
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Abstract
The utility model discloses a kind of solar energy etching machine bench reconstruction structures, including etching machine bench ontology, feed inlet, discharge port, aspiration pump, exhaust tube, fixed ring, the first escape pipe, water tank, observation glass plate, valve, the first connecting tube, coil pipe, sealing cap, PH detector, the second connecting tube, support frame, ring-like cavity, air inlet, through-hole, the second escape pipe and tee tube.The utility model is structurally reasonable; by the setting of pumping process device, can the inlet port and outlet port effectively to etching machine bench ontology two sides be evacuated, avoid the pernicious gas of etching machine bench body interior from being dispersed into the external world; staff can be protected, avoid the body of damage staff；By pumping process device, treated that gas can generate air-flow in the second escape pipe, can provide blowing by the second outlet pipe end for the drying region of etching machine bench body interior, can utilize to air-flow.
Description
Technical field
The utility model relates to a kind of etching machine bench reconstruction structure, specially a kind of solar energy etching machine bench reconstruction structure,
Belong to crystal silicon solar energy battery processed and applied technical field.
Background technique
When performing etching processing to silicon wafer, silicon wafer is generally flowed inside solar energy etching machine bench, passes through inside
Pan feeding section, wet etching section, washing section, alkali wash section, washing section, pickling section, overflow washing section and drying slot processed.
When carrying out silicon chip erosion processing, need using the harmful substance such as hydrogen fluoride, nitric acid, staff is in feed inlet
When carrying out loading and unloading with discharge port, the pernicious gas of volatilization may be touched, staff may be caused to damage, and have
The external world may be diffused into.Therefore, a kind of solar energy etching machine bench reconstruction structure is proposed regarding to the issue above.
Utility model content
The purpose of this utility model is that solve the above-mentioned problems and provides a kind of solar energy etching machine bench transformation knot
Structure.
The utility model is achieved through the following technical solutions above-mentioned purpose, a kind of solar energy etching machine bench reconstruction structure,
Including etching machine bench ontology and pumping process device, inlet port and outlet port are respectively set in etching machine bench ontology two sides；
The pumping process device includes two aspiration pumps and the chimeric water tank for being mounted on etching machine bench body bottom portion, and two
A aspiration pump is respectively and fixedly installed at the top of feed inlet and at the top of discharge port, and the bleeding point of two aspiration pumps is connected to pumping
Tracheae, the gas outlet of two aspiration pumps are respectively communicated with the first escape pipe and the second escape pipe, the feed inlet inner wall and go out
Material mouth inner wall is fixedly installed with fixed ring, and the interior of the fixed ring is provided with ring-like cavity, and the inner wall of fixed ring is equal
Even to be provided with several air inlets being connected to ring-like cavity, the end of the exhaust tube is connected to ring-like cavity, and described first goes out
Tracheae end and the second outlet pipe end are connected to by tee tube with first connecting tube one end, the first connection pipe end connection
Coil pipe inside water tank, and the end of coil pipe is fixedly installed with sealing cap, the coil pipe outer surface is uniformly provided with several
Through-hole, the tank top the second connecting tube of fixed connection, and the end of the second connecting tube and etching machine bench bodies top are affixed,
The side of the water tank is fixedly installed with PH detector.
Preferably, the feed inlet bottom and discharge port bottom pass through support frame and the shell of etching machine bench ontology is solid
It connects.
Preferably, the top of the water tank and the bottom of water tank have an inlet and outlet, and water inlet and go out
The mouth of a river is fixedly installed with valve.
Preferably, first connecting tube runs through the side wall of water tank, and seamless welding between the first connecting tube and water tank.
Preferably, observation glass plate is fixedly installed at the top of the water tank.
Preferably, the shell of the tee tube and etching machine bench ontology is affixed.
The beneficial effects of the utility model are:
1, this kind of etching machine bench reconstruction structure passes through the setting of pumping process device, can be effectively to etching machine bench ontology two
The inlet port and outlet port of side are evacuated, and the pernicious gas of etching machine bench body interior is avoided to be dispersed into the external world, can be to work
Personnel protect, and avoid the body of damage staff；
2, by fixed ring, the mating reaction of ring-like cavity and air inlet, can uniformly to inlet port and outlet port into
Row pumping, pumping effect is preferable, while when gas is handled in water tank, can by the mating reaction of coil pipe and through-hole
Make the gas entered in water tank is more uniform to be contacted with water, high treating effect, treated, and gas can be in the second escape pipe
Middle generation air-flow can provide blowing by the second outlet pipe end for the drying region of etching machine bench body interior, can be to air-flow
It is utilized.
Detailed description of the invention
Fig. 1 is the utility model overall structure diagram；
Fig. 2 is the utility model overall structure top view；
Fig. 3 is the utility model fixed ring schematic diagram of internal structure；
Fig. 4 is the utility model fixed ring side view；
Fig. 5 is the utility model coil pipe and through-hole structure schematic diagram.
In figure: 1, etching machine bench ontology, 2, feed inlet, 3, discharge port, 4, aspiration pump, 5, exhaust tube, 6, fixed ring, 7,
One escape pipe, 8, water tank, 9, observation glass plate, 10, valve, the 11, first connecting tube, 12, coil pipe, 13, sealing cap, 14, PH inspection
Survey instrument, the 15, second connecting tube, 16, support frame, 17, ring-like cavity, 18, air inlet, 19, through-hole, the 20, second escape pipe, 21,
Tee tube.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
It please refers to shown in Fig. 1-5, a kind of solar energy etching machine bench reconstruction structure, including etching machine bench ontology 1 and pumping
Feed inlet 2 and discharge port 3 is respectively set in processing unit, 1 two sides of etching machine bench ontology, and feed inlet 2 and discharge port 3 are used for silicon
The input and output material of piece；
The pumping process device includes two aspiration pumps 4 and the chimeric water tank for being mounted on 1 bottom of etching machine bench ontology
8, two aspiration pumps 4 are respectively and fixedly installed to 3 top of 2 top of feed inlet and discharge port, and the bleeding point of two aspiration pumps 4
Be connected to exhaust tube 5, the gas outlet of two aspiration pumps 4 is respectively communicated with the first escape pipe 7 and the second escape pipe 20, it is described into
2 inner wall of material mouth and 3 inner wall of discharge port are fixedly installed with fixed ring 6, and the interior of the fixed ring 6 is provided with ring-like cavity
17, and the inner wall of fixed ring 6 is uniformly provided with several air inlets 18 being connected to ring-like cavity 17, passes through several air inlets 18
Convenient for carrying out air-breathing from multiple positions, the effect of air-breathing is preferable, and the end of the exhaust tube 5 is connected to ring-like cavity 17, described
First escape pipe, 7 end and 20 end of the second escape pipe are connected to by tee tube 21 with 11 one end of the first connecting tube, and described first
The connection of 11 end of connecting tube is located at the coil pipe 12 inside water tank 8, and the end of coil pipe 12 is fixedly installed with sealing cap 13, sealing cap
The end of 13 pairs of coil pipes 12 is closed, and flows out gas only from through-hole 19,12 outer surface of coil pipe is uniformly provided with several
Through-hole 19, the second connecting tube 15 of fixed connection at the top of the water tank 8, and the end of the second connecting tube 15 and etching machine bench ontology 1
Top is affixed, and the side of the water tank 8 is fixedly installed with PH detector 14, and PH detector 14 can carry out the PH inside water tank 8
Detection, can assess the disposition of gas.
2 bottom of feed inlet and 3 bottom of discharge port pass through support frame 16 and the shell of etching machine bench ontology 1 is affixed,
It is mounted on etching machine bench ontology 1 for feed inlet 2 and discharge port 3 and support is provided；The top of the water tank 8 and the bottom of water tank 8
Have an inlet and outlet, and inlet and outlet are fixedly installed with valve 10, valve 10 control water inlet and
The opening and closing of water outlet can be carried out adding water and be discharged water；First connecting tube 11 runs through the side wall of water tank 8, and the first connecting tube 11
The seamless welding between water tank 8 avoids the first connecting tube 11 from leak occur with 8 junction of water tank；The top of the water tank 8 is fixed
Observation glass plate 9 is installed, observation glass plate 9 can carry out the observation inside water tank 8, observe water level conditions；The tee tube 21
It is affixed with the shell of etching machine bench ontology 1, fixation is provided for tee tube 21, increases stability.
The electric elements occurred in the application external connection power supply and control switch when in use, etching machine bench ontology 1
When being worked, staff is responsible for the loading and unloading of silicon wafer in feed inlet 2 and discharge port 3, starts aspiration pump 4, aspiration pump 4
Bleeding point by exhaust tube 5 to being evacuated inside ring-like cavity 17, thus make gas inside feed inlet 2 and discharge port 3 according to
It is secondary by air inlet 18, ring-like cavity 17 and exhaust tube 5, subsequently into aspiration pump 4, then from the gas outlet of aspiration pump 4 enter
Inside first escape pipe 7 and the second escape pipe 20, then passes sequentially through tee tube 21 and the first connecting tube 11 enters in coil pipe 12,
It is flowed in coil pipe 12, in flow process, can be sprayed, more uniform can be diffused into water tank 8 from through-hole 19,
The pernicious gases such as the hydrogen fluoride, the nitric acid that wherein volatilize are soluble in water, then realization processing is flowed by 20 end of the second escape pipe
Out, into the drying region of etching machine bench ontology 1, silicon wafer is blowed, so as to be utilized to air-flow.
The 2RB-7.5KW model air pump that aspiration pump 4 is sold using the prosperous electromechanical Co., Ltd of Alibaba's Dongguan City space
And its relevant mating power supply and circuit.
The SIN-PH4.0 model PH detector that PH detector 14 is sold using Hangzhou translocation source producer, Alibaba
And its relevant mating power supply and circuit.
It is related to circuit and electronic component and module is the prior art, those skilled in the art may be implemented completely,
Without superfluous words, the content of the utility model protection is not related to the improvement for software and method yet.
It is obvious to a person skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and
And without departing substantially from the spirit or essential attributes of the utility model, it can realize that this is practical new in other specific forms
Type.Therefore, in all respects, the present embodiments are to be considered as illustrative and not restrictive, this is practical new
The range of type is indicated by the appended claims rather than the foregoing description, it is intended that containing for the equivalent requirements of the claims will be fallen in
All changes in justice and range are embraced therein.It should not treat any reference in the claims as limiting
Related claim.
In addition, it should be understood that although this specification is described in terms of embodiments, but not each embodiment is only wrapped
Containing an independent technical solution, this description of the specification is merely for the sake of clarity, and those skilled in the art should
It considers the specification as a whole, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
The other embodiments being understood that.
Claims (6)
1. a kind of solar energy etching machine bench reconstruction structure, it is characterised in that: filled including etching machine bench ontology (1) and pumping process
It sets, feed inlet (2) and discharge port (3) is respectively set in etching machine bench ontology (1) two sides；
The pumping process device includes two aspiration pumps (4) and the chimeric water tank for being mounted on etching machine bench ontology (1) bottom
(8), two aspiration pumps (4) are respectively and fixedly installed at the top of feed inlet (2) and at the top of discharge port (3), and two aspiration pumps
(4) bleeding point is connected to exhaust tube (5), and the gas outlet of two aspiration pumps (4) is respectively communicated with the first escape pipe (7) and
Two escape pipes (20), feed inlet (2) inner wall and discharge port (3) inner wall are fixedly installed with fixed ring (6), the fixed ring
(6) interior is provided with ring-like cavity (17), and the inner wall of fixed ring (6) is uniformly provided with several and connects with ring-like cavity (17)
The end of logical air inlet (18), the exhaust tube (5) is connected to ring-like cavity (17), the first escape pipe (7) end and
Second escape pipe (20) end is connected to by tee tube (21) with the first connecting tube (11) one end, the first connecting tube (11) end
End connection is located at water tank (8) internal coil pipe (12), and the end of coil pipe (12) is fixedly installed with sealing cap (13), the coil pipe
(12) outer surface is uniformly provided with several through-holes (19), and connection the second connecting tube (15), and second are fixed at the top of the water tank (8)
The end of connecting tube (15) and etching machine bench ontology (1) top are affixed, and the side of the water tank (8) is fixedly installed with PH detector
(14)。
2. a kind of solar energy etching machine bench reconstruction structure according to claim 1, it is characterised in that: the feed inlet (2)
Bottom and discharge port (3) bottom pass through support frame (16) and the shell of etching machine bench ontology (1) is affixed.
3. a kind of solar energy etching machine bench reconstruction structure according to claim 1, it is characterised in that: the water tank (8)
Top and the bottom of water tank (8) have inlet and outlet, and inlet and outlet are fixedly installed with valve
(10)。
4. a kind of solar energy etching machine bench reconstruction structure according to claim 1, it is characterised in that: first connecting tube
(11) run through the side wall of water tank (8), and seamless welding between the first connecting tube (11) and water tank (8).
5. a kind of solar energy etching machine bench reconstruction structure according to claim 1, it is characterised in that: the water tank (8)
Top is fixedly installed with observation glass plate (9).
6. a kind of solar energy etching machine bench reconstruction structure according to claim 1, it is characterised in that: the tee tube (21)
It is affixed with the shell of etching machine bench ontology (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821666147.4U CN208738195U (en) | 2018-10-15 | 2018-10-15 | A kind of solar energy etching machine bench reconstruction structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821666147.4U CN208738195U (en) | 2018-10-15 | 2018-10-15 | A kind of solar energy etching machine bench reconstruction structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208738195U true CN208738195U (en) | 2019-04-12 |
Family
ID=66035323
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821666147.4U Expired - Fee Related CN208738195U (en) | 2018-10-15 | 2018-10-15 | A kind of solar energy etching machine bench reconstruction structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208738195U (en) |
-
2018
- 2018-10-15 CN CN201821666147.4U patent/CN208738195U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190412 Termination date: 20191015 |