CN208689363U - A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus - Google Patents
A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus Download PDFInfo
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- CN208689363U CN208689363U CN201821602375.5U CN201821602375U CN208689363U CN 208689363 U CN208689363 U CN 208689363U CN 201821602375 U CN201821602375 U CN 201821602375U CN 208689363 U CN208689363 U CN 208689363U
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- forming apparatus
- image forming
- polar coordinates
- exposure mask
- crossbeam
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Abstract
The utility model discloses a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus, including pedestal, the pedestal upper end is equipped with installation rotary table, the wafer that rotary table upper end is equipped with annular array distribution is installed, pedestal upper end is equipped with crossbeam, CCD is installed, crossbeam upper end is arranged with slide unit, and slide unit side is equipped with the laser of array distribution on crossbeam.The utility model cancels mask plate making link without exposure mask polar coordinates rotary scanning exposal image forming apparatus, the photoetching of wafer, it directly portrays on wafer, pattern precision is high, high-quality, speed is fast, scanning is continuous, and stability is high, reduce production process, the optimization of cost of implementation.
Description
Technical field
The utility model relates to a kind of exposal image forming apparatus, specifically a kind of no exposure mask polar coordinates rotary scanning exposure image
Device.
Background technique
The further investigation of the progress of material science, especially semiconductor silicon material promotes the scale of electronics industry chip to answer
With.The development of Computer Control Technology, precision processing technology keeps the manufacture of chip easier to control, and cost reduces, and application is wider.
Current commercialized chip processing procedure has reached 7nm, and high-precision chip is mainly used in the production of CPU, GPU and DRAM.Greatly
The processing procedure for measuring industry control chip is 200-500nm.
The process of chip manufacturing is complex, and process is similar to the manufacturing process of traditional photographs, specifically includes that film-light
The removal of quarter-development-etching-photoresist.Wherein photoetching is exactly to be placed in chip die to sit along the right angle that twocouese moves
On mark system platform, mask plate is covered on wafer, the light source being fixedly arranged above under processor control.In rectangular coordinate system
Mobile platform portrays the image on mask plate on wafer under the irradiation of light source.The cost of photoetching is about whole wafer system
The 1/3 of technique is made, the consuming time accounts for about the 40~60% of whole wafer technique.
Utility model content
The purpose of this utility model is to provide a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus, on solving
State the problem of proposing in background technique.
To achieve the above object, the utility model provides the following technical solutions:
A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus, including pedestal, the pedestal upper end are equipped with installation
Rotary table, installation rotary table upper end are equipped with the wafer of annular array distribution, and pedestal upper end is equipped with crossbeam, CCD is equipped on crossbeam, horizontal
Beam upper end is arranged with slide unit, and slide unit side is equipped with the laser of array distribution.
As a further solution of the present invention: the installation rotary table rotation is fixed on pedestal.
The chassis interior is equipped with motor as a further solution of the present invention, and the output shaft of motor is fixed
On installation rotary table.
Electric power connection line and control switch are externally provided on the motor as a further solution of the present invention,.
The wafer adsorption is on installation rotary table as a further solution of the present invention,.
The crossbeam is U-shaped as a further solution of the present invention,.
As a further solution of the present invention, there are four the CCD settings.
Compared with prior art, the utility model has the beneficial effects that
The utility model is without exposure mask polar coordinates rotary scanning exposal image forming apparatus, the photoetching of wafer, in computer technology
Under auxiliary, to cancel mask plate making link, directly portray on wafer, pattern precision is high, high-quality, speed is fast, scanning is continuous,
Stability is high, reduces production process, the optimization of cost of implementation.
Detailed description of the invention
Fig. 1 is a kind of schematic perspective view of no exposure mask polar coordinates rotary scanning exposal image forming apparatus.
Fig. 2 is a kind of overlooking structure diagram of no exposure mask polar coordinates rotary scanning exposal image forming apparatus.
Fig. 3 is a kind of polar coordinate scanner schematic diagram of no exposure mask polar coordinates rotary scanning exposal image forming apparatus.
Fig. 4 is traditional mask exposure structural schematic diagram.
Wherein: pedestal 1, installation rotary table 2, wafer 3, CCD4, crossbeam 5, slide unit 6, laser 7, silicon material layer 8, titanium dioxide
Silicon material layer 9, photoresist 10, mask plate 11, light source 12.
Specific embodiment
The technical solution of the utility model is described in more detail With reference to embodiment.
In the description of the present invention, it should be understood that term " center ", " longitudinal direction ", " transverse direction ", "upper", "lower",
The orientation or positional relationship of the instructions such as "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside" is
It is based on the orientation or positional relationship shown in the drawings, is merely for convenience of describing the present invention and simplifying the description, rather than indicate
Or imply that signified device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore cannot understand
For limitations of the present invention.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " is pacified
Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally
Connection；It can be mechanical connection, be also possible to be electrically connected；Can be directly connected, can also indirectly connected through an intermediary,
It can be the connection inside two elements.For the ordinary skill in the art, on being understood by concrete condition
State the concrete meaning of term in the present invention.
Embodiment 1
Please refer to Fig. 1 and Fig. 2, in the utility model embodiment, a kind of no exposure mask polar coordinates rotary scanning exposure image dress
It sets, including pedestal 1,1 upper end of pedestal is equipped with installation rotary table 2, and the installation rotation of rotary table 2 is fixed on pedestal 1, in order to enable peace
Motor can be equipped with, the output shaft of motor is fixed on installation rotary table 2, on motor with uniform rotation by filling rotary table 2 inside pedestal 1
It is externally provided with electric power connection line and control switch, installation 2 upper end of rotary table is equipped with the wafer 3 of annular array distribution, and wafer 3 is adsorbed on peace
Fill on rotary table 2,1 upper end of pedestal is equipped with crossbeam 5, crossbeam 5 be it is U-shaped, in order to be positioned to wafer 3, be equipped on crossbeam 5
CCD4,5 upper end of crossbeam are arranged with slide unit 6, and in order to complete portraying for image on wafer 3,6 side of slide unit is equipped with array distribution
Laser 7.
Embodiment 2
Please refer to Fig. 1 and Fig. 2, in the utility model embodiment, a kind of no exposure mask polar coordinates rotary scanning exposure image dress
It sets, is that on the basis of embodiment 1, further, there are four the CCD4 settings.
Please refer to Fig. 1-3, a kind of application method of no exposure mask polar coordinates rotary scanning exposal image forming apparatus, including following step
It is rapid:
Step 1 places the wafer 3 to photoetching on the installation rotary table 2 at the uniform velocity rotated with angular speed for θ；
Step 2 completes the contraposition to wafer 3 using the CCD4 for the positioning that installation 2 upper end of rotary table is equipped with；
Step 3 is equipped with along the radial laser 7 at the uniform velocity moved of installation rotary table 2 above installation rotary table 2；
Step 4, computer software parse graphic file, acquire data by CCD4 and position wafer 3, control installation rotary table 2
Rotation and laser 7, complete portraying for image, i.e. exposure image.
The utility model is without exposure mask polar coordinates rotary scanning exposal image forming apparatus, the photoetching of wafer 3, in computer technology
Under auxiliary, cancel mask plate making link, directly portray on wafer 3, pattern precision is high, high-quality, speed is fast, scanning connects
Continuous, stability is high, reduces production process, the optimization of cost of implementation；Traditional mask exposure structure, such as Fig. 4, including titanium dioxide
Silicon material layer 9,9 lower end of silicon dioxide material layer are equipped with silicon material layer 8, and 9 upper end of silicon dioxide material layer is equipped with photoresist 10, light
10 upper end of photoresist is equipped with mask plate 11, and 11 upper end of mask plate is equipped with light source 12.
The better embodiment of the utility model is explained in detail above, but the utility model be not limited to it is above-mentioned
Embodiment can also not depart from the utility model ancestor within the knowledge of one of ordinary skill in the art
Various changes can be made under the premise of purport.
Claims (7)
1. a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus, including pedestal (1), which is characterized in that the pedestal (1)
Upper end is equipped with installation rotary table (2), and installation rotary table (2) upper end is equipped with the wafer (3) of annular array distribution, pedestal (1) upper end peace
Equipped with crossbeam (5), crossbeam is equipped with CCD(4 on (5)), crossbeam (5) upper end is arranged with slide unit (6), and slide unit (6) side is equipped with battle array
The laser (7) of column distribution.
2. a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus according to claim 1, which is characterized in that described
Installation rotary table (2) rotation is fixed on pedestal (1).
3. a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus according to claim 1, which is characterized in that described
Motor is installed, the output shaft of motor is fixed in installation rotary table (2) inside pedestal (1).
4. a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus according to claim 3, which is characterized in that described
Electric power connection line and control switch are externally provided on motor.
5. a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus according to claim 1, which is characterized in that described
Wafer (3) is adsorbed in installation rotary table (2).
6. a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus according to claim 1, which is characterized in that described
Crossbeam (5) is U-shaped.
7. a kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus according to claim 1, which is characterized in that described
CCD(4) there are four setting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821602375.5U CN208689363U (en) | 2018-09-29 | 2018-09-29 | A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821602375.5U CN208689363U (en) | 2018-09-29 | 2018-09-29 | A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus |
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| Publication Number | Publication Date |
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| CN208689363U true CN208689363U (en) | 2019-04-02 |
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| CN201821602375.5U Active CN208689363U (en) | 2018-09-29 | 2018-09-29 | A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873624A (en) * | 2018-09-29 | 2018-11-23 | 深圳市先地图像科技有限公司 | A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus and its application method |
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2018
- 2018-09-29 CN CN201821602375.5U patent/CN208689363U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873624A (en) * | 2018-09-29 | 2018-11-23 | 深圳市先地图像科技有限公司 | A kind of no exposure mask polar coordinates rotary scanning exposal image forming apparatus and its application method |
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