CN208538804U - A kind of monocrystalline silicon piece supersonic wave cleaning machine - Google Patents
A kind of monocrystalline silicon piece supersonic wave cleaning machine Download PDFInfo
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- CN208538804U CN208538804U CN201820938873.0U CN201820938873U CN208538804U CN 208538804 U CN208538804 U CN 208538804U CN 201820938873 U CN201820938873 U CN 201820938873U CN 208538804 U CN208538804 U CN 208538804U
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Abstract
The utility model discloses a kind of monocrystalline silicon piece supersonic wave cleaning machines, belong to ultrasonic cleaning apparatus technical field, its object is to solve to need multiple motors to be controlled when switching rinse bath and being cleaned in silicon wafer in the prior art, power source is more and mutually coordinated cooperation is difficult problem.The utility model includes shell, offers inlet port and outlet port respectively at left and right sides of shell, guide rail is provided in shell, sliding block is provided in guide rail, and mobile bar is connected on sliding block, sliding sleeve is arranged with outside mobile bar, cleaning basket is connected on sliding sleeve;Rotating block has also been connected via drive on outer casing inner wall, rotating bar is arranged in rotating block, rotating bar can be slided in rotating block inner cavity, and rotating bar one end and sliding sleeve are hinged;Bottom is additionally provided with ultrasonic cleaner in shell, corresponds on guide rail in guide rail and is additionally provided with limited block at ultrasonic cleaning groove location.The utility model structure is simple, power source is single, work coordination and efficiently.
Description
Technical field
The utility model belongs to ultrasonic cleaning apparatus technical field, and in particular to a kind of monocrystalline silicon piece ultrasonic cleaning
Machine.
Background technique
With the universal and development of semiconductor material, people are also higher and higher for the quality of silicon wafer and specification requirement, and
In the cleaning process of silicon wafer, ultrasonic cleaning technology is due to its favor of the excellent cleaning effect by domestic and international company.Benefit
With ultrasonic cleaning technology, ultrasonic frequency is back and forth swept in reasonable range in the process of cleaning, and cleaning solution is driven to be formed
Subtle reflux makes workpiece dirt take away workpiece surface rapidly while being removed by ultrasound, substantially increases cleaning efficiency.
Application No. is the utility model patents of CN201621479685.3 to disclose a kind of New Polycrystalline silicon wafer cleaning machine, packet
Shell, ultrasonic wave etching groove, ultrasonic wave alkaline bath and ultrasonic acid washing trough are included, the outer shell outer wall, which offers to return, washes mouth, and returns
The lower end Xi Kou is provided with liquid feeding plate, is fixed with PLC controller on the right side of the shell, the interior of shell is fixed with guide rail, and leads
Rail is slidably connected with sliding block, and the sliding block lower end is connected with telescopic rod, and the telescopic rod other end is fixed with gripper, the machinery
Pawl is fixed by handle and cleaning basket, and is cleaned at left and right sides of basket and offered inlet port and outlet port respectively, under the cleaning basket
End be provided with transpositing plate, the transpositing plate is slidably connected by sliding rail and shell, ultrasonic wave etching groove, ultrasonic wave alkaline bath and surpass
Potcher is respectively and fixedly provided on the right side of sound wave descaling bath.The utility model passes through ultrasonic wave etching groove, ultrasonic wave alkaline bath and ultrasonic wave
Descaling bath successively cleans polysilicon chip, can effectively remove wafer surface dirt, and cleaning efficiency is high.
The cleaning machine is realizing silicon wafer switching ultrasonic wave etching groove, ultrasonic wave alkaline bath, ultrasonic acid washing trough and rinsing
Slot needs to carry out sliding block movement and the contraction of telescopic rod during cleaning;And it is moved left and right in sliding block and telescopic rod is stretched
Long shrink needs different motors to be controlled, and power source is more, and at work and needs mutually to cooperate between power source
Cooperation;It further needs exist for testing agency to detect the sliding position and telescopic rod collapsing length of sliding block, and then preferably
Silicon wafer is cleaned.
Utility model content
The purpose of this utility model is that: it solves to need when switching rinse bath and being cleaned in silicon wafer in the prior art
Multiple motors are wanted to be controlled, the problem that power source is more and mutually coordinated cooperation is difficult provides that a kind of power source is single, work association
The monocrystalline silicon piece supersonic wave cleaning machine of tune.
The technical solution adopted in the utility model is as follows:
A kind of monocrystalline silicon piece supersonic wave cleaning machine, including shell, the shell left and right sides offer feed inlet and discharging respectively
Mouthful, it is provided with guide rail in shell, sliding block is provided in guide rail, mobile bar is connected on sliding block, is arranged with sliding sleeve outside mobile bar, it is sliding
It puts on and is connected with cleaning basket;Rotating block has also been connected via drive on outer casing inner wall, has been arranged with rotating bar in rotating block, has turned
Lever can sliding axially along the central axis of rotating block, rotating bar one end stretch out rotating block after it is hinged with sliding sleeve, rotating bar is another
End forms free end after stretching out rotating block;Bottom is additionally provided with ultrasonic cleaner in shell, corresponds on guide rail in guide rail ultrasonic
Limited block is additionally provided at wave cleaning groove location.
Wherein, rotating bar one end is connected with hinged block, and hinged block is hinged with sliding sleeve, is additionally provided between hinged block and sliding sleeve
Spring.
Wherein, ultrasonic cleaner includes the ultrasonic wave etching groove, ultrasonic wave alkaline bath, ultrasonic wave pickling set gradually
Slot, guide rail are equipped with limited block at the position corresponding to ultrasonic wave etching groove, ultrasonic wave alkaline bath, ultrasonic acid washing trough;It is super
Sound wave etching groove, ultrasonic wave alkaline bath are respectively and fixedly provided with potcher on the right side of ultrasonic acid washing trough, and potcher includes the first rinsing
Slot, the second potcher and third potcher;It is located just on the first potcher with limited block corresponding to ultrasonic wave alkaline bath
Side is located just above the second potcher with limited block corresponding to ultrasonic acid washing trough;Third potcher is set to guide rail pair
Third is answered to rinse groove location.
Wherein, the corresponding rinsing groove location of housing top end offers blowing mouth, and shell two sides are located under feed inlet, discharge port
Side offers exhaust outlet.
Wherein, it is additionally provided with transposition conveyer belt in shell, multiple sizes and cleaning basket are uniformly provided on the conveyer belt that replaces
It is adapted to, position and the compatible hole of ultrasonic cleaner.
Wherein, the bottom end of sliding sleeve is provided with mechanical arm, and cleaning basket is connect by mechanical arm with sliding sleeve.
In conclusion by adopting the above-described technical solution, the beneficial effects of the utility model are:
1, in the utility model, rotating block rotation is driven by driving device, rotating block drives rotating bar rotation, rotating bar
Sleeve movement is driven, when rotating bar turns to left half-court by right half-court, sliding sleeve is turned left movement by mobile bar with movable slider;When
Sliding block is turned left when being moved to limited block position, and sliding sleeve moves down, and sliding sleeve, which drives cleaning basket to move down, at this time makes monocrystalline silicon piece
Obtain cleaning action;After cleaning, driving device counter motion is enabled, sliding sleeve drives cleaning basket to be lifted up at this time, Zhi Houzhuan
Lever turns to right half-court by left half-court, drives cleaning basket toward moving right, carries out subsequent cleaning.Overall structure is simple,
Just be able to achieve the cleaning action of monocrystalline silicon piece by single driving device, and its realize cleaning basket move up and down and it is left
Other driving devices are not needed when moving right to be cooperated, stable working state, avoid money caused by multiple power source controls
Source waste and multiple motors, which get muddled in work coordination, be easy to cause Wafer Cleaning to fail.
2, in the utility model, by the way that spring is arranged, so that overall work operation is more steady.
3, in the utility model, monocrystalline silicon piece to be cleaned passes sequentially through ultrasonic wave etching groove, potcher, ultrasonic wave alkali cleaning
Slot, potcher, ultrasonic acid washing trough, potcher are cleaned, so that whole cleaning effect has obtained very big enhancing, and
Procedure operation also improves whole working efficiency.
4, in the utility model, by setting blowing mouth and exhaust outlet, so that monocrystalline silicon piece is passing through ultrasonic wave respectively
Rapid draing after etching groove, ultrasonic wave alkaline bath and ultrasonic acid washing trough cleaning, and then continue the cleaning of potcher, in this way
The order that ensure that overall workflow improves the cleaning efficiency of silicon wafer.
5, in the utility model, by setting transposition conveyer belt and mechanical arm, monocrystalline silicon piece completes ultrasonic wave quarter
After the cleaning for losing slot, potcher First Series, mechanical arm will clean basket and be placed on transposition conveyer belt, transposition conveyer belt movement
A distance, subsequent mechanical arm by clean basket connection carry out ultrasonic wave alkaline bath, potcher second series cleaning and
Ultrasonic acid washing trough, the cleaning of potcher third series, to further improve whole working efficiency.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model;
Fig. 2 is the structural schematic diagram in the utility model at A;
Marked in the figure: 1- shell, 2- sliding block, 3- limited block, 4- guide rail, 5- sliding sleeve, 6- rotating block, 7- rotating bar, 8- bullet
Spring, 9- cleaning basket, 10- feed inlet, 11- ultrasonic wave etching groove, 12- ultrasonic wave alkaline bath, the washing trough of 13- ultrasonic acid, 14- rinsing
Slot, the first potcher of 141-, the second potcher of 142-, 143- third potcher, 15- blowing mouth, 16- transposition conveyer belt, 17- row
Port, 18- discharge port.
Specific embodiment
In order to make the purpose of the utility model, technical solutions and advantages more clearly understood, below in conjunction with attached drawing and implementation
Example, the present invention will be further described in detail.It should be appreciated that specific embodiment described herein is only to explain this
Utility model is not used to limit the utility model.
A kind of monocrystalline silicon piece supersonic wave cleaning machine, including shell 1 offer charging on the left and right sides wall of shell 1 respectively
Mouthfuls 10 and discharge port 18, guide rail 4 is horizontally arranged with above 1 inner cavity of shell, sliding block 2 is embedded in guide rail 4, sliding block 2 can led
It horizontally slips on rail 4;The vertical lower of sliding block 2 is connected with mobile bar, is arranged with sliding sleeve 5 outside mobile bar, sliding sleeve 5 can be in mobile bar
On move in the vertical direction, the bottom end of sliding sleeve 5 be connected with cleaning basket 9;It is further fixed on driving device on 1 inner wall of shell, the driving
Device is clockwise and anticlockwise motor, and the output shaft of driving device is connected with rotating block 6, and rotating block 6 can turn around the output shaft of driving device
It is rotated backward after dynamic certain angle;Rotating block 6 is hollow box structure, is additionally provided with rotating bar 7, rotating bar 7
It is inserted through the setting of rotating block 6, rotating bar 7 can be slided in 6 inner cavity of rotating block along the length direction of rotating bar 7, and 7 one end of rotating bar is worn
Cross hinged with sliding sleeve 5 after rotating block 6,7 other end of rotating bar forms free end after passing through rotating block 6;Bottom is also set up in shell 1
There is ultrasonic cleaner, is additionally provided with limited block 3 at the corresponding ultrasonic cleaning groove location of guide rail 4 on guide rail 4.
Preferably, 7 one end of rotating bar is connected with hinged block, hinged block and sliding sleeve 5 are hinged, hinged block and sliding sleeve 5 it
Between be additionally provided with spring 8.
Preferably, ultrasonic cleaner includes the ultrasonic wave etching groove 11 set gradually, ultrasonic wave alkaline bath 12, surpasses
Sound wave descaling bath 13, the position corresponding to ultrasonic wave etching groove 11, ultrasonic wave alkaline bath 12, ultrasonic acid washing trough 13 of guide rail 4
Place is equipped with limited block 3;Ultrasonic wave etching groove 11, ultrasonic wave alkaline bath 12, ultrasonic acid washing trough 13 right side be respectively and fixedly provided with drift
Washing trough 14, potcher 14 include the first potcher 141, the second potcher 142 and third potcher 143;With ultrasonic wave alkali cleaning
Limited block 3 corresponding to slot 12 is located just at the top of the first potcher 141, i.e., with limited block corresponding to ultrasonic wave alkaline bath 12
3 not only form position-limiting action to the rotating bar 7 for being located at 12 top of ultrasonic wave alkaline bath, while also to positioned at ultrasonic acid washing trough 13
The rotating bar 7 of top forms position-limiting action;Similarly, the second drift is located just at limited block 3 corresponding to ultrasonic acid washing trough 13
142 top of washing trough;Third potcher 143 is set to corresponding 143 position of third potcher of guide rail 4.
Preferably, 1 top of shell, which corresponds to 14 position of potcher, offers blowing mouth 15,1 two sides of shell are located at charging
Mouthfuls 10, the lower section of discharge port 18 offers exhaust outlet 17.
Preferably, being additionally provided with transposition conveyer belt 16 in shell 1, it is uniformly provided on the conveyer belt 16 that replaces multiple big
It is small be adapted to cleaning basket 9, position and the compatible hole of ultrasonic cleaner.
Preferably, the bottom end of sliding sleeve 5 is provided with mechanical arm, cleaning basket 9 is connect by mechanical arm with sliding sleeve 5.
Specific working principle are as follows: basket 9 will be cleaned by feed inlet 10 and be placed on transposition conveyer belt 16, driving transposition passes
Band 16 is sent to move to certain position, the mechanical arm on sliding sleeve 5 is connect with cleaning basket 9, and driving transposition conveyer belt 16 makes it again
Then hole is corresponding with cleaning 9 position of basket to stop driving transposition conveyer belt 16;Then rotating block 6 is driven to revolve by driving device
Turn, rotating block 6 finally makes sliding sleeve 5 move downward the cleaning realized to monocrystalline silicon piece in cleaning basket 9, completes reversely to drive after cleaning
Turn motion block 6 rotates, and band movable slider 2 moves right after sliding sleeve 5 moves upward to certain position, is moved in sliding block 2 next
When at a 3 position of limited block, blowing mouth 15 dries up monocrystalline silicon piece, and sliding sleeve 5 moves downward at this time, and cleaning basket 9 is sent to first
Potcher 141 is cleaned;Complete such First Series cleaning and then it is secondary be driven in the reverse direction rotating block 6 so that cleaning basket 9
Transposition 16 corresponding position of conveyer belt is promoted to put when driving transposition conveyer belt 16 operation to cleaning 9 corresponding position of basket is without hole
Lower cleaning basket 9 then proceeds by subsequent serial ultrasonic wave alkaline bath 12, potcher 142 and ultrasonic acid washing trough 13, rinsing
The cleaning of slot 143.
Embodiment 1
A kind of monocrystalline silicon piece supersonic wave cleaning machine, including shell, the shell left and right sides offer feed inlet and discharging respectively
Mouthful, it is provided with guide rail in shell, sliding block is provided in guide rail, mobile bar is connected on sliding block, is arranged with sliding sleeve outside mobile bar, it is sliding
It puts on and is connected with cleaning basket;Rotating block is also connected via drive on outer casing inner wall, driving device is clockwise and anticlockwise motor, just
The output shaft of reversion motor connect with rotating block and rotating block is driven to rotate around the output shaft of clockwise and anticlockwise motor, is arranged in rotating block
There is rotating bar, rotating bar can be slided in rotating block inner cavity, and rotating bar one end and sliding sleeve are hinged;Bottom is additionally provided with ultrasound in shell
Wave rinse bath corresponds on guide rail in guide rail and is additionally provided with limited block at ultrasonic cleaning groove location.Turned by driving device driving
Motion block rotation, rotating block drive rotating bar rotation, and rotating bar drives sleeve movement, when rotating bar turns to left half-court by right half-court
When, sliding sleeve is turned left movement by mobile bar band movable slider;When sliding block, which is turned left, is moved to limited block position, sliding sleeve moves down,
Sliding sleeve, which drives cleaning basket to move down, at this time makes monocrystalline silicon piece obtain cleaning action;After cleaning, driving device is enabled reversely to transport
It moves, sliding sleeve drives cleaning basket to be lifted up at this time, and rotating bar turns to right half-court by left half-court later, drives cleaning basket is past to move to right
It is dynamic, carry out subsequent cleaning.Overall structure is simple, is made by the cleaning that single driving device is just able to achieve monocrystalline silicon piece
With, and it is cooperated in other driving devices that do not need when moving up and down and moving left and right for realizing cleaning basket, is worked
It is in stable condition, it avoids the wasting of resources caused by the control of multiple power sources and multiple motors gets muddled appearance in work coordination
Wafer Cleaning is easily caused to fail.
Embodiment 2
On the basis of embodiment 1, rotating bar one end is connected with hinged block, and hinged block is hinged with sliding sleeve, hinged block and cunning
Spring is additionally provided between set.By the way that spring is arranged, so that overall work operation is more steady.
Embodiment 3
On the basis of the above embodiments, ultrasonic cleaner includes the ultrasonic wave etching groove set gradually, ultrasonic wave alkali
Washing trough, ultrasonic acid washing trough, guide rail is at the position corresponding to ultrasonic wave etching groove, ultrasonic wave alkaline bath, ultrasonic acid washing trough
It is equipped with limited block;Ultrasonic wave etching groove, ultrasonic wave alkaline bath are respectively and fixedly provided with potcher on the right side of ultrasonic acid washing trough, rinse
Slot includes the first potcher, the second potcher and third potcher;With the just position of limited block corresponding to ultrasonic wave alkaline bath
Above the first potcher, it is located just above the second potcher with limited block corresponding to ultrasonic acid washing trough;Third rinsing
Slot is set to guide rail and corresponds to third rinsing groove location.Monocrystalline silicon piece to be cleaned passes sequentially through ultrasonic wave etching groove, potcher, surpasses
Sound wave alkaline bath, potcher, ultrasonic acid washing trough, potcher are cleaned so that whole cleaning effect obtained it is very big
Enhancing, and procedure operation also improves whole working efficiency.
Embodiment 4
On the basis of the above embodiments, the corresponding rinsing groove location of housing top end offers blowing mouth, and shell two sides are located at
Exhaust outlet is offered below feed inlet, discharge port.By setting blowing mouth and exhaust outlet, so that monocrystalline silicon piece is passing through respectively
Rapid draing after ultrasonic wave etching groove, ultrasonic wave alkaline bath and ultrasonic acid washing trough are cleaned is crossed, and then continues potcher
Cleaning, this ensure that the order of overall workflow, improves the cleaning efficiency of silicon wafer.
Embodiment 5
On the basis of the above embodiments, it is additionally provided with transposition conveyer belt in shell, is uniformly provided on the conveyer belt that replaces
Multiple sizes are adapted to cleaning basket, position and the compatible hole of ultrasonic cleaner;The bottom end of sliding sleeve is provided with manipulator
Arm, cleaning basket are connect by mechanical arm with sliding sleeve.It is completed by setting transposition conveyer belt and mechanical arm, monocrystalline silicon piece
Ultrasonic wave etching groove, potcher First Series cleaning after, mechanical arm by clean basket be placed in transposition conveyer belt on, transposition pass
Band movement a distance is sent, subsequent mechanical arm will clean basket connection and carry out ultrasonic wave alkaline bath, potcher second series
Cleaning and ultrasonic acid washing trough, the cleaning of potcher third series, to further improve whole working efficiency.
The above is only the preferred embodiment of the utility model only, is not intended to limit the utility model, all at this
Made any modifications, equivalent replacements, and improvements etc., should be included in the utility model within the spirit and principle of utility model
Protection scope within.
Claims (6)
1. a kind of monocrystalline silicon piece supersonic wave cleaning machine, including shell (1), shell (1) left and right sides offers feed inlet respectively
(10) and discharge port (18) it, is provided with guide rail (4), is embedded with sliding block (2) in guide rail (4), sliding block (2) can led in shell (1)
Rail moves left and right on (4), it is characterised in that: is connected with mobile bar on sliding block (2), sliding sleeve (5), sliding sleeve are arranged with outside mobile bar
(5) cleaning basket (9) is connected on;It has also been connected via drive rotating block (6) on shell (1) inner wall, rotating block (6) inner sleeve
Equipped with rotating bar (7), rotating bar (7) can slide axially along the central axis of rotating block (6), and rotating block is stretched out in rotating bar (7) one end
(6) afterwards with sliding sleeve (5) hingedly, rotating bar (7) other end stretch out rotating block (6) form free end afterwards;Shell (1) interior bottom is also set
It is equipped with ultrasonic cleaner, limited block (3) compatible with ultrasonic cleaner is additionally provided on guide rail (4).
2. a kind of monocrystalline silicon piece supersonic wave cleaning machine as described in claim 1, it is characterised in that: the connection of rotating bar (7) one end
There is hinged block, hinged block and sliding sleeve (5) hingedly, are additionally provided with spring (8) between hinged block and sliding sleeve (5).
3. a kind of monocrystalline silicon piece supersonic wave cleaning machine as described in claim 1, it is characterised in that: ultrasonic cleaner include according to
The ultrasonic wave etching groove (11) of secondary setting, ultrasonic wave alkaline bath (12), ultrasonic acid washing trough (13), guide rail (4) respectively with it is super
Sound wave etching groove (11), ultrasonic wave alkaline bath (12), ultrasonic acid washing trough (13), which are adapted at position, is equipped with limited block (3);
Ultrasonic wave etching groove (11), ultrasonic wave alkaline bath (12) are respectively and fixedly provided with potcher (14) on the right side of ultrasonic acid washing trough (13).
4. a kind of monocrystalline silicon piece supersonic wave cleaning machine as claimed in claim 2, it is characterised in that: the corresponding drift in shell (1) top
Washing trough (14) position offers blowing mouth (15), and shell (1) two sides are located at feed inlet (10), discharge port offers below (18)
Exhaust outlet (17).
5. a kind of monocrystalline silicon piece supersonic wave cleaning machine as described in claim 1, it is characterised in that: be additionally provided in shell (1)
Replace conveyer belt (16), be uniformly provided in transposition conveyer belt (16) multiple sizes be adapted to cleaning basket (9), position with it is ultrasonic
The compatible hole of wave rinse bath.
6. a kind of monocrystalline silicon piece supersonic wave cleaning machine as described in claim 1, it is characterised in that: the bottom end of sliding sleeve (5) is arranged
There is mechanical arm, cleaning basket (9) is connect by mechanical arm with sliding sleeve (5).
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CN201820938873.0U CN208538804U (en) | 2018-06-19 | 2018-06-19 | A kind of monocrystalline silicon piece supersonic wave cleaning machine |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113909209A (en) * | 2021-09-29 | 2022-01-11 | 深圳市美雅洁技术股份有限公司 | Mixed frequency ultrasonic wave subassembly |
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2018
- 2018-06-19 CN CN201820938873.0U patent/CN208538804U/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113909209A (en) * | 2021-09-29 | 2022-01-11 | 深圳市美雅洁技术股份有限公司 | Mixed frequency ultrasonic wave subassembly |
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