CN207845774U - A kind of diamond-like-carbon film deposition apparatus of low hydrogen content - Google Patents
A kind of diamond-like-carbon film deposition apparatus of low hydrogen content Download PDFInfo
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- CN207845774U CN207845774U CN201721899645.9U CN201721899645U CN207845774U CN 207845774 U CN207845774 U CN 207845774U CN 201721899645 U CN201721899645 U CN 201721899645U CN 207845774 U CN207845774 U CN 207845774U
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Abstract
The utility model belongs to technical field of vacuum plating, and in particular to a kind of diamond-like-carbon film deposition apparatus of low hydrogen content.The diamond-like-carbon film deposition apparatus of the low hydrogen content includes vacuum cavity, flat target, workpiece rotating frame system, constant current ionization device, heating temperature-control system and process gas are set in vacuum cavity, distribution system is added, it is provided with taper furnace roof at the top of the vacuum cavity, deposition bleeding point is equipped in taper furnace roof upper end.The diamond-like-carbon film deposition apparatus of the low hydrogen content can be in depositing diamond-like carbon film, the light gas of hydrogen atom, hydrogen, hydrogen ion isodensity in vacuum cavity is preferentially extracted out from top, hydrogen content is low in diamond-like carbon film to make to deposit to workpiece, achievees the purpose that the diamond-like carbon film for producing low hydrogen content.
Description
Technical field
The utility model belongs to technical field of vacuum plating, and in particular to a kind of diamond-like carbon film deposition of low hydrogen content
Equipment.
Background technology
In general, diamond-like carbon-base film (DLC) is that one kind contains diamond lattic structure (SP3 hybrid bonds) and graphite knot
The metastable amorphous state substance of structure (SP2 hybrid bonds), carbon atom are mainly combined with SP3 and SP2 hybrid bonds.Amorphous carbon base film one
As can be divided into hydrogen-containing carbon film (a-C:H) and not two class of hydrogen-containing carbon film (a-C).Hydrogen content in hydrogeneous DLC film is in 20at.%
The ingredient of~50at.%, SP3 hybrid bond is less than 70%.Commonly tetrahedral amorphous carbon (ta-C) film in hydrogen-free DLC film.
In ta-C coatings based on SP3 hybrid bonds, the content of SP3 hybrid bonds is generally greater than 70%.Hydrogen content in DLC can influence SP3
The ratio of hybrid bond and SP2 hybrid bonds, therefore it also has a very big impact the performance of film.
The deposition of diamond-like carbon film (DLC) is to use ion beam depositing earliest, after decades of development, now
Successfully develop new method and new technology that many physical vapour deposition (PVD)s, chemical vapor deposition and liquid phase method prepare DLC film.
It prepares hydrogen-free DLC and mainly uses magnetron sputtering technique and magnetic filtering cathode arc technology (FCVAD).Magnetron sputtering technique
Mainly use graphite target for carbon source, magnetron sputtering graphite target, carbon atom or atomic group move to base material deposited DLC, and feature is
Deposition velocity is fast, the smooth exquisiteness in surface, and color can be adjusted by adulterating, but hardness is not high enough, and wear-resisting property has to be supplied.Magnetic mistake
Filter cathode arc technology, which is utilized in front of cathode arc, is arranged Magnetic filter pipe, and the effect using magnetic field to ion changes carbon ion
Reach the movement locus of matrix, this Magnetic filter is very stringent to the screening effect of tiny atomic group, only when the charge of particle and
When size is just suitable, be possible to deposit in substrate by magnetic field conduits；Carbon molecules, atom and the bulky grain of non-ionization are then
It depositing on magnetic field conduits inner wall, eliminates macroscopical carbon particle in film, improve the quality of DLC film, feature is hardness height,
Crocking resistance is good, but deposition rate is low, of high cost.Chemical vapor deposition (CVD), plasmaassisted especially therein
Chemical vapor deposition (PACVD) prepares carbon film and uses CH4, C2H2 etc. containing hydrocarbon organic gas for carbon source, has deposition velocity
Soon, surface is fine and smooth, glossiness is good, and hardness is high, and wear-resisting property is good, but because of hydrogen content height, easy tos produce the quick-fried film of hydrogen embrittlement.This technology master
Solve the problems, such as it is that a kind of depositing device is designed to deposit the diamond-like carbon film of low hydrogen content based on PACVD methods.
Utility model content
Based on the shortcomings and deficiencies of the above-mentioned prior art, the purpose of this utility model is to provide a kind of classes of low hydrogen content
Diamond carbon film deposition apparatus, the equipment have the characteristics that deposition velocity is fast, and it is smooth thin to be formed by diamond-like-carbon film surface
It is greasy, hardness is high, wear-resisting property is good and stress is small.
The purpose of this utility model is achieved through the following technical solutions：
A kind of diamond-like-carbon film deposition apparatus of low hydrogen content, including vacuum cavity, in the inside of vacuum cavity with true
Cavity body center is that 45 °, 135 °, the 225 ° and 315 ° directions in the center of circle are respectively equipped with a flat target；It is arranged inside vacuum cavity
There is the workpiece rotating frame system in circular ring shape, the workpiece rotating frame system memory and outside, which are provided with opposite constant current ionization, to be filled
It sets；The workpiece rotating frame systematic is horizontally disposed several circular work hangers；
The diamond-like-carbon film deposition apparatus of the low hydrogen content further includes that heating temperature-control system and process gas are added and divide
Match system；The uniformly distributed several heating tubes in workpiece rotating frame system both sides and several contour tracheaes, the tracheae is from vacuum
Vacuum cavity is stretched into the bottom of cavity；The heating tube is connected to heating temperature-control system, and the tracheae is added with process gas to be divided
Match system is connected to；
It is provided with taper furnace roof at the top of the vacuum cavity, deposition bleeding point is equipped in taper furnace roof upper end；It is described low
The diamond-like-carbon film deposition apparatus of hydrogen content further includes vacuum-pumping system, the vacuum-pumping system by pipeline with it is described
Bleeding point is deposited to be connected.
Further, the level height of the tracheae is higher 5-30cm than the work hanger；The tracheae is opened from top to bottom
If several stomatas, the stomata successively increases from lower to upper both facing to the work hanger closed on, the aperture of the stomata.
Further, the level height of the tracheae is higher 10-20cm than the work hanger.
Further, the tracheae opens up 5-20 stomata from top to bottom.
Further, the flat target is Cr targets, Ti targets or W targets.
Further, being taken out by the setting baking of 180 ° of directions in the center of circle of vacuum cavity center inside the vacuum cavity
Gas port, the baking bleeding point are connected by pipeline with the vacuum-pumping system.
Further, arc target is set by 270 ° of directions in the center of circle of vacuum cavity center inside the vacuum cavity.
Further, the diamond-like-carbon film deposition apparatus of the low hydrogen content further includes pulse direct current grid bias power supply system
System, the workpiece rotating frame system are connected with the cathode of the pulse direct current grid bias power supply system, the workpiece rotating frame system and institute
State vacuum cavity insulation, the plus earth of the pulse direct current grid bias power supply system, the vacuum cavity ground connection.
Further, the one side of the vacuum cavity is arranged into shipment fire door, is arranged with into shipment fire door adjacent side
Observation window.
The utility model has the advantage that compared with the existing technology and effect：
(1) the diamond-like-carbon film deposition apparatus for the low hydrogen content that this patent scheme is provided passes through on vacuum cavity top
The design vacuumized is set, it can be in depositing diamond-like carbon film, by hydrogen atom, hydrogen, hydrogen ion isodensity in vacuum cavity
Light gas is preferentially extracted out from top, and hydrogen content is low in the diamond-like carbon film to make to deposit to workpiece, reaches production low hydrogen
The purpose of the diamond-like carbon film of content.
(2) the diamond-like-carbon film deposition apparatus for the low hydrogen content that this patent scheme is provided passes through tracheae height, aperture
Size and the design of distribution, can be such that gas is uniformly distributed in vacuum cavity, keep plasma density uniform, to make workpiece face
Color, thickness and performance more stable and uniform.
(3) the diamond-like-carbon film deposition apparatus for the low hydrogen content that this patent scheme is provided is by being arranged plane everywhere
Target can flexibly select different flat targets according to different deposition needs, and adhesive force is improved for depositing bottom and transition zone,
It can also be used for adulterating.
(4) the diamond-like-carbon film deposition apparatus for the low hydrogen content that this patent scheme is provided is by using individual constant current
Ionization device can be convenient for the ionization level of control plasma.
Description of the drawings
Fig. 1 is that the planar structure in embodiment inside the vacuum cavity of the diamond-like-carbon film deposition apparatus of low hydrogen content is shown
It is intended to.
Fig. 2 is the exterior facades signal of the vacuum cavity of the diamond-like-carbon film deposition apparatus of low hydrogen content in embodiment
Figure.
Fig. 3 is the schematic view of facade structure of A-A in Fig. 1.
Fig. 4 is the vacuum cavity of the diamond-like-carbon film deposition apparatus of low hydrogen content and vacuum-pumping system in embodiment
Pipe connecting structure schematic diagram.
In figure：1- baking bleeding points, 2- vacuum cavities, 3- workpiece rotating frame systems, 4- flat targets, 5- tracheaes, 6- heating tubes,
7- is into shipment fire door, 8- observation windows, 9- arc targets, and 10- deposits bleeding point, 11- taper furnace roofs, 12- constant current ionization devices, and 13- is true
Empty extract system, 14- stomatas, 15- work hangers.
Specific implementation mode
The present invention will be further described in detail with reference to the embodiments and the accompanying drawings, but the implementation of the utility model
Mode is without being limited thereto.
Embodiment
In conjunction with shown in Fig. 1 and Fig. 2, the present embodiment provides a kind of diamond-like-carbon film deposition apparatus of low hydrogen content, including
Vacuum cavity 2 is distinguished in the inside of vacuum cavity 2 by 45 °, 135 °, the 225 ° and 315 ° directions in the center of circle of 2 center of vacuum cavity
Equipped with a flat target 4；It is internally provided with the workpiece rotating frame system 3 in circular ring shape in vacuum cavity 2, in the workpiece rotating frame system
3 inner and outers are provided with opposite constant current ionization device 12；The workpiece rotating frame system 3 has been placed equidistant with several work hangers
15；
The diamond-like-carbon film deposition apparatus of the low hydrogen content further includes heating temperature-control system (not shown) and work
Distribution system (not shown) is added in skill gas；Uniformly distributed several heating tubes 6 in 3 both sides of workpiece rotating frame system and several
Contour tracheae 5, the tracheae 5 stretch into vacuum cavity 2 from the bottom of vacuum cavity 2；The heating tube 6 and heating temperature-control system
Connection, the tracheae 5 are added distribution system with process gas and are connected to；
The top of the vacuum cavity 2 is provided with taper furnace roof 11, and deposition bleeding point 10 is equipped in 11 upper end of taper furnace roof；
The diamond-like-carbon film deposition apparatus of the low hydrogen content further includes vacuum-pumping system 13, and the vacuum-pumping system 13 passes through
Pipeline is connected with the deposition bleeding point 10.
In the diamond-like-carbon film deposition apparatus of the low hydrogen content, by the way that taper furnace roof 11 and deposition bleeding point is arranged
10 and it is connected to vacuum-pumping system 13, it can be in depositing diamond-like carbon film, by hydrogen atom, hydrogen, hydrogen ion in vacuum cavity 2
The light gas of isodensity is preferentially extracted out from top, and hydrogen content is low in the diamond-like carbon film to make to deposit to workpiece, reaches raw
Produce the purpose of the diamond-like carbon film of low hydrogen content.
As shown in the A-A elevational schematic views of Fig. 3, specifically, the level height of the tracheae 5 is than the work hanger 15
Height, altitude range can require adjustment height in 5-30cm according to the state modulator of actual processing workpiece；The tracheae 5 on toward
Under open up several stomatas 14,14 quantity of stomata can be adjusted at 5-20 according to actual processing parameter request；The all courts of the stomata 14
To the work hanger 15 closed on, the aperture of the stomata 14 successively increases from lower to upper.Pass through the variation in 5 height of tracheae and aperture
Setting, can be such that gas is uniformly distributed in vacuum cavity 2, keep plasma density uniform, to make workpiece color, thickness and property
It can more stable and uniform.In order to reach better effect, in other embodiments, the level height of the tracheae 5 can design
At than 15 high 10-20cm of the work hanger.
Specifically, the flat target 4 is Cr targets, Ti targets or W targets.According to different deposition needs, different put down may be selected
Face target 4 is mainly used for depositing bottom and transition zone improves adhesive force, it can also be used to adulterate.
Specifically, being taken out by the setting baking of 180 ° of directions in the center of circle of 2 center of vacuum cavity inside the vacuum cavity 2
Gas port 1, the baking bleeding point 1 are connected by pipeline with the vacuum-pumping system 13.
As shown in figure 4, described deposit the pipeline and baking bleeding point 1 and institute that bleeding point 10 is connected to vacuum-pumping system 13
The pipeline for stating the connection of vacuum-pumping system 13 is mutual indepedent, each by the independent vacuum of valve and the vacuum-pumping system 13
Mouth connection.
Specifically, arc target 9 is arranged by 270 ° of directions in the center of circle of 2 center of vacuum cavity inside the vacuum cavity 2.
Specifically, the diamond-like-carbon film deposition apparatus of the low hydrogen content further includes pulse direct current grid bias power supply system
(not shown), the workpiece rotating frame system 3 are connected with the cathode of the pulse direct current grid bias power supply system, and the workpiece turns
Frame system 3 insulate with the vacuum cavity 2, and the plus earth of the pulse direct current grid bias power supply system, the vacuum cavity 2 connects
Ground.
Specifically, the one side of the vacuum cavity 2 is arranged into shipment fire door 7, it is in the present embodiment, described into shipment stove
Door 7 be arranged inside the vacuum cavity 2 using 2 center of vacuum cavity as 90 ° of directions side in the center of circle；Meanwhile with disengaging
Observation window 8 is arranged in 7 adjacent side of goods fire door, in the present embodiment, described to be arranged in the vacuum cavity 2 into shipment fire door 7
Portion using 2 center of vacuum cavity as 0 ° of direction side in the center of circle.
In the diamond-like-carbon film deposition apparatus of the low hydrogen content described in the present embodiment, using individual constant current ionization device
12, the ionization level of control plasma can be convenient for.
The constant current ionization device 12 sets that there are two symmetrical ionization electrode (not shown)s and a constant current ionization source electricity
Source (not shown), two ionization electrodes are connected to by conducting wire on the constant current ionization source current of constant current ionization device 12, permanent
Wandering about as a refugee source current is mounted on 2 outside of vacuum cavity.The operation principle of the constant current ionization device 12 is in depositing diamond-like
When carbon film, constant current ionization source provides reaction gas ionization to independent C2H2Or methane gas plasma, energy is adjustable, ionization
C afterwards+It deposits to form film layer in product surface, added back bias voltage can be separately adjustable on product, to obtain the class of smooth densification
Diamond-like carbon film film layer becomes easy.In other embodiments, the ionization electrode of the constant current ionization device 12 is not limited to this
Installation number and installation site can be arranged as required to multiple ionization electrodes.
The diamond-like-carbon film deposition apparatus of the low hydrogen content is additionally provided with PLC controls and (does not show in figure with operating system
Go out), the PLC controls are used to control operating parameter and the start and stop of all parts and system with operating system.
The technological process of deposition process is carried out using the diamond-like-carbon film deposition apparatus of low hydrogen content described in the present embodiment
For：
(1) cleaning treatment of workpiece, using common method in general industry；Then workpiece is installed to workpiece rotating frame
On the work hanger 15 of system 3；
(2) vacuum cavity 2 is evacuated to base vacuum by toasting bleeding point 1 using vacuum-pumping system 13；It uses
Heating temperature-control system is internally heated vacuum cavity 2 by heating tube 6；
(3) start constant current ionization device 12, plasma cleaning is carried out to the workpiece on work hanger 15, activates product table
Face can improve film adhesion.
(4) decide whether that starting arc target 9 carries out arc bombardment processing according to workpiece feature；
(5) flat target 4 is used to deposit bottom；
(6) deposition bleeding point 10 is opened, is vacuumized by vacuum-pumping system 13, baking bleeding point 1 is simultaneously closed off,
Deposition transition zone is carried out by flat target 4；
(7) adjusting process parameter carries out depositing decorative diamond-like carbon film dura mater.
The above, the only preferred embodiment of the utility model not make in any form the utility model
Limitation；The those of ordinary skill of all industry can be shown in by specification attached drawing and described above and swimmingly implement this practicality
It is novel；But all those skilled in the art are not departing within the scope of technical solutions of the utility model, using the above institute
The technology contents of announcement and the equivalent variations of a little variation, modification and evolution made, are the equivalence enforcement of the utility model
Example；Meanwhile all substantial technologicals according to the utility model to the changes of any equivalent variations made by above example, modification with
Develop etc., still fall within the protection domain of the technical solution of the utility model.
Claims (10)
1. a kind of diamond-like-carbon film deposition apparatus of low hydrogen content, it is characterised in that：Including vacuum cavity, in vacuum cavity
Inside is respectively equipped with a flat target by 45 °, 135 °, the 225 ° and 315 ° directions in the center of circle of vacuum cavity center；In vacuum cavity
It is internally provided with the workpiece rotating frame system in circular ring shape, the workpiece rotating frame system memory and outside are provided with opposite constant current
Ionization device；The workpiece rotating frame systematic is horizontally disposed several circular work hangers；
The diamond-like-carbon film deposition apparatus of the low hydrogen content further includes that distribution system is added in heating temperature-control system and process gas
System；The uniformly distributed several heating tubes in workpiece rotating frame system both sides and several contour tracheaes, the tracheae is from vacuum cavity
Bottom stretch into vacuum cavity；The heating tube is connected to heating temperature-control system, and distribution system is added with process gas in the tracheae
System connection；
It is provided with taper furnace roof at the top of the vacuum cavity, deposition bleeding point is equipped in taper furnace roof upper end；The low hydrogen contains
The diamond-like-carbon film deposition apparatus of amount further includes vacuum-pumping system, and the vacuum-pumping system passes through pipeline and the deposition
Bleeding point is connected.
2. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：The tracheae
Level height is higher 5-30cm than the work hanger；The tracheae opens up several stomatas from top to bottom, and the stomata is both facing to facing
The aperture of close work hanger, the stomata successively increases from lower to upper.
3. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 2, it is characterised in that：The tracheae by
On open up 5-20 stomata down.
4. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：The tracheae
Level height is higher 10-20cm than the work hanger.
5. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：Stating flat target is
Cr targets, Ti targets or W targets.
6. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：In the vacuum
Inside cavity toasts bleeding point by the setting of 180 ° of directions in the center of circle of vacuum cavity center, and the baking bleeding point passes through pipeline
It is connected with the vacuum-pumping system.
7. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：In the vacuum
Arc target is arranged by 270 ° of directions in the center of circle of vacuum cavity center in inside cavity.
8. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：The low hydrogen contains
The diamond-like-carbon film deposition apparatus of amount further includes pulse direct current grid bias power supply system, the workpiece rotating frame system and the pulse
The cathode of DC bias power system is connected, and the workpiece rotating frame system insulate with the vacuum cavity, and the pulse direct current is inclined
The plus earth of voltage source system, the vacuum cavity ground connection.
9. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：The vacuum chamber
The one side of body is arranged into shipment fire door, and observation window is arranged with into shipment fire door adjacent side.
10. the diamond-like-carbon film deposition apparatus of low hydrogen content according to claim 1, it is characterised in that：It is additionally provided with PLC
Control and operating system.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201721899645.9U CN207845774U (en) | 2017-12-29 | 2017-12-29 | A kind of diamond-like-carbon film deposition apparatus of low hydrogen content |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721899645.9U CN207845774U (en) | 2017-12-29 | 2017-12-29 | A kind of diamond-like-carbon film deposition apparatus of low hydrogen content |
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| CN207845774U true CN207845774U (en) | 2018-09-11 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114540761A (en) * | 2022-01-12 | 2022-05-27 | 苏州市彩衣真空科技有限公司 | Coating process of amorphous tetrahedral carbon structure on surface of ultrathin PET (polyethylene terephthalate) film |
-
2017
- 2017-12-29 CN CN201721899645.9U patent/CN207845774U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114540761A (en) * | 2022-01-12 | 2022-05-27 | 苏州市彩衣真空科技有限公司 | Coating process of amorphous tetrahedral carbon structure on surface of ultrathin PET (polyethylene terephthalate) film |
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