CN207793418U - 一种镀膜设备 - Google Patents

一种镀膜设备 Download PDF

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CN207793418U
CN207793418U CN201820160021.3U CN201820160021U CN207793418U CN 207793418 U CN207793418 U CN 207793418U CN 201820160021 U CN201820160021 U CN 201820160021U CN 207793418 U CN207793418 U CN 207793418U
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sensor
filming equipment
protective device
position sensor
coating chamber
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王晓尉
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Shanghai zuqiang Energy Co.,Ltd.
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Beijing Apollo Ding Rong Solar Technology Co Ltd
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Priority to CN201820160021.3U priority Critical patent/CN207793418U/zh
Priority to PCT/CN2018/093288 priority patent/WO2019148763A1/zh
Priority to EP18185294.8A priority patent/EP3517649A1/en
Priority to AU2018208690A priority patent/AU2018208690A1/en
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Priority to US16/159,720 priority patent/US20190237613A1/en
Priority to KR1020180125005A priority patent/KR20190092231A/ko
Priority to JP2018224878A priority patent/JP2019131885A/ja
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Abstract

本实用新型公开了一种镀膜设备，通过将位置传感器设置在镀膜腔室外侧，并穿过传感器探测通路对镀膜腔室内部的镀膜载体的位置进行探测，从而避免位置传感器与镀膜载体直接接触而对镀膜载体产生损坏，且避免镀膜腔室内部极端环境对位置传感器造成不利影响；而且，通过设置防护装置，防止传感器探测通路被镀膜阻挡，从而保证位置传感器的正常工作；本实用新型结构简单，成本较低，使用方便。

Description

一种镀膜设备
技术领域
本实用新型涉及太阳能电池加工领域，尤其涉及一种镀膜设备。
背景技术
随着环境污染的问题越来越严重，人们越来越重视清洁能源的开发和应用，而薄膜太阳能电池作为一种缓解能源危机的新型的光伏器件，越来越受到大家的欢迎，PVD(Physical Vapor Deposition---物理气相沉积)和CVD(化学气相沉积Chemical VaporDeposition)就是电池制备工艺过程中常用的技术方法；通常量产的PVD和CVD设备由多个真空腔室组成，一般为进片室、加热室、工艺室、冷却室和出片室等，根据工艺需要进行数量配备，而对于电控***，主要包括真空***的控制、加热***的控制、冷却***的控制、工艺气体的控制和传输***的控制等，其中，传输***主要是对镀膜载体的传输，比如玻璃载板或硅片载板等，当载体到达特定腔室时，通常由位置传感器将位置信号传输给控制***，以便控制***根据镀膜载体的位置来调整其停留时间及传输速度，从而控制整条生产线的生产节拍。
在镀膜设备中，真空腔室的温度有的很高，有的可达600摄氏度左右，尤其在镀膜腔室，有的是磁控溅射镀膜，有的是共蒸法镀膜，有的是等离子体镀膜，涉及的镀膜方式各不一样，因此将位置传感器安装在哪里安装在什么位置怎么安装就显得尤为重要。对于PVD、CVD量产设备或者其他同类设备，镀膜载体在传输线中进行传输的时候，对载体进行位置检测对于工艺需求和生产节拍来说是非常重要的，而腔室内的环境常常具有如下特点：真空环境或高真空环境；高温，有的可达600摄氏度左右；镀膜方式各不相同，镀膜环境复杂；那么，在选择位置传感器的时候，就有了一下思路：1)采用接触式机械传感器，那么必须安装在真空腔室内；2)采用非接触式的目前比较常用光电传感器，安装在真空腔室内；3)采用非接触式的目前比较常用的光电传感器，安装在真空腔室外。
在实际应用中，以上方法存在如下问题：
第一种方法，接触式的机械传感器在接触到镀膜载体的时候，会对镀膜载体产生损坏的可能，直接影响到镀膜的质量，而且安装和工作在真空腔室内，对于安装和维护带来不便；
第二种方法，非接触式光电传感器安装在真空腔室内，不仅安装和维修不便，最主要的是能在真空高温镀膜环境下工作的传感器几乎很难做到，即使能做到成本也较高；
第三种方法，非接触式光电传感器安装在真空腔室外，克服了以上两种方法的缺点，但所要做的就是必须给外部的光电传感器设置光线路径让传感器感知到镀膜载体的存在，实际应用中通常采用玻璃窗的方式，但玻璃窗有个问题，那就是在镀膜腔室内常常会出现玻璃窗被镀上膜，妨碍光电传感器的正常工作的情况。
实用新型内容
本实用新型的目的是提供一种镀膜设备，以解决现有技术中的问题，防止对镀膜载体产生损坏，且保证传感器的正常工作。
本实用新型提供了一种镀膜设备，所述镀膜设备包括：
镀膜腔室；
设置在所述镀膜腔室的内部的镀膜载体，所述镀膜载体用于承载待镀膜工件；
设置在所述镀膜腔室的外部的位置传感器，所述位置传感器通过传感器探测通路探测所述镀膜载体的位置；
所述传感器探测通路连通所述位置传感器与所述镀膜腔室的内部；
防护装置，所述防护装置围绕所述传感器探测通路且沿着所述传感器探测通路延伸。
作为优选，所述防护装置为两端开放的中空型筒状件。
作为优选，所述传感器探测通路包括所述镀膜腔室侧壁上的通孔和密封所述通孔的透光窗。
作为优选，所述防护装置为围绕所述通孔且向镀膜腔室的内部延伸的两端开放的中空型筒状件。
作为优选，所述防护装置的延伸方向与镀膜源的喷射方向垂直。
作为优选，所述防护装置沿所述传感器探测通路延伸50mm-160mm。
作为优选，所述透光窗包括设置在所述通孔外侧的透明玻璃。
作为优选，所述镀膜设备包括至少两个位置传感器，且每个位置传感器都配置有对应的传感器探测通路和防护装置。
作为优选，所述位置传感器为光电传感器，其发射光束。
本实用新型提供的镀膜设备，通过将位置传感器设置在镀膜腔室外侧，并穿过传感器探测通路对镀膜腔室内部的镀膜载体的位置进行探测，从而避免位置传感器与镀膜载体直接接触而对镀膜载体产生损坏，且避免镀膜腔室内部极端环境对位置传感器造成不利影响；而且，通过设置防护装置围绕传感器探测通路，防止传感器探测通路被镀膜阻挡，从而保证位置传感器的正常工作；本实用新型结构简单，成本较低，使用方便。
附图说明
图1为本实用新型实施例提供的镀膜设备的结构示意图。
附图标记说明：
1-镀膜腔室，2-镀膜载体，3-位置传感器，4-防护装置，5-定位支架。
具体实施方式
下面详细描述本实用新型的实施例，所述实施例的示例在附图中示出，其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的，仅用于解释本实用新型，而不能解释为对本实用新型的限制。
如图1所示，本实用新型实施例提供了一种镀膜设备，所述镀膜设备包括：
镀膜腔室1，镀膜腔室1可以包括镀膜工件进口和出口，其中在镀膜过程中，镀膜腔室1内处于真空状态；
设置在所述镀膜腔室1的内部的镀膜载体2，所述镀膜载体2用于承载待镀膜工件；
设置在所述镀膜腔室1的外部的位置传感器3，所述位置传感器3通过传感器探测通路探测所述镀膜载体2的位置；
所述传感器探测通路连通所述位置传感器3与所述镀膜腔室1的内部；
防护装置4，所述防护装置4围绕所述传感器探测通路且沿着所述传感器探测通路延伸。
其中，作为优选，所述防护装置4为两端开放的中空型筒状件，其可以设置在所述镀膜腔室1的内部。
作为优选，所述传感器探测通路包括所述镀膜腔室1侧壁上的通孔和密封所述通孔的透光窗。作为优选，所述透光窗包括设置在所述通孔外侧的透明玻璃。
其中，透明玻璃为高硼硅玻璃材质。作为优选，所述镀膜设备还包括定位支架5，所述定位支架5设置在所述镀膜腔室1外侧，所述位置传感器3设置在所述定位支架5上；定位支架5为现有技术中的支架，实现对位置传感器3的固定；透明玻璃可以安装在定位支架5上，也可以直接设置在通孔处；可在所述通孔与所述透明玻璃之间设置密封法兰，透明玻璃与密封法兰对通孔进行密封，使得镀膜腔室1可为真空腔室，防护装置4同时也能够对透明玻璃进行防护。
作为优选，所述防护装置4为围绕所述通孔且向镀膜腔室1的内部延伸的两端开放的中空型筒状件。所述防护装置4的延伸方向与镀膜源的喷射方向垂直。所述延伸长度可以根据喷射方向与喷射强度调节，作为优选，所述防护装置4进一步延伸50mm-160mm，而其中155mm为最佳长度。
其中，防护装置4两端开口，一端设置在通孔内侧的外周缘，另一端朝向所述镀膜载体2延伸设置。作为优选，防护装置4的延伸长度为155mm，直径为10mm；且防护装置4的延伸方向可与镀膜源的喷射方向垂直，能够对通孔进行有效防护；作为优选，所述防护筒的轴向与所述镀膜载体2的运动方向一致；镀膜腔室1一般为真空腔室，在真空腔室内部，通过镀膜载体2承载待镀膜工件进行运动，此时，需要通过位置传感器3探测镀膜载体2的具体移动位置，以便控制***根据镀膜载体2的位置来调整其停留时间及传输速度，而位置传感器3，其通过透明窗通孔传输信号从而探测镀膜载体2的具体移动位置；在实际操作时，在对待镀膜工件进行镀膜时，往往将镀膜的材料溅射至透明窗通孔上，从而使得透明窗通孔被遮挡，无法进行光电传感器的信号传输，因此，本实施例中，通过在透明窗通孔处设置防护装置4，对透明窗通孔进行包围防护，通过增加径深的原理，即光电信号穿过透明窗通孔，并沿防护装置4内向镀膜载体2延伸，保证信号顺利传输，同时，防护装置4对透明窗通孔的包围，防止镀膜的材料溅射至透明窗通孔上；防护装置4可以选用耐高温的金属材料、树脂等；防护装置4长度为155mm，直径为10mm，能够对通孔进行防护，且尽量不浪费材料，防护装置4的轴向与所述镀膜载体2的运动方向垂直，即防护筒的轴向与所述镀膜载体2的运动轨迹位于同一条直线上，保证光线信号的不受阻挡的传输。
作为优选，所述位置传感器3为光电传感器，其发射光束。光束穿过传感器探测通路直至镀膜载体2的位置。
作为优选，所述镀膜设备包括至少两个位置传感器3，且每个位置传感器3都配置有对应的传感器探测通路和防护装置4。
其中，本实施例中，对位置传感器3、传感器探测通路和防护装置4的数量可根据实际情况灵活设置，也可设置有多个。
作为优选，所述镀膜设备还包括控制器，所述控制器分别与所述位置传感器3、所述镀膜载体2连接。控制器可统一控制位置传感器3进行位置探测、以及控制镀膜载体2灵活运动。
本实用新型提供的镀膜设备，通过将位置传感器3设置在镀膜腔室1外侧，并穿过传感器探测通路的通孔对镀膜腔室1内部的镀膜载体2的位置进行探测，从而避免位置传感器3与镀膜载体2直接接触而对镀膜载体2产生损坏，且避免镀膜腔室1内部极端环境对位置传感器3造成不利影响；而且，通过在镀膜腔室1内部的通孔内侧设置防护装置4，防止传感器探测通路的通孔被镀膜阻挡，从而保证位置传感器3的正常工作；本实用新型结构简单，成本较低，使用方便。
以上依据图式所示的实施例详细说明了本实用新型的构造、特征及作用效果，以上所述仅为本实用新型的较佳实施例，但本实用新型不以图面所示限定实施范围，凡是依照本实用新型的构想所作的改变，或修改为等同变化的等效实施例，仍未超出说明书与图示所涵盖的精神时，均应在本实用新型的保护范围内。

Claims (9)

1.一种镀膜设备，其特征在于，所述镀膜设备包括：
镀膜腔室；
设置在所述镀膜腔室的内部的镀膜载体，所述镀膜载体用于承载待镀膜工件；
设置在所述镀膜腔室的外部的位置传感器，所述位置传感器通过传感器探测通路探测所述镀膜载体的位置；
所述传感器探测通路连通所述位置传感器与所述镀膜腔室的内部；
防护装置，所述防护装置围绕所述传感器探测通路且沿着所述传感器探测通路延伸。
2.根据权利要求1所述的镀膜设备，其特征在于，所述防护装置为两端开放的中空型筒状件。
3.根据权利要求1所述的镀膜设备，其特征在于，所述传感器探测通路包括所述镀膜腔室侧壁上的通孔和密封所述通孔的透光窗。
4.根据权利要求3所述的镀膜设备，其特征在于，所述防护装置为围绕所述通孔且向镀膜腔室的内部延伸的两端开放的中空型筒状件。
5.根据权利要求1所述的镀膜设备，其特征在于，所述防护装置的延伸方向与镀膜源的喷射方向垂直。
6.根据权利要求1所述的镀膜设备，其特征在于，所述防护装置沿所述传感器探测通路延伸50mm-160mm。
7.根据权利要求3所述的镀膜设备，其特征在于，所述透光窗包括设置在所述通孔外侧的透明玻璃。
8.根据权利要求1所述的镀膜设备，其特征在于，所述镀膜设备包括至少两个位置传感器，且每个位置传感器都配置有对应的传感器探测通路和防护装置。
9.根据权利要求1所述的镀膜设备，其特征在于，所述位置传感器为光电传感器，其发射光束。
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