CN207632888U - A kind of symmetrical pair of high-vacuum pump extract system and coating system - Google Patents
A kind of symmetrical pair of high-vacuum pump extract system and coating system Download PDFInfo
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- CN207632888U CN207632888U CN201721837439.5U CN201721837439U CN207632888U CN 207632888 U CN207632888 U CN 207632888U CN 201721837439 U CN201721837439 U CN 201721837439U CN 207632888 U CN207632888 U CN 207632888U
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Abstract
The utility model is related to coating technique fields, more particularly, to a kind of symmetrical double high-vacuum pump extract systems and coating system, including：Vacuum chamber, the first high-vacuum pump, the second high-vacuum pump, the first high vacuum valve and the second high vacuum valve；The both sides of the vacuum chamber are symmetrically arranged with the first pump chamber and the second pump chamber；First high-vacuum pump is set in first pump chamber；Second high-vacuum pump is set in second pump chamber；First high vacuum valve is set in the vacuum chamber at the channel of the first high-vacuum pump；Second high vacuum valve is set in the vacuum chamber at the channel of the second high-vacuum pump.Because using double high-vacuum pumps and bivalve design, the whole speed of evacuation is doubled the utility model.Make to be added to the indoor process gas of vacuum using bilateral symmetry design simultaneously and uniformly be taken away from the right and left, the rate of film build and uniformity of plated film film layer can be improved, improve finished product output capacity.
Description
Technical field
The utility model is related to coating technique field, more particularly, to a kind of symmetrical double high-vacuum pump extract systems and
Coating system.
Background technology
With the fast development of optical communication industry, optical coating products application is more and more extensive, to optical coating product
Demand also increases year by year.The front-end geometry design that optical coating system extract system is commonly used.Vacuum cavity passes through Gao Zhen
Empty valve is connected with high-vacuum pump, and the indoor gas of vacuum makes vacuum chamber reach by being pumped discharge into vacuum pump after extraction valve
To high vacuum state, meet the high vacuum environment of coating process requirement.Due to plated film vacuum-chamber dimensions is larger, sealing surface is more,
The factor in the majority such as extract system path length, front and back or up-down structure extract system coating machine pumpdown time is long, process limitation
Greatly, output and the application of plated film are largely limited.
The information for being disclosed in the background technology part is merely intended to deepen the understanding to the general background technology of the application, and
It is not construed as recognizing or implying in any form that the information constitutes the prior art known to those skilled in the art.
Utility model content
The purpose of this utility model is to provide a kind of symmetrical double high-vacuum pump extract systems and coating systems, with solution
Certainly the technical problems existing in the prior art.
To achieve the goals above, the utility model uses following technical scheme：
In a first aspect, the utility model provides a kind of symmetrical double high-vacuum pump extract systems comprising：Vacuum chamber,
One high-vacuum pump, the second high-vacuum pump, the first high vacuum valve and the second high vacuum valve；
The both sides of the vacuum chamber are symmetrically arranged with the first pump chamber and the second pump chamber；
First high-vacuum pump is set in first pump chamber；
Second high-vacuum pump is set in second pump chamber；
First high vacuum valve is set in the vacuum chamber at the channel of the first high-vacuum pump；
Second high vacuum valve is set in the vacuum chamber at the channel of the second high-vacuum pump.
As a kind of further technical solution, the double high-vacuum pump extract systems of the symmetrical expression further include：Controller, first
Butterfly valve and second butterfly valve；
The first butterfly valve is set to first pump chamber and the top positioned at the first high-vacuum pump；
The second butterfly valve is set to second pump chamber and the top positioned at the second high-vacuum pump；
The controller is connect with the first butterfly valve and second butterfly valve signal respectively, for controlling dehiscing for each butterfly valve
Aperture.
As a kind of further technical solution, first pump chamber is connected with the first split channel；Second pump chamber
It is connected with the second split channel；
First split channel and the second split channel come together in a mainstream channel above the vacuum chamber.
As a kind of further technical solution, step valve before being provided with one on first split channel.
As a kind of further technical solution, step valve before being provided with one on second split channel.
As a kind of further technical solution, second split channel is connected with a branch with the vacuum chamber and leads to
Road, step valve before being provided with one on the bypass passage.
As a kind of further technical solution, lobe pump and mechanical pump, the machinery are provided on the mainstream channel
Pump is connect with gas discharge outlet, and the gas discharge outlet is provided with a filter screen.
As a kind of further technical solution, process gas inlets are provided with below the vacuum chamber.
As a kind of further technical solution, the vacuum chamber is provided with deflation close to the position of the first high vacuum valve
Valve and filter screen.
Second aspect, the utility model also provide a kind of coating system comprising the double high vacuum pumpings of the symmetrical expression
Gas system.
The double high-vacuum pump extract systems of the symmetrical expression include：Vacuum chamber, the first high-vacuum pump, the second high-vacuum pump, first
High vacuum valve and the second high vacuum valve；
The both sides of the vacuum chamber are symmetrically arranged with the first pump chamber and the second pump chamber；
First high-vacuum pump is set in first pump chamber；
Second high-vacuum pump is set in second pump chamber；
First high vacuum valve is set in the vacuum chamber at the channel of the first high-vacuum pump；
Second high vacuum valve is set in the vacuum chamber at the channel of the second high-vacuum pump.
Using above-mentioned technical proposal, the utility model has the advantages that：
1), the whole speed of evacuation is doubled, and shortens the production cycle；
2), gas flow than it is traditional evenly, film quality and uniformity can be improved；
3) plated film rate, is improved, equipment quantum of output is increased；
4) apparatus and process control flexibility, is improved, keeps application more extensive.
Description of the drawings
It, below will be right in order to illustrate more clearly of specific embodiment of the present invention or technical solution in the prior art
Specific implementation mode or attached drawing needed to be used in the description of the prior art are briefly described, it should be apparent that, it is described below
In attached drawing be that some embodiments of the utility model are not paying creativeness for those of ordinary skill in the art
Under the premise of labour, other drawings may also be obtained based on these drawings.
Fig. 1 is the structural schematic diagram for the double high-vacuum pump extract systems of symmetrical expression that the utility model embodiment provides；
Fig. 2 is the operation principle schematic diagram for the double high-vacuum pump extract systems of symmetrical expression that the utility model embodiment provides.
Icon：Step valve before 1-；The second high vacuum valves of 2-；Step valve before 3-；4- vacuum chambers；The first high vacuum valves of 5-；6- deflates
Valve；7- filter screens；Step valve before 8-；9- lobe pumps；10- mechanical pumps；11- gas discharge outlets；12- first butterfly valves；The first Gao Zhen of 13-
Sky pump；14- second butterfly valves；The second high-vacuum pumps of 15-.
Specific implementation mode
The technical solution of the utility model is clearly and completely described below in conjunction with attached drawing, it is clear that described
Embodiment is the utility model a part of the embodiment, instead of all the embodiments.Based on the embodiments of the present invention, originally
The every other embodiment that field those of ordinary skill is obtained without making creative work, belongs to this practicality
Novel protected range.
It is in the description of the present invention, it should be noted that term "center", "upper", "lower", "left", "right", " perpendicular
Directly ", the orientation or positional relationship of the instructions such as "horizontal", "inner", "outside" is to be based on the orientation or positional relationship shown in the drawings, and is only
The utility model and simplifying describes for ease of description, do not indicate or imply the indicated device or element must have it is specific
Orientation, with specific azimuth configuration and operation, therefore should not be understood as limiting the present invention.In addition, term " the
One ", " second ", " third " are used for description purposes only, and are not understood to indicate or imply relative importance.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " is pacified
Dress ", " connected ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integrally
Connection；It can be mechanical connection, can also be electrical connection；Can be directly connected, can also indirectly connected through an intermediary,
It can be the connection inside two elements.For the ordinary skill in the art, on can understanding as the case may be
State the concrete meaning of term in the present invention.
Specific embodiment of the present utility model is described in detail below in conjunction with attached drawing.It should be understood that herein
Described specific implementation mode is only used for describing and explaining the present invention, and is not intended to limit the utility model.
Embodiment one
In conjunction with shown in Fig. 1 to Fig. 2, the utility model provides a kind of symmetrical double high-vacuum pump extract systems comprising：Very
Empty room 4, the first high-vacuum pump 13, the second high-vacuum pump 15, the first high vacuum valve 5 and the second high vacuum valve 2；Wherein, described true
The both sides of empty room 4 are symmetrically arranged with the first pump chamber and the second pump chamber (using the symmetrical design of double high-vacuum pumps, vacuum chamber
Gas in 4 enters high-vacuum pump by high vacuum valve from the left and right sides and is pumped)；First high-vacuum pump 13 is set to institute
It states in the first pump chamber；Wherein, second high-vacuum pump 15 is set in second pump chamber；Wherein, first high vacuum
Valve 5 is set in the vacuum chamber 4 at the channel of the first high-vacuum pump 13；Second high vacuum valve 2 is set to described
In vacuum chamber 4 at the channel of the second high-vacuum pump 15.
As it can be seen that the symmetrical double high-vacuum pump extract systems of the utility model are set using double high-vacuum pumps are symmetrical
It counts, the gas in vacuum chamber 4 enters high-vacuum pump by high vacuum valve from the left and right sides and is pumped.Because using double high vacuum
Pump and bivalve design, the whole speed of evacuation are doubled.Make to be added to vacuum using bilateral symmetry design simultaneously
Process gas in room 4 is uniformly taken away from the right and left, and the rate of film build and uniformity that can improve plated film film layer (divide because of gas
Son can move in pumping process, and the gas molecule of movement can bump against during the motion with the Coating Materials molecule sputtered,
So the movement locus of gas molecule influences whether the direction of motion, speed and density of Coating Materials molecule, to influence film
Quality and uniformity), improve finished product output capacity.
In the present embodiment, as a kind of further technical solution, the double high-vacuum pump extract systems of the symmetrical expression further include：
Controller, first butterfly valve 12 and second butterfly valve 14；The first butterfly valve 12 is set to first pump chamber and is located at the first Gao Zhen
The top of sky pump 13；The second butterfly valve 14 is set to second pump chamber and the top positioned at the second high-vacuum pump 15；It is described
Controller is connect with the first butterfly valve 12 and 14 signal of second butterfly valve respectively, the aperture of dehiscing for controlling each butterfly valve.
Certainly, specifically, for butterfly valve, the valve shaft for being included in butterfly valve is respectively arranged with symmetrical first overturning flap
With the second overturning flap, one of valve shaft is connect with driving gear, another valve shaft is connect with driven gear, certainly, actively
Gear and driven gear intermeshing connection, and driving gear connects driver, and driver is connect with controller signals.Butterfly valve
Open angle is adjusted by controller.The angle that butterfly valve is opened is bigger, and the speed of evacuation of extract system is faster, and regulating butterfly valve is opened
Angle can adjust the speed of evacuation of extract system.Traditional optical coating system by high vacuum valve control the logical of extract system with
Break, only the function of on and off, does not have speed of evacuation adjustment function.Increase the double high-vacuum pump extract systems of symmetrical expression of butterfly valve
It can be according to the speed of evacuation of the free bleeding regulating system of needs of making technology.It can be realized by the function and stablize and adjust
Vacuum degree in vacuum coating room when dynamic keeps coating process process control more stable more flexible, realizes that apparatus and process adjusts model
Enclose big, output capacity and the requirements such as qualification rate is higher.
As a kind of further technical solution, first pump chamber is connected with the first split channel；Second pump chamber
It is connected with the second split channel；First split channel and the second split channel are in the top of the vacuum chamber 4 in the figure
Come together in a mainstream channel.
Wherein, as a kind of further technical solution, step valve 8 before being provided with one on first split channel.
It is corresponding, step valve 1 before being provided with one on second split channel.
Moreover, second split channel is connected with a bypass passage with the vacuum chamber 4, it is arranged on the bypass passage
Step valve 3 before having one.
In the present embodiment, as a kind of further technical solution, lobe pump 9 and machinery are provided on the mainstream channel
Pump 10, the mechanical pump 10 is connect with gas discharge outlet 11, and the gas discharge outlet 11 is provided with a filter screen.
In the present embodiment, as a kind of further technical solution, the lower section of the vacuum chamber 4 be provided with process gas into
Mouthful, process gas can enter to vacuum chamber 4 from the import.
In the present embodiment, as a kind of further technical solution, close first high vacuum valve 5 of the vacuum chamber 4
Position is provided with vent valve 6 and filter screen 7.
To sum up, using above-mentioned technical proposal, the utility model has the advantages that：
1), the whole speed of evacuation is doubled, and shortens the production cycle；
2), gas flow than it is traditional evenly, film quality and uniformity can be improved；
3) plated film rate, is improved, equipment quantum of output is increased；
4) apparatus and process control flexibility, is improved, keeps application more extensive.
Embodiment two
The present embodiment two also provides a kind of coating system comprising the double high-vacuum pump extract systems of the symmetrical expression.When
So, which further includes the equipment that other can be used cooperatively with symmetrical double high-vacuum pump extract systems.
Specifically, in conjunction with shown in Fig. 1 to Fig. 2, the double high-vacuum pump extract systems of the symmetrical expression include：Vacuum chamber 4, first
High-vacuum pump 13, the second high-vacuum pump 15, the first high vacuum valve 5 and the second high vacuum valve 2；Wherein, the both sides of the vacuum chamber 4
Be symmetrically arranged with the first pump chamber and the second pump chamber (using the symmetrical design of double high-vacuum pumps, gas in vacuum chamber 4 from
The left and right sides enters high-vacuum pump by high vacuum valve and is pumped)；First high-vacuum pump 13 is set to first pump chamber
It is interior；Wherein, second high-vacuum pump 15 is set in second pump chamber；Wherein, first high vacuum valve 5 is set to institute
It states in vacuum chamber 4 at the channel of the first high-vacuum pump 13；Second high vacuum valve 2, which is set in the vacuum chamber 4, to be leaned on
At the channel of nearly second high-vacuum pump 15.
As it can be seen that the symmetrical double high-vacuum pump extract systems of the utility model are set using double high-vacuum pumps are symmetrical
It counts, the gas in vacuum chamber 4 enters high-vacuum pump by high vacuum valve from the left and right sides and is pumped.Because using double high vacuum
Pump and bivalve design, the whole speed of evacuation are doubled.Make to be added to vacuum using bilateral symmetry design simultaneously
Process gas in room 4 is uniformly taken away from the right and left, and the rate of film build and uniformity that can improve plated film film layer (divide because of gas
Son can move in pumping process, and the gas molecule of movement can bump against during the motion with the Coating Materials molecule sputtered,
So the movement locus of gas molecule influences whether the direction of motion, speed and density of Coating Materials molecule, to influence film
Quality and uniformity), improve finished product output capacity.
In the present embodiment, as a kind of further technical solution, the double high-vacuum pump extract systems of the symmetrical expression further include：
Controller, first butterfly valve 12 and second butterfly valve 14；The first butterfly valve 12 is set to first pump chamber and is located at the first Gao Zhen
The top of sky pump 13；The second butterfly valve 14 is set to second pump chamber and the top positioned at the second high-vacuum pump 15；It is described
Controller is connect with the first butterfly valve 12 and 14 signal of second butterfly valve respectively, the aperture of dehiscing for controlling each butterfly valve.
Certainly, specifically, for butterfly valve, the valve shaft for being included in butterfly valve is respectively arranged with symmetrical first overturning flap
With the second overturning flap, one of valve shaft is connect with driving gear, another valve shaft is connect with driven gear, certainly, actively
Gear and driven gear intermeshing connection, and driving gear connects driver, and driver is connect with controller signals.Butterfly valve
Open angle is adjusted by controller.The angle that butterfly valve is opened is bigger, and the speed of evacuation of extract system is faster, and regulating butterfly valve is opened
Angle can adjust the speed of evacuation of extract system.Traditional optical coating system by high vacuum valve control the logical of extract system with
Break, only the function of on and off, does not have speed of evacuation adjustment function.Increase the double high-vacuum pump extract systems of symmetrical expression of butterfly valve
It can be according to the speed of evacuation of the free bleeding regulating system of needs of making technology.It can be realized by the function and stablize and adjust
Vacuum degree in vacuum coating room when dynamic keeps coating process process control more stable more flexible, realizes that apparatus and process adjusts model
Enclose big, output capacity and the requirements such as qualification rate is higher.
As a kind of further technical solution, first pump chamber is connected with the first split channel；Second pump chamber
It is connected with the second split channel；First split channel and the second split channel are in the top of the vacuum chamber 4 in the figure
Come together in a mainstream channel.
Wherein, as a kind of further technical solution, step valve 8 before being provided with one on first split channel.
It is corresponding, step valve 1 before being provided with one on second split channel.
Moreover, second split channel is connected with a bypass passage with the vacuum chamber 4, it is arranged on the bypass passage
Step valve 3 before having one.
In the present embodiment, as a kind of further technical solution, lobe pump 9 and machinery are provided on the mainstream channel
Pump 10, the mechanical pump 10 is connect with gas discharge outlet 11, and the gas discharge outlet 11 is provided with a filter screen.
In the present embodiment, as a kind of further technical solution, the lower section of the vacuum chamber 4 be provided with process gas into
Mouthful, process gas can enter to vacuum chamber 4 from the import.
In the present embodiment, as a kind of further technical solution, close first high vacuum valve 5 of the vacuum chamber 4
Position is provided with vent valve 6 and filter screen 7.
The symmetrical double high-vacuum pump extract systems of the utility model are using the symmetrical design of double high-vacuum pumps, vacuum
Gas in room 4 enters high-vacuum pump by high vacuum valve from the left and right sides and is pumped.Because using double high-vacuum pumps and double
Valve designs, and the whole speed of evacuation is doubled.Make to be added in vacuum chamber 4 using bilateral symmetry design simultaneously
Process gas is uniformly taken away from the right and left, and the rate of film build and uniformity that can improve plated film film layer (are being taken out because of gas molecule
It can be moved during gas, the gas molecule of movement can bump against during the motion with the Coating Materials molecule sputtered, so gas
The movement locus of body molecule influences whether the direction of motion, speed and density of Coating Materials molecule, to influence the quality of film
And uniformity), improve finished product output capacity.
Finally it should be noted that：The above various embodiments is only to illustrate the technical solution of the utility model, rather than limits it
System；Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should
Understand：It still can be with technical scheme described in the above embodiments is modified, either to which part or whole
Technical characteristic carries out equivalent replacement；And these modifications or replacements, this practicality that it does not separate the essence of the corresponding technical solution are new
The range of each embodiment technical solution of type.
Claims (10)
1. a kind of symmetrical double high-vacuum pump extract systems, which is characterized in that including：It is vacuum chamber, the first high-vacuum pump, second high
Vacuum pump, the first high vacuum valve and the second high vacuum valve；
The both sides of the vacuum chamber are symmetrically arranged with the first pump chamber and the second pump chamber；
First high-vacuum pump is set in first pump chamber；
Second high-vacuum pump is set in second pump chamber；
First high vacuum valve is set in the vacuum chamber at the channel of the first high-vacuum pump；
Second high vacuum valve is set in the vacuum chamber at the channel of the second high-vacuum pump.
2. symmetrical double high-vacuum pump extract systems according to claim 1, which is characterized in that further include：Controller,
One butterfly valve and second butterfly valve；
The first butterfly valve is set to first pump chamber and the top positioned at the first high-vacuum pump；
The second butterfly valve is set to second pump chamber and the top positioned at the second high-vacuum pump；
The controller is connect with the first butterfly valve and second butterfly valve signal respectively, for controlling dehiscing out for each butterfly valve
Degree.
3. symmetrical double high-vacuum pump extract systems according to claim 1, which is characterized in that
First pump chamber is connected with the first split channel；
Second pump chamber is connected with the second split channel；
First split channel and the second split channel come together in a mainstream channel above the vacuum chamber.
4. symmetrical double high-vacuum pump extract systems according to claim 3, which is characterized in that first split channel
On be provided with one before step valve.
5. symmetrical double high-vacuum pump extract systems according to claim 3, which is characterized in that second split channel
On be provided with one before step valve.
6. symmetrical double high-vacuum pump extract systems according to claim 3, which is characterized in that second split channel
It is connected with a bypass passage, step valve before being provided with one on the bypass passage with the vacuum chamber.
7. symmetrical double high-vacuum pump extract systems according to claim 3, which is characterized in that set on the mainstream channel
It is equipped with lobe pump and mechanical pump, the mechanical pump is connect with gas discharge outlet, and the gas discharge outlet is provided with a filter screen.
8. symmetrical double high-vacuum pump extract systems according to claim 1, which is characterized in that the lower section of the vacuum chamber
It is provided with process gas inlets.
9. symmetrical double high-vacuum pump extract systems according to claim 1, which is characterized in that the vacuum chamber it is close
The position of first high vacuum valve is provided with vent valve and filter screen.
10. a kind of coating system, which is characterized in that including symmetrical double high vacuum as claimed in any one of claims 1-9 wherein
Pump extract system.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721837439.5U CN207632888U (en) | 2017-12-25 | 2017-12-25 | A kind of symmetrical pair of high-vacuum pump extract system and coating system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201721837439.5U CN207632888U (en) | 2017-12-25 | 2017-12-25 | A kind of symmetrical pair of high-vacuum pump extract system and coating system |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110303374A (en) * | 2019-07-26 | 2019-10-08 | 哈尔滨理工大学 | One kind being based on mach automation workpiece holding shipping unit |
| CN112430805A (en) * | 2020-11-23 | 2021-03-02 | 中国科学院光电技术研究所 | Vacuum control system of atomic layer deposition coating machine |
| CN112853304A (en) * | 2020-12-31 | 2021-05-28 | 广东欣丰科技有限公司 | Vacuum winding coating device and processing method thereof |
-
2017
- 2017-12-25 CN CN201721837439.5U patent/CN207632888U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110303374A (en) * | 2019-07-26 | 2019-10-08 | 哈尔滨理工大学 | One kind being based on mach automation workpiece holding shipping unit |
| CN112430805A (en) * | 2020-11-23 | 2021-03-02 | 中国科学院光电技术研究所 | Vacuum control system of atomic layer deposition coating machine |
| CN112853304A (en) * | 2020-12-31 | 2021-05-28 | 广东欣丰科技有限公司 | Vacuum winding coating device and processing method thereof |
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